Drip prevention system of semiconductor processing device and usage thereof

Abstract

This invention discloses an anti-drip system for semiconductor manufacturing equipment and its usage method, comprising: a liquid outlet pipe, one end of which is connected to a liquid storage unit, and the other end of which is connected to a nozzle; a control valve disposed in the liquid outlet pipe for controlling the opening and closing of the liquid outlet pipe; a connecting pipe, one end of which is connected to the liquid outlet pipe and placed between the control valve and the nozzle; and a liquid suction assembly connected to the other end of the connecting pipe, wherein a liquid is introduced into the liquid suction assembly to create negative pressure and suction out the liquid. This invention utilizes the Venturi principle, that is, using negative pressure to absorb residual liquid, achieving a simple, efficient, and thorough back-suction of the liquid.

Description

[Technical Field]

[0001] This invention relates to the field of semiconductor technology, and in particular to an anti-drip system for semiconductor manufacturing equipment and its method of use. [Previous Technology]

[0002] Electric and pneumatic diaphragm back suction valves are commonly used anti-drip devices in the semiconductor field; in order to prevent the liquid from the nozzle from dripping onto the wafer during non-working hours, the nozzle located above the wafer needs to have an anti-drip function.

[0003] The existing technology uses electric or pneumatic diaphragm back-suction valves to achieve the back-suction effect. This solution has the following drawbacks:

[0004] 1. Diaphragm-type back suction valves are easily affected by the properties of the liquid itself, leading to malfunctions and back suction failure. For example, the easy crystallization or decomposition of the liquid will cause the back suction valve to fail to play an effective back suction role, and high specific gravity adhesives will also lead to poor back suction effect.

[0005] 2. The suction power of the diaphragm-type back suction valve is limited. The current common back suction volume is about 0.2ml, which is small and cannot completely back suction the medicine in the swing arm. There is still a risk of dripping during the movement of the swing arm equipped with the nozzle.

[0006] 3. Diaphragm back suction valves use diaphragm back suction, which has a complex structure and is easily damaged.

[0007] Therefore, it is necessary to provide a new type of anti-drip system for semiconductor manufacturing equipment and its usage method to solve the above-mentioned problems existing in the prior art. [Summary of the Invention]

[0008] The purpose of this invention is to provide an anti-drip system for semiconductor manufacturing equipment and its usage method, which is used to back-absorb residual liquid in the nozzle, achieving simple, efficient and thorough back-absorption of the liquid.

[0009] To achieve the above objectives, the technical solution of the present invention is as follows:

[0010] A liquid-resistant anti-drip system for semiconductor manufacturing equipment, comprising:

[0011] A liquid outlet pipe, one end of which is used to connect to the liquid storage section, and the other end of which is used to connect to the nozzle;

[0012] A control valve is provided in the liquid outlet pipe for controlling the opening and closing of the liquid outlet pipe;

[0013] A connecting pipe, one end of which is connected to the liquid outlet pipe and placed between the control valve and the nozzle;

[0014] A liquid suction assembly is connected to the other end of the connecting tube. Liquid is introduced into the liquid suction assembly and used to form a negative pressure to suction out the liquid.

[0015] By adopting the above technical solution, the liquid is introduced into the liquid suction component, and the liquid flows in the liquid suction component, forming a negative pressure to suck out the liquid in the nozzle. In this invention, the liquid suction component mainly utilizes the Venturi principle, that is, the residual liquid is sucked up through negative pressure. The diaphragm-type back suction valve in the prior art is easily affected by the properties of the liquid itself, resulting in malfunction and back suction failure. For example, the liquid is prone to crystallization or decomposition, which will cause the back suction valve to fail to play an effective back suction role. High specific gravity glue will also lead to poor back suction effect. Through its improvement, the liquid can be simply, efficiently and thoroughly back-suctioned. At the same time, the structure is simple and not easily damaged. In addition, the applicability of the liquid is increased. Liquids of different properties can be used. The back suction time and back suction force can be set. The back suction volume can be adjusted by adjusting the back suction position. At the same time, the liquid is used to provide back suction power to ensure that the back-suctioned liquid is fully recovered and that no air or other impurities are mixed in during recovery.

[0016] Optionally, the control valve is an on / off valve, and the liquid suction assembly is provided with a second pipe. One end of the second pipe is connected to the liquid suction assembly, and the other end is used to connect to a supply device. The supply device is used to provide fluid to the liquid suction assembly. A first valve is provided on the second pipe to control the on / off state of the second pipe.

[0017] By adopting the above technical solution, the supply equipment is used to provide liquid to the liquid suction component, which facilitates the generation of negative pressure in the liquid suction component. After the negative pressure is generated, the liquid remaining in the nozzle will be sucked up by the liquid suction component, which facilitates the cleaning of the residual liquid. At the same time, the back suction volume is large, which improves the problem of limited suction power of the diaphragm back suction valve.

