Part of shower plate

TWD247315SActive Publication Date: 2026-10-11NIPPON SEIMITSU DENSHI
View PDF 6 Cites 0 Cited by

Patent Information

Application Number
TW115302723D01
Authority / Receiving Office
TW · TW
Patent Type
Designs
Current Assignee / Owner
Priority Date
2026-01-06
Filing Date
2026-06-08
Publication Date
2026-10-11
Estimated Expiration
2041-06-07

Smart Images

  • Figure TWG2TB001916419_001
    Figure TWG2TB001916419_001
  • Figure TWG2TB001916419_002
    Figure TWG2TB001916419_002
  • Figure TWG2TB001916419_003
    Figure TWG2TB001916419_003
Patent Text Reader

Abstract

【Item Uses】 The article used in this design is used in plasma reactors used in the manufacture of semiconductors, etc., to inject plasma excitation gas into the processing chamber of the plasma reactor. The spray plate of the article used in this design is arranged with its front view side facing into the processing chamber. The part of the design to be claimed in this application is the nozzle portion of the spray plate that injects the gas. 【Design Description】 The parts indicated by solid lines represent the design aspects for which this application seeks to claim a design, while the parts indicated by dashed lines represent the parts for which this application does not claim a design. The left-side view is omitted because it is symmetrical to the right-side view. The top view is omitted because it is symmetrical to the bottom view. The enlarged view of section D is an enlarged view of the portion circled in the cross-sectional view along reference line AA (section D). The enlarged view of the front view is an enlarged view of the hole seen from the direction indicated by arrow E in the enlarged view of section D. The enlarged view of the rear view is an enlarged view of the hole seen from the direction indicated by arrow F in the enlarged view of section D.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Gas ejection plate for semiconductor processing electrodes

    TW596250S

  • Gas ejection plate for semiconductor processing electrodes

    TW596251S

  • Gas ejection plate for semiconductor processing electrodes

    TWD104305S

  • Showerhead for a semiconductor processing chamber (1)

    TWD184277S

  • Shower plate

    USD665055S