Light source unit, illumination unit, exposure device, and exposure method

Abstract

The light source unit includes: a fixed object; a first light source array and a second light source array, respectively disposed in the fixed object and arranged in a first region and a second region in a first direction, and each including a plurality of light source elements; a first lens array, configured to correspond to the first region; a second lens array, configured to correspond to the second region; and a lens holder, holding the first lens array and the second lens array; the first side surface of the first lens array and the first side surface of the second lens array are in contact in the first direction; the lens holder includes a first wall portion that defines the position of the first lens array and the second lens array in the first direction, and a first pressing member that presses the first lens array and the second lens array toward the first wall portion.

Description

Technical Field

[0001] The present invention relates to a light source unit, an illumination unit, an exposure device, and an exposure method. Prior Art

[0002] In recent years, liquid crystal display panels have been widely used as display elements for personal computers and televisions. Liquid crystal display panels are manufactured by forming a circuit pattern of a thin film transistor on a plate (glass substrate) using a photolithography method. As a device used in the photolithography step, an exposure device is used to project the original pattern formed on the mask onto the photoresist layer on the plate through a projection optical system. As such an exposure device, an exposure device using an LED (Light Emitting Diode) as a light source has been proposed (for example, Patent Document 1).

[0003] In an exposure device using an LED as a light source, a lens is provided corresponding to the LED. Since the desired optical characteristics cannot be obtained if the lens is displaced, a fixing method capable of suppressing the displacement of the lens is required. [Prior art literature] [Patent Document]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 2016-184127 Summary of the invention

[0005] According to the first disclosed aspect, the light source unit comprises: a fixed object; a first light source array and a second light source array, which are respectively arranged in a first area and a second area arranged in a first direction in the fixed object, and respectively include a plurality of light source elements; a first lens array, which is arranged to correspond to the first area; a second lens array, which is arranged to correspond to the second area; and a lens holder, which holds the first lens array and the second lens array; the first side surface of the first lens array is in contact with the first side surface of the second lens array in the first direction; the lens holder comprises a first wall portion which defines the positions of the first lens array and the second lens array in the first direction, and a first pressure member which presses the first lens array and the second lens array toward the first wall portion.

[0006] According to the second disclosed aspect, the lighting unit comprises: the above-mentioned light source unit; and a lighting optical system for guiding the light emitted from the above-mentioned light source unit to the illuminated object.

[0007] According to the third disclosed aspect, the lighting unit comprises: a plurality of the above-mentioned light source units; and an illumination optical system, including a synthetic optical element for synthesizing the light emitted from the plurality of the above-mentioned light source units, and guiding the synthetic light emitted from the above-mentioned synthetic optical element to the irradiated object.

[0008] According to the fourth disclosed aspect, the exposure device comprises: the above-mentioned lighting unit; and a projection optical system for projecting a pattern image of the mask illuminated by the above-mentioned lighting unit onto a photosensitive substrate.

[0009] According to the aspect disclosed in No. 5, the exposure method is an exposure method using the above-mentioned exposure device, which includes the following actions: illuminating the mask by the above-mentioned lighting unit; and projecting the pattern image of the above-mentioned mask onto the photosensitive substrate using the above-mentioned projection optical system.

[0010] In addition, the configuration of the embodiments described below may be appropriately improved, and at least a portion thereof may be replaced by other components. Furthermore, the components whose configuration is not particularly limited are not limited to the configuration disclosed in the embodiments, and may be configured at a position that can achieve their functions. Simple diagram description

[0011] [Fig. 1] Fig. 1 is a schematic diagram showing the structure of an exposure device according to a first embodiment. [Fig. 2] Fig. 2 is a schematic diagram showing the structure of the lighting unit of the first embodiment. [Fig. 3] Fig. 3(A) is a three-dimensional view of a light source unit; Fig. 3(B) is a top view of an array of multiple light sources arranged on a heat sink. [Fig. 4] Fig. 4(A) is a top view schematically showing the structure of a light source array; Fig. 4(B) is a diagram schematically showing the internal structure of a light source unit. [Figure 5] Figure 5(A) is a diagram used to illustrate the shape of the lens array; Figure 5(B) is a diagram used to illustrate the configuration of the first lens array, the second lens array, and the third lens array. [Fig. 6] Fig. 6(A) is a front view of a light source unit; Fig. 6(B) is a side view of the light source unit. [Figure 7] Figure 7(A) is a cross-sectional view taken along line AA of Figure 6(A); Figure 7(B) is a cross-sectional view taken along line BB of Figure 6(A); Figure 7(C) is an enlarged view of portion PP1 surrounded by dotted lines in Figure 7(B); and Figure 7(D) is an enlarged view of portion PP2 surrounded by dotted lines in Figure 7(B). [Figure 8] Figure 8(A) is a cross-sectional view taken along line CC of Figure 6(B); Figure 8(B) is a cross-sectional view taken along line DD of Figure 6(B); and Figure 8(C) is a cross-sectional view taken along line EE of Figure 6(B). [Figure 9] Figure 9(A) is a top view of the spacer viewed from the +Z1 side; Figure 9(B) is a cross-sectional view taken along line AA of Figure 9(A); Figure 9(C) is a top view of another spacer viewed from the +Z1 side; Figure 9(D) is a cross-sectional view taken along line AA of Figure 9(C). [Fig. 10] Fig. 10 is a cross-sectional view illustrating a case where a spacer is integrated with a third wall portion and a fourth wall portion. [Fig. 10] [Figure 11] Figure 11(A) is a front view of the light source unit showing a state in which the first wall portion and the second wall portion are installed on a mounting plate; Figure 11(B) is a side view of the light source unit viewed from the +X1 side; and Figure 11(C) is a BB line cross-sectional view of Figure 11(A). [Figure 12] Figure 12(A) is a front view of the light source unit of variant example 1; Figure 12(B) is a view of the light source unit with the cooling mechanism removed, viewed from the -Y1 side. [Figure 13] Figure 13(A) is a front view of the light source unit of variant example 2; Figure 13(B) is a view of the light source unit with the cooling mechanism removed, as viewed from the +X1 side. [Figure 14] Figure 14(A) is a cross-sectional view of the light source unit of variant example 3; Figure 14(B) is a cross-sectional view of the light source unit of variant example 4. [Fig. 15] Fig. 15 is a schematic diagram showing the structure of the lighting unit of the second embodiment. [Fig. 16] Fig. 16 is a schematic diagram showing the structure of the exposure device of the third embodiment. Implementation

[0012] 《First Implementation Form》 An exposure apparatus 10 according to a first embodiment will be described based on FIGS. 1 to 10 .

[0013] (Construction of Exposure Device) FIG. 1 is a diagram schematically showing the structure of an exposure apparatus 10 according to a first embodiment.

[0014] The exposure device 10 is a scanning stepper (scanner) that transfers the pattern formed on the mask MSK to the plate P by driving the mask MSK and the glass substrate (hereinafter referred to as "plate") P in the same direction and at the same speed relative to the projection optical system PL. The plate P is, for example, a rectangular glass substrate used in a liquid crystal display device (flat panel display), and the length of at least one side or the diagonal length is 500 mm or more.

[0015] In the following, the direction (scanning direction) of driving the mask MSK and the plate P during scanning exposure is set as the X-axis direction, the direction in the horizontal plane orthogonal to it is set as the Y-axis direction, the direction orthogonal to the X-axis and the Y-axis is set as the Z-axis direction, and the rotation (tilt) directions around the X-axis, Y-axis and Z-axis are set as the θx, θy and θz directions respectively.

[0016] The exposure device 10 includes an illumination optical system IOP, a mask stage MST holding a mask MSK, a projection optical system PL, a main body 70 supporting them, a substrate stage PST holding a plate P, and control systems thereof. The control system controls the components of the exposure device 10 in an integrated manner.

