Gas supply system and method

Abstract

A gas supply system according to one embodiment may include: a supply line configured to connect a gas container to a process article; a purge line connected to a first point of the supply line and connected to a purge gas supply unit for supplying purge gas; a first exhaust line connected to a second point of the supply line and connecting the supply line to an exhaust unit applying negative pressure; and a second exhaust line connected to a third point of the purge line and connecting the purge line to a fourth point of the first exhaust line. In one embodiment, the first point of the supply line may be closer to the gas container than the second point.

Description

Technical Field

[0001] The following embodiments relate to a gas supply system and method. Prior Technology

[0002] In semiconductor or electronic device manufacturing processes, various types of gases may be supplied. During the process of changing gas containers after the semiconductor or electronic device manufacturing process, the purge gas may contain moisture when purging the supply tube. This moisture may be absorbed into the supply tube when the purge gas is supplied and react with corrosive gases, thus corroding the supply tube. Therefore, a process is needed to remove the moisture contained in the purge gas.

[0003] Traditional purging methods involve repeatedly introducing purge gas into the gas pipeline to dilute the gas concentration and then applying negative pressure to expel the purge gas. In this process, when the purge gas is introduced, moisture from impurities in the gas may repeatedly flow into the pipeline and adhere to the pipes or components, leading to corrosion or component failure. Therefore, a purging method or a gas supply system equipped with a purging system is needed to address this problem.

[0004] The above description is based on information obtained in the course of conceiving this case, or information that was already available at the time, and is not necessarily technology that was publicly known prior to the submission of this case. Summary of the Invention

[0005] [Technical Issues] One embodiment aims to provide a gas supply system for performing a purging process that can prevent gas pipeline corrosion and / or component failure.

[0006] One embodiment aims to provide a gas supply method for performing a purging process, which can prevent gas pipeline corrosion and / or component failure.

[0007] [Technical Methods] A gas supply system according to one embodiment may include: a supply line configured to connect a gas container to a process article; a purge line connected to a first point of the supply line and connected to a purge gas supply unit for supplying purge gas; a first exhaust line connected to a second point of the supply line and connecting the supply line to an exhaust unit applying negative pressure; and a second exhaust line connected to a third point of the purge line and connecting the purge line to a fourth point of the first exhaust line.

[0008] In one embodiment, a first point of the supply line is closer to the gas container than a second point, wherein the supply line may be connected to: a supply pressure sensor configured to detect the internal pressure of the supply line; and a first supply valve configured to control the flow rate of fluid flowing through the supply line.

[0009] In one embodiment, the purge line may be connected to: a first purge valve connected between the first point and the third point and configured to control the flow rate of fluid flowing through the purge line; a second purge valve disposed between the first purge valve and the third point and configured to control the flow rate of fluid flowing through the purge line; a purge pressure sensor disposed between the first purge valve and the second purge valve and configured to detect the internal pressure of the purge line; a first regulator disposed between the third point and the purge gas supply unit and configured to regulate the internal pressure of the purge line; and a flow rate regulating device disposed between the first regulator and the third point.

[0010] In one embodiment, the first exhaust line may be connected to: a first exhaust valve disposed between the second point and the fourth point; and a second exhaust valve disposed between the fourth point and the exhaust section. In one embodiment, the second exhaust line may be connected to: a third exhaust valve configured to regulate gas supply; and an exhaust pressure sensor disposed between the third exhaust valve and the fourth point and detecting the internal pressure of the line.

[0011] In one embodiment, the purge line may be connected to: a first purge valve connected between the first point and the third point and configured to control the flow rate of fluid flowing through the purge line; a fourth purge valve disposed between the third point and the purge gas supply unit and configured to control the flow rate of fluid flowing through the purge line; a purge pressure sensor disposed between the first purge valve and the fourth purge valve and configured to detect the internal pressure of the purge line; a first regulator disposed between the fourth purge valve and the purge gas supply unit and configured to regulate the internal pressure of the purge line; and a flow regulating device disposed between the first regulator and the fourth purge valve.

[0012] In one embodiment, the supply line may also be connected to a second regulator configured to control the pressure of the supply line.

[0013] In one embodiment, the supply line may also be connected to a second supply valve configured to control the flow rate of the supply line.

[0014] In one embodiment, the supply line may also be connected to a supply screening program, which is connected to the supply line.

[0015] In one embodiment, the first exhaust line may also be connected to a first exhaust valve, which is disposed between the second point and the fourth point.

[0016] In one embodiment, the purge line may also be connected to a fourth purge valve connected to the rear end of the flow regulating device.

[0017] A gas supply method according to an embodiment of a gas supply system may include the following steps: opening a second exhaust valve; continuously applying negative pressure through the exhaust section; opening a first exhaust valve and a second supply valve; opening a third exhaust valve and a second purge valve; closing the third exhaust valve and opening the first purge valve; and repeatedly opening and closing a fourth purge valve.

[0018] In one embodiment, the following step may also be included: after opening the second exhaust valve, using the exhaust pressure sensor to detect whether a vacuum exists.

[0019] In one embodiment, the following steps may also be included: detecting the presence of a vacuum using the exhaust pressure sensor, and closing the first exhaust valve or all valves when the pressure change range is less than or equal to a set value within a certain time.

[0020] In one embodiment, the following step may also be included: venting the second exhaust line while the first purge valve is closed.

[0021] In one embodiment, the method may further include the step of venting the first exhaust line.

