Carrier ring for plasma chamber

TWD245898SActive Publication Date: 2026-08-01LAM RES CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Designs
Current Assignee / Owner
LAM RES CORP
Filing Date
2024-12-30
Publication Date
2026-08-01

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Abstract

【Item Uses】 (slightly). 【Design Description】 The top perspective view is a top perspective view of an embodiment of the support ring used in the plasma chamber; The bottom-view perspective is a bottom-view perspective of the bearing ring shown in the top-view perspective. The enlarged view is an enlarged view of a portion of the perspective shown in the bottom-view stereoscopic view; The top view is a top view of the bearing ring shown in the top-view perspective. The bottom view is the bottom view of the bearing ring shown in the top-view perspective. The left-side view is the left-side view of the bearing ring shown in the top perspective view; and The right-side view is the right-side view of the bearing ring shown in the top-view perspective. The dashed broken lines in the diagram represent parts of the object that are not recommended for design. The design shown in the top perspective, bottom perspective, enlarged view, top view, bottom view, left view, and right view is characterized by three slots in the support ring, and three base plate support assemblies are respectively installed in the slots in the support ring. As shown and illustrated, this design is a decorative design for a carrier ring used in a plasma chamber in semiconductor manufacturing equipment.
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