Plasma treatment unit
The apparatus addresses vacuum maintenance by using a sheet member to cover and secure the dielectric plate, ensuring vacuum integrity despite damage, thus preventing air leakage and pressure rise.
TWI934511BActive Publication Date: 2026-08-01NISSIN ELECTRIC CO LTD
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Patent Information
- Application Number
- TW114109457
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2024-06-05
- Filing Date
- 2025-03-14
- Publication Date
- 2026-08-01
- Estimated Expiration
- 2045-03-13
AI Technical Summary
Technical Problem
The existing plasma processing apparatuses face a challenge in maintaining vacuum integrity when the dielectric plate is damaged.
Method used
A plasma processing apparatus is designed with a sheet member made of insulating material that covers the dielectric plate from the outside, fixed around the opening edge, and secured by bolts to maintain vacuum even if the dielectric plate is damaged.
Benefits of technology
The apparatus ensures that the vacuum is maintained within the container by effectively sealing the damaged dielectric plate, preventing air leakage and pressure rise.
✦ Generated by Eureka AI based on patent content.
Abstract
Even if the dielectric plate is damaged, the vacuum of the vacuum container is maintained. The plasma processing device (101) includes: a vacuum container (1) whose interior is evacuated by vacuum; an antenna (3) disposed outside the vacuum container, which generates plasma inside the vacuum container (1) by flowing a high-frequency current; a dielectric plate (5) that blocks the opening (1a) formed in the vacuum container (1) facing the antenna (3); and a sheet member (6) that covers the dielectric plate (5) from the outside of the vacuum container (1) and has insulation. The periphery of the sheet member (6) is fixed around the area in the vacuum container (1) where the dielectric plate (5) is disposed.
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