[0022] A gas supply method via a gas supply system according to one embodiment may include the following steps: closing all valves and supplying gas; venting the first exhaust line and the supply line while the first supply valve, the fourth purge valve, and the first purge valve are closed; venting the second exhaust line and the purge line to a vacuum state; and after closing the second exhaust line, performing pulse venting between the first pressure and the second pressure using the flow regulating device of the purge line and the fourth purge valve.

[0023] In one embodiment, the first pressure may be a pressure that makes the Knudsen number based on the pipe diameter less than 1, and the second pressure may be a pressure that is less than or equal to the saturated vapor pressure of water in the pipe, so as to cause water molecules in the pipe to evaporate.

[0024] [Invention Effects] According to one embodiment, a gas supply system and method can purge the process pipeline with purge gas before / after injecting process gas into the process pipeline.

[0025] A gas supply system and method according to one embodiment can reduce or prevent the inflow of impurities when injecting purge gas.

[0026] A gas supply system and method according to one embodiment can reduce or prevent pipeline corrosion that may occur during repeated purging processes.

[0027] According to one embodiment, a gas supply system and method can maximize the purging effect by configuring the purge valves and exhaust valves connected to the process pipeline in a single row without any stagnant sections.

[0028] However, the effects of the gas supply system and gas supply method according to one embodiment are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the following description. Simple Explanation of the Diagram

[0029] The following accompanying drawings illustrate preferred embodiments of the invention and, together with the detailed description of the invention, serve to further understand the technical concept of the invention. Therefore, the invention should not be construed as being limited to the matters described in the drawings.

[0030] Figure 1 is a schematic diagram illustrating a gas supply system according to an embodiment.

[0031] Figure 2 is a schematic diagram illustrating a gas supply system according to the prior art. Implementation

[0032] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. It should be noted that, regarding the element symbols assigned to the constituent elements in the drawings, even if the same constituent elements are shown in different drawings, the same element symbols will be used to represent the same constituent elements whenever possible. Furthermore, in the process of describing the embodiments, detailed descriptions of relevant well-known technologies will be omitted when it is determined that a detailed explanation of such technologies would unnecessarily obscure the embodiments.

[0033] Furthermore, in the description of the elements in the embodiments, terms such as first, second, A, B, (a), (B) may be used. These terms are only used to distinguish one constituent element from another, and the nature, sequence, or order of the elements is not limited by these terms. When a constituent element is described as "connected," "coupled," or "in contact" with another constituent element, it should be understood that the constituent element can be directly connected to or in contact with the other constituent element, or that the other constituent element is "connected," "coupled," or "in contact" with each constituent element.

[0034] Elements included in one embodiment and elements having common functions may be described using the same names in another embodiment. Unless otherwise stated, the description of one embodiment may be applied to other embodiments, and detailed descriptions will be omitted to the extent of repetition.

[0035] Figure 1 is a schematic diagram showing a gas supply system 1 according to an embodiment, and Figure 2 is a schematic diagram showing a gas supply system according to the prior art.

[0036] Referring to FIG1, a gas supply system 1 according to one embodiment can receive process gas from a gas container G and supply the process gas to a process object R. In one embodiment, the gas supply system 1 can allow gas to flow along a predetermined flow path inside the system, control the gas flow through a valve, and supply at least a portion of the supplied gas to the object being supplied.

[0037] In one embodiment, the supply object may include a substrate used in a semiconductor manufacturing process or a semiconductor device including a substrate, or a display included in an electronic device. However, the supply object is not limited to these and may include any object to which process gases can be supplied.

[0038] In the following text, when describing the components included in the gas supply system 1, "front end" and "rear end" may be defined according to the flow direction of the process gas. For example, "front end" may refer to the point where the process gas flows in based on the flow path of the process gas, while "rear end" may refer to the point where the process gas flows out.

[0039] A gas supply system 1 according to one embodiment may include a supply line 100, a purge line 200, a first exhaust line 310, and a second exhaust line 320. In one embodiment, the supply line 100 may be connected to the purge line 200 at a first point P1 on the supply line 100. In one embodiment, the supply line 100 may be connected to the first exhaust line 310 at a second point P2 on the supply line 100. In one embodiment, the purge line 200 may be connected to the second exhaust line 320 at a third point P3 on the purge line 200. In one embodiment, the first exhaust line 310 may be connected to the second exhaust line 320 at a fourth point P4 on the first exhaust line 310. In other words, the first point P1 to the fourth point P4 represent points where the pipelines branch off.

[0040] In one embodiment, the supply line 100 can provide a path for process gas to flow from a gas container G to a process object R. In one embodiment, the supply line 100 may include a conduit through which fluid can flow. In one embodiment, one end of the supply line 100 may be connected to the gas container G, and the other end may be connected to the process object R. For example, the supply line 100 may connect the gas container G to the process object R, such that the gas container G and the process object R are in fluid communication with each other. In this case, the process gas can flow from the gas container G into the supply line 100, flow from the front end of the supply line 100 to the rear end, and discharge to the process object R.

[0041] In one embodiment, the supply pressure sensor 1016, the first supply valve 1011, the second supply valve 1012, the second regulator 1013, and the supply screening program 1015 can be connected to the supply line 100.

[0042] In one embodiment, the supply pressure sensor 1016 can detect the pressure generated by the fluid inside the supply line 100. For example, the supply pressure sensor 1016 can detect whether a vacuum exists inside the supply line 100. In one embodiment, the supply pressure sensor 1016 can be connected to any point in the supply line 100. For example, when the inside of the supply line 100 is evacuated, the supply pressure sensor 1016 can detect whether the supply line 100 is airtight.

