Substrate processing apparatus and substrate processing method

Abstract

The present invention provides a substrate processing apparatus and a substrate processing method capable of precisely dispensing the processing liquid in the processing liquid supply section. The substrate processing apparatus 100 of the present invention includes a nozzle 136, a processing liquid supply unit 200, a near-infrared light source 140, a near-infrared imaging unit 150, and a control unit 102. The nozzle 136 supplies processing liquid to the upper surface Wa of the substrate W. The processing liquid supply unit 200 supplies a plurality of processing liquids to the nozzle 136. The near-infrared light source 140 irradiates an area including at least a portion of the processing liquid supply unit 200 using near-infrared light. The near-infrared imaging unit 150 generates an image of the processing liquid irradiated by near-infrared light. The control unit 102 controls the processing liquid supply unit 200 and the near-infrared imaging unit 150. Based on the captured image, the control unit 102 identifies the type of processing liquid within the area including at least a portion of the processing liquid supply unit 200.

Description

Technical Field

[0001] The invention relates to a substrate processing device and a substrate processing method. Prior Art

[0002] There is known a substrate processing device for processing a substrate by supplying a processing liquid to the substrate (for example, refer to Patent Document 1). Patent Document 1 describes a substrate processing device having a multi-valve to which a plurality of processing liquids are supplied and a processing liquid nozzle for supplying the processing liquid from the multi-valve to the substrate. [Prior Technical Literature] [Patent Document]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2023-4684 Summary of the invention

[0004] [Problems to be solved by the invention] In the substrate processing apparatus described in Patent Document 1, for example, when the type of processing liquid supplied from the multi-valve to the processing liquid nozzle is switched, the valve opening and closing state of the multi-valve connected to the processing liquid supply source is changed. In this case, it is difficult to confirm whether the processing liquid in the flow path of the multi-valve has been switched. Specifically, the processing liquid used for substrate processing is usually transparent, so a general CCD camera cannot detect the processing liquid. Therefore, there is a case where the processing liquid in the multi-valve cannot be identified with high precision.

[0005] The present invention is completed in view of the above-mentioned problems, and its purpose is to provide a substrate processing device and a substrate processing method that can accurately identify the processing liquid in the processing liquid supply part. [Technical means to solve the problem]

[0006] According to one aspect of the present invention, a substrate processing device comprises a substrate holding portion, a processing liquid nozzle, a processing liquid supply portion, at least one near-infrared light source, a near-infrared camera portion and a control portion. The substrate holding portion holds a substrate. The processing liquid nozzle supplies processing liquid to the upper surface of the substrate. The processing liquid supply portion supplies a plurality of the processing liquids to the processing liquid nozzle. The at least one near-infrared light source irradiates an area including at least a portion of the processing liquid supply portion with near-infrared rays. The near-infrared camera portion generates a captured image obtained by capturing the processing liquid irradiated by the near-infrared rays from the near-infrared light source. The control portion controls the processing liquid supply portion and the near-infrared camera portion. Based on the captured image, the control portion specifies the type of the processing liquid in the area including at least a portion of the processing liquid supply portion.

[0007] In one embodiment, the control unit controls the processing liquid supply unit to switch the type of the processing liquid to be supplied to the processing liquid nozzle.

[0008] In one embodiment, the control unit controls the processing liquid supply unit based on a result obtained by specifying the type of the processing liquid.

[0009] In one embodiment, the processing liquid supply unit has a plurality of upstream pipes, a common pipe and a downstream pipe. The plurality of upstream pipes are respectively used to circulate the plurality of processing liquids. The common pipe is connected to the downstream ends of the plurality of upstream pipes. The upstream end of the downstream pipe is connected to the common pipe and supplies the processing liquid to the processing liquid nozzle.

[0010] In one embodiment, the near-infrared light source irradiates an area including the common pipe with near-infrared rays. The control unit specifies the type of the processing liquid in the area including the common pipe based on the captured image.

[0011] In one embodiment, the common pipe includes a multi-valve.

[0012] In one embodiment, the processing liquid supply unit includes a discharge pipe whose upstream end is connected to the common pipe and discharges the processing liquid.

[0013] In one embodiment, the near-infrared light source irradiates an area including the discharge pipe with near-infrared rays. The control unit specifies the type of the processing liquid in the area including the discharge pipe based on the captured image.

[0014] In one embodiment, the control unit controls the processing liquid supply unit to supply the first processing liquid to the processing liquid nozzle via the common pipe, and then supplies the first processing liquid to the discharge pipe via the common pipe. Then, the second processing liquid is supplied to the discharge pipe via the common pipe. When it is detected based on the captured image that the processing liquid in the common pipe or the discharge pipe has been switched from the first processing liquid to the second processing liquid, the second processing liquid is supplied to the processing liquid nozzle via the common pipe.

[0015] In one embodiment, the at least one near-infrared light source is provided in plurality. The plurality of near-infrared light sources emit near-infrared rays having different peak wavelengths. The control unit acquires type information indicating the type of the processing liquid, and based on the acquired type information, changes the near-infrared light source that irradiates the area including at least a portion of the processing liquid supply unit.

[0016] According to another aspect of the present invention, a substrate processing method includes the following steps: holding a substrate and rotating the substrate; and supplying a plurality of processing liquids from a processing liquid supply unit to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to the upper surface of the substrate. The process of supplying the processing liquid includes the following steps: irradiating an area including at least a portion of the processing liquid supply unit with near-infrared rays; generating a captured image obtained by capturing the processing liquid irradiated by the near-infrared rays; and specifying the type of the processing liquid in the area including at least a portion of the processing liquid supply unit based on the captured image.

[0017] In one embodiment, in the step of supplying the processing liquid, the type of the processing liquid is switched and supplied to the processing liquid nozzle.

[0018] In one embodiment, in the step of supplying the processing liquid, the processing liquid supply unit is controlled based on a result of specifying the type of the processing liquid.

[0019] In one embodiment, the processing liquid supply unit has a plurality of upstream pipes, a common pipe and a downstream pipe. The plurality of upstream pipes are respectively used to circulate the plurality of processing liquids. The common pipe is connected to the downstream ends of the plurality of upstream pipes. The upstream end of the downstream pipe is connected to the common pipe and supplies the processing liquid to the processing liquid nozzle.

[0020] In one embodiment, in the step of irradiating with near infrared rays, the region including the common pipe is irradiated with near infrared rays. In the step of specifying, the type of the processing liquid in the region including the common pipe is specified based on the captured image.

[0021] In one embodiment, the common pipe includes a multi-valve.

[0022] In one embodiment, the processing liquid supply unit includes a discharge pipe whose upstream end is connected to the common pipe and discharges the processing liquid.

[0023] In one embodiment, in the step of irradiating with near infrared rays, the region including the discharge pipe is irradiated with near infrared rays. In the step of specifying, the type of the processing liquid in the region including the discharge pipe is specified based on the captured image.

[0024] In one embodiment, in the process of supplying the processing liquid, after the first processing liquid is supplied to the processing liquid nozzle via the common pipe, the first processing liquid is supplied to the discharge pipe via the common pipe, and then the second processing liquid is supplied to the discharge pipe via the common pipe. When it is detected based on the captured image that the processing liquid in the common pipe or the discharge pipe has been switched from the first processing liquid to the second processing liquid, the second processing liquid is supplied to the processing liquid nozzle via the common pipe.

[0025] In one embodiment, the process of supplying the above-mentioned processing liquid includes the following steps: obtaining type information indicating the type of the above-mentioned processing liquid; and based on the above-mentioned type information obtained, changing the peak wavelength of near-infrared light irradiating an area including at least a portion of the above-mentioned processing liquid supply part. [Effects of the Invention]

[0026] According to the present invention, a substrate processing device and a substrate processing method can be provided which can identify the processing liquid in the processing liquid supply part with high precision. Simple diagram description

[0027] FIG. 1 is a schematic top view of a substrate processing apparatus according to the present embodiment. FIG. 2 is a schematic diagram of a substrate processing unit in a substrate processing apparatus. FIG. 3 is a block diagram of a substrate processing apparatus. FIG. 4 is a flow chart of a substrate processing method according to the present embodiment. FIG. 5 is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. 6 is a flow chart showing a substrate processing step. FIG. 7 is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. 8 is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. 9 is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. 10 is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. 11 is a schematic diagram of a substrate processing unit in a substrate processing apparatus having a plurality of near-infrared light sources. Implementation

[0028] Hereinafter, the embodiments of the substrate processing device and the substrate processing method of the present invention will be described with reference to the drawings. In addition, the same reference symbols are marked on the same or equivalent parts in the drawings, and the description is not repeated. In addition, in the present specification, in order to facilitate the understanding of the invention, mutually orthogonal X-axis, Y-axis and Z-axis are sometimes described. Typically, the X-axis and the Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0029] First, a substrate processing apparatus 100 according to the present embodiment will be described with reference to Fig. 1. Fig. 1 is a schematic top view of the substrate processing apparatus 100.

[0030] 1 , the substrate processing apparatus 100 processes a substrate W. The substrate processing apparatus 100 processes the substrate W by at least one of etching, surface processing, imparting characteristics, forming a processing film, removing at least a portion of a film, and cleaning the substrate W.

[0031] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W is substantially disk-shaped. Here, the substrate processing apparatus 100 processes the substrate W piece by piece.

[0032] 1 , the substrate processing apparatus 100 includes a plurality of substrate processing units 110, a fluid cabinet 10A, a fluid box 10B, a plurality of loading ports LP, a carrier robot IR, a central robot CR, and a control device 101. The control device 101 controls the loading ports LP, the carrier robot IR, the central robot CR, and the substrate processing units 110.

[0033] Each loading port LP accommodates a plurality of substrates W in a stacked manner. The carrier robot IR transports the substrates W between the loading port LP and the central robot CR. Furthermore, the following device configuration may be adopted: a setting table (path) for temporarily placing the substrates W is provided between the carrier robot IR and the central robot CR, and the substrates W are indirectly transferred between the carrier robot IR and the central robot CR via the setting table. The central robot CR transports the substrates W between the carrier robot IR and the substrate processing unit 110. Each substrate processing unit 110 sprays a processing liquid onto the substrate W to process the substrate W. The fluid cabinet 10A accommodates the processing liquid. Furthermore, the fluid cabinet 10A may also accommodate gas.

[0034] The plurality of substrate processing units 110 form a plurality of towers TW (four towers TW in FIG. 1 ) arranged so as to surround the central robot CR in a top view. Each tower TW includes substrate processing units 110 stacked up and down (three substrate processing units 110 in FIG. 1 ). The fluid boxes 10B correspond to the plurality of towers TW, respectively. The processing liquid in the fluid cabinet 10A is supplied to all the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via any fluid box 10B. In addition, the gas in the fluid cabinet 10A is supplied to all the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via any fluid box 10B.

