Chemical solution supply system, solution replacement method, substrate processing device and medium

Abstract

The chemical solution supply system includes a first supply unit and a control unit. The first supply unit includes a storage tank, an inlet pipe, a first loop pipe, a heater, a first discharge pipe, a flushing pipe, and a detection device. The inlet pipe is used to introduce chemical solution into the storage tank. The first loop pipe connects the inlet and outlet of the storage tank. The heater is located in the first loop pipe. The first discharge pipe is connected to the first loop pipe. The flushing pipe is used to introduce flushing liquid into the storage tank after the chemical solution in the storage tank and the heater is discharged from the first discharge pipe. The detection device is used to detect process parameters in the storage tank and / or the first loop pipe. The control unit is communicatively connected to the inlet pipe, the flushing pipe, and the detection device, and is used to control the on / off state of the inlet pipe or the flushing pipe according to the process parameters detected by the detection device.

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