[0017] The main body 70 includes a base (vibration-proof table) 71, columns 72A and 72B, an optical platen 73, a support body 74, and a sliding guide 75. The base (vibration-proof table) 71 is arranged on the floor F, and isolating the vibration from the floor F and supporting the columns 72A and 72B. The columns 72A and 72B each have a frame shape, and the column 72A is arranged inside the column 72B. The optical platen 73 has a flat plate shape and is fixed to the top plate of the column 72A. The support body 74 is supported on the top plate of the column 72B via the sliding guide 75. The sliding guide 75 includes an air ball lifter and a positioning mechanism, and positions the support body 74 (i.e., the mask stage MST described later) relative to the optical platen 73 to an appropriate position in the X-axis direction.

[0018] The illumination optical system IOP is disposed above the main body 70. The illumination optical system IOP irradiates the mask MSK with illumination light IL. The detailed structure of the illumination optical system IOP will be described later.

[0019] The mask stage MST is supported by the support body 74. The mask MSK having a pattern surface (lower surface in FIG. 1 ) on which a circuit pattern is formed is fixed to the mask stage MST by, for example, vacuum adsorption (or electrostatic adsorption). The mask stage MST is driven by, for example, a driving system including a linear motor in a predetermined stroke in the scanning direction (X-axis direction) and is slightly driven in the non-scanning direction (Y-axis direction and θz direction).

[0020] The position information of the mask stage MST in the XY plane (including the rotation information in the θz direction) is measured by the interferometer system. The interferometer system irradiates the moving mirror (or the reflective surface (not shown) processed by mirror surface) at the end of the mask stage MST with a length measuring beam and receives the reflected light from the moving mirror to measure the position of the mask stage MST. The measurement result is supplied to the control device CNT, and the control device CNT drives the mask stage MST through the drive system according to the measurement result of the interferometer system.

[0021] The projection optical system PL is supported on the optical platen 73 below the mask stage MST (-Z side). The projection optical system PL is configured similarly to the projection optical system disclosed in the specification of U.S. Patent No. 5,729,331, for example, and includes a plurality of (e.g., 7) projection optical units 100 (multi-lens projection optical units) in which projection areas of the pattern image of the mask MSK are arranged in a houndstooth pattern, for example, to form a rectangular image field with the Y-axis direction as the long side direction. Here, four projection optical units 100 are arranged at predetermined intervals along the Y-axis direction, and the remaining three projection optical units 100 are arranged at predetermined intervals along the Y-axis direction away from the four projection optical units 100 toward the +X side. As each of the plurality of projection optical units 100, for example, an equal magnification system with telecentricity on both sides is used to form an erect standing image. In addition, the plurality of projection areas of the projection optical units 100 arranged in a houndstooth pattern are collectively referred to as exposure areas.

[0022] When the illumination area on the mask MSK is illuminated by the illumination light IL from the illumination optical system IOP, the projection image (partial erect image) of the circuit pattern of the mask MSK in the illumination area is formed on the irradiation area (exposure area (conjugate with the illumination area)) on the plate P arranged on the image plane side of the projection optical system PL through the illumination light IL that penetrates the mask MSK. Here, a resist (photosensitive agent) is coated on the surface of the plate P. By synchronously driving the mask stage MST and the substrate stage PST, that is, driving the mask MSK in the scanning direction (X-axis direction) relative to the illumination area (illumination light IL), and driving the plate P in the same scanning direction relative to the exposure area (illumination light IL), the plate P is exposed and the pattern of the mask MSK is transferred to the plate P.

[0023] The substrate stage PST is arranged on a base (anti-vibration table) 71 below (at the -Z side) the projection optical system PL. The plate material P is held on the substrate stage PST via a substrate holder (not shown).

[0024] The position information of the substrate stage PST in the XY plane (including rotation information (yaw amount (rotation amount θz in the θz direction), pitch amount (rotation amount θy in the θy direction), roll amount (rotation amount θx in the θx direction))) is measured by the interferometer system. The interferometer system irradiates the moving mirror (or the reflecting surface (not shown) processed by mirror surface) provided at the end of the substrate stage PST with a length measuring beam from the optical fixed plate 73 and receives the reflected light from the moving mirror, thereby measuring the position of the substrate stage PST. The measurement result is supplied to the control device CNT, and the control device CNT drives the substrate stage PST according to the measurement result of the interferometer system.

[0025] In the exposure device 10, alignment measurement (such as EGA, etc.) is performed before exposure, and the result is used to expose the plate P according to the following process. First, according to the instruction of the control device CNT, the mask stage MST and the substrate stage PST are synchronously driven along the X-axis direction. In this way, the scanning exposure of the first irradiation area on the plate P is performed. When the scanning exposure of the first irradiation area is completed, the control device CNT moves (steps) the substrate stage PST to the position corresponding to the second irradiation area. And, the scanning exposure of the second irradiation area is performed. The control device CNT repeats the stepping between the irradiation areas of the plate P and the scanning exposure of the irradiation areas in the same way, so as to transfer the pattern of the mask MSK to all the irradiation areas on the plate P.

[0026] (Composition of the IOP illumination system) Next, the configuration of the illumination optical system IOP in the present embodiment will be described. The illumination optical system IOP includes a plurality of illumination units 90 corresponding to the plurality of projection optical units 100 included in the projection optical system PL.

[0027] FIG2 is a diagram schematically showing the structure of the lighting unit 90. As shown in FIG2, the lighting unit 90 includes a light source unit OPU and an illumination optical system 80.

[0028] (Composition of light source unit OPU) FIG. 3(A) is a perspective view of the light source unit OPU; FIG. 3(B) is a top view of a plurality of light source arrays 20 provided on a heat sink 21. In the following description, the two directions in which the plurality of LED packages 23 provided in each light source array 20 are arranged are referred to as the X1 direction and the Y1 direction. The X1 direction is orthogonal to the Y1 direction. In addition, the direction orthogonal to the X1 direction and the Y1 direction is referred to as the Z1 direction.

[0029] The light source unit OPU includes a heat sink 21, a plurality of (three in this embodiment) light source arrays 20, a plurality of (three in this embodiment) magnifying optical systems 30 provided corresponding to the plurality of light source arrays 20, and a lens holder 40 for holding the plurality of magnifying optical systems 30. In addition, the number of light source arrays 20 provided in the light source unit OPU only needs to be a plurality, and is not limited to three, and may be two, or may be four or more.

[0030] As shown in FIG3(B), the plurality of light source arrays 20 include a first light source array 20a, a second light source array 20b, and a third light source array 20c, which are respectively arranged in a first region R1, a second region R2, and a third region R3 on the heat sink 21 along the X1 direction. In addition, in the following description, the first to third light source arrays 20a to 20c are described as the light source array 20 unless otherwise specified.

[0031] The plurality of magnifying optical systems 30 include a first magnifying optical system 30a, a second magnifying optical system 30b, and a third magnifying optical system 30c, which are respectively provided to correspond to the first region R1, the second region R2, and the third region R3. In the following description, the first to third magnifying optical systems 30a to 30c are described as the magnifying optical system 30 unless otherwise specified.

[0032] FIG4(A) is a top view schematically showing the structure of the light source array 20. The light source array 20 includes, for example, a plurality of (5×5 in FIG4(A)) LED (Light Emitting Diode) packages 23 arranged in an array on a heat sink 21 (fixed object). That is, the light source unit OPU is an LED light source. The number of LED packages 23 can be appropriately changed as needed.

