Method, system and apparatus for controlling a liquid
Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- ASM IP HLDG BV
- Filing Date
- 2022-09-12
- Publication Date
- 2026-08-01
AI Technical Summary
Conventional systems for refilling source containers during semiconductor device fabrication suffer from false sensor readings due to liquid spray and splash, which affect the accuracy of liquid level detection.
The system directs the incoming liquid flow onto the side wall of the source container using an inlet tube with a curved design, preventing direct contact with the sensor and minimizing splash, thereby ensuring accurate liquid level detection.
The solution effectively prevents false sensor readings by controlling the liquid flow direction, ensuring precise liquid level monitoring and maintaining operational integrity.
Smart Images

Figure TWG2TB001903370_001 
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Abstract
Description
Technical Field
[0001] This disclosure generally relates to a method and apparatus for controlling liquids in a source container. More specifically, this disclosure relates to a system for controlling the flow of liquid chemicals used during the manufacture of semiconductor devices. Prior Technology
[0002] Source containers used during semiconductor device manufacturing may require refilling. Conventional systems provide an inlet pipe to allow liquid to flow into the source container, refilling it to the desired level. Sensors typically positioned within the source container detect the level of liquid within and determine when the liquid has reached the desired level. However, during the refill process, the incoming liquid may spray directly onto the sensors, leading to erroneous sensor readings. Furthermore, the incoming liquid may splash out as it flows into the source container, also potentially causing erroneous sensor readings. Summary of the Invention
[0003] An apparatus for controlling a liquid provides a source container to contain the liquid and an inlet pipe for allowing the liquid to flow into the source container. The inlet pipe may extend into the source container and may be configured to guide the flowing liquid onto a side wall of the source container. Simple Explanation of the Diagram
[0004] The following description will use the accompanying drawings, which are intended to illustrate but not limit certain embodiments of the present disclosure, to describe these and other features, features, and advantages of the present disclosure disclosed herein. Figure 1 representatively illustrates a system according to one exemplary embodiment of the present technology; Figure 2 is a side view of a device for controlling liquids according to an exemplary embodiment of the present technology; Figure 3 is a perspective view of a portion of an apparatus for controlling liquids according to an exemplary embodiment of the present technology; Figure 4 is a side view of an inlet pipe according to an exemplary embodiment of the present technology; and Figure 5 is a side view of the inlet pipe according to an alternative embodiment of the present technology.
[0005] It should be understood that the elements in the drawings are shown for simplicity and clarity and are not necessarily drawn to scale. For example, the relative size of some elements in the drawings may be exaggerated relative to other elements to help improve the understanding of the illustrated embodiments. Implementation
[0006] The reference figures, with their similar element symbols, identify similar structural features or configurations disclosed herein. For purposes of explanation and illustration, and not limitation, partial views of an example of a semiconductor processing system according to this disclosure are shown in Figure 1 and are generally designated by reference character 100. Other examples of semiconductor processing systems according to this disclosure, or their configurations, are provided in Figures 2 through 5 as described. The systems and methods disclosed herein can be used to fill containers, such as filling source containers for semiconductor processing, but this disclosure is not limited to filling source containers for semiconductor processing or filling containers in general.
[0007] The illustrative embodiments described below are merely exemplary and intended for illustrative purposes only; the following description is not intended to limit the scope of this disclosure or the claims. Furthermore, depicting multiple embodiments having the described features is not intended to exclude other embodiments having additional features or other embodiments having different combinations of the described features.
[0008] This disclosure is generally related to systems and devices for controlling liquids. Furthermore, some aspects of this technology are generally related to devices for containing liquids.
[0009] Referring to Figure 1, system 100 may include an external bulk container 105 for storing liquids, such as chemical liquids used in the manufacturing process of semiconductor devices. The external bulk container 105 may be fluidly connected to a tool 110, which houses a device 115 for controlling the flow of liquid to a reaction chamber 120. For example, the external bulk container 105 may be connected to the device 115 via a first piping system 125, and the device 115 may be connected to the reaction chamber 120 via a second piping system 130.
[0010] The first piping system 125 may be configured to flow liquid chemicals 135 from an external bulk container 105 to the equipment 115, and may include any number of pipes, pumps and / or valves suitable for maintaining the desired flow rate.
[0011] The second piping system 130 may be configured to allow gas or vapor from device 115 to flow into reaction chamber 120, and may include any number of pipes, pumps, and / or valves suitable for maintaining the desired flow rate. The gas or vapor flowing into reaction chamber 120 may be used to deposit a semiconductor film on a wafer disposed within reaction chamber 120.
[0012] In one exemplary embodiment, and referring to Figure 2, device 115 may include source container 200, cap 215, inlet tube 205, and sensor 210.
