Cable, cable connection system and method of forming cable

Abstract

In one described example, a cable may include a first conductor, a second conductor, and an offset structure. The first conductor may be formed to include a first self-passivating metal. The second conductor may be formed to include a second self-passivating metal. The offset structure may be disposed between the first conductor and the second conductor. The offset structure may be configured such that a medium can contact the first conductor and the second conductor along one length of the cable. Furthermore, a cable connection system may include the cable, a first connector, and a second connector.

Description

Technical Field

[0001] The present disclosure relates generally to electrical systems, and more particularly to a communications cable and a connector for the cable. Prior Art

[0002] Signal connectors, which provide an electrical connection between a pair of wires, are essential in nearly every wired communications environment. Numerous environmental challenges arise from ensuring wire connectivity over long distances, facilitating the use of signal connectors. One such environmental challenge involves using signal connectors in environments where electrical conduction is possible under ambient conditions. For example, in environments involving fluids such as water (e.g., seawater), electrical connections may be required, which can create challenges in ensuring that individual signal conductors do not experience conduction between each other. Such conduction can result in signal loss, noise, and / or crosstalk in the individually transmitted signals. Summary of the Invention

[0003] In one described embodiment, a cable may include a first conductor, a second conductor, and an offset structure. The first conductor may be formed to include a first self-passivating metal. The second conductor may be formed to include a second self-passivating metal. The offset structure may be disposed between the first and second conductors. The offset structure may be configured to enable a dielectric to contact the first and second conductors along a length of the cable.

[0004] In one described example, a method of forming a cable may include forming a first conductor to include a first self-passivating metal; forming a second conductor to include a second self-passivating metal; and forming an offset structure disposed between the first conductor and the second conductor and formed to maintain a constant distance between the first conductor and the second conductor.

[0005] In one described embodiment, a cable connection system may include a cable, a first connector, and a second connector. The cable may include: a first conductor formed to include a first self-passivating metal; a second conductor formed to include a second self-passivating metal; and an offset structure disposed between the first and second conductors. The offset structure may be configured to enable a dielectric to contact the first and second conductors along a length of the cable. The first connector may include a first housing, a first contact formed from a third self-passivating metal and having a first portion configured to contact the dielectric, and a first contact insulator at least partially surrounding a second portion of the first contact. The first contact of the first connector may be electrically connected to the first conductor of the cable. The second connector may include a second housing, a second contact formed of a fourth self-passivating metal and having a first portion configured to contact the medium, and a second contact insulator at least partially surrounding a second portion of the second contact. The first housing and the second housing may be configured to couple to provide an electrical connection between the first contact of the first connector and the second contact of the second connector. Simple diagram description

[0006] [FIG. 1A] and [FIG. 1B] are exemplary diagrams showing a cable having an offset structure.

[0007] [FIG. 2A] and [FIG. 2B] are exemplary diagrams showing a cable having an offset structure.

[0008] [Figure 3] shows an exemplary diagram of a cable connection system.

[0009] [FIG. 4] illustrates an exemplary method for forming a cable having an offset structure. Implementation Method

[0010] This specification relates to electrical systems, and more particularly to a cable and a communication cable connection system for the cable. A cable, such as a coaxial cable, may include a first conductor formed of a first self-passivating metal, such as niobium, a second conductor formed of a second self-passivating metal, and an offset structure disposed between the first and second conductors. According to one embodiment, the first and second self-passivating metals may be the same self-passivating metal. Examples of self-passivating metals include niobium, tantalum, titanium, zirconium, molybdenum, ruthenium, rhodium, palladium, hafnium, tungsten, rhenium, osmium, and iridium. The offset structure is configured to allow a dielectric to contact the first and second conductors along the length of the cable while providing a physical separation between the first and second conductors. As used herein, the term "dielectric" refers to a fluid (e.g., water) or a high-particulate ambient environment that nominally provides an arc between electrical conductors having different voltage potentials across a physical separation of the dielectric. However, because both the first and second conductors are formed of a self-passivating metal and due to the spacing provided by the offset structure, submerged or "wet" ambient environments (e.g., high humidity) do not cause any signal loss and / or crosstalk issues between the first and second conductors.