[0035] The control device 101 controls various operations of the substrate processing device 100. The control device 101 includes a control unit 102 and a memory unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may also have a general-purpose computer.

[0036] The memory unit 104 includes a main memory device and an auxiliary memory device. The main memory device is, for example, a semiconductor memory. The auxiliary memory device is, for example, a semiconductor memory and / or a hard disk. The memory unit 104 may also include a removable medium. The control unit 102 executes the computer program stored in the memory unit 104 to perform substrate processing operations.

[0037] The memory unit 104 stores data. The data includes process recipe data. The process recipe data includes information indicating a plurality of process recipes. Each of the plurality of process recipes specifies the processing content and processing sequence of the substrate W.

[0038] Furthermore, the memory unit 104 may also memorize the brightness value or brightness of the reference processing solution. Alternatively, the memory unit 104 may also memorize the reference image obtained by photographing the reference processing solution.

[0039] Next, the substrate processing unit 110 in the substrate processing apparatus 100 of the present embodiment will be described with reference to Fig. 2. Fig. 2 is a schematic diagram of the substrate processing unit 110 in the substrate processing apparatus 100.

[0040] The substrate processing unit 110 includes a chamber 112, a substrate holding portion 120, a nozzle 136, a processing liquid supply portion 200, a near-infrared light source 140, and a near-infrared imaging portion 150. The chamber 112 accommodates at least a portion of the substrate holding portion 120, the nozzle 136, the processing liquid supply portion 200, the near-infrared light source 140, and the near-infrared imaging portion 150. The nozzle 136 is an example of a "processing liquid nozzle" of the present invention.

[0041] The chamber 112 is substantially box-shaped with an internal space. The chamber 112 accommodates the substrate W. Here, the substrate processing unit 110 is a single-wafer type that processes the substrates W one by one, and accommodates the substrates W one by one in the chamber 112. The substrates W are accommodated in the chamber 112 and processed in the chamber 112.

[0042] The substrate holding part 120 holds the substrate W. The substrate holding part 120 holds the substrate W horizontally in such a manner that the upper surface (front surface) Wa of the substrate W faces upward and the lower surface (back surface) Wb of the substrate W faces vertically downward. In addition, the substrate holding part 120 rotates the substrate W while holding the substrate W. The upper surface Wa of the substrate W may also be flattened. Alternatively, a device surface may be provided on the upper surface Wa of the substrate W, or a columnar laminated body provided with a groove may be provided. The substrate holding part 120 rotates the substrate W while holding the substrate W.

[0043] For example, the substrate holding part 120 may be a clamping type that clamps the end of the substrate W. Alternatively, the substrate holding part 120 may also have any mechanism that holds the substrate W from the lower surface Wb. For example, the substrate holding part 120 may also be a vacuum type. In this case, the substrate holding part 120 holds the substrate W horizontally by adsorbing the central part of the lower surface Wb of the substrate W, which is a non-device forming surface, onto its upper surface. Alternatively, the substrate holding part 120 may also combine a clamping type that makes a plurality of chuck pins contact the peripheral end surface of the substrate W with a vacuum type.

[0044] For example, the substrate holding portion 120 includes a rotating base 121, a chuck member 122, a shaft 123, an electric motor 124, and a housing 125. The chuck member 122 is provided on the rotating base 121. The chuck member 122 chucks the substrate W. Typically, a plurality of chuck members 122 are provided on the rotating base 121.

[0045] The shaft 123 is a hollow shaft. The shaft 123 extends in the vertical direction along the rotation axis Ax. The rotation base 121 is coupled to the upper end of the shaft 123. The substrate W is placed on the rotation base 121.

[0046] The rotating base 121 is in the shape of a disk. The chuck member 122 supports the substrate W horizontally. The shaft 123 extends downward from the center of the rotating base 121. The electric motor 124 applies a rotational force to the shaft 123. The electric motor 124 rotates the shaft 123 in the rotation direction, thereby rotating the substrate W and the rotating base 121 around the rotation axis Ax. The housing 125 surrounds the shaft 123 and the electric motor 124.

[0047] The nozzle 136 sprays the processing liquid onto the upper surface Wa of the substrate W. Specifically, the nozzle 136 supplies the processing liquid onto the upper surface Wa of the substrate W that is held by the substrate holding portion 120 and is rotating. Furthermore, the nozzle 136 supplies a plurality of processing liquids to the substrate W. In the present embodiment, the nozzle 136 switches the type of processing liquid to supply. The nozzle 136 is preferably configured to be movable relative to the substrate W. The nozzle 136 includes a resin. The nozzle 136 is not particularly limited, and is formed, for example, of PFA (perfluoroalkoxyalkane) or PTFE (polytetrafluoroethylene).

[0048] The processing liquid may be an etching liquid for etching the substrate W. Examples of the etching liquid include nitric acid (a mixture of hydrofluoric acid (HF) and nitric acid (HNO 3)), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H 3PO 4). The type of etching liquid is not particularly limited, and may be acidic or alkaline, for example.

[0049] Furthermore, the treatment liquid may also include hydrogen peroxide. Furthermore, the treatment liquid may also include SC1 (ammonia-hydrogen peroxide mixture), SC2 (hydrochloric acid-hydrogen peroxide mixture) or aqua regia (a mixture of concentrated hydrochloric acid and concentrated nitric acid).

[0050] Alternatively, the treatment liquid may be a rinse liquid. Examples of the rinse liquid include deionized water (DIW), carbonated water, electrolytic ionized water, ozone water, ammonia water, diluted hydrochloric acid water, and reduced water (hydrogen water).

[0051] Alternatively, the treatment liquid may be an organic solvent. Typically, the volatility of the organic solvent is higher than that of the rinse liquid. Examples of the organic solvent include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoroether (HFE), propylene glycol ethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0052] The processing liquid supply unit 200 supplies the processing liquid to the nozzle 136. In the present embodiment, the processing liquid supply unit 200 supplies a plurality of processing liquids to the nozzle 136. Furthermore, in the present embodiment, the processing liquid supply unit 200 switches the type of processing liquid to supply to the nozzle 136.

[0053] The processing liquid supply unit 200 includes an upstream pipe 210a, an upstream pipe 210b, a common pipe 220, a downstream pipe 230, and a discharge pipe 240. At least a portion of the upstream pipe 210a, at least a portion of the upstream pipe 210b, the common pipe 220, a portion of the downstream pipe 230, and at least a portion of the discharge pipe 240 are disposed in the fluid box 10B.

[0054] The treatment liquid flows through the upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, and the discharge pipe 240. A plurality of treatment liquids flow through the upstream pipe 210a and the upstream pipe 210b, respectively. In other words, different types of treatment liquids flow through the upstream pipe 210a and the upstream pipe 210b, respectively. In the present embodiment, for example, carbonated water (H 2CO 3) from a supply source flows through the upstream pipe 210a. Also, in the present embodiment, for example, SC2 from a supply source flows through the upstream pipe 210b.

[0055] The downstream end of the upstream pipe 210 a and the downstream end of the upstream pipe 210 b are connected to a common pipe 220 .

[0056] The processing liquids from the upstream pipe 210a and the upstream pipe 210b flow through the common pipe 220. The processing liquids from the upstream pipe 210a and the upstream pipe 210b may flow through the common pipe 220 at the same time, or may flow through the upstream pipe 210a and the upstream pipe 210b at different times. In this embodiment, the processing liquid from the upstream pipe 210a flows through the common pipe 220 after the processing liquid from the upstream pipe 210b flows through the common pipe 220.

[0057] The downstream pipe 230 is connected to the common pipe 220. Specifically, the upstream end of the downstream pipe 230 is connected to the common pipe 220. The processing liquid from the common pipe 220 flows through the downstream pipe 230. In addition, the downstream end of the downstream pipe 230 is connected to the nozzle 136. The downstream pipe 230 supplies the processing liquid from the common pipe 220 to the nozzle 136. As the processing liquid flows through the nozzle 136, the nozzle 136 sprays the processing liquid onto the upper surface Wa of the substrate W.

[0058] The discharge pipe 240 is connected to the common pipe 220. Specifically, the upstream end of the discharge pipe 240 is connected to the common pipe 220. The processing liquid from the common pipe 220 flows through the discharge pipe 240. In addition, the downstream end of the discharge pipe 240 is connected to, for example, a processing liquid tank 290. For example, when the processing liquid supplied to the nozzle 136 is switched, the processing liquid is supplied from the common pipe 220 to the discharge pipe 240.

[0059] In addition, the processing liquid supply unit 200 includes an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253. The upstream valve 251a opens and closes the flow path in the upstream pipe 210a. The upstream valve 251b opens and closes the flow path in the upstream pipe 210b. The downstream valve 252 opens and closes the flow path in the downstream pipe 230. The discharge valve 253 opens and closes the flow path in the discharge pipe 240. The upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 are not particularly limited, and may be, for example, air valves. Furthermore, the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 may be valves other than air valves, and may include needle valves capable of changing flow rates, and / or speed controllers capable of changing opening and closing speeds.

[0060] The processing liquid supply unit 200 includes a resin. The processing liquid supply unit 200 allows near infrared rays emitted from the near infrared light source 140 to pass through. Specifically, the upstream piping 210a, the upstream piping 210b, the common piping 220, the downstream piping 230, and the discharge piping 240 include a resin, which allows near infrared rays emitted from the near infrared light source 140 to pass through. In this embodiment, the upstream piping 210a, the upstream piping 210b, the common piping 220, the downstream piping 230, the discharge piping 240, the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 include a resin, which allows near infrared rays emitted from the near infrared light source 140 to pass through. The upstream piping 210a, the upstream piping 210b, the common piping 220, the downstream piping 230, the discharge piping 240, the upstream valve 251a, the upstream valve 251b, the downstream valve 252 and the discharge valve 253 are not particularly limited and are formed of, for example, PFA or PTFE.

[0061] The processing liquid supply unit 200 has a moving mechanism 138. The moving mechanism 138 moves the nozzle 136 in the horizontal direction and the vertical direction. Specifically, the moving mechanism 138 moves the nozzle 136 in the circumferential direction around the rotation axis extending in the vertical direction. Furthermore, the moving mechanism 138 moves the nozzle 136 up and down in the vertical direction.

[0062] The moving mechanism 138 includes an arm 138a, a shaft 138b, and a driving portion 138c. The arm 138a extends in the horizontal direction. The nozzle 136 is disposed at the front end of the arm 138a. The nozzle 136 is disposed at the front end of the arm 138a in a posture capable of supplying a processing liquid to the upper surface Wa of the substrate W held by the chuck member 122. Specifically, the nozzle 136 is coupled to the front end of the arm 138a and protrudes downward from the arm 138a. The base end of the arm 138a is coupled to the shaft 138b. The shaft 138b extends in the vertical direction.