[0018] Optionally, the control valve is a three-way valve, which includes an inlet end, a first outlet end and a second outlet end. The inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, and the second outlet end is connected to the liquid suction assembly. In the supply state, the inlet end is connected to the first outlet end; in the back suction state, the inlet end is connected to the second outlet end.

[0019] By adopting the above technical solution, when the control valve is a three-way valve, no external supply equipment is required. By switching the three-way valve, the liquid storage section can supply liquid to the nozzle or the liquid storage section can supply liquid to the suction assembly. At the same time, the logic control is simplified, which facilitates the liquid suction process.

[0020] Optionally, the control valve is a four-way valve, which includes an inlet end, a first outlet end, a second outlet end, and a circulation end. The inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, the second outlet end is connected to the liquid suction assembly, and the circulation end of the control valve is connected to the liquid storage section. In the supply state, the inlet end is connected to the first outlet end; in the back suction state, the inlet end is connected to the second outlet end; and in the circulation state, the inlet end is connected to the circulation end.

[0021] By adopting the above technical solution, when the control valve is a four-way valve, it has three states at the same time: liquid supply, back suction, and circulation, which facilitates the replacement and heat preservation of the liquid in the pipeline, and realizes the triple functions of nozzle liquid supply, back suction, and liquid circulation.

[0022] Optionally, a second valve is provided on the connecting pipe for controlling the opening and closing of the connecting pipe.

[0023] By adopting the above technical solution, in actual use, after negative pressure is formed in the liquid aspiration component, the second valve is opened, which can achieve the purpose of simple, efficient and thorough back aspiration of the medicine.

[0024] A method of using an anti-drip system includes the following steps:

[0025] Step 1: Open the control valve to connect the liquid storage section and the nozzle through the liquid outlet pipe;

[0026] Step 2: The liquid storage unit begins to supply liquid, and after passing through the liquid outlet pipe, the liquid is transferred to the wafer surface via the nozzle;

[0027] Step 3: Close the control valve to disconnect the liquid storage section from the nozzle;

[0028] Step 4: The liquid suction assembly performs back suction, transferring the liquid in the nozzle through the connecting tube into the liquid suction assembly.

[0029] By adopting the above technical solution, the liquid in the reservoir is controlled to flow into the nozzle when the control valve is opened and closed. At the same time, when the suction component is suctioning back, the reservoir no longer provides liquid, which facilitates the suction process.

[0030] Optionally, when the control valve is an on / off valve, a second pipe is provided on the liquid suction assembly, one end of the second pipe is connected to the liquid suction assembly, and the other end is used to connect to the supply equipment, and a second valve is provided on the connecting pipe; a first valve is provided on the second pipe;

[0031] In step four, the first valve is opened to allow the supply device to introduce fluid into the liquid suction assembly through the second pipe, so that the liquid suction assembly is in a negative pressure state. The second valve is then opened to transfer the liquid in the nozzle into the liquid suction assembly through the connecting pipe.

[0032] By adopting the above technical solution, when the control valve is an on / off valve, before the liquid suction assembly moves, the first valve needs to be opened to introduce fluid into the liquid suction assembly, so as to facilitate the formation of negative pressure in the liquid suction assembly. Here, an external supply device is used to provide fluid, which can be liquid or gas, to facilitate the liquid suction process.

[0033] Optionally, when the control valve is a three-way valve, the inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, the second outlet end is connected to the liquid suction assembly, and a second valve is provided on the connecting pipe;

[0034] In step one, the control valve is opened to connect the inlet end with the first outlet end, thereby connecting the liquid storage section with the nozzle through the liquid outlet pipe;

[0035] In step three, the control valve is closed, so that the inlet end is disconnected from the first outlet end and the inlet end is connected to the second outlet end, thereby connecting the liquid storage section with the liquid suction assembly;

[0036] In step four, after the liquid in the storage section passes through the inlet end and the second outlet end, it passes through the liquid suction assembly, making the liquid suction assembly under negative pressure. The second valve is then opened, and the liquid in the nozzle is transferred to the liquid suction assembly through the connecting pipe.

[0037] By adopting the above technical solution, when the control valve is a three-way valve and the liquid suction component needs to provide negative pressure, it is only necessary to connect the inlet end to the second outlet end. The liquid in the storage section passes through the liquid suction component to form a negative pressure state. There is no need to use external supply equipment, which simplifies the control method and improves the liquid suction efficiency.

[0038] Optionally, when the control valve is a four-way valve, the inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, the second outlet end is connected to the liquid suction assembly, the circulation end of the control valve is connected to the liquid storage section, and a second valve is provided on the connecting pipe;

[0039] In step one, the control valve is opened to connect the inlet end with the first outlet end, thereby connecting the liquid storage section with the nozzle through the liquid outlet pipe;

[0040] In step three, the control valve is closed, so that the inlet end is disconnected from the first outlet end and the inlet end is connected to the second outlet end, thereby connecting the liquid storage section with the liquid suction assembly;

[0041] In step four, after the liquid in the storage section passes through the inlet end and the second outlet end, it passes through the liquid suction assembly, making the liquid suction assembly under negative pressure. The second valve is then opened, and the liquid in the nozzle is transferred to the liquid suction assembly through the connecting pipe.