[0043] In one embodiment, the first supply valve 1011 can control the flow rate of fluid flowing through the supply line 100. In one embodiment, the first supply valve 1011 can be connected to the supply line 100. In one embodiment, the first supply valve 1011 can selectively open or close the supply line 100. For example, when the first supply valve 1011 is open, the supply line 100 at the front and rear ends of the first supply valve 1011 can be connected in fluid communication. In this case, fluid can flow from the front end of the first supply valve 1011 to the rear end of the first supply valve 1011. For example, when the first supply valve 1011 is closed, the supply line 100 at the front and rear ends of the first supply valve 1011 can be sealed and separated, preventing fluid flow. In this case, fluid will not flow from the front end of the first supply valve 1011 to the rear end of the first supply valve 1011. In other words, the supply line 100 can be separated from the first supply valve 1011, preventing fluid from flowing through the supply line 100. In one embodiment, the first supply valve 1011 may be connected to the rear end of the supply pressure sensor 1016. However, it should be noted that these connection locations are non-limiting examples and can be modified and changed. In one embodiment, the first supply valve 1011 may partially open or partially close the supply line 100 between open and closed states. For example, when the first supply valve 1011 is partially open or partially closed, the supply line 100 may be in fluid communication from the first supply valve 1011. In this case, the fluid flow may be relatively less compared to the open state.

[0044] In one embodiment, the second regulator 1013 can control the pressure inside the supply line 100. In one embodiment, the second regulator 1013 can be connected to the supply line 100. In one embodiment, the second regulator 1013 can control the pressure inside the supply line 100 by regulating the pressure of the fluid flowing through the supply line 100. In one embodiment, the second regulator 1013 can be located downstream of the supply pressure sensor 1016. In one embodiment, the second regulator 1013 can be located upstream of the first supply valve 1011. For example, the second regulator 1013 can regulate the flow rate of the fluid flowing through the first supply valve 1011 and applying pressure. In this case, the pressure inside the supply line 100 downstream of the second regulator 1013 can be controlled. However, it should be noted that these connection locations are non-limiting examples and can be modified and changed. In one embodiment, the supply screening program 1015 can filter the fluid flowing inside the supply line. In one embodiment, the supply screening program 1015 can be connected to a point in the supply line 100.

[0045] In one embodiment, the purge line 200 can provide a path for purge gas to flow from the purge gas supply P to the supply line 100 to purge the interior of the supply line 100. In one embodiment, one end of the purge line 200 can be connected to the purge gas supply P, and the other end can be connected to a first point P1 of the supply line 100. In this case, the first point P1 can be any point on the supply line 100. In this case, the first point P1 can be any point in the supply line 100 adjacent to the gas container G. In this case, the first point P1 can be located adjacent to the gas container G, thereby minimizing the dead zone where purge gas is not supplied to the supply line 100. For example, the purge line 200 can connect the purge gas supply P to the supply line 100, so that the purge gas supply P and the supply line 100 are in fluid communication. In this case, the purge gas can flow from the purge gas supply P into the purge line 200, and can flow from the front end to the rear end of the purge line 200, and into the interior of the supply line 100.

[0046] In one embodiment, the first purge valve 2011, the second purge valve 2012, the third purge valve 2021, the purge pressure sensor 2013, the first regulator 2023, and the flow regulating device 2024 can be connected to the purge line 200. In another embodiment, the fourth purge valve 2022 and the second check valve can be further connected to the purge line 200.

[0047] In one embodiment, the first purge valve 2011 can control the flow rate of fluid flowing through the purge line 200. In one embodiment, the first purge valve 2011 can be connected to the purge line 200. In one embodiment, the first purge valve 2011 can selectively open or close the purge line 200. For example, when the first purge valve 2011 is open, the front and rear purge lines 200 of the first purge valve 2011 can be connected in fluid communication. In this case, fluid can flow from the front end of the first purge valve 2011 to the rear end of the first purge valve 2011. For example, when the first purge valve 2011 is closed, the front and rear purge lines 200 of the first purge valve 2011 can be sealed and separated, preventing fluid flow. In this case, fluid cannot flow from the front end of the first purge valve 2011 to the rear end of the first purge valve 2011. In other words, the purge line 200 can be disconnected from the first purge valve 2011, preventing fluid from flowing through it. In one embodiment, the first purge valve 2011 can be connected to a point between a first point P1 and a third point P3. Here, the third point P3 refers to any point on the purge line 200 to which the second exhaust line 320, described below, is connected. In this case, the first purge valve 2011 can control the flow rate of fluid passing through the third point P3 and flowing to the first point P1. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed. In one embodiment, the first purge valve 2011 can partially open or partially close the purge line 200 between open and closed states. For example, when the first purge valve 2011 is partially open or partially closed, the purge line 200 can be fluidly connected from the first purge valve 2011. In this case, only a small amount of fluid can move compared to the open state.

[0048] In one embodiment, the second purge valve 2012 can control the flow rate of fluid flowing through the purge line 200. In describing the second purge valve 2012, to avoid repetition, for configurations substantially identical to the first purge valve 2011, the description of the first purge valve 2011 will be used to the extent that it does not conflict with the first purge valve 2011. In one embodiment, the second purge valve 2012 can be located between the first purge valve 2011 and a third point P3. In this case, the second purge valve 2012 can control the flow rate of fluid passing through the third point P3 and flowing through the purge line 200. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed. In one embodiment, the second purge valve 2012 can open and close independently of the first purge valve 2011.

