Semiconductor device and methods of forming the same

Abstract

A method for forming a semiconductor device, comprising forming a dielectric layer over a substrate; forming a conductive layer over the dielectric layer; forming a photoresist layer over the conductive layer, wherein the photoresist layer includes a magnetic material; performing an exposure process to the photoresist layer to form an exposed region and an unexposed region in the photoresist layer; applying a directional magnetic field to the photoresist layer; performing a post-exposure baking process to the photoresist layer; performing a developing process to remove portions of the photoresist layer; and transferring a pattern of remaining portions of the photoresist layer to the conductive layer and the dielectric layer.

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