[0042] By adopting the above technical solution, when the control valve is a four-way valve and the liquid suction assembly needs to work, the inlet end is connected to the second outlet end, so that the liquid in the storage section can flow through the liquid suction assembly, thereby forming a negative pressure state in the liquid suction assembly, which facilitates the liquid suction process.

[0043] Optionally, it also includes step five, connecting the inlet end to the circulation end, so that the liquid in the storage section re-enters the storage section after passing through the inlet end and the circulation end, thus completing the circulation.

[0044] By adopting the above technical solution, when the control valve is a four-way valve, it also has a circulation function, connecting the inlet end with the circulation end, and the liquid medicine circulates continuously through the circulation pipeline to ensure the temperature of the liquid medicine.

[0045] Optionally, the second valve opens after the liquid suction assembly generates negative pressure.

[0046] By adopting the above technical solution, the second valve opens after the liquid suction component forms a negative pressure. At the same time as the second valve opens, the residual liquid in the nozzle is sucked up, which facilitates the liquid suction process.

[0047] Optionally, the liquid suction assembly includes an installation body and a Laval nozzle. The Laval nozzle is disposed inside the installation body and communicates with the outside of the installation body. One end of the Laval nozzle is the inlet end of the liquid suction assembly, and the other end is the outlet end of the liquid suction assembly. The connecting pipe is disposed on the side wall of the installation body and communicates with the Laval nozzle.

[0048] By adopting the above technical solution, the Laval nozzle can accelerate the fluid, which makes it easier to form a negative pressure in the liquid suction assembly. At the same time, compared with other types of nozzles, the structure of the Laval nozzle is simpler and easier to manufacture and maintain.

[0049] Optionally, a sensor is provided on the liquid aspiration assembly, and the sensor is used to detect the back-suction effect of the liquid aspiration assembly.

[0050] By adopting the above technical solution, the sensor detects the back suction effect. Once back suction failure occurs, an alarm can be triggered immediately to avoid losses caused by process defects.

[0051] A semiconductor manufacturing apparatus includes an anti-drip system, a nozzle, a liquid storage unit, and a worktable, wherein one end of the liquid outlet pipe is connected to the liquid storage unit and the other end is connected to the nozzle;

[0052] In the working state, the wafer is placed on the worktable, and the nozzle position corresponds to the wafer position.

[0053] By adopting the above technical solution, when wafer processing is required, the wafer is placed on the worktable and the nozzle position is aligned with the wafer position to perform processing. The anti-drip system uses a liquid suction component, which can effectively suck back the residual liquid in the nozzle; realize the complete recovery of the liquid in the swing arm, and increase the recovery rate.

[0054] The beneficial effects of the anti-drip system for semiconductor manufacturing equipment and its usage method provided by the present invention are as follows:

[0055] 1. This invention utilizes the Venturi principle, that is, to draw in residual medicine liquid through negative pressure; the diaphragm-type back suction valve in the prior art is easily affected by the characteristics of the liquid itself, leading to malfunction and back suction failure. For example, the medicine liquid is prone to crystallization or decomposition, which will cause the back suction valve to fail to play an effective back suction role, and high specific gravity glue will also lead to poor back suction effect; through the improvement, the medicine liquid can be simply, efficiently and thoroughly back-suctioned; at the same time, the structure is simple and not easily damaged;

[0056] 2. The invention reduces the complexity and maintenance cost of the system by using a simpler component as the back suction power source compared to the traditional diaphragm pump structure; it avoids the possibility of clogging of the traditional diaphragm gas path, improves the recovery rate of the medicine, and avoids the waste of the medicine;

[0057] 3. Increased applicability of the medicine solution, it can be used for medicine solutions of different properties, and the back suction time and back suction force can be set; and the back suction volume can be adjusted by adjusting the back suction position;

[0058] 4. Achieve complete recovery of the liquid medicine by swinging arm, increase the recovery rate, and at the same time use the liquid medicine to provide back suction power to ensure that the back suction liquid medicine is fully recovered and that no air or other impurities are mixed in during recovery.

Implementation Method

[0060] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are some embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed after the word and its equivalents, but does not exclude other elements or objects.

[0061] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings.