[0049] In one embodiment, the third purge valve 2021 can control the flow rate of fluid flowing through the purge line 200. In describing the third purge valve 2021, to avoid repetition, for configurations substantially the same as the first purge valve 2011, the description of the first purge valve 2011 will be used to the extent that it does not conflict with the first purge valve 2011. In one embodiment, the third purge valve 2021 can be located between the third point P3 and the purge gas supply P. In this case, the third purge valve 2021 can control the flow rate of fluid flowing from the purge gas supply P to the rear end of the third purge valve 2021. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed. In one embodiment, the third purge valve 2021 can open and close independently of the first purge valve 2011 and the second purge valve 2012.

[0050] In one embodiment, the purge pressure sensor 2013 can detect the pressure inside the purge line 200. For example, the purge pressure sensor 2013 can detect whether the purge line 200 is in a vacuum state. In one embodiment, the purge pressure sensor 2013 can be disposed between the first purge valve 2011 and the second purge valve 2012. For example, the purge pressure sensor 2013 can detect the pressure inside the purge line 200 in the portion between the first purge valve 2011 and the second purge valve 2012. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed.

[0051] In one embodiment, the first regulator 2023 can regulate the pressure inside the purge line 200. For example, the first regulator 2023 can regulate the flow rate of the purge gas flowing inside the purge line 200. In this case, the pressure inside the purge line 200 can vary according to the flow rate of the purge gas. In one embodiment, the first regulator 2023 can be located between the third purge valve 2021 and the purge gas supply unit P. In this case, the purge gas that has passed through the third purge valve 2021 can pass through the first regulator 2023. In this case, the first regulator 2023 can control the pressure inside the purge line 200 downstream of the first regulator 2023 by controlling the flow rate of the purge gas that has passed through the third purge valve 2021. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed.

[0052] In one embodiment, the flow regulating device 2024 can control the flow rate of the purge gas. For example, the flow regulating device 2024 can be connected to the purge line 200 to reduce the flow rate of the purge gas. For example, the flow regulating device 2024 can control the flow rate of the purge gas so that a small amount of purge gas can be injected into the purge line 200. For example, when the purge gas flows into the purge line 200, the flow regulating device 2024 can regulate the flow rate of the purge gas flowing into the purge line 200 so that the pressure in the line is less than or equal to the saturated vapor pressure of water. At this time, the pressure in the line can be controlled to be less than or equal to the saturated vapor pressure of water by the first regulator 2023 and the flow regulating device 2024. In other words, the flow regulating device 2024 and the first regulator 2023 can jointly regulate the flow rate of the gas in the line, thereby controlling the pressure in the line below the saturated vapor pressure of water. For example, the flow regulating device 2024 can be located between the third purge valve 2021 and the fourth purge valve 2022. For example, the flow regulating device 2024 can be located upstream of the first purge valve 2011 and the second purge valve 2012. In this case, pulse venting can be performed by adjusting the opening and closing of the first purge valve 2011 and the second purge valve 2012. For example, when the pressure inside the pipeline is lower than the saturated vapor pressure of water, the water inside the pipeline will actively evaporate. In this case, the evaporated water inside the pipeline can be discharged to the outside of the pipeline. In one embodiment, the flow regulating device 2024 may include a portion of the pipeline whose diameter is smaller than the internal diameter of the purge pipeline 200. For example, the flow regulating device 2024 may include an orifice, a variable orifice, a mass flow controller (MFC), a bleed valve, a metering valve, or a flow meter. For example, the diameter of the flow regulating device 2024 may be 0.2 mm. However, this is merely an example, and the flow regulating device 2024 is not limited thereto. It should be noted that those skilled in the art can make various modifications and variations to the embodiments described herein to regulate the flow rate of the purge gas.

[0053] In one embodiment, the fourth purge valve 2022 can control the flow rate of fluid flowing through the purge line 200. When describing the fourth purge valve 2022, the description of the first purge valve 2011 can be applied thereto, provided it does not conflict with the description of the first purge valve 2011. In one embodiment, the fourth purge valve 2022 can control the flow rate of fluid flowing to the flow regulating device 2024. For example, when the fourth purge valve 2022 is open, the flow rate of the fluid can be regulated by the flow regulating device 2024. In one embodiment, pulse purging can be performed, wherein purging is performed by repeatedly opening and closing the fourth purge valve 2022. In one embodiment, pulse purging can be performed to purge the supply line 100. For example, pulse purging can be performed without breaking the vacuum. In this case, purging can be performed so that a negative pressure can be continuously applied to continuously maintain the vacuum in the pipeline. In one embodiment, the fourth purge valve 2022 can be located between the third point P3 and the purge gas supply section P, while the second purge valve 2012 can be omitted. In this configuration, the purge pressure sensor 2013 can be positioned between the third point P3 and the fourth purge valve 2022. Alternatively, the purge pressure sensor 2013 can be positioned between the first purge valve 2011 and the fourth purge valve 2022. In another configuration, the first regulator 2023 can be positioned between the fourth purge valve 2022 and the purge gas supply unit P. However, this is merely an example, and the types and arrangements of components installed in the pipeline are not limited to these.

