Plasma treatment equipment, control methods, computer programs and power supply systems
By synchronizing high-frequency power states with the bias power phase, the method addresses IMD in plasma etching, enhancing etching efficiency and rate in high aspect ratio processes.
TWI934500BActive Publication Date: 2026-08-01TOKYO ELECTRON LTD
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Patent Information
- Application Number
- TW114108640
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2019-06-05
- Filing Date
- 2019-06-13
- Publication Date
- 2026-08-01
- Estimated Expiration
- 2039-06-12
AI Technical Summary
Technical Problem
Existing plasma etching technologies experience intermodulation distortion (IMD) due to the application of high-frequency powers with different frequencies, leading to increased reflected power and reduced etching rates, especially in high aspect ratio processes.
Method used
A control method is implemented to synchronize the on/off states of high-frequency powers with the phase of the bias power, reducing IMD by controlling the quantity and quality of free radicals and ions through phase-synchronized power supply timing.
Benefits of technology
The method effectively reduces IMD, enhances etching efficiency, and improves the etching rate in high aspect ratio processes by controlling the ion energy and plasma density.
✦ Generated by Eureka AI based on patent content.
Abstract
The object of this invention is to control the quantity and quality of free radicals and ions. To achieve the above object, this invention provides a control method for a plasma processing apparatus having a first electrode on which a subject is placed, characterized by comprising: a step of supplying bias power to the first electrode; and a step of supplying a source power having a frequency higher than the bias power to a plasma processing space; the source power having a first state and a second state; the control method further comprising: a first control step of interactively applying the first state and the second state in a manner synchronized with the phase of a reference electrical state representing any one of the voltage, current, or electromagnetic field measured by the power supply system of the bias power within one cycle.
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