[0062] In a first aspect, the present invention provides an anti-drip system for a semiconductor manufacturing process apparatus. Referring to Figures 1-4, the anti-drip system includes a liquid outlet pipe 1. One end of the liquid outlet pipe 1 is connected to a liquid storage unit 2, and the other end is connected to a nozzle 3. During use, the liquid in the liquid storage unit 2 flows into the liquid outlet pipe 1, and then flows from the liquid outlet pipe 1 into the nozzle 3, and is sprayed out through the nozzle 3 onto the wafer surface. A control valve 4 is provided on the liquid outlet pipe 1. Both ends of the control valve 4 are connected to the liquid outlet pipe 1. When the control valve 4 is opened or closed, it can control the flow of the liquid outlet pipe 1, thereby controlling the flow of the liquid in the liquid storage unit 2 into the nozzle 3 or stopping the flow into the nozzle 3. A connecting pipe 5 and a liquid suction assembly 6 are also provided on the liquid outlet pipe 1. One end of the connecting pipe 5 is connected to the liquid outlet pipe 1, and the other end is connected to the liquid suction assembly 6. The position where the connecting pipe 5 is connected to the liquid outlet pipe 1 is located between the control valve 4 and the nozzle 3. When the control valve 4 is opened or closed, the liquid outlet pipe 1 is connected to the nozzle 3. 4. After closing, the nozzle 3 no longer sprays out liquid medicine. At this time, the liquid suction component 6 is activated, providing suction to draw the residual liquid medicine in the nozzle 3 into the connecting pipe 5 and into the liquid suction component 6. In addition, a second valve 9 is provided on the connecting pipe, with both ends of the second valve 9 connected to the connecting pipe 5. By controlling the opening and closing of the second valve 9, the connection between the connecting pipe 5 and the liquid outlet pipe 1 can be controlled. The liquid suction component 6 can be permeable to both gas and liquid. In this embodiment, liquid medicine is introduced into the liquid suction component 6, and negative pressure is generated during the flow of the fluid, thereby drawing the liquid medicine in the nozzle 3. In this invention, the Venturi principle is used to draw the liquid medicine in the nozzle 3 and the liquid medicine pipe of the swing arm, so as to achieve simple, efficient and thorough liquid medicine back-drawing. This can fundamentally avoid the problem of liquid medicine dripping, and at the same time, prevent the liquid medicine in the swing arm from denaturing due to long-term inactivity, and also increase the liquid medicine recovery rate.

[0063] The liquid suction assembly 6 includes a mounting body 61 and a Laval nozzle 62. The Laval nozzle 62 is placed inside the mounting body 61 and connected to the outside of the mounting body 61. The two ends of the Laval nozzle 62 are respectively connected to the external environment corresponding to the two end faces of the mounting body 61, and the two ends of the Laval nozzle 62 are used for liquid inlet and liquid outlet respectively; that is, one end of the Laval nozzle 62 is the inlet end of the liquid suction assembly 6, and the other end is the outlet end of the liquid suction assembly 6. The connecting pipe 5 is set on the side wall of the mounting body 61 and connected to the side wall of the Laval nozzle 62 inside the mounting body 61. When fluid flows through the inside of the Laval nozzle 62, because the diameter of the middle section of the Laval nozzle 62 is small, a high-speed fluid will be generated, forming a negative pressure, thereby sucking up the residual liquid in the nozzle 3.

[0064] A sensor can be installed inside the liquid suction assembly 6. The sensor is used to detect the back suction effect of the liquid suction assembly 6. Once back suction failure occurs, an alarm can be triggered immediately to avoid losses caused by process defects.

[0065] In a second aspect, the present invention also provides a method of using an anti-drip system, comprising the following steps:

[0066] Step 1: Open the control valve 4 to connect the pipes at both ends of the control valve 4, so that the liquid storage section 2 and the nozzle 3 are connected through the liquid outlet pipe 1, and the liquid in the liquid storage section 2 can enter the liquid outlet pipe 1.

[0067] Step 2: The liquid storage unit 2 starts to supply the liquid. After the liquid passes through the liquid outlet pipe 1, it first enters the nozzle 3 and then is transferred to the wafer surface through the nozzle 3 to complete the processing of the wafer surface.

[0068] Step 3: Close the control valve 4, and the two ends of the liquid outlet pipe 1 are no longer connected, so that the liquid storage section 2 is disconnected from the nozzle 3, and the liquid cannot be transferred from the liquid storage section 2 to the nozzle 3;

[0069] Step 4: Activate the liquid suction component 6. The liquid suction component 6 performs back suction, first sucking the residual liquid in the nozzle 3 into the connecting tube 5, and then transferring it through the connecting tube 5 into the liquid suction component 6 and then to the outside, completing the suction and transfer of the residual liquid, so as to facilitate the unified collection and treatment of the residual liquid.

[0070] It is worth noting that during this process, the second valve 9 is opened after a negative pressure is formed inside the liquid aspiration component 6. The second valve 9 is an on / off valve, which can absorb the residual liquid more quickly.