[0063] The driving part 138c has a rotation driving mechanism and a lifting driving mechanism. The rotation driving mechanism of the driving part 138c rotates the shaft part 138b around the rotation axis, thereby causing the arm 138a to rotate along the horizontal plane around the shaft part 138b. As a result, the nozzle 136 moves along the horizontal plane. Specifically, the nozzle 136 moves along the circumferential direction around the shaft part 138b. The rotation driving mechanism of the driving part 138c includes, for example, a motor capable of forward and reverse rotation.

[0064] The lifting drive mechanism of the driving part 138c lifts the shaft part 138b in the vertical direction. The lifting drive mechanism of the driving part 138c lifts the shaft part 138b, so that the nozzle 136 is lifted in the vertical direction. The lifting drive mechanism of the driving part 138c has a driving source such as a motor and a lifting mechanism. The lifting mechanism is driven by the driving source to lift or lower the shaft part 138b. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

[0065] The near-infrared light source 140 emits at least near-infrared rays. The near-infrared light source 140 irradiates an area including at least a portion of the processing liquid supply unit 200 with near-infrared rays. In the present embodiment, the near-infrared light source 140 irradiates an area outside the chamber 112 and including at least a portion of the processing liquid supply unit 200 with near-infrared rays. For example, the near-infrared light source 140 may also irradiate an area including all or a portion of the common pipe 220 with near-infrared rays. For another example, the near-infrared light source 140 may also irradiate an area including a portion of the downstream pipe 230 with near-infrared rays. For another example, the near-infrared light source 140 may also irradiate an area including all of the common pipe 220 and a portion of the downstream pipe 230 with near-infrared rays.

[0066] For example, the near-infrared light source 140 emits near-infrared light with a wavelength of 800 nm or more and 2.5 μm or less. Typically, the near-infrared light source 140 at least emits near-infrared light with a wavelength of 800 nm or more and 1.5 μm or less. Furthermore, the near-infrared light source 140 may also emit near-infrared light and visible light.

[0067] For example, the near infrared light emitted from the near infrared light source 140 travels in a straight line along the optical axis. Alternatively, the near infrared light emitted from the near infrared light source 140 travels while diffusing around the optical axis. It is preferred that the near infrared light source 140 is arranged so that the optical axis of the near infrared light source 140 passes through the processing liquid supply unit 200. In this embodiment, the near infrared light source 140 is arranged so that the optical axis of the near infrared light source 140 passes through the common pipe 220 or the downstream pipe 230.

[0068] The near infrared camera unit 150 has a plurality of pixels. The near infrared camera unit 150 is sensitive to at least near infrared rays. The near infrared camera unit 150 receives the components of the near infrared rays emitted from the near infrared light source 140 that pass through the processing liquid supply unit 200 and / or are reflected, and photographs an area including at least a portion of the processing liquid supply unit 200, thereby generating a photographed image. Therefore, the near infrared camera unit 150 can photograph the processing liquid irradiated by the near infrared rays emitted from the near infrared light source 140 to generate a photographed image.

[0069] The near-infrared camera section 150 captures an area including at least a portion of the processing liquid supply section 200. In the present embodiment, the near-infrared camera section 150 captures an area located outside the chamber 112 and including at least a portion of the processing liquid supply section 200. For example, the near-infrared camera section 150 may also capture an area including all or a portion of the common pipe 220. For another example, the near-infrared camera section 150 may also capture an area including a portion of the downstream pipe 230. For another example, the near-infrared camera section 150 may also capture an area including all of the common pipe 220 and a portion of the downstream pipe 230. Furthermore, the near-infrared camera section 150 may also capture an area including the entirety of the chamber 112. The area captured by the near-infrared camera section 150 may not be consistent with the area irradiated by the near-infrared light source 140.

[0070] In the near infrared camera unit 150, the frame rate may be 30 fps, or 60 fps, or 120 fps.

[0071] The near infrared camera unit 150 may also include a SWIR (Short Wavelength Infra-Red) image sensor. In this case, the near infrared camera unit 150 detects near infrared rays within a wavelength range of 800 nm or more and 2.5 μm or less.

[0072] Furthermore, the near infrared camera unit 150 may be sensitive not only to near infrared rays but also to visible light. Alternatively, the near infrared camera unit 150 may switch between near infrared rays and visible light to receive light.

[0073] The near-infrared imaging unit 150 captures the surroundings centered on the imaging optical axis. Typically, the imaging optical axis is located at the center of the captured image. For example, the center of the captured image of the near-infrared imaging unit 150 is located at the processing liquid supply unit 200. For another example, the center of the captured image of the near-infrared imaging unit 150 is located at the common pipe 220. In this case, the imaging optical axis of the near-infrared imaging unit 150 is located at the common pipe 220. Alternatively, the center of the captured image of the near-infrared imaging unit 150 may also be located at the downstream pipe 230.

[0074] The near infrared camera unit 150 generates a captured image of at least a portion of the processing liquid supply unit 200. It is preferred that the captured image can be used to identify the processing liquid in at least a portion of the processing liquid supply unit 200. For example, it is preferred that the captured image can be used to identify the types of a plurality of processing liquids in at least a portion of the processing liquid supply unit 200. Also, for example, it is preferred that the captured image can be used to identify the position of the outer edge of the processing liquid in at least a portion of the processing liquid supply unit 200.

[0075] When the fluid box 10B is observed from vertically above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 pass through at least a portion of the processing liquid supply unit 200. Furthermore, when the fluid box 10B is observed from vertically above, the near-infrared light source 140 and the near-infrared imaging unit 150 may be arranged on opposite sides across the processing liquid supply unit 200. Furthermore, when the fluid box 10B is observed from vertically above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may be consistent or parallel. Furthermore, when the fluid box 10B is observed from vertically above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may not be parallel.

[0076] Here, the near infrared light source 140 and the near infrared imaging unit 150 are arranged inside the fluid box 10B. The near infrared light source 140 and the near infrared imaging unit 150 may also be arranged fixedly to each other.

[0077] The near-infrared light source 140 and the near-infrared imaging unit 150 may also be movable relative to the substrate W. For example, the near-infrared light source 140 and the near-infrared imaging unit 150 are preferably movable in the horizontal direction and / or the vertical direction following the moving mechanism controlled by the control unit 102. When the near-infrared light source 140 and the near-infrared imaging unit 150 move, the near-infrared light source 140 and the near-infrared imaging unit 150 may also be movable independently of each other. Alternatively, the near-infrared light source 140 and the near-infrared imaging unit 150 may also be movable as a whole.

[0078] The processing liquid may also contain organic matter. For example, in organic matter, bonds such as CH, CO, CN, and CF absorb specific wavelengths contained in near-infrared rays. The absorption amount of a specific wavelength of near-infrared rays is proportional to the amount of components having a specific bonding group, so the amount of a specific component in the substrate W can be measured based on the near-infrared rays reflected from the substrate W.

[0079] The substrate processing apparatus 100 further includes a cup 180. The cup 180 collects the processing liquid scattered from the substrate W. The cup 180 rises and falls. For example, during the entire period when the nozzle 136 supplies the processing liquid to the substrate W, the cup 180 rises vertically upward to the side of the substrate W. In this case, the cup 180 collects the processing liquid scattered from the substrate W due to the rotation of the substrate W. Moreover, when the period when the nozzle 136 supplies the processing liquid to the substrate W ends, the cup 180 descends vertically downward from the side of the substrate W.

[0080] As described above, the control device 101 includes the control unit 102 and the memory unit 104. The control unit 102 controls the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared imaging unit 150 and / or the cup 180. In one example, the control unit 102 controls the electric motor 124, the upstream valve 251a, the upstream valve 251b, the downstream valve 252, the discharge valve 253, the moving mechanism 138, the near-infrared light source 140, the near-infrared imaging unit 150 and / or the cup 180.

[0081] According to the substrate processing apparatus 100 of the present embodiment, the processing liquid irradiated with near infrared rays from the near infrared light source 140 is photographed by the near infrared camera unit 150. Specifically, the processing liquid in at least a portion of the processing liquid supply unit 200 is photographed by the near infrared camera unit 150. Typically, the processing liquid supply unit 200 is transparent and transmits visible light and near infrared rays. The processing liquid is transparent and transmits visible light. On the other hand, the processing liquid often shows relatively strong absorption in the near infrared region. Therefore, the outer edge of the processing liquid can be identified in the captured image obtained by capturing the region including at least a portion of the processing liquid supply unit 200 by the near infrared camera unit 150. Specifically, the brightness or lightness of the portion representing the upstream piping 210a, the upstream piping 210b, the common piping 220, the downstream piping 230, and the discharge piping 240 in the captured image becomes higher. On the other hand, the brightness or lightness of the portion representing the processing liquid in the captured image becomes lower. Therefore, the outer edge of the processing liquid can be identified in the captured image.

[0082] In addition, the processing liquid often exhibits a unique absorption in the near-infrared region depending on its type. Therefore, in the image obtained by photographing the processing liquid in at least a portion of the processing liquid supply unit 200 by the near-infrared imaging unit 150, the brightness or lightness of the processing liquid varies depending on the type of the processing liquid. Therefore, the type of the processing liquid can be identified based on the brightness or lightness of the processing liquid in the photographed image.

[0083] Alternatively, since the wavelength showing strong absorption varies depending on the treatment liquid, the near-infrared light source 140 can also change the wavelength of the emitted near-infrared light. In this way, the outer edge and type of the treatment liquid can be easily identified.

[0084] The substrate processing apparatus 100 of this embodiment is suitable for manufacturing a semiconductor element provided with a semiconductor. Typically, in a semiconductor element, a conductive layer and an insulating layer are stacked on a substrate. The substrate processing apparatus 100 is suitable for cleaning and / or processing (e.g., etching, property change, etc.) the conductive layer and / or insulating layer when manufacturing a semiconductor element.

[0085] Next, a substrate processing apparatus 100 according to the present embodiment will be described with reference to Fig. 1 to Fig. 3. Fig. 3 is a block diagram of the substrate processing apparatus 100.

[0086] As shown in FIG3 , the control device 101 controls various actions of the substrate processing apparatus 100. The control device 101 controls the carrier robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared camera unit 150, and the cup 180. Specifically, the control device 101 controls the carrier robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared camera unit 150, and the cup 180 by sending control signals to the carrier robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared camera unit 150, and the cup 180.

[0087] In addition, the memory unit 104 stores computer programs and data. The data includes process recipe data. The process recipe data includes information indicating a plurality of process recipes. Each of the plurality of process recipes specifies the processing content, processing sequence, and substrate processing conditions of the substrate W. The control unit 102 executes the computer program stored in the memory unit 104 to perform substrate processing operations.