[0033] Each of the plurality of LED packages 23 has a light emitting portion 231, and the peak wavelength of the light emitted from the light emitting portion 231 is, for example, in the range of 360 to 370 nm, in the range of 380 to 390 nm, or in the range of 400 to 410 nm. That is, the light emitting portion 231 is an ultraviolet LED (UV LED). The light emitting surface of the light emitting portion 231 is a square, and the length of one side is L. The LED packages 23 are arranged at a pitch P1. The pitch P1 is the distance between the centers of adjacent LED packages 23. In addition, the LED packages 23 can also be arranged in an array on a substrate fixed to the heat sink 21.

[0034] 4(B) is a diagram schematically showing the internal structure of the light source unit OPU. The Z1 direction is substantially parallel to the optical axis OA of the light emitted from the light emitting section 231 .

[0035] As shown in FIG. 4(B) , the magnifying optical system 30 is a magnifying optical system for forming magnified images of the light emitting portions 231 of the respective LED packages 23 on the predetermined plane PP.

[0036] The magnifying optical system 30 includes a plurality of lens arrays 301, 302, 303, and 304 that are separated and arranged in the Z1 direction. A plurality of lens units 31 arranged in a manner corresponding to the arrangement of the plurality of LED packages 23 are formed by the lens elements of the plurality of lens arrays 301, 302, 303, and 304. Each lens unit 31 is a bilaterally telecentric optical system that magnifies and projects the light emitting unit 231 at a magnification M greater than (the arrangement pitch P1 of the LED package 23) / (the length L of one side of the light emitting surface of the light emitting unit 231). In addition, in the following description, the multiple lens arrays of the first magnifying optical system 30a will be referred to as the first lens array 30a1, 30a2, 30a3, 30a4, the multiple lens arrays of the second magnifying optical system 30b will be referred to as the second lens array 30b1, 30b2, 30b3, 30b4, and the multiple lens arrays of the third magnifying optical system 30c will be referred to as the third lens array 30c1, 30c2, 30c3, 30c4.

[0037] In addition, in the present embodiment, each magnifying optical system 30 includes lens arrays 301 to 304 whose lens units are plano-convex lenses, but the present invention is not limited thereto. The magnifying optical system 30 may include, for example, two lens arrays whose lens units are biconvex lenses, or three lens arrays whose lens units are biconvex lenses. In addition, the magnifying optical system 30 may include, for example, a lens array whose lens units are plano-convex lenses and a lens array whose lens units are biconvex lenses.

[0038] Once the first to third magnifying optical systems 30a to 30c respectively provided corresponding to the first to third light source arrays 20a to 20c are displaced, it is possible that the desired optical characteristics cannot be obtained. In this embodiment, the positional displacement of the first to third magnifying optical systems 30a to 30c is suppressed by the shape and arrangement of the lens arrays 301 to 304 and the structure of the lens holder 40 holding the lens arrays 301 to 304. The shape and arrangement of the lens arrays 301 to 304 and the structure of the lens holder 40 are described below.

[0039] First, the shapes of the lens arrays 301 to 304 are described with reference to Fig. 5(A). In the present embodiment, the lens arrays 301 to 304 have the same outer shapes, so the lens array 301 will be described.

[0040] As shown in FIG5(A), the lens array 301 has a generally rectangular shape, and the two first side surfaces 32 parallel to the Y1 direction each have a protrusion 32a protruding in the X1 direction. The surface of the protrusion 32a parallel to the Y1 direction has high flatness. The two second side surfaces 33 parallel to the X1 direction do not have a protrusion.

[0041] Next, the configurations of the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 will be described with reference to FIG. 5(B).

[0042] Since the configurations of the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 are respectively the same, the first to third lens arrays 30a1 to 30c1 will be described.

[0043] As shown in FIG. 5(B), the first lens array 30a1, the second lens array 30b1 and the third lens array 30c1 are arranged along the X1 direction in a manner corresponding to the first region R1, the second region R2 and the third region R3, respectively. The first side surface 32 of the first lens array 30a1 contacts the first side surface 32 of the second lens array 30b1 at the protrusion 32a, and does not contact at other parts. The first side surface 32 of the second lens array 30b1 contacts the first side surface 32 of the third lens array 30c1 at the protrusion 32a, and does not contact at other parts.

[0044] Next, the structure of the lens holder 40 for holding the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 arranged as described above will be described.

[0045] (Configuration of Lens Holder 40) FIG6(A) is a front view of the light source unit OPU, and FIG6(B) is a side view of the light source unit OPU. In addition, FIG7(A) is a cross-sectional view taken along line AA of FIG6(A), FIG7(B) is a cross-sectional view taken along line BB of FIG6(A), FIG7(C) is an enlarged view of the portion PP1 surrounded by a dotted line in FIG7(B), and FIG7(D) is an enlarged view of the portion PP2 surrounded by a dotted line in FIG7(B). In addition, FIG8(A) is a cross-sectional view taken along line CC of FIG6(B), FIG8(B) is a cross-sectional view taken along line DD of FIG6(B), and FIG8(C) is a cross-sectional view taken along line EE of FIG6(B).

[0046] The lens holder 40 includes a first wall portion 41 , a second wall portion 42 , a third wall portion 43 , and a fourth wall portion 44 .

[0047] The first wall portion 41 defines the positions of the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 in the X1 direction. The first wall portion 41 has a protrusion 411 that protrudes in the X1 direction and contacts the protrusion 32a of the first side surface 32 of the third lens array 30c1 to 30c4.

[0048] The second wall portion 42 is opposite to the first wall portion 41 in the X1 direction. A plurality of first pressure members 45 (see FIG. 7(B) and FIG. 7(C) ) are mounted on the second wall portion 42 to respectively press the first to third lens arrays 30a1 to 30c1, 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 toward the first wall portion 41. The first pressure member 45 is, for example, a leaf spring, but is not limited thereto.

[0049] As shown in FIG8(A), the first side surface 32 of the first lens array 30a1 contacts the first side surface 32 of the second lens array 30b1 at the protrusion 32a, and does not contact at other parts. The first side surface 32 of the second lens array 30b1 contacts the first side surface 32 of the third lens array 30c1 at the protrusion 32a, and does not contact at other parts. The surface of the protrusion 32a parallel to the Y1 direction has high flatness. By applying pressure to the first to third lens arrays 30a1 to 30c1 toward the first wall 41 through the first pressure member 45, the third lens array 30c1 is pushed against the protrusion 411 of the first wall 41, the second lens array 30b1 is pushed against the third lens array 30c1, and the first lens array 30a1 is pushed against the second lens array 30b1. Thus, since the protrusion 32a of the first lens array 30a1, the protrusion 32a of the second lens array 30b1, and the protrusion 32a of the third lens array 30c1 are in close contact with each other, the positional deviation of the first to third lens arrays 30a1 to 30c1 in the X1 direction can be suppressed. In addition, although the first lens array 30a1, the second lens array 30b1, and the third lens array 30c1 are described, the first to third lens arrays 30a2 to 30c2, 30a3 to 30c3, and 30a4 to 30c4 are also the same.

[0050] The third wall portion 43 defines the positions of the first lens array 30a1-30a4, the second lens array 30b1-30b4, and the third lens array 30c1-30c4 in the Y1 direction. The third wall portion 43 has a protrusion 431 that protrudes in the Y1 direction and contacts the second side surface 33 of the first lens array 30a1-30a4, the second lens array 30b1-30b4, and the third lens array 30c1-30c4.

[0051] The fourth wall portion 44 is opposite to the third wall portion 43 in the Y1 direction. In the present embodiment, the fourth wall portion 44 includes the fourth wall portion 44a corresponding to the first lens array 30a1~30a4, the fourth wall portion 44b corresponding to the second lens array 30b1~30b4, and the fourth wall portion 44c corresponding to the third lens array 30c1~30c4. In addition, in the present embodiment, although the fourth wall portion 44 is divided into the fourth wall portions 44a~44c, it can also be integrated. In addition, in the case where no special distinction is required, there will be a case where the fourth wall portions 44a~44c are recorded as the fourth wall portion 44.