[0071] Utilizing the Venturi principle, the liquid in the nozzle 3 and the swing arm liquid pipe is drawn back to achieve simple, efficient and thorough liquid back-drawing. This fundamentally avoids the problem of liquid dripping, prevents the liquid in the swing arm from deteriorating due to prolonged inactivity, and increases the liquid recovery rate. Compared with existing technologies, it also increases the applicability of liquids, allowing the use of liquids of different properties. The back-drawing time and back-drawing force can be set, and the back-drawing volume can be adjusted by adjusting the back-drawing position. In addition, back-drawing is achieved through simple pipeline components, reducing the failure rate.

[0072] In a third aspect, the present invention also discloses a semiconductor manufacturing apparatus, including an anti-drip system, a nozzle 3, a liquid storage section 2, and a worktable, wherein the two ends of the liquid outlet pipe 1 are respectively connected to the liquid storage section 2 and the nozzle 3; in the working state, the wafer is placed on the worktable, and the position of the nozzle 3 is moved so that the position of the nozzle 3 corresponds to the position of the wafer, which facilitates the processing of the wafer.

[0073] Example 1:

[0074] In the first embodiment, referring to Figures 1 and 4, a control valve 4 is used as an on / off valve. A second pipe 7 is provided on the liquid suction assembly 6. One end of the second pipe 7 is connected to the liquid suction assembly 6, and the other end is connected to the supply device. The supply device is mainly used to provide fluid to the liquid suction assembly 6. The supply element can provide liquid or gas. In this embodiment, the supply element provides liquid medicine to the liquid suction assembly. During the supply process, the liquid medicine will be given an initial velocity and allowed to enter the second pipe 7, thereby entering the liquid suction assembly 6. A high-speed fluid is formed in the liquid suction assembly 6, thereby generating negative pressure, which facilitates the liquid suction process.

[0075] At the same time, a first valve 8 is provided on the second pipeline 7. The first valve 8 is an on / off valve. Both ends of the first valve 8 are connected to the second pipeline 7. By controlling the opening and closing of the first valve 8, the on / off of the second pipeline 7 can be controlled, thereby connecting or disconnecting the supply equipment from the liquid suction assembly 6.

[0076] When the control valve 4 is an on / off valve, the method of using the anti-drip system includes the following steps:

[0077] Step 1: Open the control valve 4 to connect the pipes at both ends of the control valve 4, so that the liquid storage section 2 and the nozzle 3 are connected through the liquid outlet pipe 1, and the liquid in the liquid storage section 2 can enter the liquid outlet pipe 1.

[0078] Step 2: The liquid storage unit 2 starts to supply the liquid. After the liquid passes through the liquid outlet pipe 1, it first enters the nozzle 3 and then is transferred to the wafer surface through the nozzle 3 to complete the processing of the wafer surface.

[0079] Step 3: Close the control valve 4, and the two ends of the liquid outlet pipe 1 are no longer connected, so that the liquid storage section 2 is disconnected from the nozzle 3, and the liquid cannot be transferred from the liquid storage section 2 to the nozzle 3;

[0080] Step 4: Open the first valve 8 to supply fluid to the second pipe 7 and introduce fluid into the suction assembly 6 through the second pipe 7. The fluid flows in the suction assembly 6, making the suction assembly 6 negative pressure. Open the second valve 9 and the suction assembly 6 performs back suction, first sucking the residual medicine in the nozzle 3 into the connecting pipe 5, and then transferring it to the suction assembly 6 through the connecting pipe 5 and then to the outside, completing the suction and transfer of the residual medicine, which facilitates the unified collection and treatment of the residual medicine.

[0081] It is worth noting that during this process, the second valve 9 is opened after a negative pressure is formed inside the liquid aspiration component 6, which can more quickly aspirate the residual liquid.

[0082] When control valve 4 is an on / off valve, the anti-drip system has the following two states:

[0083] Liquid supply status: First, the on / off valve is in the open state, continuously supplying liquid to the wafer surface; at this time, the second valve 9 and the first valve 8 remain in the closed state;

[0084] Back suction state: When the command to close the on / off valve is issued, the first valve 8 will open immediately and start to provide power to the liquid suction assembly 6, so that the liquid suction assembly 6 generates suction; after a two-second delay, the second valve 9 opens, and the generated suction pulls the liquid back to the swing arm.

[0085] Through the combination of the above two working states, the liquid supply and anti-drip scheme can be realized; the amount of liquid can be controlled by setting the back suction state time; at the same time, for safety reasons, the first valve 8 and the second valve 9 are preferably normally open on-off valves to ensure that the back suction state can be maintained in case of failure and to prevent the liquid from dripping.

[0086] Example 2:

[0087] In the second embodiment, referring to Figures 2 and 4, the control valve 4 is a three-way valve. Therefore, the control valve 4 includes an inlet end, a first outlet end, and a second outlet end. The inlet end is connected to the liquid storage section 2, that is, the liquid provided by the liquid storage section 2 first enters the control valve 4 through the inlet end; the first outlet end is connected to the nozzle 3, that is, in the liquid supply operation, the liquid in the liquid storage section 2 enters the nozzle 3 through the inlet end and the first outlet end; the second outlet end is connected to the liquid suction assembly 6; in the supply state, the inlet end is connected to the first outlet end to facilitate the supply of liquid to the nozzle 3; in the back suction state, the inlet end is connected to the second outlet end to facilitate the supply of fluid to the liquid suction assembly 6.

