Substrate processing chamber

TW202642959APending Publication Date: 2026-10-16APPLIED MATERIALS INC
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Patent Information

Application Number
TW115104172
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-04
Filing Date
2026-02-03
Publication Date
2026-10-16

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Abstract

A substrate processing chamber includes a first actuator coupled to a first shaft to raise and lower a substrate support, and a second actuator coupled to a second shaft to raise and lower a seal plate disposed below the substrate support. The processing chamber further includes a third actuator coupled to a third shaft to raise and lower a hoop plate to operate a plurality of lift pins.
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