[0052] The fourth wall portions 44a to 44c are provided with second pressing members 46 for pressing the first lens arrays 30a1 to 30a4, the second lens arrays 30b1 to 30b4, and the third lens arrays 30c1 to 30c4 toward the third wall portion 43. The second pressing member 46 is, for example, a leaf spring, but is not limited thereto.

[0053] By applying pressure toward the third wall portion 43 through the second pressure member 46, the second side surface 33 of the first lens array 30a1~30a4, the second side surface 33 of the second lens array 30b1~30b4 and the second side surface 33 of the third lens array 30c1~30c4 are pushed against the protrusion 431 of the third wall portion 43, thereby suppressing the positional deviation of the first lens array 30a1~30a4, the second lens array 30b1~30b4 and the third lens array 30c1~30c4 in the Y1 direction. In addition, since the second side surface 33 of the first lens array 30a1~30a4, the second side surface 33 of the second lens array 30b1~30b4 and the second side surface 33 of the third lens array 30c1~30c4 are in contact with the protrusion 431 of the third wall portion 43, the first lens array 30a1~30a4, the second lens array 30b1~30b4 and the third lens array 30c1~30c4 can be positioned with high precision in the Y1 direction compared to the case where they are in contact with the side surface of the third wall portion 43 as a whole.

[0054] In addition, the third pressing member 47 for pressing the first lens array 30a1-30a4, the second lens array 30b1-30b4, and the third lens array 30c1-30c4 toward the heat sink 21 is installed on the fourth wall portion 44a-44c. In addition, the third pressing member 47 for pressing the first lens array 30a1-30a4, the second lens array 30b1-30b4, and the third lens array 30c1-30c4 toward the heat sink 21 is also installed on the third wall portion 43. The third pressing member 47 is, for example, a leaf spring, but is not limited thereto.

[0055] As shown in Figures 7(A) and 7(B), for example, a spacer SP1 is arranged between the heat sink 21 and the first lens array 30a4, a spacer SP2 is arranged between the first lens array 30a4 and the first lens array 30a3, a spacer SP3 is arranged between the first lens array 30a3 and the first lens array 30a2, and a spacer SP4 is arranged between the first lens array 30a2 and the first lens array 30a1.

[0056] Since the third pressure member 47 presses the first lens array 30a1-30a4 and the spacers SP1-SP4 toward the heat sink 21, the first lens array 30a1-30a4 and the spacers SP1-SP4 are in close contact with each other in the Z1 direction, thereby suppressing the positional deviation of the first lens array 30a1-30a4 in the Z1 direction. The same is true for the second lens array 30b1-30b4 and the third lens array 30c1-30c4.

[0057] Next, the spacer is described. FIG9(A) is a top view of the spacer SP1 viewed from the +Z1 side, and FIG9(B) is a cross-sectional view taken along the AA line of FIG9(A). In addition, FIG9(C) is a top view of the spacer SP2 viewed from the +Z1 side, and FIG9(D) is a cross-sectional view taken along the AA line of FIG9(C).

[0058] As shown in FIG. 9(A), in this embodiment, the spacer SP1 has an opening OP1 at a position corresponding to the first region R1 to the third region R3. As shown in FIG. 9(B), the spacer SP1 has a substrate 200 and a functional layer 201 formed on the substrate 200. In this embodiment, the functional layer 201 is a black chromium layer. That is, a black chromium layer is formed on the inner peripheral surface of the opening OP1 of the spacer SP1, which can absorb unnecessary light and suppress stray light.

[0059] As shown in FIG. 9(C), the spacer SP2 has a frame shape. The spacer SP2 has a substrate 202 and a functional layer 203 formed on the substrate 202. In this embodiment, the functional layer 203 is a black chromium layer. That is, a black chromium layer is formed on the inner peripheral surface of the spacer SP2, which can absorb unnecessary light and suppress stray light. In addition, the spacers SP3 and SP4 also have the same structure as the spacer SP2.

[0060] During use of the light source unit OPU, the temperature of the spacers SP1 to SP4 rises due to the irradiation heat from the LED package 23. Depending on the heat resistance of the lens array held by the spacers SP1 to SP4, there is a risk that the lens arrays 301 to 304 may be damaged due to lighting of the LED package 23, or that the thermal expansion of the spacers SP1 to SP4 may cause interference between parts in the lens holder and reduce the pressure effect of the pressure member. In this case, the functional layers 201 and 203 may be reflective layers having a reflectivity higher than that of black chrome. By configuring in this way, the temperature rise of the spacers SP1 to SP4 can be further suppressed compared to the case where the substrates 200 and 202 are covered with black chrome. In this way, the damage of the lens arrays 301 to 304 can be suppressed.

[0061] In addition, when a reflective layer is formed as the functional layer 201, 203, it is sufficient that the reflectivity is at least higher than that of the substrates 200, 202. In this way, the temperature rise of the spacers SP1 to SP4 can be further suppressed compared to the case where the substrates 200, 202 are directly used. In this way, the damage of the lens arrays 301 to 304 can be suppressed.

[0062] In addition, although the present embodiment describes an example in which the functional layers 201 and 203 are provided on the substrates 200 and 202, the functional layers 201 and 203 may not be provided. In addition, the spacers SP1 to SP4 may also be made of glass. In this case, since the temperature rise of the spacers SP1 to SP4 is suppressed, the damage of the lens arrays 301 to 304 can be suppressed.

[0063] In addition, the shape of the spacer SP1 is not limited to the present embodiment, and for example, it may have a frame shape like the spacer SP2. In addition, one or more pressing members for pressing any one or more of the spacers SP2 to SP4 toward the first wall portion 41 may be provided on the second wall portion 42. The pressing member is, for example, a leaf spring. The leaf spring may have the same shape as the first pressing member 45 shown in FIG. 8(A), and may be installed in a convex shape facing the -X direction.

[0064] (Configuration of Illumination Optical System 80) 2 again, the configuration of the illumination optical system 80 will be described. The illumination optical system 80 includes an imaging optical system 81, a fly-eye lens FEL, an aperture stop 85, a condenser optical system 86, and an illumination correction filter 87.

[0065] The imaging optical system 81 is a telecentric optical system that projects the image of the light source unit OPU (plural light source arrays 20) at equal magnification onto both sides of the incident end of the fly-eye lens FEL.

[0066] The fly-eye lens FEL is formed by, for example, arranging a plurality of lens units having positive refractive power in a dense manner in a vertical and horizontal manner so that the optical axes thereof are parallel to the reference optical axis AX. Each lens unit constituting the fly-eye lens FEL has a rectangular cross section similar to the shape of the illumination field to be formed on the mask MSK (or even the shape of the exposure area to be formed on the plate P).

[0067] Therefore, the light beam incident on the fly-eye lens FEL is split by the plurality of lens units, and a light source image is formed on the rear focal plane (exit plane) or in the vicinity of each lens unit. That is, a substantially surface light source, i.e., a secondary light source, composed of a plurality of light source images is formed on the rear focal plane (exit plane) or in the vicinity of the fly-eye lens FEL. The light beam from the secondary light source formed on the rear focal plane (exit plane) of the fly-eye lens FEL or in the vicinity thereof is incident on the aperture stop 85 disposed in the vicinity thereof. In addition, in the present embodiment, the rear focal plane (exit plane) of the fly-eye lens FEL is optically conjugate with the light source array 20.