[0011] Thus, no sealing of the cable is required, and the cable is ready for use in submerged or "wet" environments. Because the cable does not require sealing (i.e., is designed to operate without a waterproof or watertight enclosure), engineering modifications and costs can be significantly reduced. In other words, the aforementioned waterproof construction means that the cable can utilize a simple, less complex design that allows water or fluids to enter the cable and provides benefits or advantages, such as significantly reduced engineering modifications and maintenance costs. Therefore, no special measures or seals are required to prevent fluids from entering the cable. It should be understood that while water is used as an example of a fluid herein, any fluid that may be introduced into the cable is contemplated. Conversely, cables designed to be sealed or moisture-proof are often associated with additional costs, such as maintenance, repair, or field failure of the seals when moisture penetrates them, particularly when the cable is located in a remote location or is not easily accessible.

[0012] Furthermore, the above concepts can be applied to twisted-pair cables. For example, the cable may include a first conductor formed from a first self-passivating metal, such as niobium, a second conductor formed from a second self-passivating metal, a first portion of an offset structure surrounding at least a portion of the first conductor, and a second portion of the offset structure surrounding at least a portion of the second conductor. The first and second conductors may be helically intertwined to form the twisted pair. Furthermore, the offset structure is configured to allow a medium, such as water, to contact the first and second conductors along the length of the twisted pair.

[0013] Finally, a cable connection system (e.g., an RF coaxial connector system including a jack and a plug) may include signal-conducting contacts and / or surfaces formed from a self-passivating metal. For example, a first connector may include a first housing, a first contact formed from a self-passivating metal (e.g., niobium) and having a first portion configured to contact a medium (e.g., a fluid such as water), and a first contact insulator at least partially surrounding a second portion of the first contact. A second connector may include a second housing, a second contact formed from a self-passivating metal (e.g., niobium) and having a first portion configured to contact the medium, and a second contact insulator at least partially surrounding the second portion of the second contact. Using self-passivating metal for the first and second contacts enables the cable connection system to operate with low loss across a wide range of RF power levels in an immersion or "wet" environment.

[0014] However, it should be understood that water or fluids are not necessary for operation or signal conduction during the use of the cable. The cables and cable connection systems of the present disclosure can therefore be used in submerged and / or dry environments and are not subject to insertion loss and impedance issues in the presence of moisture within the cable, while providing shielded signal transmission and known controlled inherent impedance throughout the length of the cable, which is lower than the impedance of typical "dry" or "sealed" cables with the same physical parameters and type of separating dielectric material. For example, a "dry" or watertight cable dielectric may be combined with air (dielectric constant, = 1) and polyethylene ( = 2.2), and the cables described herein may include water ( = 78), water is allowed to flow freely inside the cable and remain inside the cable throughout the life of the cable. Furthermore, although water is discussed as an example of a fluid, any fluid may be utilized.

[0015] Figures 1A and 1B illustrate exemplary cables 100A and 100B having offset structures 110A and 110B. In the depicted example, cables 100A and 100B may include first conductors 102A and 102B, second conductors 104A and 104B, and offset structures 110A and 110B. First conductors 102A and 102B may be formed to include a first self-passivating metal. Second conductors 104A and 104B may be formed to include a second self-passivating metal. As used herein, a self-passivating metal may also be a self-insulating conductor or a precious metal. Furthermore, according to one example, the self-passivating metal may have a hydrophobic coating applied to an outer surface of the self-passivating metal. One example of a useful self-passivating metal is niobium. For example, a self-passivating metal forms an insulating oxide layer that resists corrosion when immersed in an environment such as underwater. For example, the offset structures 110A, 110B may be disposed between the first conductors 102A, 102B and the second conductors 104A, 104B and formed of a dielectric material such as plastic. The offset structures 110A, 110B may be configured to allow the dielectric to contact the first conductors 102A, 102B and the second conductors 104A, 104B along the length of the cable 100A, 100B.