[0088] When the control valve 4 is a three-way valve, the method of using the anti-drip system includes the following steps:

[0089] Step 1: Open the control valve 4 to connect the inlet end with the first outlet end, so that the liquid storage section 2 and the nozzle 3 are connected through the liquid outlet pipe 1. At this time, the liquid in the liquid storage section 2 can enter the liquid outlet pipe 1.

[0090] Step 2: The liquid storage unit 2 starts to supply the liquid. After the liquid passes through the liquid outlet pipe 1, it first enters the nozzle 3 and then is transferred to the wafer surface through the nozzle 3 to complete the processing of the wafer surface.

[0091] Step 3: Close the control valve 4 to disconnect the inlet end from the first outlet end, and at the same time connect the inlet end to the second outlet end, thereby connecting the liquid storage section 2 with the liquid suction assembly 6. The liquid storage section 2 supplies liquid to the liquid suction assembly 6, and the liquid flows in the liquid suction assembly 6, generating negative pressure. At the same time, the two ends of the liquid outlet pipe 1 are no longer connected, and the medicine cannot be transferred from the liquid storage section 2 to the nozzle 3.

[0092] Step 4: After the liquid in the storage unit 2 passes through the inlet end and the second outlet end, it passes through the liquid suction assembly 6, making the liquid suction assembly 6 under negative pressure. The second valve 9 is opened, and the residual medicine in the nozzle 3 is first sucked into the connecting pipe 5, and then transferred through the connecting pipe 5 to the liquid suction assembly 6 and then to the outside, completing the absorption and transfer of the residual medicine, which facilitates the unified collection and treatment of the residual medicine.

[0093] It is worth noting that during this process, when a negative pressure is formed inside the liquid aspiration component 6, the second valve 9 is opened, which can more quickly aspirate the residual liquid.

[0094] When control valve 4 is a three-way valve, the anti-drip system has the following two states:

[0095] Liquid supply status: First, control valve 4 is in the switching state and the second valve 9 is kept open, continuously supplying liquid to the wafer surface; the second outlet end of the three-way valve is connected to the liquid suction assembly 6, and the first outlet end is connected to the nozzle 3 pipeline; this can effectively prevent the nozzle 3 from being opened accidentally in abnormal conditions.

[0096] Back suction state: When the back suction command is issued, the three-way valve immediately switches to the state where the inlet end and the second outlet end are connected, and the medicine is directed to the inlet of the liquid suction component 6. The high-speed flowing medicine generates negative pressure for back suction. The second valve 9 is delayed by pneumatic speed regulation. After the liquid suction component 6 forms negative pressure, the second valve 9 is opened. The generated suction force draws the medicine and back suctions the swing arm.

[0097] Example 3:

[0098] In the third embodiment, using Figures 3 and 4, the control valve 4 is a four-way valve. The control valve 4 includes an inlet end, a first outlet end, a second outlet end, and a circulation end. The inlet end is connected to the liquid storage section 2, the first outlet end is connected to the nozzle 3, the second outlet end is connected to the liquid suction assembly 6, and the circulation end is connected to the liquid storage section 2. In the supply state, the inlet end is connected to the first outlet end; in the back suction state, the inlet end is connected to the second outlet end; in the circulation state, the inlet end is connected to the circulation end.

[0099] When the control valve 4 is a four-way valve, the method of using the anti-drip system includes the following steps:

[0100] Step 1: Open the control valve 4 to connect the inlet end with the first outlet end, so that the liquid storage section 2 and the nozzle 3 are connected through the liquid outlet pipe 1, and the liquid in the liquid storage section 2 can enter the liquid outlet pipe 1.

[0101] Step 2: The liquid storage unit 2 starts to supply the liquid. After the liquid passes through the liquid outlet pipe 1, it first enters the nozzle 3 and then is transferred to the wafer surface through the nozzle 3 to complete the processing of the wafer surface.

[0102] Step 3: Close the control valve 4 to disconnect the inlet end from the first outlet end and connect the inlet end to the second outlet end, thereby connecting the liquid storage section 2 with the liquid suction assembly 6, and disconnecting the two ends of the liquid outlet pipe 1, so that the liquid storage section 2 is disconnected from the nozzle 3, and the liquid cannot be transferred from the liquid storage section 2 to the nozzle 3.