[0013] Source container 200 may be configured to hold or otherwise contain liquid 135. For example, source container 200 may include a horizontally configured base plate 202. Source container 200 may further include sidewalls 204 connected to or integrated with the base plate 202 and extending upward from the base plate 202 in a vertical position. In other words, sidewalls 204 may be perpendicular to the base plate 202. Source container 200 may be of any suitable shape and size. For example, source container 200 may be a cylindrical shape with one continuous sidewall and a circular base plate (e.g., as shown in Figure 3). Alternatively, source container 200 may be a cubic or cuboid shape with four (4) sidewalls and a square or rectangular base plate.
[0014] In one embodiment, the source container 200 may be a single continuous shape. Alternatively, the source container 200 may be formed from two or more elements (e.g., the base plate 202 may be welded to the sidewall 204). The source container 200 may be formed from any material suitable for holding liquid 135, such as stainless steel 316L or any other suitable material.
[0015] The sidewall 204 may include an inward-facing surface 230 and an outward-facing surface 220. Similarly, the base plate 202 may include an inward-facing surface 265 and an outward-facing surface 270. The inward-facing surface 265 of the base plate 202, the inward-facing surface of the sidewall 204, and the lid 215 define an internal cavity 260 of the source container. The internal cavity 260 can be used to hold liquid 135.
[0016] The lid 215 (also referred to as the top plate) may be configured to close or otherwise seal the source container 200. For example, the lid 215 may abut the top edge of the sidewall 204 and may establish an airtight seal with the sidewall 204 of the source container 200. For example, the lid 215 may be welded to the sidewall 204 of the source container 200. Alternatively, the lid 215 may be integrated with the sidewall 204.
[0017] The lid 215 may include a first flat surface 275 facing the internal cavity 260 of the source container 200, and a second flat surface 280 facing away from the internal cavity 260 of the source container 200 relative to the first flat surface 275. The top plate includes a first flat surface facing the internal cavity of the source container, and a second flat surface facing away from the internal cavity of the source container relative to the first flat surface. The lid 215 may be configured parallel to the base plate 202 and perpendicular to the sidewall 204.
[0018] In various embodiments, and referring to Figure 3, the cover 215 may further include a first through-hole 300 and a second through-hole 305. The first through-hole 300 may be appropriately sized to accommodate the inlet tube 205. The second through-hole 305 may be appropriately sized to accommodate the sensor 210. In various embodiments, the cover 315 may further include various sealing devices and / or materials within the first through-hole 300 and the second through-hole 305 to prevent air from entering the internal cavity 260 of the source container 200 and to maintain the required pressure within the source container 200.
[0019] In various embodiments, the cap 215 may further include a third through-hole (not shown), appropriately sized to accommodate or otherwise attach to the second piping system 130. The third through-hole may be modified with various sealing devices and / or other materials to prevent air from entering the internal cavity 260 of the source container 200 and / or to maintain the required pressure within the source container 200 and the second piping system 130.
[0020] In various embodiments, inlet pipe 205 may be configured to facilitate the flow 255 of liquid 135 from external bulk container 105 and / or the first piping system 125 into source container 200. Inlet pipe 205 may comprise any material suitable for flowing liquid 135, such as stainless steel 316L, Hastelloy, or other suitable materials, and may have any diameter. For example, inlet pipe 205 may have a diameter D of 3 / 8 inch. The diameter of inlet pipe 205 may be selected based on specific applications, required flow rates, and the like. In various embodiments, inlet pipe 205 extends through a first through-hole 300 and into the internal cavity 260 of source container 200.
[0021] The inlet tube 205 may include a first portion 235 extending beyond the source container 200 and a second portion 240 extending into the internal cavity 260 of the source container 200. In one exemplary embodiment, the first portion 235 may have a linear shape extending upward from the cap 205 and may be attached to the first tubing system 125. Alternatively, the first portion 235 may have a non-linear shape extending upward and / or away from the cap 205.
[0022] In various embodiments, the second portion 240 may have a non-linear shape. For example, and referring to Figure 4, the second portion 240 may have a curved shape with a radius of curvature R ranging from 1.9 to 4.5 cm. In one embodiment, the inlet pipe 205 may have a diameter of 3 / 8 inch, wherein the second portion 240 has a radius of curvature of 2.38 cm. Alternatively, the second portion 240 may have a curved shape with an angle θ ranging from 90 to 150 degrees. The second portion 240 of the inlet pipe 205 may have any non-linear shape suitable for guiding the liquid flow 255 toward the sidewall 204, and more specifically, away from the sensor 210. Thus, the opening 245 of the inlet pipe 205 may face or otherwise point toward the sidewall 204. In other words, the opening 245 of the inlet pipe 205 may point laterally rather than toward the downward direction of the base plate 202. Furthermore, the second portion 240 of the inlet pipe 205 may be configured to prevent liquid from flowing directly to the bottom of the internal cavity 260, because direct flow of liquid to the bottom of the internal cavity 260 could cause the liquid to splash onto the sensor 210 upon reaching the bottom of the internal cavity 260.