[0068] The aperture stop 85 is arranged at a position that is substantially optically conjugate with the entrance pupil plane of the projection optical system PL, and has a variable opening portion for defining a range that contributes to the illumination of the secondary light source. Furthermore, the aperture stop 85 changes the opening diameter of the variable opening portion, thereby setting the σ value (the ratio of the aperture of the secondary light source image on the pupil plane of the projection optical system to the opening diameter of the pupil plane) that determines the illumination condition to a desired value. The light from the secondary light source that passes through the aperture stop 85 is focused by the focusing optical system 86, and then its illumination is corrected by the illumination correction filter 87, so as to illuminate the mask MSK formed with a predetermined pattern in an overlapping manner.

[0069] In addition, the wavelength of light emitted by the light source unit OPU is not limited to the above, and the light source unit OPU can also be formed by appropriately combining LED packages that emit light with a peak wavelength in the range of 360~440nm.

[0070] As described in detail above, according to the present embodiment, the light source unit OPU comprises: a heat sink 21, a first light source array 20a to a third light source array 20c respectively arranged in the first region R1 to the third region R3 arranged along the X1 direction on the heat sink 21 and comprising a plurality of LED packages 23, a first lens array 30a1 to 30a4 to a third lens array 30c1 to 30c4 respectively arranged corresponding to the first region R1 to the third region R3, and a lens holder 40 for holding the first lens array 30a1 to 30a4 to the third lens array 30c1 to 30c4. The first side surface 32 of the first lens array 30a1~30a4 to the third lens array 30c1~30c4 each has a protrusion 32a protruding in the X1 direction, and the first side surface 32 of the first lens array 30a1~30a4 and the first side surface 32 of the second lens array 30b1~30b4 are in contact at the protrusion 32a in the X1 direction, but not in contact at other parts. The lens holder 40 includes: a first wall portion 41 that defines the position of the first lens array 30a1~30a4 to the third lens array 30c1~30c4 in the X1 direction, and a first pressure member 45 that presses the first lens array 30a1~30a4 to the third lens array 30c1~30c4 toward the first wall portion 41. Thereby, the first wall portion 41, the protrusion 32a of the first lens array 30a1~30a4, the protrusion 32a of the second lens array 30b1~30b4, and the protrusion 32a of the third lens array 30c1~30c4 are respectively in close contact with each other, thereby suppressing the position deviation in the X1 direction from the first lens array 30a1~30a4 to the third lens array 30c1~30c4.

[0071] In addition, in the present embodiment, the lens holder 40 includes: a third wall portion 43 that defines the positions of the first lens array 30a1-30a4 to the third lens array 30c1-30c4 in the Y1 direction orthogonal to the X1 direction in a plane parallel to the surface on which the plurality of LED packages 23 are arranged; and a second pressing member 46 that presses the first lens array 30a1-30a4 to the third lens array 30c1-30c4 toward the third wall portion 43. Thus, it is possible to suppress the positional deviation of the first lens array 30a1-30a4, the second lens array 30b1-30b4, and the third lens array 30c1-30c4 in the Y1 direction.

[0072] In addition, in the present embodiment, the third wall portion 43 has a protrusion 431 that protrudes in the Y1 direction and contacts the second side surface 33 of the first lens array 30a1-30a4 to the third lens array 30c1-30c4. Thus, compared with the case where the entire side surface of the third wall portion 43 contacts the second side surface 33 of the first lens array 30a1-30a4 to the third lens array 30c1-30c4, the first lens array 30a1-30a4 to the third lens array 30c1-30c4 can be positioned with high precision in the Y1 direction.

[0073] In addition, in this embodiment, the lens holder 40 has a third pressing member 47 for pressing the first lens array 30a1-30a4 to the third lens array 30c1-30c4 toward the heat sink 21. This can suppress the positional deviation of the first lens array 30a1-30a4 to the third lens array 30c1-30c4 in the Z1 direction.

[0074] In addition, in this embodiment, spacers SP2 to SP4 are provided between the plurality of first lens arrays 30a1 to 30a4 to separate the plurality of first lens arrays 30a1 to 30a4 from each other, spacers SP2 to SP4 are provided between the plurality of second lens arrays 30b1 to 30b4 to separate the plurality of second lens arrays 30b1 to 30b4 from each other, and spacers SP2 to SP4 are provided between the plurality of third lens arrays 30c1 to 30c4 to separate the plurality of third lens arrays 30c1 to 30c4 from each other. Thus, an enlarged image of the light emitting portion 231 of each LED package 23 can be formed on a predetermined surface PP.

[0075] In addition, in this embodiment, each of the spacers SP2 to SP4 has a substrate 202 and a functional layer 203 formed on the substrate. When the functional layer 203 is set as a black chrome layer, noise light can be suppressed. In addition, when the functional layer 203 is set as a reflective layer having a reflectivity higher than that of black chrome, the temperature rise of the spacers SP2 to SP4 can be suppressed more than when the substrate 202 is covered with black chrome, thereby suppressing the damage of the lens arrays 301 to 304 caused by heat, and suppressing the interference between the parts in the lens holder caused by the thermal expansion of the spacers.

[0076] In addition, in the first embodiment, although the two first side surfaces 32 of the first lens array 30a1-30a4 to the third lens array 30c1-30c4 respectively have protrusions 32a protruding in the X1 direction, it is also possible to set that any one of the two first side surfaces 32 has the protrusion 32a. In this case, for example, the protrusion 32a of the first lens array 30a1 contacts the first side surface 32 of the second lens array 30b1 that does not have the protrusion 32a, and the protrusion 32a of the second lens array 30b1 contacts the first side surface 32 of the third lens array 30c1 that does not have the protrusion 32a. In addition, any one of the two first side surfaces 32 of the first lens array 30a1-30a4 to the third lens array 30c1-30c4 may not have the protrusion 32a. That is, the first side surface 32 may also be flat. Even in this case, the first lens array 30a1~30a4 to the third lens array 30c1~30c4 can be pressed toward the first wall portion 41 by the first pressure member 45, thereby suppressing the positional deviation of the first lens array 30a1~30a4 to the third lens array 30c1~30c4 in the X1 direction.

[0077] In the first embodiment, the spacer SP1 may be integrated with the third wall portion 43 and the fourth wall portion 44. FIG. 10 is a cross-sectional view showing an example of the integration of the spacer SP1 with the third wall portion 43 and the fourth wall portion 44. The cross section of FIG. 10 corresponds to the cross section taken along line AA of FIG. 7(A). As shown in FIG. 10, by integrating the spacer SP1 with the third wall portion 43 and integrating the spacer SP1 with the fourth wall portion 44, the number of parts can be reduced.

[0078] In addition, in the first embodiment, the first wall portion 41 and the second wall portion 42 are mounted on the heat sink 21, but the first wall portion 41 and the second wall portion 42 may be mounted on the mounting plate. FIG. 11(A) is a front view of the light source unit OPU viewed from the +Z1 side when the first wall portion 41 and the second wall portion 42 are mounted on the mounting plate 400. FIG. 11(B) is a side view of the light source unit OPU viewed from the +X1 side. FIG. 11(C) is a BB line cross-sectional view of FIG. 11(A).

[0079] As shown in FIG. 11(C), the first wall portion 41 and the second wall portion 42 respectively have notches 415 and 425 into which the heat sink 21 is inserted. Thus, the heat sink 21 can be sandwiched between the mounting plate 400 and the first wall portion 41 and the second wall portion 42. By mounting the first wall portion 41 and the second wall portion 42 on the mounting plate 400, the heat sink 21 can be fixed to the mounting plate 400. Thus, compared with the case where the heat sink 21 is fixed to the mounting plate 400 without using the first wall portion 41 and the second wall portion 42, the number of parts can be reduced, but the heat sink 21 can also be fixed to the mounting plate 400 by tightening screws. In addition, when the width of the heat sink 21 in the X1 direction is short, the first wall portion 41 and the second wall portion 42 do not need to be provided with notches, and the heat sink 21 can be directly fixed to the mounting plate 400. At this time, the heat sink 21 may be fixed to the mounting plate 400 using fastening screws.

