Process liquid supply system and control method thereof

Abstract

This application provides a process liquid supply system and its control method. The process liquid supply system includes: a first tank for storing a process liquid; a second tank connected to the first tank for receiving and storing the process liquid from the first tank; a first pipeline connecting the first tank and a nozzle; a second pipeline connecting the second tank and the nozzle; a first valve disposed on the first pipeline; and a second valve disposed on the second pipeline. One of the first valve and the second valve is selectively opened to supply the process liquid from the first tank or the second tank to the substrate surface via the nozzle.

Claims

1. A process liquid supply system, applicable to a substrate processing apparatus, the substrate processing apparatus comprising: A rotating platform for supporting a substrate; a nozzle disposed above the rotating platform; And a recycling ring disposed around the rotary table, wherein the process liquid supply system includes: a first tank connected to the plant-end process liquid supply equipment for storing a brand new, unused process liquid; and a second tank connected to the first tank for receiving and storing the process liquid from the first tank. A first pipeline connects the first groove and the nozzle; A second pipeline connecting the second groove and the nozzle; a first valve disposed on the first pipeline; A second valve is provided on the second pipeline, wherein one of the first valve and the second valve is opened to supply the process liquid from the first tank or the second tank to the substrate surface via the nozzle.

2. The process liquid supply system of claim 1, wherein the process liquid supply system further comprises: a third pipeline connecting the recovery ring and the second tank; a third valve disposed on the third pipeline, wherein the third valve opens synchronously when the second valve opens, so that the process liquid is supplied from the second tank to the substrate surface via the nozzle, recovered by the recovery ring, and transported back to the second tank via the third pipeline.

3. The process liquid supply system of claim 1, wherein the process liquid supply system further comprises: a concentration analyzer; a fourth pipeline connecting the recovery ring and the concentration analyzer; and a fourth valve disposed on the fourth pipeline, wherein the fourth valve opens synchronously when the first valve opens, so that the process liquid is supplied from the first tank to the substrate surface via the nozzle, recovered by the recovery ring, and transported to the concentration analyzer via the fourth pipeline.

4. The process liquid supply system of claim 1, wherein the process liquid supply system further comprises: a heater disposed in the first tank for heating the process liquid in the first tank to a specific temperature.

5. A control method for a process liquid supply system, applicable to a substrate processing apparatus, the substrate processing apparatus comprising: A rotating platform for supporting a substrate; a nozzle disposed above the rotating platform; And a recycling ring disposed around the rotary table, wherein the process liquid supply system comprises: providing a process liquid supply system as described in any one of claims 1 to 4; closing a first valve and opening a second valve to supply process liquid from a second tank to the substrate surface via the nozzle; and closing the second valve after it has been opened for a specific duration and opening the first valve to supply process liquid from a first tank to the substrate surface via the nozzle.

6. The control method of the process liquid supply system as claimed in claim 5, wherein when the first valve is closed and the second valve is opened, the control method further includes: opening a third valve so that the process liquid is supplied from the second tank to the substrate surface via the nozzle, then recovered by the recovery ring, and transported back to the second tank via a third pipeline.

7. The control method of the process liquid supply system of claim 5, wherein when the second valve is closed and the first valve is opened, the control method further includes: opening a fourth valve so that the process liquid is supplied from the first tank to the substrate surface via the nozzle, then recovered by the recovery ring, and transported to a concentration analyzer via a fourth pipeline.

8. The control method of the process liquid supply system as claimed in claim 7, wherein the first valve is closed when the concentration analyzer detects that the concentration of the target metal ion in the process liquid has decreased to a preset endpoint value.

9. The control method for the process liquid supply system of claim 5, wherein before closing the first valve and opening the second valve, the control method further comprises: heating the process liquid in the first tank to a specific temperature; transferring the heated process liquid to the second tank; injecting new process liquid into the first tank and heating it to the specific temperature.

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