[0023] A specific degree of curvature θ or radius of curvature R can be selected to ensure that the liquid 135 flows onto the sidewall 204 rather than straight down. For example, in various embodiments, a specific degree of curvature θ or radius of curvature R can be selected based on various factors that may affect the flow of the liquid 135 out of the inlet pipe 205, such as the size of the inlet pipe 205 (e.g., the length and diameter of the inlet pipe 205), the size of the source container 200, the flow rate of the liquid 135, and / or the distance x from the inlet pipe 205 to the sidewall 204. For example, as the distance x from the inlet pipe 205 to the sidewall 204 increases, the degree of curvature θ or radius of curvature R can also increase to ensure that the liquid 135 flows onto the sidewall 204 rather than straight down.
[0024] In various embodiments, the inlet pipe 205 extends from the cover 215 into the internal cavity by a distance h (in centimeters), wherein the distance h is selected based on the total height H (in centimeters, where H is the height of the sidewall 204 of the source container 200). For example, the distance h can be selected based on a percentage of the total height H, wherein the distance h can be in the range of 20-40% of the total height H. For example, if the total height H is 100 cm, the inlet pipe 205 can extend from the cover 215 into the internal cavity 260 by a distance h of 20 cm to 40 cm. Specifically, the distance h is measured from the cover 215 to the lowest boundary 400 of the opening 245 of the inlet pipe 205 (Figure 4).
[0025] Sensor 210 can be configured to detect the liquid level in the internal cavity 260 of the source container 200 during a refill procedure or during normal operation of the system 100. For example, sensor 210 can detect when the surface 285 of the liquid 135 (i.e., the liquid level) reaches the maximum fill level FMAX, when the liquid level reaches the minimum fill level FMIN, and / or when the liquid level reaches the intermediate fill level FINT. The specific values of the maximum fill level FMAX, the intermediate fill level FINT, and the minimum fill level FMIN are predetermined and can be selected according to a specific application, the specific size and shape of the source container 200, and / or the volume of the source container 200.
[0026] In various embodiments, sensor 210 may include an ultrasonic sensor, an optical sensor, an infrared sensor, or the like. Sensor 210 may generate an output signal indicating the level of liquid 135. Sensor 210 may be connected to and cooperating with a processing system to interpret the output signal and provide alerts or indicators to an operator interface (not shown).
[0027] In various embodiments, the opening 245 of the inlet pipe 205 is located above the maximum fill level FMAX. Therefore, the distance h can be limited based on the maximum fill level FMAX. In other words, the larger the maximum fill level FMAX, the smaller the range of the distance h.
[0028] In operation, and referring to Figures 1 and 2, during the filling process, the first tubing system 125 facilitates the flow of liquid 135 from the bulk container 105 and into the device 115. Specifically, the first tubing system 125 facilitates the flow of liquid 135 from the bulk container 105 to the inlet pipe 205. The liquid 135 can then flow through the inlet pipe 205 and into the internal cavity 260 of the source container 200. In various embodiments, allowing liquid 135 to flow into the source container 200 includes directing the liquid 135 toward the sidewall 204 of the source container 200. This flow direction can be achieved by directing the opening 245 of the inlet pipe 205 toward the sidewall 204 and / or by providing an inlet pipe 205 with a bend or curve, as described above. In various embodiments, allowing liquid 135 to flow into the source container 200 may further include directing the liquid 135 away from the sensor 210.
[0029] During the filling process and as liquid 135 flows from bulk container 105 to source container 200, sensor 210 can continuously detect the liquid level and output sensor readings indicating the liquid level. Alternatively, sensor 210 can detect the liquid level and output sensor readings indicating the liquid level at predetermined intervals (such as every 5 seconds). System 100 can be configured to fill source container 200 to a maximum fill level FMAX during a refilling process.
[0030] During normal operation of tool 110, sensor 210 can be used to detect a decrease in the liquid level. Specifically, sensor 210 can warn system 100 that the liquid level is at or near the minimum fill level FMIN. At this time, system 100 can pause the operation of tool 100 and start the refill procedure, as described above.
[0031] While this disclosure has been provided in the context of certain embodiments and examples, those skilled in the art will understand that this disclosure extends beyond the specifically described embodiments to other alternative embodiments and / or uses of such embodiments and obvious modifications and equivalents thereof. Furthermore, although several variations of the embodiments of this disclosure have been shown and described in detail, those skilled in the art will understand other modifications within the scope of this disclosure based on this disclosure. It is also contemplated that various combinations or sub-combinations of the specific features and styles of the embodiments can be made, and still fall within the scope of this disclosure. It should be understood that the various features and styles of the disclosed embodiments can be combined or substituted with each other to form variations of the embodiments of this disclosure. Therefore, it is intended that the scope of this disclosure should not be limited to the specific embodiments described above.