[0088] Furthermore, the process recipe data includes type information indicating the type of the processing liquid supplied from the supply source to the common pipe 220. Furthermore, the memory unit 104 pre-memorizes data associating the type of the processing liquid with the brightness or lightness of the processing liquid in the reference image.

[0089] The control unit 102 controls the carrier robot IR to transfer the substrate W via the carrier robot IR.

[0090] The control unit 102 controls the central robot CR to transfer the substrate W through the central robot CR. For example, the central robot CR receives an unprocessed substrate W and moves the substrate W into any one of the plurality of chambers 112. Also, the central robot CR receives a processed substrate W from the chamber 112 and moves the substrate W out.

[0091] The control unit 102 controls the substrate holding unit 120 to control the start of rotation of the substrate W, change of the rotation speed, and stop of the rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 120 to change the rotation speed of the substrate holding unit 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holding unit 120.

[0092] The control unit 102 can control the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 of the treatment liquid supply unit 200 to switch the states of the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 to an open state and a closed state. For example, the control unit 102 can control the upstream valve 251a to set the upstream valve 251a to an open state, thereby allowing the treatment liquid flowing in the upstream pipe 210a toward the common pipe 220 to pass. In addition, for example, the control unit 102 can control the upstream valve 251a to set the upstream valve 251a to a closed state, thereby stopping the supply of the treatment liquid flowing in the upstream pipe 210a toward the common pipe 220.

[0093] The control unit 102 can control the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 to change the treatment liquid supplied to the nozzle 136. Specifically, when the treatment liquid supplied to the nozzle 136 is changed from SC2 to carbonated water, the control unit 102 sets the upstream valve 251b to an open state to supply SC2 to the common pipe 220, and sets the downstream valve 252 to an open state to supply SC2 from the common pipe 220 to the downstream pipe 230. Then, the control unit 102 sets the downstream valve 252 to a closed state and sets the discharge valve 253 to an open state to supply SC2 from the common pipe 220 to the discharge pipe 240. Then, the control unit 102 sets the upstream valve 251b to a closed state and sets the upstream valve 251a to an open state to supply carbonated water to the common pipe 220. Moreover, when the control unit 102 detects that the treatment liquid in the common piping 220 or the discharge piping 240 has been switched from SC2 to carbonated water, the carbonated water is supplied to the nozzle 136 via the common piping 220 and the downstream piping 230 by setting the discharge valve 253 to a closed state and the downstream valve 252 to an open state.

[0094] The control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136. Specifically, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136 to above the upper surface Wa of the substrate W. In addition, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136 to a retreat position away from above the upper surface Wa of the substrate W.

[0095] The control unit 102 controls the near-infrared light source 140 and the near-infrared camera unit 150 to capture an area including at least a portion of the processing liquid supply unit 200 and generate a captured image. The control unit 102 controls the near-infrared light source 140 to irradiate the area including at least a portion of the processing liquid supply unit 200 with near-infrared rays. In addition, the control unit 102 controls the near-infrared camera unit 150 to capture an area including at least a portion of the processing liquid supply unit 200 and generate a captured image.

[0096] For example, the control unit 102 controls the near-infrared light source 140 and the near-infrared camera unit 150 in the following manner: near-infrared light is emitted from the near-infrared light source 140 toward a region including at least a portion of the processing liquid supply unit 200, and near-infrared light that has passed through each component or has been reflected is received in the near-infrared camera unit 150 to measure the brightness value or brightness. Furthermore, the control unit 102 may also control the near-infrared light source 140 and the near-infrared camera unit 150 so that the near-infrared light source 140 and the near-infrared camera unit 150 move relative to the processing liquid supply unit 200.

[0097] The control unit 102 specifies the type of the processing liquid in the captured image based on the brightness value or brightness in the captured image. The control unit 102 specifies the type of the processing liquid in the captured image based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 specifies the type of the processing liquid in the captured image based on the captured image and the reference image.

[0098] Furthermore, the control unit 102 identifies the outer edge of the processing liquid in the captured image. For example, the control unit 102 identifies the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image. In one example, the control unit 102 identifies the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the outer edge of the processing liquid in the captured image based on the captured image and the reference image.

[0099] The control unit 102 can also control the cup 180 to move the cup 180 relative to the substrate W. Specifically, during the entire period that the processing liquid supply unit 200 supplies the processing liquid to the substrate W, the control unit 102 causes the cup 180 to rise vertically upward to the side of the substrate W. After the processing liquid supply unit 200 supplies the processing liquid to the substrate W, the control unit 102 causes the cup 180 to fall vertically downward from the side of the substrate W.

[0100] The substrate processing apparatus 100 of this embodiment is suitable for forming a semiconductor element. For example, the substrate processing apparatus 100 is suitable for processing a substrate W used as a semiconductor element of a stacked structure. The semiconductor element is a so-called 3D structure memory (memory device). As an example, the substrate W is suitable for use as a NAND type flash memory.

[0101] Next, the substrate processing method of this embodiment is described with reference to FIGS. 1 to 4. FIG. 4 is a flow chart of the substrate processing method of this embodiment. Furthermore, step SB is an example of "a process of rotating the substrate" of the present invention. Step SC is an example of "a process of supplying a plurality of processing liquids" of the present invention.

[0102] As shown in Fig. 4, in step SA, the substrate W is carried into the substrate processing apparatus 100. Specifically, the substrate W is carried into the chamber 112 of the substrate processing unit 110 via the carrier robot IR and the central robot CR.

[0103] In step SB, the substrate holding unit 120 holds the substrate W. Specifically, after the substrate W is carried into the chamber 112 , it is held by the substrate holding unit 120 .

[0104] In step SC, the control unit 102 processes the substrate W. The substrate W is processed in the substrate processing unit 110. Typically, the substrate holding unit 120 is rotated while holding the substrate W, and the processing liquid supply unit 200 supplies the processing liquid to the nozzle 136, and the nozzle 136 supplies the processing liquid to the substrate W. After a predetermined time has passed since the processing liquid is supplied to the substrate W, the control unit 102 stops supplying the processing liquid to the substrate W.

[0105] In this embodiment, in step SC, the control unit 102 switches the types of the plurality of processing liquids from the processing liquid supply unit 200 to the nozzle 136 for supply. Specifically, the control unit 102 processes the substrate W using the first processing liquid (here, SC2). Then, the control unit 102 switches the processing liquid from the first processing liquid to the second processing liquid (carbonated water), and processes the substrate W using the second processing liquid.

[0106] Furthermore, in the present embodiment, in step SC, the near-infrared light source 140 emits near-infrared rays. At least a portion of the processing liquid supply section 200 is irradiated with the near-infrared rays emitted from the near-infrared light source 140. For example, the common pipe 220 of the processing liquid supply section 200 is irradiated with the near-infrared rays emitted from the near-infrared light source 140. The near-infrared camera section 150 photographs the area including at least a portion of the processing liquid supply section 200 irradiated with the near-infrared rays. For example, the near-infrared camera section 150 photographs the common pipe 220 irradiated with the near-infrared rays. By photographing the area including at least a portion of the processing liquid supply section 200 irradiated with the near-infrared rays by the near-infrared camera section 150, even if the processing liquid in at least a portion of the processing liquid supply section 200 is substantially transparent, the processing liquid can be photographed with high precision.

[0107] Furthermore, in the present embodiment, in step SC, the control unit 102 controls the near-infrared imaging unit 150 to generate an image obtained by photographing the area including at least a portion of the processing liquid supply unit 200. In the present embodiment, when the control unit 102 switches the processing liquid supplied to the processing liquid supply unit 200, the near-infrared imaging unit 150 photographs the area including at least a portion of the processing liquid supply unit 200. Specifically, the control unit 102 controls the near-infrared light source 140 to emit near-infrared rays. The area including at least a portion of the processing liquid supply unit 200 is irradiated with the near-infrared rays emitted from the near-infrared light source 140. Furthermore, the control unit 102 controls the near-infrared imaging unit 150 to photograph at least a portion of the area irradiated with the near-infrared rays. Specifically, the control unit 102 photographs the area including at least a portion of the processing liquid supply unit 200. By photographing the area including at least a portion of the processing liquid supply section 200 irradiated with near-infrared rays by the near-infrared camera section 150, the processing liquid can be photographed with high precision even if the processing liquid in at least a portion of the processing liquid supply section 200 is substantially transparent.

[0108] Furthermore, in this embodiment, in step SC, the control unit 102 specifies the position of the outer edge of the processing liquid in at least a portion of the processing liquid supply unit 200 based on the captured image. Furthermore, the control unit 102 specifies the type of the processing liquid in at least a portion of the processing liquid supply unit 200 based on the captured image. In this way, it is possible to detect whether the type of the processing liquid in the processing liquid supply unit 200 has been switched.

[0109] In step SD, the control unit 102 stops the rotation of the substrate W by the substrate holding unit 120 and releases the substrate W from being held by the substrate holding unit 120 .

[0110] In step SE, the substrate W is unloaded from the substrate processing apparatus 100. Specifically, the substrate W is unloaded from the chamber 112 of the substrate processing unit 110 via the central robot CR and the carrier robot IR.

[0111] According to the present embodiment, the control unit 102 controls the near-infrared imaging unit 150 to capture an area including at least a portion of the processing liquid supply unit 200. In other words, the processing liquid irradiated with near-infrared rays from the near-infrared light source 140 is captured by the near-infrared imaging unit 150. The processing liquid absorbs near-infrared rays relatively strongly, so the outer edge of the processing liquid can be identified with high precision.

[0112] Furthermore, the control unit 102 uses the near infrared camera unit 150 to capture the processing liquid in at least a portion of the processing liquid supply unit 200. Therefore, the captured image can be used to identify the type of processing liquid in at least a portion of the processing liquid supply unit 200. Therefore, for example, when the type of processing liquid supplied to the nozzle 136 is switched, it can be confirmed whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0113] Next, the processing liquid supply unit 200 of the substrate processing apparatus 100 of the present embodiment will be further described with reference to Fig. 5. Fig. 5 is a schematic diagram showing the structure of the processing liquid supply unit 200 of the substrate processing apparatus 100 of the present embodiment.

[0114] 5 , the processing liquid supply unit 200 includes a multi-valve 300. The multi-valve 300 includes a base 310, an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253.

[0115] The base 310 has a common flow path 311, an upstream flow path 312a, an upstream flow path 312b, a downstream flow path 312c and a discharge flow path 312d. The common flow path 311 extends in a substantially straight line. Both ends of the common flow path 311 are closed. Each of the upstream flow path 312a, the upstream flow path 312b, the downstream flow path 312c and the discharge flow path 312d is connected to the common flow path 311. Each of the upstream flow path 312a, the upstream flow path 312b, the downstream flow path 312c and the discharge flow path 312d extends in a direction intersecting with the direction in which the common flow path 311 extends. The upstream flow path 312a, the upstream flow path 312b, the downstream flow path 312c and the discharge flow path 312d are connected in sequence from one end of the common flow path 311 toward the other end. The upstream flow path 312 a is connected to one end of the common flow path 311 , and the discharge flow path 312 d is connected to the other end of the common flow path 311 .