[0103] Step 4: After the liquid in the storage unit 2 passes through the inlet end and the second outlet end, it passes through the liquid suction assembly 6, making the liquid suction assembly 6 under negative pressure. The second valve 9 is opened, and the liquid suction assembly 6 performs back suction, first sucking the residual medicine in the nozzle 3 into the connecting pipe 5, and then transferring it through the connecting pipe 5 into the liquid suction assembly 6 and then to the outside, completing the absorption and transfer of the residual medicine, which facilitates the unified collection and treatment of the residual medicine.

[0104] Step 5: Connect the inlet end to the circulation end. The liquid in the storage section 2 enters the control valve 4 through the inlet end, and then re-enters the storage section 2 after passing through the circulation end to complete the circulation.

[0105] It is worth noting that during this process, the second valve 9 is opened after a negative pressure is formed inside the liquid aspiration component 6, which can more quickly aspirate the residual liquid.

[0106] When control valve 4 is a four-way valve, the anti-drip system has the following three states:

[0107] Circulation state: First, the four-way valve is in the preset state, that is, the inlet end is connected to the circulation end, the second valve 9 is kept off, and the medicine liquid is continuously circulated through the circulation pipe 10 to ensure the temperature of the medicine liquid;

[0108] Liquid supply status: When a liquid supply command is issued, the inlet end of the three-way valve is connected to the first outlet end, and the second valve 9 remains disconnected, continuously supplying liquid to the wafer surface;

[0109] Back suction state: When the on / off back suction command is issued, the three-way valve immediately switches to connect the inlet end and the second outlet end, the second valve 9 is closed, and the medicine is directed to the vacuum generator inlet. The high-speed flowing medicine generates negative pressure for back suction. The second valve 9 is delayed by pneumatic speed regulation. After the vacuum generator forms negative pressure, the on / off valve is opened, and the medicine is drawn by the generated suction to back suction the swing arm.

[0110] It simultaneously realizes the triple functions of nozzle 3 supplying liquid, back suction, and liquid circulation.

[0111] The implementation principle of the anti-drip system for semiconductor process equipment and its usage method of the present invention is as follows: The wafer is placed on the worktable, and the position of the nozzle 3 is moved so that the position of the nozzle 3 corresponds to the position of the wafer; the control valve 4 is opened, connecting the pipes at both ends of the control valve 4, so that the liquid storage unit 2 and the nozzle 3 are connected through the liquid outlet pipe 1, allowing the liquid in the liquid storage unit 2 to enter the liquid outlet pipe 1; the liquid storage unit 2 begins to supply liquid, and the liquid, after passing through the liquid outlet pipe 1, first enters the nozzle 3, and then is transferred to the wafer surface via the nozzle 3, completing the wafer processing. Surface processing; closing control valve 4, the two ends of the liquid outlet pipe 1 are no longer connected, disconnecting the liquid storage section 2 from the nozzle 3, preventing the liquid from being transferred from the liquid storage section 2 to the nozzle 3; activating the liquid suction assembly 6, which performs back suction, first drawing the residual liquid in the nozzle 3 into the connecting pipe 5, then transferring it through the connecting pipe 5 into the liquid suction assembly 6, and finally to the outside, completing the absorption and transfer of the residual liquid, facilitating the unified collection and treatment of the residual liquid; mainly using the Venturi principle, the liquid suction assembly 6 is used to perform back suction of the liquid to achieve the purpose of preventing dripping.

[0112] Although embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or carried out in various ways. [Simplified Explanation of the Diagram]

[0059] Figure 1 is a schematic diagram of the valve connection method in Embodiment 1 of the present invention; Figure 2 is a schematic diagram of the valve connection method in Embodiment 2 of the present invention; Figure 3 is a schematic diagram of the valve connection method in Embodiment 3 of the present invention; Figure 4 is a schematic diagram of the liquid suction assembly structure in the embodiment of the present invention. [Biomaterial Storage]

[0114] None

Claims

1. An anti-drip system suitable for semiconductor manufacturing equipment, comprising: A liquid outlet pipe, one end of which is used to connect to the liquid storage section and the other end of which is used to connect to the nozzle; a control valve, which is installed in the liquid outlet pipe, is used to control the opening and closing of the liquid outlet pipe; A connecting tube, one end of which is connected to the liquid outlet pipe and placed between the control valve and the nozzle; a liquid suction assembly, connected to the other end of the connecting tube, through which liquid is introduced and used to create negative pressure to suction out the liquid; liquid is introduced into the liquid suction assembly, and the liquid flows within the liquid suction assembly, creating negative pressure, and using the Venturi principle, the liquid in the nozzle is suctioned out.

2. The anti-drip system as claimed in claim 1, wherein, The control valve is an on / off valve. The liquid suction assembly is provided with a second pipe. One end of the second pipe is connected to the liquid suction assembly, and the other end is used to connect to a supply device. The supply device is used to provide fluid to the liquid suction assembly. A first valve is provided on the second pipe to control the on / off state of the second pipe.