[0080] (Variant 1) FIG12(A) is a front view of the light source unit OPU-A of variation 1 viewed from the +Z1 side.

[0081] The light source unit OPU-A of the modification 1 is different from the light source unit OPU in that it is provided with a cooling mechanism 300A. The cooling mechanism 300A has an inlet 310 for gas. The gas flowing in from the inlet 310 is discharged from an outlet (not shown) provided on the opposite side of the inlet 310 in the Y1 direction. In addition, although three inlets 310 are provided in FIG. 12(A), the number of inlets 310 may be less than two or more than four.

[0082] FIG12(B) is a view of the light source unit OPU-A from which the cooling mechanism 300A is removed, as viewed from the -Y1 side. The third wall portion 43A of the lens holder 40A of Modification 1 has an opening 432 through which the gas exhausted from the exhaust port of the cooling mechanism 300A passes. In addition, although not shown, the fourth wall portion 44A of the lens holder 40A also has an opening through which the gas passes.

[0083] Furthermore, the spacers SP2A, SP3A, and SP4A of Modification 1 have openings OP2 for allowing the gas discharged from the discharge port of the cooling mechanism 300A to pass through. The openings OP2 are provided at least on two surfaces intersecting the Y1 direction.

[0084] Thus, as shown by arrows in FIG. 12(A) , the gas flows between the first lens arrays 30a1 to 30a4 , between the second lens arrays 30b1 to 30b4 , and between the third lens arrays 30c1 to 30c4 .

[0085] During use of the light source unit OPU-A, the temperature of the spacers SP1, SP2A, SP3A, and SP4A rises due to the irradiation heat from the LED package 23. Therefore, depending on the heat resistance of the lenses held by the spacers SP1, SP2A, SP3A, and SP4A, there is a risk that the lens arrays 301 to 304 may be damaged due to lighting of the LED package 23. By allowing gas to flow between the lens arrays 301 to 304, the spacers SP1 to SP4 and the lens arrays 301 to 304 are cooled, and the temperature rise thereof is suppressed, thereby suppressing damage to the lens arrays 301 to 304 and suppressing interference between parts in the lens holder caused by thermal expansion of the spacers. In addition, a cooling mechanism 300A may be provided on the side of the fourth wall portion 44A.

[0086] (Variant 2) FIG13(A) is a front view of the light source unit OPU-B of variation 2 as viewed from the +Z1 side.

[0087] The light source unit OPU-B of the second modification is different from the light source unit OPU in that it is provided with a cooling mechanism 300B. The cooling mechanism 300B has a gas inlet 310. The gas flowing in from the inlet 310 is discharged from an outlet provided on the opposite side of the inlet 310 in the X1 direction.

[0088] FIG13(B) is a diagram of the light source unit OPU-B with the cooling mechanism 300B removed, as viewed from the +X1 side. The first wall portion 41B of the lens holder 40B of the second modification has an opening 412 through which the gas exhausted from the exhaust port of the cooling mechanism 300B passes. In addition, although not shown, the second wall portion 42B of the lens holder 40B also has an opening through which the gas passes.

[0089] Furthermore, the spacers SP2B, SP3B, and SP4B of Modification 2 have openings OP3 through which the gas discharged from the discharge port of the cooling mechanism 300B passes. The openings OP3 are provided on at least two surfaces intersecting the X1 direction.

[0090] Thereby, as shown by arrow A2, the gas flows between the first lens arrays 30a1 to 30a4, between the second lens arrays 30b1 to 30b4, and between the third lens arrays 30c1 to 30c4.

[0091] During use of the light source unit OPU-B, the temperature of the spacers SP1, SP2B, SP3B, and SP4B rises due to the irradiation heat from the LED package 23. Therefore, depending on the heat resistance of the lenses held by the spacers SP1 to SP4, there is a risk that the lens arrays 301 to 304 may be damaged due to lighting of the LED package 23. By allowing gas to flow between the lens arrays 301 to 304, the spacers SP1, SP2B, SP3B, SP4B and the lens arrays 301 to 304 are cooled, and the temperature rise is suppressed, thereby suppressing damage to the lens arrays 301 to 304 and suppressing interference between parts in the lens holder due to thermal expansion of the spacers.

[0092] (Variant 3) Fig. 14(A) is a cross-sectional view of a light source unit OPU-C according to Modification 3. The cross section of Fig. 14(A) corresponds to the cross section taken along line AA of Fig. 6(A).

[0093] In the third modification, the third wall portion 43C and the fourth wall portion 44C respectively have a flow path 433 and a flow path 442 through which the refrigerant flows. The flow path 433 and the flow path 442 only need to be optimized in accordance with the structure of the third wall portion 43C and the fourth wall portion 44C.

[0094] During use of the light source unit OPU-C, the temperature of the spacers SP1 to SP4 rises due to the irradiation heat from the LED package 23. Depending on the heat resistance of the lenses held by the spacers SP1 to SP4, the lens arrays 301 to 304 may be damaged due to lighting of the LED package 23. By allowing the coolant to flow inside the third wall portion 43C and the fourth wall portion 44C, the spacers SP1 to SP4 and the lens arrays 301 to 304 are cooled, and by suppressing the temperature rise, damage to the lens arrays 301 to 304 can be suppressed, and interference between parts in the lens holder caused by thermal expansion of the spacers can also be suppressed.

[0095] (Variant 4) Fig. 14(B) is a cross-sectional view of the light source unit OPU-D according to Modification 4. The cross section of Fig. 14(B) corresponds to the cross section taken along line AA of Fig. 6(A) .

[0096] In the modification 4, the third wall portion 43D and the fourth wall portion 44D respectively have a flow path 434 and a flow path 443 through which the refrigerant flows. The flow path 434 and the flow path 443 are connected to the flow path 211 of the radiator 21. The flow path 434 and the flow path 443 only need to be optimized in accordance with the structures of the third wall portion 43D, the fourth wall portion 44D, and the radiator 21.

[0097] By connecting the flow paths 434 and 443 of the third wall portion 43D and the fourth wall portion 44D to the flow path 211 of the radiator 21, the coolant of the radiator 21 can be used to cool the spacers SP1 to SP4 and the lens arrays 301 to 304. This eliminates the need to provide a separate mechanism for allowing the coolant to flow through the flow paths of the third wall portion 43D and the fourth wall portion 44D, thereby simplifying the structure.

[0098] In addition, the modifications 1 to 4 may be appropriately combined. For example, the light source unit may include a cooling mechanism 300A and a cooling mechanism 300B. In addition, for example, the light source unit may include a cooling mechanism 300A and a third wall portion 43C having a flow path 433 through which a coolant flows, and a fourth wall portion 44C having a flow path 442 through which a coolant flows.

[0099] 《Second Implementation Form》 The lighting unit to which the light source unit of the first embodiment and its modified examples is applied is not limited to the lighting unit 90 of the first embodiment. Fig. 15 is a schematic diagram showing the structure of a lighting unit 90A of the second embodiment.

[0100] The lighting unit 90A includes: a first light source unit OPU1, a second light source unit OPU2, and an illumination optical system 80A. The first light source unit OPU1 includes a light source array 20A and an enlargement optical system 30A, and the second light source unit OPU2 includes a light source array 20B and an enlargement optical system 30B. The structures of the light source array 20A and the light source array 20B are the same as those of the light source array 20, so detailed descriptions are omitted. In addition, the structures of the enlargement optical system 30A and the enlargement optical system 30B are the same as those of the enlargement optical system 30, so detailed descriptions are omitted. The plurality of lens arrays included in the enlargement optical system 30A and the plurality of lens arrays included in the enlargement optical system 30B are held by the lens holder of the first embodiment and its modified example.