[0116] The base 310 includes a resin that transmits the near infrared light emitted from the near infrared light source 140. The base 310 is not particularly limited, and is formed of, for example, PFA or PTFE.

[0117] Here, in this embodiment, the processing liquid supply unit 200 includes an upstream pipe 211a, an upstream pipe 211b, a downstream pipe 231, and a discharge pipe 241. The upstream pipe 211a constitutes the upstream pipe 210a. The upstream pipe 211b constitutes the upstream pipe 210b. The downstream pipe 231 constitutes the downstream pipe 230. The discharge pipe 241 constitutes the discharge pipe 240.

[0118] The upstream pipe 211a, the upstream pipe 211b, the downstream pipe 231 and the exhaust pipe 241 contain resin, which transmits the near infrared rays emitted from the near infrared light source 140. The upstream pipe 211a, the upstream pipe 211b, the downstream pipe 231 and the exhaust pipe 241 are not particularly limited, and are formed of, for example, PFA or PTFE.

[0119] One end (downstream end) of the upstream flow path 312a is connected to the common flow path 311. One end (downstream end) of the upstream pipe 211a is connected to the other end (upstream end) of the upstream flow path 312a, and the other end (upstream end) of the upstream pipe 211a is connected to the supply source. The flow path of the upstream pipe 211a is connected to the upstream flow path 312a.

[0120] One end (downstream end) of the upstream flow path 312b is connected to the common flow path 311. One end (downstream end) of the upstream pipe 211b is connected to the other end (upstream end) of the upstream flow path 312b, and the other end (upstream end) of the upstream pipe 211b is connected to the supply source. The flow path of the upstream pipe 211b is connected to the upstream flow path 312b.

[0121] One end (upstream end) of the downstream flow path 312c is connected to the common flow path 311. One end (upstream end) of the downstream pipe 231 is connected to the other end (downstream end) of the downstream flow path 312c, and the other end (downstream end) of the downstream pipe 231 is connected to the nozzle 136. The flow path of the downstream pipe 231 is connected to the downstream flow path 312c.

[0122] One end (upstream end) of the discharge flow path 312d is connected to the common flow path 311. One end (upstream end) of the discharge pipe 241 is connected to the other end (downstream end) of the discharge flow path 312d, and the other end (downstream end) of the discharge pipe 241 is connected to the processing liquid tank 290. The flow path of the discharge pipe 241 is connected to the discharge flow path 312d.

[0123] The base 310 has a common piping portion 321, an upstream piping portion 322a, an upstream piping portion 322b, a downstream piping portion 322c, and a discharge piping portion 322d. In FIG. 5 , for easy understanding, the common piping portion 321, the upstream piping portion 322a, the upstream piping portion 322b, the downstream piping portion 322c, and the discharge piping portion 322d are indicated by dotted lines.

[0124] The common pipe portion 321 constitutes the common flow path 311 and extends in the direction in which the common flow path 311 extends. The common pipe portion 321 is a portion of the base 310 that surrounds the common flow path 311. In this embodiment, the common pipe 220 is constituted by the common pipe portion 321.

[0125] The upstream piping portion 322a constitutes the upstream flow path 312a and extends in the direction in which the upstream flow path 312a extends. The upstream piping portion 322a is a portion of the base 310 that surrounds the upstream flow path 312a. In this embodiment, the upstream piping portion 322a and the upstream pipe 211a constitute the upstream piping 210a.

[0126] The upstream piping portion 322b constitutes the upstream flow path 312b and extends in the direction in which the upstream flow path 312b extends. The upstream piping portion 322b is a portion of the base 310 that surrounds the upstream flow path 312b. In this embodiment, the upstream piping portion 322b and the upstream pipe 211b constitute the upstream piping 210b.

[0127] The downstream piping portion 322c constitutes the downstream flow path 312c and extends in the direction in which the downstream flow path 312c extends. The downstream piping portion 322c is a portion of the base 310 that surrounds the downstream flow path 312c. In this embodiment, the downstream piping portion 322c and the downstream pipe 231 constitute the downstream piping 230.

[0128] The discharge piping portion 322d constitutes the discharge flow path 312d and extends in the direction in which the discharge flow path 312d extends. The discharge piping portion 322d is a portion of the base 310 that surrounds the discharge flow path 312d. In this embodiment, the discharge piping portion 322d and the discharge pipe 241 constitute the discharge piping 240.

[0129] The upstream valve 251a can move between a closed position and an open position. The closed position of the upstream valve 251a indicates a position where the upstream valve 251a closes one end of the upstream flow path 312a. The open position of the upstream valve 251a indicates a position where the upstream valve 251a opens one end of the upstream flow path 312a to connect the upstream flow path 312a with the common flow path 311.

[0130] When the upstream valve 251a moves from the open position to the closed position, one end of the upstream flow path 312a is closed, and the upstream flow path 312a is disconnected from the common flow path 311. That is, when the upstream valve 251a moves from the open position to the closed position, the upstream piping 210a is disconnected from the common piping 220. On the other hand, when the upstream valve 251a moves from the closed position to the open position, one end of the upstream flow path 312a is opened, and the upstream flow path 312a is connected to the common flow path 311. That is, when the upstream valve 251a moves from the closed position to the open position, the upstream piping 210a is connected to the common piping 220.

[0131] The upstream valve 251b can move between a closed position and an open position. The closed position of the upstream valve 251b indicates a position where the upstream valve 251b closes one end of the upstream flow path 312b. The open position of the upstream valve 251b indicates a position where the upstream valve 251b opens one end of the upstream flow path 312b to connect the upstream flow path 312b with the common flow path 311.

[0132] When the upstream valve 251b moves from the open position to the closed position, one end of the upstream flow path 312b is closed, and the upstream flow path 312b is disconnected from the common flow path 311. That is, when the upstream valve 251b moves from the open position to the closed position, the upstream piping 210b is disconnected from the common piping 220. On the other hand, when the upstream valve 251b moves from the closed position to the open position, one end of the upstream flow path 312b is opened, and the upstream flow path 312b is connected to the common flow path 311. That is, when the upstream valve 251b moves from the closed position to the open position, the upstream piping 210b is connected to the common piping 220.

[0133] The downstream valve 252 can move between a closed position and an open position. The closed position of the downstream valve 252 indicates a position where the downstream valve 252 closes one end of the downstream flow path 312c. The open position of the downstream valve 252 indicates a position where the downstream valve 252 opens one end of the downstream flow path 312c to connect the downstream flow path 312c with the common flow path 311.

[0134] When the downstream valve 252 moves from the open position to the closed position, one end of the downstream flow path 312c is closed, and the downstream flow path 312c is disconnected from the common flow path 311. That is, when the downstream valve 252 moves from the open position to the closed position, the downstream piping 230 is disconnected from the common piping 220. On the other hand, when the downstream valve 252 moves from the closed position to the open position, one end of the downstream flow path 312c is opened, and the downstream flow path 312c is connected to the common flow path 311. That is, when the downstream valve 252 moves from the closed position to the open position, the downstream piping 230 is connected to the common piping 220.

[0135] The discharge valve 253 can move between a closed position and an open position. The closed position of the discharge valve 253 indicates a position where the discharge valve 253 closes one end of the discharge flow path 312d. The open position of the discharge valve 253 indicates a position where the discharge valve 253 opens one end of the discharge flow path 312d to connect the discharge flow path 312d with the common flow path 311.

[0136] When the discharge valve 253 moves from the open position to the closed position, one end of the discharge flow path 312d is closed, and the discharge flow path 312d is disconnected from the common flow path 311. That is, when the discharge valve 253 moves from the open position to the closed position, the discharge piping 240 is disconnected from the common piping 220. On the other hand, when the discharge valve 253 moves from the closed position to the open position, one end of the discharge flow path 312d is opened, and the discharge flow path 312d is connected to the common flow path 311. That is, when the discharge valve 253 moves from the open position to the closed position, the discharge piping 240 is connected to the common piping 220.

[0137] Next, the substrate processing step (step SC of FIG. 4 ) in the substrate processing method of the present embodiment is described with reference to FIGS. 1 to 10 . FIG. 6 is a flow chart showing the substrate processing step. FIGS. 7 to 10 are schematic diagrams showing the structure of the processing liquid supply unit 200 of the substrate processing device 100 of the present embodiment. Furthermore, step S15 is an example of the "process of obtaining type information" of the present invention. Step S16 is an example of the "process of utilizing near-infrared irradiation" of the present invention. Step S17 is an example of the "process of generating a captured image" of the present invention. Step S18 is an example of the "process of specifying the type of processing liquid" of the present invention.

[0138] As shown in Fig. 6, step SC includes step S11 to step S21. Furthermore, in this embodiment, at the time point when step S11 starts, the upstream valve 251a, the upstream valve 251b, the downstream valve 252 and the discharge valve 253 are in a closed state.

[0139] In step S11, the first processing liquid (here, SC2) is supplied to the nozzle 136. Specifically, as shown in FIG5, the control unit 102 sets the upstream valve 251b and the downstream valve 252 from the closed state to the open state, and maintains the upstream valve 251a and the discharge valve 253 in the closed state. Thereby, the first processing liquid is supplied to the nozzle 136 from the upstream pipe 210b via the common pipe 220 and the downstream pipe 230. Therefore, the first processing liquid starts to be supplied from the nozzle 136 to the substrate W. When a predetermined time (for example, several tens of seconds) has passed after the upstream valve 251b and the downstream valve 252 are set to the open state, the process enters step S12.

[0140] Then, in step S12, the first processing liquid (here, SC2) is supplied to the discharge piping 240. Specifically, as shown in FIG7, the control unit 102 sets the downstream valve 252 from the open state to the closed state, and sets the discharge valve 253 from the closed state to the open state. Thereby, the first processing liquid is supplied from the upstream piping 210b to the discharge piping 240 via the common piping 220. Therefore, the supply of the first processing liquid from the nozzle 136 to the substrate W is stopped. In addition, the first processing liquid is discharged from the discharge piping 240 to the processing liquid tank 290. If a predetermined time (for example, less than 1 second) has passed after the discharge valve 253 is set to the open state, the process enters step S13.

[0141] Then, in step S13, the supply of the first processing liquid is stopped. Specifically, the control unit 102 changes the upstream valve 251b from an open state to a closed state. Thus, the first processing liquid is no longer supplied to the common pipe 220.