[0016] As shown in Figures 1A-1B, first conductors 102A, 102B can be at least partially surrounded by offset structures 110A, 110B and thus function as coaxial cable center conductors. The offset structures 110A, 110B can be at least partially surrounded by second conductors 104A, 104B, which can function as coaxial shields. The offset structures 110A, 110B can be configured to maintain a constant distance between the first and second conductors 102A, 102B, 104A, 104B.

[0017] As seen in FIG. 1A , the offset structure 110A may have a spiral shape to enable the dielectric to contact the first conductor 102A and the second conductor 104A along the length of the cable 100A.

[0018] As shown in FIG1B , the offset structure 110B may include one or more openings 106 configured to allow a dielectric to contact the first conductor 102B and the second conductor 104B. For example, the offset structure 110B may have an open cell structure comprising a plurality of cells. Each cell may include two or more openings 106, which may be configured to interface with another cell, the first conductor 102B, or the second conductor 104B. According to one example, the offset structure 110B may be formed from a material configured to retain fluid or otherwise provide fluid-retaining features (e.g., a layered dielectric, capillary function, etc.) to retain the fluid 150 within the cable 100B even after the cable 100B is removed from the fluid immersion environment. In this manner, the offset structure 110B may facilitate impedance control for the cable 100B. As another example, the offset structure 110B may be formed from a mesh material.

[0019] According to one embodiment, the cable 100A, 100B of FIG. 1A or FIG. 1B may be a cable that generates an impedance of about 50 ohms and a low relative permittivity ( ) value (e.g., 2.2 to 2.5), and has a characteristic impedance drop of approximately 5 to approximately 9.2 ohms. The cutoff frequency and propagation velocity can also be reduced accordingly. These reduced parameter values make them suitable for use in various applications in submerged or "wet" (e.g., water-immersed) environments. Assuming 9 ohm impedance and 120 volts, the RF power handling capacity of such a cable can be estimated as follows:

[0020] ;and

[0021]

[0022] Such RF power levels of 1.6 kW can be used in various applications.

[0023] FIG2A-2B illustrate an exemplary diagram of a cable 200 having an offset structure 210. In the depicted example, cable 200 may include a first conductor 202, a second conductor 204, and an offset structure 210 having a first portion 212 and a second portion 214. First conductor 202 may be formed to include a first self-passivating metal. Second conductor 204 may be formed to include a second self-passivating metal. For example, first conductor 202 and second conductor 204 may be helically intertwined to form a twisted pair. First portion 212 of offset structure 210 may be configured to at least partially surround first conductor 202, and second portion 214 of offset structure 210 may be configured to at least partially surround second conductor 204. In the example of FIG2B , offset structure 210 is shown as an open-cell example. Offset structure 210 provides insulation for first conductor 202 and second conductor 204, thereby providing consistent impedance between conductors 202 and 204. Thus, the first portion 212 and the second portion 214 of the offset structure 210 can be configured to enable the dielectric 250 to contact the first conductor 202 and the second conductor 204 along the length of the cable 200 in this manner. Additionally, the cable 200 can include a cable insulator 290 that at least partially surrounds the first portion 212 and the second portion 214.

[0024] According to one example, the first portion 212 or the second portion 214 can have a spiral shape (e.g., similar to FIG1A ) to enable the dielectric 250 to contact the first and second conductors 202, 204 along the length of the cable 200. According to another example, at least one of the first portion 212 or the second portion 214 can include one or more openings 206 configured to enable the dielectric 250 to contact the first and second conductors 202, 204, or have an open cell structure including a plurality of cells. Each cell can include two or more openings 206 that can be configured to interface with another cell, two or more of the first and second conductors 202, 204. The cable insulator 290 can surround the first and second conductors 202, 204, and the corresponding portions 212, 214 of the offset structure 210.

[0025] According to one embodiment, the cable 200 of FIG. 2A or FIG. 2B may be a cable that generates an impedance of approximately 112 ohms and a low The invention relates to a twisted pair cable having a value (e.g., 2.2 to 2.5) and having a characteristic impedance drop of about 5 to approximately 19 ohms.