[0054] In one embodiment, while maintaining a vacuum in process line 100, a third purge valve 2021 in purge line 200 can be opened, and the pressure of the first regulator 2023 can be adjusted (e.g., 10 to 20 psi), after which a fourth purge valve 2022 can be opened. In one embodiment, when the purge gas passes through flow regulating device 2024 (e.g., 0.2 mm in diameter), the flow rate of the purge gas can be reduced, and a second purge valve 2012 and a first purge valve 2011 can be opened to allow purge gas to flow into process line 100. In this case, purge can be performed using the first purge valve 2011 by repeated pulse purging (e.g., opening for 5 seconds and closing for 1 second). In one embodiment, after purging is completed, the first purging valve 2011 can be closed, and the process line 100 can be vented to a vacuum state. Then, the second venting valve 3102 can be closed, and the vacuum level can be measured using a vacuum sensor (VT) 3002. After a certain period of time (e.g., 10 minutes), the change in vacuum pressure in the process line 100 can be detected to determine whether purging is complete.

[0055] In one embodiment, the second check valve 2026 can control the fluid flow direction so that the fluid can only flow in one direction to prevent backflow. For example, the second check valve 2026 can control the fluid flow direction so that the fluid can only flow in the direction from the front end to the rear end based on the second check valve 2026. For example, the fluid may include purge gas.

[0056] In one embodiment, the first exhaust line 310 can provide a path for fluid in the supply line 100 to flow to the exhaust section V to discharge fluid from the supply line 100. In one embodiment, the first exhaust line 310 can connect the exhaust section V to the supply line 100 to apply negative pressure to the supply line 100. For example, one end of the first exhaust line 310 can be connected to a second point P2 of the supply line 100, and the other end can be connected to the exhaust section V. In one embodiment, the exhaust section V can include a pump that applies negative pressure. For example, the exhaust section V can create a vacuum state inside the line by applying negative pressure. In this case, the exhaust section V can maintain a vacuum state inside the line by continuously applying negative pressure. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed.

[0057] In one embodiment, the first exhaust line 310 may be connected to the first exhaust valve 3101, the second exhaust valve 3102 and the first check valve 3103.

[0058] In one embodiment, the first exhaust valve 3101 can control the flow rate of fluid flowing through the first exhaust line 310. In one embodiment, the first exhaust valve 3101 can be connected to the first exhaust line 310. In one embodiment, the first exhaust valve 3101 can selectively open or close the first exhaust line 310. For example, when the first exhaust valve 3101 is open, the front end of the first exhaust line 310 and the rear end of the first exhaust valve 3101 can be connected in fluid communication. At this time, fluid can flow from the front end of the first exhaust valve 3101 to the rear end of the first exhaust valve 3101. For example, when the first exhaust valve 3101 is closed, the first exhaust line 310 can be sealed and separated at the front end and the rear end of the first exhaust valve 3101, so that fluid cannot flow. At this time, fluid cannot flow from the front end of the first exhaust valve 3101 to the rear end of the first exhaust valve 3101. In other words, the first exhaust line 310 can be separated from the first exhaust valve 3101, so that fluid cannot flow through the first exhaust line 310. In one embodiment, the first vent valve 3101 may be located between the second point P2 and the fourth point P4. In this case, the first vent valve 3101 can control the flow rate of fluid passing through the second point P2 and flowing to the fourth point P4. However, it should be noted that these connection positions are merely non-limiting examples and can be modified and changed.

[0059] In one embodiment, the second exhaust valve 3102 can control the flow rate of fluid flowing through the first exhaust line 310. When describing the second exhaust valve 3102, to avoid repetition, for configurations substantially identical to the first exhaust valve 3101, the description of the first exhaust valve 3101 will be used to the extent that it does not conflict with the first exhaust valve 3101. In one embodiment, the second exhaust valve 3102 can be located between the fourth point P4 and the exhaust section V. In this case, the second exhaust valve 3102 can control the flow rate of fluid passing through the fourth point P4 and flowing through the first exhaust line 310. In one embodiment, the second exhaust valve 3102 can open and close independently of the first exhaust valve 3101. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed.

[0060] In one embodiment, the first check valve 3103 can control the flow direction of the fluid, so that the fluid flows only in one direction to prevent backflow. For example, the first check valve 3103 can control the flow direction of the fluid, so that the fluid can only flow from the front end to the rear end based on the first check valve 3103.

[0061] In one embodiment, the second exhaust line 320 can provide a path for fluid in the purge line 200 to flow to the exhaust section V, thereby discharging the fluid from the purge line 200. In one embodiment, the second exhaust line 320 can connect the exhaust section V to the purge line 200 to apply negative pressure to the purge line 200. For example, one end of the second exhaust line 320 can be connected to a third point P3 of the purge line 200, while the other end can be connected to the exhaust section V. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed.

[0062] In one embodiment, the third exhaust valve 3201 may be connected to the second exhaust line 320.

[0063] In one embodiment, the third vent valve 3201 can control the flow rate of fluid flowing through the second vent line 320. In one embodiment, the third vent valve 3201 can be connected to the second vent line 320. The descriptions of the first vent valve 3101 and the second vent valve 3102 can be applied to the description of the third vent valve 3201, provided they do not conflict with them. In one embodiment, the third vent valve 3201 can be connected to the point between the third point P3 and the fourth point P4. In this case, the third vent valve 3201 can control the flow of fluid through the portion between the third point P3 and the fourth point P4. In other words, the third vent valve 3201 can control the fluid communication state between the third point P3 and the fourth point P4.

[0064] In one embodiment, an exhaust pressure sensor (not shown) can detect the pressure inside the second exhaust line 320. For example, the exhaust pressure sensor can be connected to the second exhaust line 320. For example, the exhaust pressure sensor can detect whether the second exhaust line 320 is in a vacuum state. In one embodiment, the exhaust pressure sensor can be connected between the third exhaust valve 3201 and the fourth point P4. For example, the exhaust pressure sensor can detect the pressure in the portion between the third exhaust valve 3201 and the fourth point P4. However, it should be noted that these connection positions are non-limiting examples and can be modified and changed.