[0142] Next, in step S14, the second treatment liquid (here, carbonated water) is supplied to the discharge pipe 240. Specifically, as shown in FIG8 , the control unit 102 opens the upstream valve 251a from the closed state. Thus, the second treatment liquid is supplied from the upstream pipe 210a to the discharge pipe 240 via the common pipe 220.

[0143] Furthermore, even if the second processing liquid starts to be supplied from the upstream pipe 210a to the common pipe 220, the processing liquid in the common pipe 220 will not be immediately switched from the first processing liquid to the second processing liquid. Specifically, as shown in FIG9 , in the common pipe 220, for example, an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253 are arranged, or the upstream pipe 210b and the downstream pipe 230 are connected, so that a part of the first processing liquid L1 is retained in the common pipe 220. Furthermore, in FIG9 , for easy understanding, the first processing liquid is marked with a symbol "L1", and the second processing liquid is marked with a symbol "L2". In addition, for easy understanding, only the first processing liquid L1 and the second processing liquid L2 are hatched.

[0144] Then, in step S15, type information indicating the type of the processing liquid is obtained. Specifically, the control unit 102 obtains type information indicating the type of the processing liquid supplied to the common pipe 220 from the process recipe data, for example.

[0145] Then, in step S16, the near-infrared light source 140 irradiates the area including at least a portion of the processing liquid supply part 200 with near-infrared rays. Specifically, the control part 102 irradiates the area including at least a portion of the processing liquid supply part 200 with near-infrared rays through the near-infrared light source 140. In this embodiment, the control part 102 irradiates the area including the common pipe 220 with near-infrared rays through the near-infrared light source 140. Furthermore, the control part 102 may also irradiate the area including a portion of the discharge pipe 240 (for example, the portion on the upstream side of the discharge pipe 240) with near-infrared rays through the near-infrared light source 140.

[0146] Then, in step S17, the near-infrared camera unit 150 photographs the area including at least a portion of the processing liquid supply unit 200 irradiated by the near-infrared ray. Specifically, the control unit 102 photographs the area including at least a portion of the processing liquid supply unit 200 irradiated by the near-infrared camera unit 150. In this embodiment, the control unit 102 photographs the area including the common pipe 220 irradiated by the near-infrared ray by the near-infrared camera unit 150. Furthermore, the control unit 102 may also photograph the area including a portion of the discharge pipe 240 irradiated by the near-infrared camera unit 150.

[0147] In step S17, the near-infrared camera unit 150 captures the area including at least a portion of the processing liquid supply unit 200 irradiated with near-infrared rays to generate a captured image. Furthermore, the time point when the near-infrared light source 140 starts to emit near-infrared rays may be the same as or different from the time point when the near-infrared camera unit 150 starts to capture images. Furthermore, the time point when the near-infrared light source 140 starts to emit near-infrared rays may be earlier or later than the time point when the near-infrared camera unit 150 starts to capture images. Furthermore, the time point when the near-infrared light source 140 starts to emit near-infrared rays may be the same as or different from the time point when the second processing liquid is discharged to the discharge pipe 240 in step S14. Furthermore, the time point when the near-infrared light source 140 starts to emit near-infrared rays may be earlier or later than the time point when the second processing liquid is supplied to the discharge pipe 240 in step S14.

[0148] Then, in step S18, the type of the processing liquid is identified based on the captured image. Specifically, the control unit 102 identifies the type of the processing liquid in the area including at least a portion of the processing liquid supply unit 200 based on the captured image. In this embodiment, the control unit 102 identifies the type of the processing liquid in the common pipe 220 based on the captured image. Furthermore, the control unit 102 can also identify the type of the processing liquid in the discharge pipe 240 based on the captured image.

[0149] More specifically, the control unit 102 identifies the type of the processing liquid in the captured image based on the brightness value or brightness in the captured image generated by the near-infrared imaging unit 150. Alternatively, the control unit 102 identifies the type of the processing liquid in the captured image based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the type of the processing liquid in the captured image based on the captured image and the reference image.

[0150] Furthermore, the control unit 102 specifies the position of the outer edge of the processing liquid in the captured image based on the captured image generated by the near-infrared camera unit 150. For example, the control unit 102 specifies the position of the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image. For example, the control unit 102 specifies the position of the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the memory unit 104. Alternatively, the control unit 102 specifies the position of the outer edge of the processing liquid in the captured image based on the captured image and the reference image. Alternatively, for example, the control unit 102 may also determine that the area in the captured image whose brightness value or brightness is within a specified range is the processing liquid, and determine that the outer edge of the area whose brightness value or brightness is within a specified range is the outer edge of the processing liquid.

[0151] Furthermore, the control unit 102 specifies the position of the second processing liquid in the captured image based on the brightness value or brightness in the captured image and the type information. Furthermore, the control unit 102 may also identify the area where the first processing liquid is located and the area where the second processing liquid is located in a specified area of ​​the captured image (for example, an area corresponding to the common pipe 220) based on the brightness value or brightness in the captured image, the brightness value or brightness of the reference processing liquid stored in the memory unit 104, and the type information. Furthermore, for example, the control unit 102 may also calculate the ratio of the number of pixels having the brightness value or brightness corresponding to the second processing liquid to the total number of pixels in the specified area in the specified area (for example, an area corresponding to the common pipe 220). Furthermore, the control unit 102 may also calculate the total brightness value or brightness of all pixels in the specified area.

[0152] Then, in step S19, it is determined whether the brightness value or lightness in the captured image satisfies the prescribed condition. Specifically, the control unit 102 determines whether the value calculated in step S18 satisfies the prescribed condition. For example, the control unit 102 determines whether the area where the second processing liquid is located is a prescribed value (for example, 99%) or more of a prescribed area (for example, an area corresponding to the common pipe 220) of the captured image. In addition, for example, the control unit 102 may also determine whether the calculated above ratio is a prescribed value (for example, 99%) or more. Furthermore, the control unit 102 may also determine whether the calculated above total is a prescribed value or more.

[0153] In step S19, if the control unit 102 determines that the specified condition is not satisfied, the process returns to step S18. That is, if the process liquid is not sufficiently switched from the first process liquid to the second process liquid in at least a portion of the process liquid supply unit 200 (here, the common pipe 220), the process returns to step S18.

[0154] On the other hand, in step S19, if the control unit 102 determines that the predetermined condition is satisfied, the process proceeds to step S20. That is, if the control unit 102 detects that the process liquid in the common pipe 220 or the discharge pipe 240 has been switched from the first process liquid to the second process liquid, the process proceeds to step S20.

[0155] Here, step S19 will be described in more detail. Generally, the time from when the second processing liquid starts to be supplied to the discharge pipe until it starts to be supplied to the downstream pipe is preset. Specifically, usually, even when the second processing liquid starts to be supplied from the upstream pipe to the common pipe, a part of the first processing liquid remains in the common pipe. Therefore, the processing liquid in the common pipe does not immediately switch from the first processing liquid to the second processing liquid. For example, when the time required for the processing liquid in the common pipe to switch from the first processing liquid to the second processing liquid is t1 seconds or more and t2 seconds or less (where t1 < t2), after t2 seconds or more have passed since the processing liquid supplied to the common pipe switched from the first processing liquid to the second processing liquid, the opening and closing states of the discharge valve and the downstream valve are switched. That is, since the time required to switch the processing liquid in the common pipe varies depending on temperature and the like, in order to supply the processing liquid to the nozzle after switching the processing liquid, the time from when the second processing liquid starts to be supplied to the discharge pipe until it starts to be supplied to the downstream pipe is set to be long. Similarly, in this embodiment, in the process recipe, the time from when the second processing liquid starts to be supplied to the discharge pipe 240 until it starts to be supplied to the downstream pipe 230 is set (for example, t2 seconds or more).

[0156] In this embodiment, in step S19, if the control unit 102 determines that a specified condition is satisfied, regardless of whether the set time (t2 seconds or more) has passed, the process proceeds to step S20. In this case, for example, the control unit 102 may also overwrite the process recipe in such a way that the time from when the second processing liquid starts to be supplied to the discharge pipe 240 until it starts to be supplied to the downstream pipe 230 (for example, t2 seconds or more) is shortened according to the point in time when it is determined that the specified condition is satisfied. Furthermore, for example, the control unit 102 may also overwrite the process recipe in such a way that the time from when the second processing liquid starts to be supplied to the discharge pipe 240 until it starts to be supplied to the downstream pipe 230 (for example, t2 seconds or more) is extended according to the point in time when it is determined that the specified condition is satisfied.

[0157] Subsequently, in step S20, the second processing liquid (here, carbonated water) is supplied to the nozzle 136. Specifically, the control unit 102 changes the discharge valve 253 from the closed state to the open state, and changes the downstream valve 252 from the closed state to the open state. Thereby, as shown in FIG. 10, the second processing liquid is supplied from the upstream pipe 210a to the nozzle 136 via the common pipe 220 and the downstream pipe 230. Therefore, the second processing liquid starts to be supplied from the nozzle 136 to the substrate W. After a specified time (for example, several seconds or more) has passed since the downstream valve 252 was changed to the open state, the process proceeds to step S21.

[0158] Then, in step S21, the supply of the second processing liquid is stopped. Specifically, the control unit 102 changes the upstream valve 251a and the downstream valve 252 from the open state to the closed state. Thus, the supply of the second processing liquid to the common pipe 220 is stopped, and the supply of the second processing liquid to the nozzle 136 is stopped.

[0159] In this embodiment, as described above, the control unit 102 specifies the type of the processing liquid in the area including at least a portion of the processing liquid supply unit 200 based on the captured image. Therefore, for example, it is possible to confirm whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0160] Furthermore, for example, since it is possible to confirm whether the processing liquid in the processing liquid supply unit 200 has been switched, the substrate processing time can be shortened by switching the downstream valve 252 from the closed state to the open state at the time when the processing liquid in the processing liquid supply unit 200 has been switched, regardless of whether the above-mentioned set time (for example, more than t2 seconds) has passed. In addition, since the amount of the second processing liquid used can be reduced, the environmental load is reduced.

[0161] Furthermore, as described above, the control unit 102 controls the processing liquid supply unit 200 to switch the type of processing liquid to supply to the nozzle 136. In this way, when the type of processing liquid is switched to supply to the nozzle 136, the application of the present invention is particularly effective.

[0162] As described above, the control unit 102 controls the processing liquid supply unit 200 based on the result of identifying the type of the processing liquid. Therefore, the processing liquid supply unit 200 can easily supply and / or stop the processing liquid to the nozzle 136 according to the state of the processing liquid in the processing liquid supply unit 200.

[0163] As described above, the processing liquid supply unit 200 includes the upstream pipe 210a and the upstream pipe 210b for respectively passing a plurality of processing liquids, the common pipe 220 connected to the downstream ends of the upstream pipe 210a and the upstream pipe 210b, and the downstream pipe 230. In this way, when a plurality of processing liquids pass through the common pipe 220, it is particularly effective to specify the type of processing liquid by applying the present invention.