3. The anti-drip system as claimed in claim 1, wherein, The control valve is a three-way valve, which includes an inlet end, a first outlet end, and a second outlet end. The inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, and the second outlet end is connected to the liquid suction assembly. In the supply state, the inlet end is connected to the first outlet end; in the back suction state, the inlet end is connected to the second outlet end.

4. The anti-drip system as claimed in claim 1, wherein, The control valve is a four-way valve, comprising an inlet end, a first outlet end, a second outlet end, and a circulation end. The inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, the second outlet end is connected to the liquid suction assembly, and the circulation end of the control valve is connected to the liquid storage section. In the supply state, the inlet end is connected to the first outlet end; in the back suction state, the inlet end is connected to the second outlet end. In the cyclic state, the inlet end is connected to the cyclic end.

5. The anti-drip system as described in any one of claims 1 to 4, wherein, A second valve is provided on the connecting pipe to control the opening and closing of the connecting pipe.

6. A method of using an anti-drip system, applicable to any one of claims 1 to 5, comprising: Step 1: Open the control valve to connect the liquid storage unit and the nozzle through the liquid outlet pipe; Step 2: The liquid storage unit begins to supply liquid, which is transferred to the wafer surface via the nozzle after passing through the liquid outlet pipe; Step 3: Close the control valve to disconnect the liquid storage unit from the nozzle; Step 4: The liquid suction assembly performs back suction, transferring the liquid in the nozzle through the connecting pipe into the liquid suction assembly.

7. The method of use as described in claim 6, wherein, When the control valve is an on / off valve, the liquid suction assembly is provided with a second pipe, one end of which is connected to the liquid suction assembly and the other end is used to connect to the supply device. The connecting pipe is provided with a second valve; the second pipe is provided with a first valve; in step four, the first valve is opened, allowing the supply device to introduce fluid into the liquid suction assembly through the second pipe, creating a negative pressure state inside the liquid suction assembly. The second valve is then opened, transferring the liquid in the nozzle through the connecting pipe into the liquid suction assembly.

8. The method of use as described in claim 6, wherein, When the control valve is a three-way valve, the inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, and the second outlet end is connected to the liquid suction assembly. A second valve is provided on the connecting pipe. In step one, the control valve is opened to connect the inlet end with the first outlet end, thereby connecting the liquid storage section and the nozzle through the liquid outlet pipe. In step three, the control valve is closed to disconnect the inlet end from the first outlet end and connect the inlet end with the second outlet end, thereby connecting the liquid storage section and the liquid suction assembly. In step four, after the liquid in the liquid storage section passes through the inlet end and the second outlet end, it passes through the liquid suction assembly, creating a negative pressure state inside the liquid suction assembly. The second valve is then opened to transfer the liquid in the nozzle through the connecting pipe into the liquid suction assembly.

9. The method of use as described in claim 6, wherein, When the control valve is a four-way valve, the inlet end is connected to the liquid storage section, the first outlet end is connected to the nozzle, the second outlet end is connected to the liquid suction assembly, the circulation end of the control valve is connected to the liquid storage section, and a second valve is provided on the connecting pipe; In step one, the control valve is opened, so that the inlet end is connected to the first outlet end, thereby connecting the liquid storage section and the nozzle through the liquid outlet pipe; In step three, the control valve is closed, so that the inlet end is disconnected from the first outlet end, and the inlet end is connected to the second outlet end, thereby connecting the liquid storage section and the liquid suction assembly; In step four, after the liquid in the liquid storage section passes through the inlet end and the second outlet end, it passes through the liquid suction assembly, making the liquid suction assembly under negative pressure, and the second valve is opened to transfer the liquid in the nozzle through the connecting pipe into the liquid suction assembly.

10. The method of use as described in claim 6 further includes step five, connecting the inlet end to the circulation end, so that the liquid in the storage section re-enters the storage section after passing through the inlet end and the circulation end, thus completing the circulation.

11. The method of use as described in any one of claims 7 to 10, wherein, The second valve opens after the liquid suction assembly generates negative pressure.

12. The anti-drip system as described in any one of claims 1 to 4, wherein, The liquid suction assembly includes a mounting body and a Laval nozzle. The Laval nozzle is disposed inside the mounting body and communicates with the outside of the mounting body. One end of the Laval nozzle is the inlet end of the liquid suction assembly, and the other end is the outlet end of the liquid suction assembly. The connecting tube is disposed on the side wall of the mounting body and communicates with the Laval nozzle.

13. The anti-drip system as claimed in any one of claims 1 to 4, wherein, A sensor is provided on the liquid suction assembly, and the sensor is used to detect the back suction effect of the liquid suction assembly.

14. A semiconductor manufacturing apparatus, comprising an anti-drip system, a nozzle, a liquid reservoir, and a worktable as described in any one of claims 1 to 5, wherein one end of the liquid outlet pipe is connected to the liquid reservoir and the other end is connected to the nozzle; in an operating state, a wafer is placed on the worktable, and the position of the nozzle corresponds to the position of the wafer.

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