[0101] The illumination optical system 80A includes: a first focusing optical system 83A including a first dichroic mirror DM1, a second focusing optical system 83B, a second dichroic mirror DM2, an imaging optical system 81A, a fly-eye lens FEL, an aperture stop 85, a condenser optical system 86 and an illumination correction filter 87.

[0102] The first light-converging optical system 83A forms a pupil of the magnified image of the light-emitting portion 231 formed by the first magnifying optical system 30A. That is, the rear focal position of the first light-converging optical system 83A becomes the position of the pupil. The first light-converging optical system 83A has a first dichroic mirror DM1 in the middle of the optical path, which reflects at least a part of the light with a peak wavelength of 385 nm. Thereby, the light beam is incident on the second dichroic mirror DM2. In addition, the first light-converging optical system 83A can also be configured without the first dichroic mirror DM1. In this case, it is sufficient to appropriately adjust the configuration of the first light source unit OPU1 and the configuration of each lens of the first light-converging optical system 83A so that the light beam is incident on the second dichroic mirror DM2. In addition, the first light-converging optical system 83A can be configured with a single lens or a lens group including a plurality of lenses.

[0103] The second light-converging optical system 83B forms a pupil of the magnified image of the light-emitting portion 231 formed by the second magnifying optical system 30B. That is, the rear focal position of the second light-converging optical system 83B becomes the position of the pupil. The second light-converging optical system 83B may be composed of a single lens or a lens group including a plurality of lenses.

[0104] The second dichroic mirror DM2 transmits at least a portion of the light with a peak wavelength of 385 nm and reflects at least a portion of the light with a peak wavelength of 365 nm, thereby forming a composite image in which the pupil image formed by the first focusing optical system 83A and the pupil image formed by the second focusing optical system 83B overlap.

[0105] The imaging optical system 81A is a telecentric optical system that projects the composite image synthesized by the second dichroic mirror DM2 to the incident end of the fly-eye lens FEL at the same magnification. In addition, the imaging optical system 81A can also reduce the composite image synthesized by the second dichroic mirror DM2 and project it to the incident end of the fly-eye lens FEL.

[0106] The other structures are the same as those in the above-mentioned embodiment, and thus detailed description is omitted. Thus, in an exposure device having a plurality of light source units, any light source unit of the first embodiment and its modified example can be applied.

[0107] 《Third Implementation Form》 FIG. 16 is a schematic diagram showing the structure of an exposure apparatus 10B according to the third embodiment.

[0108] In the exposure device 10B, the lighting unit 90B includes: a first light source unit OPU1, a second light source unit OPU2, and an illumination optical system 80B. The first light source unit OPU1 and the second light source unit OPU2 are the same as those in the second embodiment, and thus detailed description thereof is omitted.

[0109] The illumination optical system 80B includes a first focusing optical system 83A1, a second focusing optical system 83B1, a third dichroic mirror DM3, an imaging optical system 81B, a fly-eye lens FEL, an aperture stop 85, a focusing optical system 86B and an illumination correction filter 87.

[0110] The first condensing optical system 83A1 is disposed on the predetermined plane PP or its vicinity, and forms a pupil of the magnified image of the light emitting unit 231 formed by the magnifying optical system 30A. The first condensing optical system 83A1 may be composed of a single lens or a lens group including a plurality of lenses.

[0111] The second light-collecting optical system 83B1 is disposed on the predetermined plane PP or in the vicinity thereof, and forms a pupil of the magnified image of the light-emitting portion 231 formed by the magnifying optical system 30B. The second light-collecting optical system 83B1 may be composed of a single lens or a lens group including a plurality of lenses.

[0112] The third dichroic mirror DM3 transmits at least a portion of the light with a peak wavelength of 385 nm and reflects at least a portion of the light with a peak wavelength of 365 nm, thereby forming a composite image in which the pupil image formed by the first focusing optical system 83A1 and the pupil image formed by the second focusing optical system 83B1 overlap.

[0113] The imaging optical system 81B is a telecentric optical system that projects the composite image synthesized by the third dichroic mirror DM3 to the incident end of the fly-eye lens FEL at the same magnification. In addition, the imaging optical system 81B can also reduce the composite image synthesized by the third dichroic mirror DM3 and project it to the incident end of the fly-eye lens FEL.

[0114] The light beam incident on the fly-eye lens FEL is split by a plurality of lens units, and a light source image is formed at or near the focal plane behind each lens unit. The light beam from the secondary light source formed at or near the focal plane behind the fly-eye lens FEL is incident on the aperture stop 85 disposed near the focal plane.

[0115] The light from the secondary light source that passes through the aperture stop 85 is focused by the condenser optical system 86B, and then its illumination is corrected by the illumination correction filter 87, so as to illuminate the mask MSK having a predetermined pattern in an overlapping manner.

[0116] In the exposure device 10B, the projection optical system PL is an Offner type optical system supported by the optical platen 73 below the mask stage MST (-Z side). The projection optical system PL forms an image field in an arc shape with the Y-axis direction as the long side direction, for example.

[0117] When the illumination area on the mask MSK is illuminated by the illumination light IL from the illumination optical system IOP, the projection image (partial erect image) of the circuit pattern of the mask MSK in the illumination area is formed on the irradiation area (exposure area (conjugate with the illumination area)) on the plate P arranged on the image plane side of the projection optical system PL by the illumination light IL that penetrates the mask MSK. Thus, the plate P is exposed and the pattern of the mask MSK is transferred to the plate P.

[0118] As shown in the third embodiment, in an exposure apparatus 10B including an Offner-type projection optical system PL, the light source unit of any one of the first embodiment and its modified example can be applied.

[0119] In addition, the wavelength of light emitted by the first light source unit OPU1 and the second light source unit OPU2 is not limited to the above-mentioned ones. The first light source unit OPU1 and the second light source unit OPU2 can also be formed by appropriately combining LED packages that emit light with a peak wavelength in the range of 360~440nm.

[0120] For example, the peak wavelength of the light emitted from the light emitting portion 231 of the LED package 23 may also be within the range of 400 to 410 nm. For example, the first light source unit OPU1 may emit light with a peak wavelength of 405 nm, and the second light source unit OPU2 may emit light with a peak wavelength of 365 nm. In addition, the first light source unit OPU1 may emit light with a peak wavelength of 395 nm, and the second light source unit OPU2 may emit light with a peak wavelength of 385 nm. The combination of the wavelength of the light emitted from the first light source unit OPU1 and the wavelength of the light emitted from the second light source unit OPU2 is not limited to these examples. In addition, when the combination of the wavelength of the light emitted from the first light source unit OPU1 and the wavelength of the light emitted from the second light source unit OPU2 is set to a combination other than that of the present embodiment, it is preferable to appropriately change the material of the dichroic mirror according to the wavelength used.

[0121] In the above-mentioned embodiment and its modification, it is described that the exposure device is used in the manufacture of liquid crystal display devices (flat panel displays), but the exposure device may also be used for exposing silicon wafers to manufacture semiconductors.

[0122] The above-mentioned embodiments are preferred embodiments of the present invention, but are not limited thereto, and various modifications can be implemented within the scope of the gist of the present invention.