[0164] Furthermore, as described above, the control unit 102 specifies the type of the processing liquid in the area including the common pipe 220 based on the captured image. Therefore, it is possible to easily confirm the status of the processing liquid in the common pipe 220. For example, it is possible to easily confirm whether the processing liquid in the common pipe 220 has been switched. In other words, it is possible to easily confirm whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0165] Furthermore, as described above, the common pipe 220 includes a multi-valve. Therefore, it is possible to suppress the enlargement of the structure around the common pipe 220, and thus it is possible to suppress the enlargement of the substrate processing apparatus.

[0166] Furthermore, as described above, the processing liquid supply unit 200 includes the discharge pipe 240 which is connected to the common pipe 220 at the upstream end and discharges the processing liquid. Therefore, when the processing liquid supplied to the nozzle 136 is switched, the first processing liquid and the second processing liquid can be supplied to the discharge pipe 240, so that the processing liquid can be prevented from being supplied to the nozzle 136 in a state where the first processing liquid is mixed in the second processing liquid.

[0167] Furthermore, as described above, the control unit 102 can also identify the type of the processing liquid in the area including the discharge pipe 240 based on the captured image. Therefore, it is possible to easily confirm the status of the processing liquid in the discharge pipe 240. For example, it is possible to easily confirm whether the processing liquid in the discharge pipe 240 has been switched. In other words, it is possible to easily confirm whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0168] Furthermore, as described above, after the control unit 102 supplies the first processing liquid to the nozzle 136 through the common pipe 220, the control unit 102 supplies the first processing liquid to the discharge pipe 240 through the common pipe 220, and then supplies the second processing liquid to the discharge pipe 240 through the common pipe 220. When it is detected based on the captured image that the processing liquid in the common pipe 220 or the discharge pipe 240 has been switched from the first processing liquid to the second processing liquid, the control unit 102 supplies the second processing liquid to the nozzle 136 through the common pipe 220. Therefore, the processing liquid supplied to the nozzle 136 can be easily switched from the first processing liquid to the second processing liquid.

[0169] Next, an example in which a plurality of near-infrared light sources 140 are provided will be described with reference to FIG11. Here, an example in which the near-infrared light source 140 includes a near-infrared light source 140a and a near-infrared light source 140b will be described. FIG11 is a schematic diagram of a substrate processing unit 110 in a substrate processing apparatus 100 having a plurality of near-infrared light sources 140 (near-infrared light sources 140a and near-infrared light sources 140b).

[0170] As shown in Fig. 11, the near infrared light source 140 includes a near infrared light source 140a and a near infrared light source 140b. The near infrared light source 140a and the near infrared light source 140b emit near infrared rays having different peak wavelengths.

[0171] The control unit 102 acquires the process recipe data from the memory unit 104, and acquires type information indicating the type of the processing liquid supplied to the common pipe 220 from the process recipe data. Also, for example, the process recipe data may also include information indicating the type of the near-infrared light source 140 corresponding to the type of the processing liquid. Also, for example, the control unit 102 may also acquire type information indicating the type of the processing liquid supplied to the common pipe 220 from input information input by the user.

[0172] The control unit 102 changes the near infrared light source 140 that irradiates the area including at least a portion of the treatment liquid supply unit 200 based on the acquired type information. For example, when carbonated water is supplied from the upstream pipe 210a to the common pipe 220, the control unit 102 irradiates with the near infrared light source 140a. On the other hand, when SC2 is supplied from the upstream pipe 210b to the common pipe 220, the control unit 102 irradiates with the near infrared light source 140b.

[0173] Specifically, for example, when the treatment liquid supplied to the common pipe 220 is switched from SC2 to carbonated water, after the control unit 102 supplies the second treatment liquid (here, carbonated water) to the common pipe 220 (step S14 of Figure 6), the near-infrared light source 140 that irradiates the area including at least a portion of the treatment liquid supply part 200 is changed from the near-infrared light source 140b to the near-infrared light source 140a, and the area including at least a portion of the treatment liquid supply part 200 is irradiated by the near-infrared light source 140a (step S16 of Figure 6).

[0174] On the other hand, for example, when the treatment liquid supplied to the common pipe 220 is switched from carbonated water to SC2, after the control unit 102 supplies the second treatment liquid (here SC2) to the common pipe 220 (step S14 of Figure 6), the near-infrared light source 140 that irradiates the area including at least a portion of the treatment liquid supply part 200 is changed from the near-infrared light source 140a to the near-infrared light source 140b, and the area including at least a portion of the treatment liquid supply part 200 is irradiated by the near-infrared light source 140b (step S16 of Figure 6).

[0175] The other structures and substrate processing flow in the example of providing a plurality of near-infrared light sources 140 are the same as the structures and substrate processing flow of the substrate processing apparatus described using Figures 1 to 10. Furthermore, step S16 in the example of providing a plurality of near-infrared light sources 140 is an example of the "process of changing the peak wavelength of near-infrared rays" of the present invention.

[0176] In this embodiment, as described above, the control unit 102 acquires the type information indicating the type of the processing liquid, and based on the acquired type information, changes the near-infrared light source 140 that irradiates the area including at least a portion of the processing liquid supply unit 200. Therefore, since the irradiated near-infrared light can be changed according to the absorbance (also called absorbance) of the processing liquid, even when the type of the processing liquid is changed, the type and outer edge of the processing liquid can be more accurately specified.

[0177] Specifically, the absorbance of the treatment liquid varies depending on the type of the treatment liquid. Therefore, for example, by irradiating the second treatment liquid with light of a wavelength having a relatively high absorbance and photographing the treatment liquid, the contrast between the brightness value or brightness of the area representing the second treatment liquid and the area other than the second treatment liquid in the photographed image can be increased. Therefore, the type and position of the treatment liquid can be more accurately identified based on the photographed image.

[0178] Other effects in the example of providing a plurality of near-infrared light sources 140 are the same as those of the substrate processing apparatus described using FIGS. 1 to 10 .

[0179] Above, the embodiments of the present invention are described with reference to the drawings. However, the present invention is not limited to the above embodiments, and can be implemented in various ways without departing from the scope of its main purpose. In addition, various inventions can be formed by appropriately combining the multiple components disclosed in the above embodiments. For example, several components can be deleted from all the components shown in the embodiments. Furthermore, the components in different embodiments can also be appropriately combined. For ease of understanding, the drawings mainly show each component in a schematic manner, and the thickness, length, number, spacing, etc. of each component shown in the drawings may also be different from the actual one for the convenience of making the drawings. In addition, the material, shape, size, etc. of each component shown in the above embodiments are examples, and there is no special limitation, and various changes can be made within the scope of the effect of the present invention.

[0180] For example, in the above embodiment, an example of applying the present invention to a substrate processing step to shorten the substrate processing time is shown, but the present invention is not limited to this. For example, when setting the time from the start of supplying the second processing liquid to the discharge pipe 240 to the start of supplying the second processing liquid to the downstream pipe 230 (for example, t2 seconds or more) (when making a process recipe), the present invention can also be applied. In this case, the process recipe making time can be shortened. In addition, as in the above embodiment, the usage of the second processing liquid can be reduced, thereby reducing the environmental load.

[0181] In addition, in the above-mentioned embodiment, as an example of supplying a plurality of treatment liquids to the nozzle 136, an example of switching the type of treatment liquid to supply to the nozzle 136 is shown, but the present invention is not limited to this. For example, hydrochloric acid aqueous solution (treatment liquid) may be supplied from the upstream pipe 210a to the common pipe 220, and hydrogen peroxide water (treatment liquid) may be supplied from the upstream pipe 210b to the common pipe 220, and a plurality of (here, two) treatment liquids may be mixed in the common pipe 220, and the plurality of treatment liquids may be supplied to the nozzle 136 in a mixed state. In this case, by applying the present invention, for example, the mixed state of the plurality of treatment liquids in the common pipe 220 can be confirmed.

[0182] In the above embodiment, an example is shown in which two upstream pipes (upstream pipe 210a and upstream pipe 210b) are connected to the common pipe 220, but the present invention is not limited thereto. For example, three or more upstream pipes may be connected to the common pipe 220.

[0183] In the above embodiment, only one downstream pipe 230 is provided to supply the processing liquid from the common pipe 220 to the nozzle 136, but the present invention is not limited thereto. For example, a plurality of downstream pipes 230 may be provided to supply the processing liquid from the common pipe 220 to the plurality of nozzles 136.

[0184] In the above embodiment, the processing liquid supply unit 200 is provided with a multi-valve, but the present invention is not limited thereto. For example, the processing liquid supply unit 200 may not include a multi-valve.

[0185] In the above embodiment, the upstream pipe 210a and the upstream pipe 210b are connected to the multi-valve 300, but the present invention is not limited thereto. For example, the upstream pipe 210a and the upstream pipe 210b may be connected to the multi-valve 300 after being merged with each other.

[0186] In the above embodiment, the downstream pipe 230 and the discharge pipe 240 are respectively connected to the multi-valve 300, but the present invention is not limited thereto. For example, a common pipe may be connected to the multi-valve 300, and the downstream pipe 230 and the discharge pipe 240 may be branched from the pipe. [Industrial Applicability]

[0187] The present invention is suitable for use in a substrate processing device and a substrate processing method.

[0188] 10A: Fluid cabinet 10B: Fluid tank 100: substrate processing device 101: Control Device 102: Control Department 104: Memory Department 110: Substrate processing unit 112: Chamber 120: substrate holding portion 121: Rotating base 122: Clamp member 123: Axis 124: Electric Motor 125: Shell 136: Nozzle (treatment liquid nozzle) 138: Mobile mechanism 138a: Arm 138b: shaft 138c: driving unit 140:Near infrared light source 140a:Near infrared light source 140b:Near infrared light source 150:Near infrared camera unit 180: Cup 200: Treatment liquid supply unit 210a: Upstream piping 210b: Upstream piping 211a: Upstream pipe 211b: Upstream pipe 220: Common piping 230: Downstream piping 231: Downstream pipe 240: Discharge pipe 241: discharge pipe 251a: Upstream valve 251b: Upstream valve 252: Downstream valve 253: Discharge valve 290: Treatment tank 300:Multiple valve 310: Base 311: Common flow path 312a: Upstream flow path 312b: Upstream flow path 312c: Downstream flow path 312d: Discharge flow path 321: Common piping department 322a: Upstream piping 322b: Upstream piping 322c: Downstream piping 322d: discharge piping Ax: Rotation axis CR: Center Robot IR:Transport Robot L1: 1st treatment liquid L2: Second treatment liquid LP: Loading Port S11: Steps S12: Steps S13: Steps S14: Steps S15: Step (Process of obtaining type information) S16: Step (process of utilizing near infrared irradiation, process of changing the peak wavelength of near infrared ray) S17: Step (Process of Generating Photographed Images) S18: Step (process for specifying the type of treatment liquid) S19: Steps S20: Steps S21: Steps SA: Steps SB: Step (process of rotating the substrate) SC: Step (process of supplying multiple treatment solutions) SD: Steps SE: Steps TW:Tower W: substrate Wa: upper surface Wb: Lower surface

Claims

1. A substrate processing apparatus comprising: a substrate holding section for holding a substrate; a processing liquid nozzle for supplying processing liquid to an upper surface of the substrate; a processing liquid supply section for supplying a plurality of processing liquids to the processing liquid nozzle; at least one near-infrared light source for irradiating an area including at least a portion of the processing liquid supply section with near-infrared light; a near-infrared imaging section for generating an image of the processing liquid in the area including at least a portion of the processing liquid supply section by receiving a component of the near-infrared light from the near-infrared light source that passes through the processing liquid supply section and / or is reflected; and a control section for controlling the processing liquid supply section and the near-infrared imaging section; wherein the control section identifies the type of processing liquid in the area including at least a portion of the processing liquid supply section based on the image, a brightness value, luminance, or image of a reference processing liquid.