[0026] FIG3 illustrates an exemplary diagram of a cable connection system 300 . The cable connection system 300 of FIG3 may include any of the cables (eg, 100A, 100B, 200 ) discussed herein in FIG1-2 . The cable connection system 300 may further include a first connector 310 and a second connector 330 .

[0027] First connector 310 may include a first housing 312, a first contact 314 formed from a third self-passivating metal and having a first portion 316 configured to contact a medium 350, and a first contact insulator 322 at least partially surrounding a second portion 318 of first contact 314. First contact 314 of first connector 310 may be electrically connected to a first conductor of a corresponding cable (e.g., at second portion 318). Second connector 330 may include a second housing 332, a second contact 334 formed from a fourth self-passivating metal and having a first portion 336 configured to contact a medium 350, and a second contact insulator 342 at least partially surrounding a second portion 338 of second contact 334. According to one example, two or more of the first, second, third, and fourth self-passivating metals may be the same self-passivating metal (e.g., niobium). It should be understood that in some examples, only one of the first contact 314 or the second contact 334 may be formed from a self-passivating metal, while the other may be formed from a non-self-passivating metal. Certain self-passivating metals offer the advantage of being able to connect to non-self-passivating metals without generating an intrinsic voltage (which may not be desirable). Therefore, it may be advantageous to form one or both of the first contact 314 or the second contact 334 from a self-passivating metal such as niobium.

[0028] The first and second housings 312, 332 can be configured to couple to provide an electrical connection between the first contact 314 of the first connector 310 and the second contact 334 of the second connector 330 (e.g., by mating the portion 316 of the first contact 314 with the first portion 336 of the second contact 334). Furthermore, the first and second housings 312, 332 can be formed from a corrosion-resistant, non-conductive material, thereby enabling the cable connection system 300 to be used underwater without the need for conductive outer shell materials. For example, mechanical coupling techniques can be used to implement contact retention features, such as by using a mating retention system (e.g., a ring nut having threads 352 and a threaded sleeve 354) to ensure that the connector set remains mated across multiple environments. According to another example, the cable connection system 300 can include a multi-contact connector having multiple first connectors and multiple second connectors.

[0029] Each of the first contact insulator 322 and the second contact insulator 342 can be formed to include a dielectric material having a dielectric constant that can be substantially equal to the dielectric constant of the dielectric 350. For example, TiO2 can be used as the material for either contact insulator 322, 342 because TiO2 generally has good retention characteristics for the corresponding contact while also providing the benefit of not adding significant impedance.

[0030] In any case, for example, this similar dielectric constant is used to achieve impedance matching for connecting the source to the cable, connecting the cable to a load such as an electronic assembly (which may be 50 ohms, 90 ohms, 120 ohms, etc.), and from the load to the antenna. This changes the resulting total cable impedance, previously designed for approximately 50 ohms for "dry" cables, to less than 10 ohms for the cables described herein, assuming the cable dimensions remain the same. However, the impedance shift to 10 ohms does not preclude the use of the cable when input and / or output matching considerations with the source and load functions are matched to the cable impedance values. Therefore, the impedance of the cabling system 300 can be designed based on the system's operating impedance. For example, components or portions of the impedance of the cabling system 300 can be set based on factors including the transmission source impedance, the impedance of the submerged or wet RF connector, the impedance of the submerged or wet transmission line, and the impedance of the load (e.g., the antenna).

[0031] FIG4 illustrates an exemplary method for forming a cable having an offset structure. In the depicted example, method 400 of forming a cable (e.g., 100A, 100B, 200) may include forming 402 a first conductor (e.g., 102A, 102B, 202) to include a first self-passivating metal; forming 404 a second conductor (e.g., 104A, 104B, 204) to include a second self-passivating metal; and forming 406 an offset structure (e.g., 110A, 110B, 210) disposed between the first and second conductors and formed to maintain a constant distance between the first and second conductors.

[0032] The offset structure can be formed to include one or more openings (e.g., 106, 206) configured to allow the dielectric to contact the first and second conductors. For example, the offset structure can be formed to have an open cell structure comprising a plurality of cells. Each cell can include two or more openings configured to interface with another cell, the first conductor, or two or more of the second conductor.