[0123] 10, 10B: Exposure device 20, 20A, 20B: Light source array 20a~20c: 1st~3rd light source array 21: Radiator 23:LED package 30, 30A, 30B: Magnifying optical system 30a~30c: 1st~3rd magnifying optical system 30a1~30a4: 1st lens array 30b1~30b4: 2nd lens array 30c1~30c4: 3rd lens array 31: Lens part 32: Side 1 32a: protrusion 40, 40A, 40B: Lens holder 41, 41B: 1st wall 42, 42B: Second wall 43, 43A, 43C, 43D: Third wall 44, 44A, 44C, 44D, 44a~44c: 4th wall 45: First pressure member 46: Second pressure member 47: The third pressure member 70: Main body 71: Base (anti-vibration table) 72A, 72B: Column 73: Optical Fixture 74: Support body 75: Sliding guide 80, 80A, 80B: Illumination optical system 81, 81A, 81B: Imaging optical system 83A, 83A1: 1st focusing optical system 83B, 83B1: Second focusing optical system 85: Aperture diaphragm 86, 86A, 86B: Condenser optical system 87: Illumination correction filter 90, 90A, 90B: Lighting unit 100: Projection optical unit 200, 202: Base material 201, 203: Functional layer 211:Flow path 231: Luminous part 300A, 300B: Cooling mechanism 301~304: Lens array 310: Inlet 400: Mounting plate 411, 431: protrusion 412, 432: Opening 415, 425: Notch 433, 434, 442, 443: Flow path AX: Reference optical axis CNT: Control Device F: Floor FEL: Fly Eye Lens DM1: The first dichroic mirror DM2: Second dichroic mirror DM3: The third dichroic mirror IL: Illumination light IOP: Illumination Optics MSK:Mask MST: Mask Stage OP1, OP2, OP3: Open OPU, OPU-A, OPU-B, OPU-C, OPU-D: light source unit OPU1: Light source unit 1 OPU2: Second light source unit P: Glass substrate PL: Projection Optical System PP:Predetermined surface PST: substrate stage R1~R3: Area 1~Area 3 SP1~SP4, SP2A~SP4A, SP2B~SP4B: Spacer

Claims

1. A light source unit comprising: a fixed object; a first light source array and a second light source array respectively disposed in the fixed object in a first region and a second region in a first direction, and each comprising a plurality of light source elements; a first lens array configured to correspond to the first region; a second lens array configured to correspond to the second region; and a lens holder for holding the first lens array and the second lens array; a first side surface of the first lens array and a first side surface of the second lens array in contact in the first direction; the lens holder comprising a first wall portion defining the positions of the first lens array and the second lens array in the first direction, and a first pressing member for pressing the first lens array and the second lens array toward the first wall portion.

2. The light source unit as described in claim 1, wherein, At least one of the first side surface of the first lens array and the first side surface of the second lens array has a protrusion protruding in the first direction.

3. The light source unit as described in claim 1, wherein, The first side surface of the first lens array and the first side surface of the second lens array each have a protrusion protruding in the first direction. The first side of the first lens array and the first side of the second lens array are in contact at the protrusion, but not in contact at other parts.

4. The light source unit as described in any one of claims 1 to 3, wherein, The aforementioned lens holding member comprises: a second wall portion, which defines the positions of the aforementioned first lens array and the aforementioned second lens array in a second direction orthogonal to the aforementioned first direction in a plane parallel to the plane on which the aforementioned plurality of light source elements are arranged; and a second pressure member, which applies pressure to the aforementioned first lens array and the aforementioned second lens array toward the aforementioned second wall portion.

5. The light source unit as described in claim 4, wherein, The aforementioned second wall portion has a protrusion that protrudes in the aforementioned second direction and contacts the second side surface of the aforementioned first lens array and the second side surface of the aforementioned second lens array.

6. The light source unit as described in claim 4, wherein, The aforementioned lens holder has a third wall portion that is opposite to the aforementioned second wall portion in the aforementioned second direction, separated by the aforementioned first lens array and the aforementioned second lens array; at least one of the aforementioned second wall portion and the aforementioned third wall portion has a flow path for refrigerant to flow inside.

7. The light source unit as described in any one of claims 1 to 3, wherein, The aforementioned fixed object is a heat sink.

8. The light source unit as described in claim 6, wherein, The aforementioned fixed object is a heat sink; the aforementioned flow path is connected to the flow path of the aforementioned heat sink.

9. The light source unit as described in any one of claims 1 to 3, wherein, When viewed from above, the aforementioned first lens array and the aforementioned second lens array have a rectangular shape.

10. The light source unit as described in any one of claims 1 to 3, wherein, The aforementioned lens holder includes a third pressure-applying member that applies pressure to the aforementioned first lens array and the aforementioned second lens array toward the aforementioned fixed object.

11. The light source unit as described in any one of claims 1 to 3, wherein, Along a third direction orthogonal to the plane in which the aforementioned plurality of light source elements are arranged, a plurality of the aforementioned first lens arrays and a plurality of the aforementioned second lens arrays are respectively provided; between the plurality of the aforementioned first lens arrays, a first frame is provided to separate the plurality of the aforementioned first lens arrays from each other; between the plurality of the aforementioned second lens arrays, a second frame is provided to separate the plurality of the aforementioned second lens arrays from each other.

12. The light source unit as described in claim 11, wherein, The inner circumferential surfaces of the first frame and the second frame have a higher reflectivity than black chrome.

13. The light source unit as described in claim 11, wherein, The aforementioned first frame and the aforementioned second frame each have a substrate and a black chromium layer formed on the aforementioned substrate.

14. The light source unit as described in claim 11, wherein, The first frame and the second frame each have a substrate and a reflective layer formed on the substrate; the reflectivity of the reflective layer is higher than that of the substrate.

15. The light source unit as described in claim 11, wherein, The aforementioned first frame and the aforementioned second frame are made of glass.

16. The light source unit as described in claim 11, wherein, The aforementioned lens holder includes a fourth pressure-applying member that applies pressure to at least one of the aforementioned first frame and the aforementioned second frame toward the aforementioned first wall portion.

17. The light source unit as described in claim 11, wherein, It has a gas flow mechanism that allows gas to flow between the aforementioned plurality of the aforementioned first lens arrays and between the aforementioned plurality of the aforementioned second lens arrays.

18. The light source unit as described in any one of claims 1 to 3, wherein, The aforementioned plurality of light source elements are a plurality of LED elements.

19. The light source unit as described in any one of claims 1 to 3, wherein, The peak wavelength of the light emitted from the aforementioned plurality of light source elements is in the range of 360–370 nm.

20. The light source unit as described in any one of claims 1 to 3, wherein, The peak wavelength of the light emitted from the aforementioned plurality of light source elements is in the range of 380 to 390 nm.

21. The light source unit as described in any one of claims 1 to 3, wherein, The peak wavelength of the light emitted from the aforementioned plurality of light source elements is in the range of 400 to 410 nm.

22. The light source unit as described in any one of claims 1 to 3, wherein, The aforementioned light source unit is used in an exposure device.

23. An illumination unit comprising: a light source unit as described in any one of claims 1 to 22; and an illumination optical system for guiding light emitted from the aforementioned light source unit to an illuminated object.

24. An illumination unit comprising: a light source unit as described in any one of claims 1 to 22; and an illumination optical system comprising a combining optical element for combining light emitted from the plurality of the aforementioned light source units, and guiding the combined light emitted from the aforementioned combining optical element to an irradiated object.

25. An exposure apparatus comprising: an illumination unit as described in claim 23 or 24; and a projection optical system for projecting a pattern image of a mask illuminated by the aforementioned illumination unit onto a photosensitive substrate.

26. The exposure apparatus as described in claim 25, wherein, The length of at least one side or the diagonal length of the aforementioned photosensitive substrate is 500 mm or more.

27. An exposure method using the exposure apparatus described in claim 25 or 26, comprising the following actions: illuminating a mask by means of the aforementioned illumination unit; and projecting a pattern image of the aforementioned mask onto a photosensitive substrate using the aforementioned projection optics system.

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