2. A substrate processing apparatus comprising: a substrate holding section for holding a substrate; a processing liquid nozzle for supplying processing liquid to an upper surface of the substrate; a processing liquid supply section for supplying a plurality of processing liquids to the processing liquid nozzle; at least one near-infrared light source for irradiating an area including at least a portion of the processing liquid supply section with near-infrared light; a near-infrared imaging section for generating an image of the processing liquid irradiated by the near-infrared light from the near-infrared light source; and a control section for controlling the processing liquid supply section and the near-infrared imaging section; wherein the processing liquid supply section comprises: a plurality of upstream pipes for supplying the plurality of processing liquids respectively; a common pipe connected to the downstream end of the plurality of upstream pipes; and a downstream pipe whose upstream end is connected to the common pipe for supplying the processing liquid to the processing liquid nozzle; wherein the near-infrared light source irradiates an area including the common pipe with near-infrared light. Based on the captured images, the control unit identifies the type of the processing fluid within the area including the common piping.

3. A substrate processing apparatus comprising: a substrate holding section for holding a substrate; a processing liquid nozzle for supplying processing liquid to an upper surface of the substrate; a processing liquid supply section for supplying a plurality of processing liquids to the processing liquid nozzle; at least one near-infrared light source for irradiating an area including at least a portion of the processing liquid supply section with near-infrared light; a near-infrared imaging section for generating an image of the processing liquid irradiated by the near-infrared light from the near-infrared light source; and a control section for controlling the processing liquid supply section and the near-infrared imaging section; wherein the processing liquid supply section comprises: a plurality of upstream pipes for supplying the plurality of processing liquids respectively; a common pipe connected to the downstream ends of the plurality of upstream pipes; a downstream pipe whose upstream end is connected to the common pipe and supplies the processing liquid to the processing liquid nozzle; and a discharge pipe whose upstream end is connected to the common pipe and discharges the processing liquid. The aforementioned near-infrared light source irradiates the area including the aforementioned discharge pipe with near-infrared light, and the aforementioned control unit identifies the type of the aforementioned treatment liquid in the area including the aforementioned discharge pipe based on the aforementioned captured image.

4. A substrate processing apparatus comprising: a substrate holding section for holding a substrate; a processing liquid nozzle for supplying processing liquid to an upper surface of the substrate; a processing liquid supply section for supplying a plurality of processing liquids to the processing liquid nozzle; at least one near-infrared light source for irradiating an area including at least a portion of the processing liquid supply section with near-infrared light; a near-infrared imaging section for generating an image of the processing liquid irradiated by the near-infrared light from the near-infrared light source; and a control section for controlling the processing liquid supply section and the near-infrared imaging section; wherein the processing liquid supply section comprises: a plurality of upstream pipes for supplying the plurality of processing liquids respectively; a common pipe connected to the downstream end of the plurality of upstream pipes; a downstream pipe whose upstream end is connected to the common pipe and supplies the processing liquid to the processing liquid nozzle; and a discharge pipe whose upstream end is connected to the common pipe and discharges the processing liquid. The control unit controls the processing fluid supply unit, and supplies the first processing fluid to the processing fluid nozzle via the common pipe, then supplies the first processing fluid to the discharge pipe via the common pipe, and then supplies the second processing fluid to the discharge pipe via the common pipe. When it is detected based on the captured image that the first processing fluid or the second processing fluid has been switched in the common pipe or the discharge pipe, the second processing fluid is supplied to the processing fluid nozzle via the common pipe.

5. A substrate processing apparatus comprising: a substrate holding section for holding a substrate; a processing liquid nozzle for supplying processing liquid to an upper surface of the substrate; a processing liquid supply section for supplying a plurality of processing liquids to the processing liquid nozzle; at least one near-infrared light source for irradiating an area including at least a portion of the processing liquid supply section with near-infrared light; a near-infrared imaging section for generating an image of the processing liquid irradiated by the near-infrared light from the near-infrared light source; and a control section for controlling the processing liquid supply section and the near-infrared imaging section; wherein the at least one near-infrared light source is provided with a plurality of near-infrared light sources, the plurality of near-infrared light sources emitting near-infrared light having different peak wavelengths, the control section, based on the image, identifies the type of processing liquid in the area including at least a portion of the processing liquid supply section, acquires type information indicating the type of processing liquid, and, based on the acquired type information, changes the near-infrared light source irradiating the area including at least a portion of the processing liquid supply section.

6. The substrate processing apparatus of any one of claims 1 to 5, wherein the control unit controls the processing liquid supply unit to switch the type of processing liquid to the processing liquid nozzle for supply.

7. The substrate processing apparatus of any one of claims 1 to 5, wherein the control unit controls the processing liquid supply unit based on the result of a specific determination of the type of processing liquid.

8. The substrate processing apparatus of any one of claims 2, 3 and 4, wherein the aforementioned common piping includes a multi-port valve.

9. The substrate processing apparatus of claim 2, wherein the processing liquid supply unit has an upstream end connected to the common pipe and a discharge pipe for discharging the processing liquid.

10. A substrate processing method comprising the steps of: holding a substrate and rotating the substrate; supplying a plurality of processing liquids from a processing liquid supply section to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to an upper surface of the substrate; wherein the step of supplying the processing liquids comprises the steps of: irradiating an area including at least a portion of the processing liquid supply section with near-infrared light; generating an image of the processing liquids in the area including at least a portion of the processing liquid supply section by receiving the components of the near-infrared light that are transmitted through the processing liquid supply section and / or reflected; and identifying the type of processing liquid in the area including at least a portion of the processing liquid supply section based on the image, the brightness value, luminance, or image of a reference processing liquid.

11. A substrate processing method comprising the steps of: holding a substrate and rotating the substrate; supplying a plurality of processing liquids from a processing liquid supply unit to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to an upper surface of the substrate; the processing liquid supply unit comprising: a plurality of upstream pipes, each of which is supplied with the plurality of processing liquids; a common pipe connected to the downstream end of the plurality of upstream pipes; and a downstream pipe, the upstream end of which is connected to the common pipe, supplying the processing liquids to the processing liquid nozzles; the step of supplying the processing liquids comprising the steps of: irradiating an area including the common pipes with near-infrared light; generating an image of the processing liquids irradiated by the near-infrared light; and, based on the image, identifying the type of processing liquid in the area including the common pipes.

12. A substrate processing method comprising the steps of: holding a substrate and rotating the substrate; supplying a plurality of processing liquids from a processing liquid supply unit to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to an upper surface of the substrate; the processing liquid supply unit comprising: a plurality of upstream pipes, each of which is supplied with the plurality of processing liquids; a common pipe connected to the downstream end of the plurality of upstream pipes; a downstream pipe, the upstream end of which is connected to the common pipe and supplies the processing liquids to the processing liquid nozzle; and a discharge pipe, the upstream end of which is connected to the common pipe and discharges the processing liquids; the step of supplying the processing liquids comprises the steps of: irradiating an area including the discharge pipes with near-infrared light; generating an image of the processing liquids irradiated by the near-infrared light; and, based on the image, identifying the type of processing liquids in the area including the discharge pipes.

13. A substrate processing method comprising the steps of: holding a substrate and rotating the substrate; and supplying a plurality of processing liquids from a processing liquid supply unit to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to an upper surface of the substrate; the processing liquid supply unit comprising: a plurality of upstream pipes, each for which the plurality of processing liquids flow; a common pipe connected to the downstream ends of the plurality of upstream pipes; a downstream pipe, the upstream end of which is connected to the common pipe and supplies the processing liquids to the processing liquid nozzle; and a discharge pipe, the upstream end of which is connected to the common pipe and discharges the processing liquids; the step of supplying the processing liquids comprises the steps of: irradiating an area including at least a portion of the processing liquid supply unit with near-infrared light; generating an image of the processing liquids irradiated by the near-infrared light; and, based on the image, identifying the type of processing liquid within the area including at least a portion of the processing liquid supply unit; in the step of supplying the processing liquids, After the first processing fluid is supplied to the processing fluid nozzle via the common pipe, the first processing fluid is supplied to the discharge pipe via the common pipe. Then, the second processing fluid is supplied to the discharge pipe via the common pipe. When it is detected based on the captured image that the first processing fluid or the second processing fluid has been switched in the common pipe or the discharge pipe, the second processing fluid is supplied to the processing fluid nozzle via the common pipe.

14. A substrate processing method comprising the steps of: holding a substrate and rotating the substrate; supplying a plurality of processing liquids from a processing liquid supply unit to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to an upper surface of the substrate; wherein the step of supplying the processing liquids comprises the steps of: irradiating an area including at least a portion of the processing liquid supply unit with near-infrared light; generating an image of the processing liquid irradiated by the near-infrared light; and, based on the image, identifying the type of the processing liquid in the area including at least a portion of the processing liquid supply unit; acquiring type information indicating the type of the processing liquid; and, based on the acquired type information, changing the peak wavelength of the near-infrared light irradiating the area including at least a portion of the processing liquid supply unit.

15. The substrate processing method of any one of claims 10 to 14, wherein in the process of supplying the processing liquid, the type of the processing liquid is switched from the processing liquid supply unit to the processing liquid nozzle for supply.

16. A substrate processing method according to any one of claims 10 to 14, wherein in the process of supplying the processing liquid, the processing liquid supply unit is controlled based on the result of a specific determination of the type of processing liquid.

17. The substrate processing method of any one of claims 11 to 13, wherein the aforementioned common piping includes a multi-port valve.

18. The substrate processing method of claim 11, wherein the processing liquid supply unit has an upstream end connected to the common pipe and a discharge pipe for discharging the processing liquid.

Images