Particle beam system with multi-source system and multi-beam particle microscope

The two-stage beam shaping method in multi-beam particle systems addresses non-uniform emission issues by initial shaping near the multi-source and final adjustment, ensuring uniformity and improving throughput and resolution.

TWI933806BActive Publication Date: 2026-08-01CARL ZEISS MULTISEM GMBH
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Patent Information

Application Number
TW110118419
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Priority Date
2020-06-08
Filing Date
2021-05-21
Publication Date
2026-08-01
Estimated Expiration
2041-05-20

AI Technical Summary

Technical Problem

Existing multi-beam particle beam systems face challenges with non-uniform emission characteristics across multiple beams, leading to variations in current density and irradiance, which affect image brightness and throughput, especially when using large emission angles and multi-source systems like cold field emitter arrays.

Method used

A two-stage beam shaping process is implemented, where initial beam shaping is done near the multi-source using MEMS technology to form individual beams, followed by final beam shaping within the system, adjusting lenses and deflectors to compensate for emission variations and ensure uniformity, using a multi-lens array and beam current-limiting plates.

Benefits of technology

This approach achieves uniform beam current intensity across individual beams, minimizing imaging aberrations and enhancing throughput and resolution in multi-beam detection systems, allowing for high-resolution and high-throughput particle optical imaging.

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Abstract

This invention discloses a particle beam system with a multi-source system. The multi-source system includes an array of electron emitters, which serves as a multi-source particle system. In this multi-source system, the heterogeneous emission characteristics of the various emitters are corrected or pre-corrected for subsequent particle optical imaging using particle optics components (which can be manufactured using MEMS technology). The beam current of the individual particle beams can be adjusted within this multi-source system.
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