Focus ring

Abstract

【Item Uses】 This article is a focusing ring installed and used inside a cavity. It is used to improve the plasma uniformity on the surface of the semiconductor wafer by extending the distribution of plasma generated in the cavity from the surface of the semiconductor wafer to the surface of this article. The "Reference Diagram Showing the Use State" is a schematic cross-sectional view illustrating the use state of this article. 【Design Description】 In the "3D view", the curved lines appearing on the surface of the object indicate the shape and do not constitute a decorative pattern of this design. This design is about a novel and creative design that not only achieves the required function, but also provides a unique appearance that is not seen in previous technologies and is refreshing to the observer.

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