[0065] Referring to Figure 2, a conventional gas supply system may include a supply line 700, a purge line 800, and an exhaust line 900. In describing the conventional gas supply system of Figure 2, to avoid repetitive descriptions of configurations substantially identical or similar to the gas supply system of Figure 1, the description in Figure 1 will be applied.

[0066] The conventional gas supply system's supply line 700 can be connected to a supply pressure sensor 7016, a first supply valve 7011, a second supply valve 7012, a second regulator 7013, and a supply screening program 7015. The conventional gas supply system's purge line 800 can be connected to a first purge valve 8011, a second purge valve 8012, a third purge valve 8021, a purge pressure sensor 8013, a fourth purge valve 8022, and a second check valve 8026. The conventional gas supply system's exhaust line 900 can be connected to a first exhaust valve 9101 and a second exhaust valve 9102. In one embodiment, the conventional gas supply system can dilute the gas in the supply line 700 by injecting purge gas into the supply line 700 through the purge line 800, and can discharge the gas from the supply line 700 through the exhaust line 900, thereby reducing the concentration of harmful gases in the supply line 700. However, when a conventional gas supply system pressurizes purge gas into the supply line 700, moisture from impurities in the purge gas may flow into the supply line 700 and be absorbed into the pipes or components of the gas supply system, reacting with oxidizing or corrosive gases, thus causing corrosion or malfunction.

[0067] Conversely, according to one embodiment, the gas supply system 1 can be configured such that there is no stagnation when the fluid flows between the first purge valve 2011 and the first exhaust valve 3101. For example, a stagnation may include elements involved in the fluid flow, such as a valve controlling the fluid flow, a regulator controlling the fluid pressure, or a flow control device 2024 controlling the fluid flow rate. For example, when the gas supply system 1 is configured such that there is no stagnation in the fluid flowing between the first purge valve 2011 and the first exhaust valve 3101, the purging effect in that section can be maximized.

[0068] In conventional gas supply systems, a vacuum is created between the first purge valve 8011 and the second purge valve 8012 when supplying process gases to prevent purge gas from mixing with the process gases. However, with increased usage time, trace amounts of oxygen and moisture may flow into the piping between the first purge valve 8011 and the second purge valve 8012. Furthermore, trace amounts of purge gas may flow into the supply line, potentially causing the process gas and purge gas to mix. For example, trace amounts of oxygen and moisture flowing into the piping between the first purge valve 8011 and the second purge valve 8012 may mix with the purge gas when it is injected and flow into the supply line 700, potentially leading to pipe corrosion and / or component failure.

[0069] Conversely, according to one embodiment, the gas supply system 1 can discharge trace amounts of purge gas, oxygen, or moisture present in the purge line 200 via a third exhaust valve 3201 before injecting purge gas. In this case, by preventing oxygen or moisture from flowing into the supply line 100, pipeline corrosion and / or component failure can be reduced or prevented. It should be noted that the differences between the gas supply system 1 described herein and conventional gas supply systems are non-limiting examples.

[0070] It should be noted that the connection relationship of the individual gas supply line 100 described herein is an example. Those skilled in the art can change the connection relationship according to the installation location of the gas supply system 1 and other environments. They can also change the presence, connection location, quantity and type of valves and sensors connected to the supply line 100.

[0071] According to one embodiment, the gas supply system 1 can purge the supply line 100 using a gas supply method after changing the gas container and before supplying process gas to the supply line 100. The gas supply method according to one embodiment can start from an initial state where all valves are closed. In one embodiment, the gas supply method may perform the step of opening the second exhaust valve 3102 and checking for any abnormalities in the vacuum pump using a pressure sensor. Subsequently, the step of opening the first exhaust valve 3101 and the second supply valve 1012 and venting gas may be performed. Subsequently, the step of opening the third exhaust valve 3201 and the second purge valve 2012 and venting gas may be performed. The order of opening the first exhaust valve 3101 and the second supply valve 1012 and venting gas may be alternated with the step of opening the third exhaust valve 3201 and the second purge valve 2012 and venting gas. Subsequently, pulse venting may be performed, wherein the third exhaust valve 3201 is closed, the first purge valve 2022 is open, and the fourth purge valve 2022 repeatedly opens and closes.

[0072] In one embodiment, by maintaining the pressure between the second purge valve 2012 and the first purge valve 2011 lower than the pressure inside the supply line 100, the inflow of gas from the purge line 200 into the supply line 100 can be reduced or prevented. In other words, since gas flows from a high-pressure area to a low-pressure area, impurities such as oxygen or moisture may not flow from the pipe between the second purge valve 2012 and the first purge valve 2011 (where the pressure is relatively lower than that of the supply line 100) to the supply line 100, which has a relatively higher pressure, but instead flow from the supply line 100 into the pipe between the second purge valve 2012 and the first purge valve 2011. Therefore, when the pipe between the second purge valve 2012 and the first purge valve 2011 is kept under negative pressure, gases capable of reacting with oxidizing gases can flow into the pipe between the second purge valve 2012 and the first purge valve 2011, leading to corrosion of the pipe and components. Furthermore, during the purging of the first purge valve 2011 and the supply line 100, the purge gas may mix with moisture, oxygen, etc., flowing into it, and may flow into the supply line 100 to react with each other. For example, gases that react with moisture or oxygen may include hydrogen fluoride (HF), hydrogen chloride (HCl), or hydrogen bromide (HBr). In this case, corrosion of pipes and components may occur. To prevent this, venting can be performed on both sides of the first purge valve 2011. In other words, the gas supply method can open the second purge valve 2012 while the first purge valve 2011 is closed, and vent gas can be performed on both sides of the first purge valve 2011 through the second vent line 320. In addition, the gas supply method can also open the second vent valve 3102, the first vent valve 3101, and the second supply valve 1012 to vent gas from the supply line 100.

