electrostatic chuck

TWD246959SActive Publication Date: 2026-10-01ULVAC INC
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Patent Information

Application Number
TW114305668
Authority / Receiving Office
TW · TW
Patent Type
Designs
Current Assignee / Owner
Priority Date
2025-10-10
Filing Date
2025-12-03
Publication Date
2026-10-01
Estimated Expiration
2040-12-02

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    Figure TWG2TB001914207_002
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Abstract

【Item Uses】 The item in this design is an electrostatic chuck, which is, for example, placed in the vacuum chamber of a vacuum processing device to adsorb a rectangular glass substrate that is the object being vacuum processed. 【Design Description】 This product is primarily composed of a substrate and a dielectric layer disposed on the front side of the substrate. The dielectric layer consists of a first dielectric layer and a second dielectric layer, whose color differences are visually discernible due to their different volume resistivity. Furthermore, the dielectric layer has protruding strips that extend towards the front side to contact a portion of the glass substrate. The contact surfaces of these protruding strips with the glass substrate are processed to allow visually discernible color differences. As shown in the "Reference Cross-Sectional View and DD Enlarged Reference Cross-Sectional View showing the adsorption state of the substrate," after the glass substrate is disposed on the dielectric layer, applying a voltage to the electrodes disposed within the dielectric layer causes the portion of the glass substrate facing the first dielectric layer to be adsorbed by an adsorption force primarily composed of Johnson-Rahbeck force or Coulomb force; the portion of the glass substrate facing the second dielectric layer is adsorbed by an adsorption force primarily composed of gradient force. In addition, this article is provided with a first gas passage that runs through the thickness direction of the substrate and a second gas passage that connects to the first gas passage, forms a slit in the dielectric layer, so that a specified gas can be introduced between the substrate and the dielectric layer. The right-side view is symmetrical to the left-side view; the right-side view is omitted. The bottom view is symmetrical to the top view, and the bottom view is omitted.
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Citation Information

Patent Citations

  • Tray (anti-static EVA integrated foam molding BY001)

    CN309441241S