[0033] According to the example of FIG. 1A-FIG . 1B , the first conductor may be at least partially surrounded by the offset structure, and the offset structure may be at least partially surrounded by the second conductor.

[0034] 2A-2B , the first conductor, the second conductor, and the offset structure may be formed to have a spiral shape. For example, the first portion of the offset structure may be formed to at least partially surround the first conductor, the second portion of the offset structure may be formed to at least partially surround the second conductor, and the first and second conductors may be formed to be spirally entangled.

[0035] As used herein, the term "coupled" may encompass any connection, communication, or signal path that achieves a functional relationship consistent with this specification. For example, if device A generates a signal to control device B to perform an action, then: (a) in the first instance, device A is coupled to device B via a direct connection; or (b) in the second instance, if the intervening component C does not modify the functional relationship between device A and device B, device A is coupled to device B through an intervening component C, such that device B is controlled by device A via the control signal generated by device A.

[0036] The above description is provided as an example. It is, of course, not possible to describe every conceivable combination of components or methods, but one of ordinary skill in the art will recognize that many further combinations and permutations are possible. Therefore, the present disclosure is intended to encompass all such alterations, modifications, and variations that fall within the scope of this application (including the appended claims). As used herein, the term "includes" means including, but not limited to, and the term "including" means including, but not limited to. The term "based on" means based, at least in part, on. Furthermore, where the present disclosure or claims recite "a," "an," "a first," or "another" element or its equivalent, this should be construed to encompass the inclusion of one or more such elements, neither requiring nor excluding the inclusion of two or more such elements.

[0037] 100A: Cable 100B: Cable 102A: First conductor 102B: First conductor 104A: Second conductor 104B: Second conductor 106: Opening 110A: Offset structure 110B: Offset structure 150: Fluid 200: Cable 202: First conductor 204: Second conductor 206: Opening 210:Offset structure 212: Part 1 214: Part 2 250: Medium 290: Cable insulator 300: Cable connection system 310: First connector 312: First Shell 314: First contact 316: Part 1 318: Part 2 322: First contact insulator 330: Second connector 332: Second Shell 334: Second contact 336: Part 1 338: Part 2 342: Second contact insulator 350: Medium 352: Thread 354:Threaded sleeve 400:Method 402: Formation 404: Formation 406: Formation

Claims

1. A cable comprising: a first conductor formed to include a first self-passivating metal; a second conductor formed to include a second self-passivating metal; and an offset structure disposed between the first conductor and the second conductor, the offset structure having an open cell structure comprising a plurality of cells, each cell including two or more openings configured to interface with another cell, the first conductor, or two or more of the second conductor, the offset structure being configured such that a medium can contact the first conductor and the second conductor along the length of the cable.

2. The cable of claim 1, wherein the first conductor is at least partially surrounded by the offset structure, and wherein the offset structure is at least partially surrounded by the second conductor.

3. The cable of claim 1, wherein the offset structure is configured to maintain a constant distance between the first conductor and the second conductor.

4. The cable of claim 1, wherein the offset structure comprises: a first portion configured to at least partially surround the first conductor; and a second portion configured to at least partially surround the second conductor, wherein the first portion and the second portion are configured such that the medium can contact the first conductor and the second conductor along the length of the cable.

5. The cable of claim 4, wherein at least one of the first portion or the second portion includes one or more openings configured to allow the medium to contact the first conductor and the second conductor.

6. The cable of claim 4, wherein the first conductor and the second conductor are helically entangled.

7. The cable of claim 4, further comprising cable insulation that at least partially surrounds the first portion and the second portion.

8. A cable connection system comprising a cable as claimed in claim 1, the cable connection system further comprising: a first connector comprising a first housing, a first contact formed of a third self-passivating metal and having a first portion configured to contact the medium, and a first contact insulator at least partially surrounding a second portion of the first contact, wherein the first contact of the first connector is electrically connected to the first conductor of the cable; and a second connector comprising a second housing, a second contact formed of a fourth self-passivating metal and having a first portion configured to contact the medium, and a second contact insulator at least partially surrounding a second portion of the second contact, the first housing and the second housing being configured to couple to provide an electrical connection between the first contact of the first connector and the second contact of the second connector.