[0073] In one embodiment, nitrogen or trace amounts of moisture can be purged using viscous purging. For example, viscous purging can refer to purging using a viscous flow. In one embodiment, the gas supply method can effectively remove moisture molecules or oxidizing gases from the pipeline by causing the purge gas molecules to collide with oxidizing gas and moisture molecules within the pipeline through viscous purging; or it can evaporate moisture mixed in the purge gas or liquid moisture within the pipeline by maintaining the pressure within the pipeline below saturated vapor during viscous purging, thereby discharging the moisture along with the purge gas.

[0074] In one embodiment, the gas supply method can control the pressure and flow rate of the purge gas while supplying it. For example, the gas supply method can adjust the pressure and flow rate of the purge gas simultaneously with its supply, ensuring that the pressure and flow rate remain within a specific range. For example, the gas supply method can adjust the pressure and flow rate of the purge gas using multiple pressure and flow regulating components located in the purge pipeline. In one embodiment, moisture can be effectively removed in a short time by increasing the number of supply / cut-off cycles and the purge time of the purge gas. In one embodiment, the lower limit of the pressure of the purge gas supplied by the gas supply method can be the pressure and flow rate suitable for viscous purging. In one embodiment, the pressure and flow rate of the purge gas flowing in a viscous manner can be determined based on the pipe diameter. In one embodiment, the lower limit of the pressure and flow rate can be determined by the Knudsen number K. For example, the Knudsen number K can be the mean free movement distance of the gas divided by the representative length of the object (e.g., the pipe diameter). For example, when the Knudsen number K is less than 1, the number of collisions between purge gas molecules may increase. For example, the lower limits of pressure and flow rate can be greater than or equal to the pressure and flow rate that make the Knudsen number K less than 1 according to the predetermined diameter of the pipe. In one embodiment, the upper limits of pressure and flow rate of the purge gas supplied by the gas supply method can be less than or equal to the saturated vapor pressure of water in the pipe to allow water molecules adsorbed on the inner wall of the pipe to evaporate. For example, the type of viscous purge gas may include at least one of helium, neon, argon, and nitrogen. However, it should be noted that the type of purge gas is a non-limiting example.

[0075] A gas supply method according to one embodiment may include the steps of opening a second exhaust valve, continuously applying negative pressure through the exhaust section, opening a first exhaust valve and a second supply valve, opening a third exhaust valve and a second purge valve, closing the third exhaust valve and opening the first purge valve, and repeatedly opening and closing a fourth purge valve. However, it should be noted that each step may be omitted or repeated, and may be performed in different sequences.

[0076] In one embodiment, the gas supply method can be performed with the gas container G closed. In another embodiment, the gas supply method can create a vacuum in the space inside the pipeline by applying negative pressure through the exhaust section V, followed by supplying a small amount of purge gas to maintain the pressure inside the pipeline at less than or equal to the saturated vapor pressure. In this case, the supply pipeline 100 can be purged by repeatedly supplying small amounts of purge gas. Furthermore, moisture in the purge gas can evaporate and be discharged simultaneously with the injection of the purge gas.

[0077] In one embodiment, the gas supply method may further include, after the step of closing the second exhaust valve 3102, using an exhaust pressure sensor 4002 to detect the presence of a vacuum. In one embodiment, the gas supply method may include, using the exhaust pressure sensor 4002 to detect the presence of a vacuum, and closing the first exhaust valve 3101 or all valves when the pressure change range is less than or equal to a set value within a certain time period. In one embodiment, when the pressure change range is less than or equal to the set value within a certain time period, it can be determined that purging is complete.

[0078] In summary, embodiments have been described with reference to the limited accompanying drawings. Those skilled in the art can make various modifications and variations to the above description. For example, the described technology may be performed in a different sequence than the described method, and / or the described constituent elements may be combined or arranged in a different form than the described method, or the same effect may be obtained by replacing or substituting other constituent elements or equivalents.

[0079] Therefore, all other embodiments, other implementations, and equivalents of the scope of the claim fall within the scope of the patent claim.

[0080] 1: Gas supply system 100: Supply pipeline 200: Purge pipeline 310: First exhaust pipe 320: Second exhaust pipe 700: Supply pipeline 800: Purge line 900: Exhaust pipe 1011: First supply valve 1012: Second supply valve 1013: Second Regulator 1015: Supply screening program 1016: Supply pressure sensor 2011: First purge valve 2012: Second purge valve 2013: Purge Pressure Sensor 2021: Third purge valve 2022: Fourth Purge Valve 2023: The First Regulator 2024: Flow regulating device 2026: Second Check Valve 3002: Vacuum Sensor (VT) 3101: First exhaust valve 3102: Second exhaust valve 3103: First check valve 3201: Third exhaust valve 7011: First supply valve 7012: Second supply valve 7013: Second Regulator 7015: Supply screening program 7016: Supply pressure sensor 8011: First purge valve 8012: Second purge valve 8013: Purge Pressure Sensor 8021: Third purge valve 8022: Fourth purge valve 8026: Second check valve 9101: First exhaust valve 9102: Second exhaust valve G: Gas container P: Purge Gas Supply Department P1: First point P2: Second point P3: Third point P4: Fourth point V: Exhaust section R: Process object