[0032] 100: System 105: Bulk containers 110: Tools 115: Equipment 120: Reaction Chamber 125: First Pipeline System 130: Second Pipeline System 135: Liquid chemicals, liquids 200: Source container 202: Base Plate 204: Sidewall 205: Inlet pipe 210: Sensor 215: Lid 220: Surface 230: Surface 235: Part One 240: Part Two 245: Opening 255: Flow 260: Internal cavity 265: Surface 270: Surface 275: First flat surface 280: Two flat surfaces 285: Surface 300: First through hole 305: Second through hole 400: Minimum Boundary D: Diameter F INT: Middle padding level F MAX: Maximum fill level F MIN: Minimum Fill Level h: distance H: Total height x: distance θ: curvature
Claims
1. A device for controlling a liquid, comprising: A source container includes: a base plate; and a sidewall including a first end connected to the base plate and a second end opposite the first end, wherein the sidewall extends upward from the base plate; wherein the base plate and the sidewall form an internal cavity for containing a liquid; a top plate configured to abut the second end of the sidewall and including a first through-hole and a second through-hole; a sensor extending through the second through-hole and into the source container, the sensor being configured to sense a level of the liquid contained in the source container; and an inlet pipe configured to: dispense the liquid into the source container; and extend through the first through-hole and into the source container; wherein the inlet pipe includes: a first portion having a linear shape; and a second portion having a non-linear shape to guide the liquid away from the sensor.
2. The device of claim 1, wherein the second portion of the inlet pipe extends into the internal cavity of the source container.
3. The device of claim 1, wherein the second portion of the inlet pipe extends into the internal cavity by a distance that is 20% to 40% of the height of one of the sidewalls.
4. The device as requested in item 1, wherein the second portion of the inlet pipe is bent.
5. The device of claim 4, wherein the second portion of the inlet pipe is bent toward the sidewall of the source container and has a radius of curvature in the range of 1.9 cm to 4.5 cm.
6. The device of claim 1, wherein the second portion of the inlet pipe is at an angle ranging from 90 degrees to 150 degrees relative to the first portion.
7. The device of claim 6, wherein the second portion of the inlet pipe is angled toward the sidewall of the container.
8. The device of claim 1, wherein the top plate includes a first flat surface facing the internal cavity of the source container and a second flat surface relative to the first flat surface and facing away from the internal cavity of the source container.
9. The equipment as requested in item 8, wherein: The first portion of the inlet pipe begins from the second flat surface and extends away from the second flat surface; The second portion of the inlet pipe begins from the first flat surface and extends out from the first flat surface into the internal cavity of the source container.
10. A system for controlling a liquid, comprising: A bulk container configured to store a liquid; a source container connected to the bulk container via an inlet pipe, wherein the source container includes a side wall and a bottom plate, the side wall and the bottom plate forming an internal cavity for containing the liquid; and a sensor extending into the internal cavity, wherein the sensor is configured to sense a level of the liquid in the internal cavity; wherein the inlet tube extends into the internal cavity and includes an opening pointing toward one of the sidewalls, and at least a portion of the inlet tube is bent to guide the liquid away from the sensor.
11. The system of claim 10, wherein the sidewall includes: A first end is connected to the base plate and extends upward from the base plate; And a second end, relative to the first end.
12. The system of claim 11 further includes a top plate configured to abut the second end of the sidewall, and includes a first through hole and a second through hole.
13. The system of claim 10, wherein the inlet pipe extends through the first through-hole and at least a portion of the inlet pipe bends toward the sidewall of the source container.
14. The system of claim 10, wherein the inlet pipe extends through the first through-hole and at least a portion of the inlet pipe is angled toward the sidewall of the source container.
15. A method for controlling liquid flow, comprising: To allow a liquid to flow from a bulk container through a first pipe system; The liquid is allowed to flow from the first pipe system to an inlet pipe; and the liquid is allowed to flow through the inlet pipe and into a source container including a sidewall, wherein allowing the liquid to flow into the source container includes allowing the liquid to flow toward the sidewall of the source container, wherein the source container further includes a bottom plate, and wherein the sidewall extends upward from the bottom plate, and wherein the bottom plate and the sidewall form an internal cavity for containing the liquid, wherein allowing the liquid to flow into the source container further includes allowing the liquid to flow away from a sensor located in the internal cavity of the source container.
16. The method of claim 15, wherein at least a portion of the inlet tube extends into the internal cavity, and the portion of the inlet tube extending into the internal cavity has a non-linear shape.