9. A method of forming a cable, comprising: forming a first conductor including a first self-passivating metal; forming a second conductor including a second self-passivating metal; and forming an offset structure disposed between the first conductor and the second conductor, the offset structure being formed to have an open cell structure including a plurality of cells, wherein each cell includes two or more openings configured to interface with another cell, the first conductor, or two or more of the second conductor, the offset structure being formed to maintain a constant distance between the first conductor and the second conductor, wherein the offset structure is configured to allow a medium to contact the first conductor and the second conductor along the length of the cable.

10. The method of claim 9, wherein the first conductor is at least partially surrounded by the offset structure, and wherein the offset structure is at least partially surrounded by the second conductor.

11. The method of claim 9, further comprising: forming a first portion of the offset structure to at least partially surround the first conductor; forming a second portion of the offset structure to at least partially surround the second conductor; and forming the first conductor and the second conductor in a helical entanglement.

12. A cable connection system comprising: a cable including: a first conductor formed to include a first self-passivating metal; a second conductor formed to include a second self-passivating metal; and an offset structure disposed between the first conductor and the second conductor, the offset structure being configured to allow a medium to contact the first conductor and the second conductor along the length of the cable; a first connector including a first housing, a first contact formed of a third self-passivating metal and having a first portion configured to contact the medium, and a first contact insulator at least partially surrounding a second portion of the first contact, wherein the first contact of the first connector is electrically connected to the first conductor of the cable; and a second connector including a second housing, a second contact formed of a fourth self-passivating metal and having a first portion configured to contact the medium, and a second contact insulator at least partially surrounding a second portion of the second contact, the first housing and the second housing being configured to couple to provide an electrical connection between the first contact of the first connector and the second contact of the second connector.

13. The cable connection system of claim 12, wherein each of the first contact insulator and the second contact insulator is formed to include a dielectric material having a dielectric constant substantially equal to that of the medium.

14. The cable connection system of claim 12, wherein two or more of the first self-passivating metal, the second self-passivating metal, the third self-passivating metal and the fourth self-passivating metal are the same self-passivating metal.

15. The cable connection system of claim 12, wherein the first conductor is at least partially surrounded by the offset structure, wherein the offset structure is at least partially surrounded by the second conductor, and wherein the offset structure includes one or more openings configured to allow the medium to contact the first conductor and the second conductor.

16. The cable connection system of claim 12, wherein the offset structure has an open cell structure comprising a plurality of cells, wherein each cell includes two or more openings configured to interface with another cell, the first conductor or the second conductor, or two or more of them.

17. A cable comprising: a first conductor formed to include a first self-passivating metal; a second conductor formed to include a second self-passivating metal; and an offset structure disposed between the first conductor and the second conductor, the offset structure comprising: a first portion configured to at least partially surround the first conductor; and a second portion configured to at least partially surround the second conductor, wherein at least one of the first portion or the second portion includes one or more openings configured to allow the medium to contact the first conductor and the second conductor, or has an open unit structure comprising one of a plurality of units, wherein each unit includes two or more openings configured to interface with another unit, the first conductor, or two or more of the second conductor.

18. A cable connection system comprising: a cable including: a first conductor formed to include a first self-passivating metal; a second conductor formed to include a second self-passivating metal; and an offset structure disposed between the first conductor and the second conductor, the offset structure being configured to allow a medium to contact the first conductor and the second conductor along the length of the cable; a first connector including a first housing, a first contact formed of a third self-passivating metal and having a first portion configured to contact the medium, and a first contact insulator at least partially surrounding a second portion of the first contact, wherein the first contact of the first connector is electrically connected to the first conductor of the cable; and a second connector including a second housing, a second contact formed of a fourth self-passivating metal and having a first portion configured to contact the medium, and a second contact insulator at least partially surrounding a second portion of the second contact, the first housing and the second housing being configured to couple to provide an electrical connection between the first contact of the first connector and the second contact of the second connector.

Images