[0081] Domestic storage information (please note in order of storage institution, date, and number) none

[0082] Overseas storage information (please note in the order of storage country, institution, date, and number) none

Claims

1. A gas supply system, comprising: A supply line configured to connect a gas container to a process object; A purge line is connected to a first point of the supply line and to a purge gas supply unit for supplying purge gas; a first exhaust line is connected to a second point of the supply line and to an exhaust unit that applies negative pressure; and a second exhaust line is connected to a third point of the purge line and to a fourth point of the first exhaust line. The purge line is connected to: a fourth purge valve disposed between the third point and the purge gas supply unit and configured to control the flow rate of fluid flowing through the purge line; a first regulator disposed between the fourth purge valve and the purge gas supply unit and configured to regulate the internal pressure of the purge line; and a flow rate regulating device.

2. The gas supply system according to claim 1, wherein a first point of the supply line is closer to the gas container than a second point, wherein the supply line is connected to: a supply pressure sensor configured to detect the internal pressure of the supply line; and a first supply valve configured to control the flow rate of fluid flowing through the supply line.

3. The gas supply system according to claim 1, wherein the purge line is connected to: a first purge valve connected between the first point and the third point and configured to control the flow rate of fluid flowing through the purge line; a second purge valve disposed between the first purge valve and the third point and configured to control the flow rate of fluid flowing through the purge line; a purge pressure sensor disposed between the first purge valve and the second purge valve and configured to detect the internal pressure of the purge line; a first regulator disposed between the third point and the purge gas supply unit and configured to regulate the internal pressure of the purge line; and a flow rate regulating device disposed between the first regulator and the third point.

4. The gas supply system according to claim 1, wherein the first exhaust line is connected to: a first exhaust valve disposed between the second point and the fourth point; and a second exhaust valve disposed between the fourth point and the exhaust section, wherein the second exhaust line is connected to: a third exhaust valve configured to regulate gas supply; and an exhaust pressure sensor disposed between the third exhaust valve and the fourth point and detecting the internal pressure of the line.

5. The gas supply system according to claim 1, wherein the purge line is connected to: a first purge valve connected between the first point and the third point and configured to control the flow rate of fluid flowing through the purge line; and a purge pressure sensor disposed between the first purge valve and the fourth purge valve and configured to detect the internal pressure of the purge line.

6. The gas supply system according to claim 1, wherein the supply line is further connected to: a second regulator configured to control the pressure of the supply line.

7. The gas supply system according to claim 1, wherein the supply line is further connected to: a second supply valve configured to control the flow rate of the supply line.

8. The gas supply system according to claim 1, wherein the supply line is further connected to: a supply screening program connected to the supply line.

9. The gas supply system according to claim 1, wherein the first exhaust line is further connected to: a first exhaust valve disposed between the second point and the fourth point.

10. The gas supply system according to claim 3, wherein the purge line is further connected to a fourth purge valve connected to the rear end of the flow regulating device.

11. A gas supply method using a gas supply system, wherein the gas supply system comprises: A supply line configured to connect a gas container to a process object; A purge line is connected to a first point of the supply line and to a purge gas supply unit for supplying purge gas; a first exhaust line is connected to a second point of the supply line and to an exhaust unit that applies negative pressure; and a second exhaust line is connected to a third point of the purge line and to a fourth point of the first exhaust line; wherein the method includes the following steps: opening a second exhaust valve; continuously applying negative pressure through the exhaust unit; opening a first exhaust valve and a second supply valve; opening a third exhaust valve and a second purge valve; closing the third exhaust valve and opening the first purge valve; and repeatedly opening and closing a fourth purge valve.

12. A gas supply method using the gas supply system according to claim 4, comprising the steps of: opening a second exhaust valve; continuously applying negative pressure through an exhaust section; opening a first exhaust valve and a second supply valve; opening a third exhaust valve and a second purge valve; closing the third exhaust valve and opening the first purge valve; and repeatedly opening and closing a fourth purge valve; further comprising the step of: after opening the second exhaust valve, using the exhaust pressure sensor to detect whether a vacuum exists.

13. A gas supply method using the gas supply system according to claim 4, comprising the steps of: opening a second exhaust valve; continuously applying negative pressure through an exhaust section; opening a first exhaust valve and a second supply valve; opening a third exhaust valve and a second purge valve; closing the third exhaust valve and opening the first purge valve; and repeatedly opening and closing a fourth purge valve; further comprising the step of: detecting the presence of a vacuum using the exhaust pressure sensor, and closing the first exhaust valve or all valves when the pressure change range is less than or equal to a set value within a certain time.

14. The gas supply method according to claim 11, further comprising the step of: venting the second exhaust line while the first purge valve is closed.

15. The gas supply method according to claim 11, further comprising the step of: venting the first exhaust line.

16. A gas supply method using a gas supply system according to claims 1 to 10, comprising the steps of: closing all valves and supplying gas; venting a first exhaust line and a supply line while the first supply valve, a fourth purge valve, and the first purge valve are closed; venting a second exhaust line and a purge line to a vacuum state; and, after closing the second exhaust line, performing pulsed venting between a first pressure and a second pressure using a flow regulating device for the purge line and the fourth purge valve.

17. The gas supply method according to claim 16, wherein the first pressure is a pressure that causes the Knudsen number based on the pipe diameter to be less than 1, and the second pressure is a pressure that is less than or equal to the saturated vapor pressure of water in the pipe, so as to cause water molecules in the pipe to evaporate.

Images