Wafer cleaning fluid discharge structure

Abstract

This application provides a wafer cleaning fluid discharge structure, belonging to the field of semiconductor manufacturing. The wafer cleaning fluid discharge structure is disposed in a wafer cleaning chamber. The discharge structure includes: multiple annular guide shields, each annular guide shield including a shield body and an annular snap-fit ​​member extending vertically from the lower end of the shield body. Adjacent annular guide shields are connected by the annular snap-fit ​​member and form a guide channel for discharging cleaning fluid; a lifter for driving each annular guide shield to move up and down; wherein, each annular guide shield has a limiting part on the annular snap-fit ​​member, the limiting part being used to limit the adjacent annular guide shields.

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