Exposure device

Abstract

The exposure apparatus of the present invention includes: a plurality of laser light sources (20); an output module (30) having a light modulator; and a time divider (50) disposed between the plurality of laser light sources and the output module to divide the laser light emitted from the plurality of laser light sources in time.

Description

Technical Field

[0001] The present invention relates to an optical device with a laser light source, an exposure device, a manufacturing method of a flat panel display, and a device manufacturing method. This application claims priority based on U.S. Provisional Application No. 62 / 959,178, filed on January 10, 2020, the contents of which are incorporated herein by reference. Prior Art

[0002] Laser beams are used in various fields. Summary of the Invention

[0003] [Problem to be Solved by the Invention] In devices using laser beams, there is a growing demand for improved processing accuracy and energy efficiency. For example, it is desirable to reduce laser beam energy loss, appropriately control laser beam output intensity, suppress speckle, appropriately control beam output timing, and / or appropriately control the output beam waveform. [Methods for solving the problem]

[0004] In one aspect of the present invention, an optical device includes: a plurality of laser light sources; an output module having a light modulator; and a time divider disposed between the plurality of laser light sources and the output module for temporally dividing the laser light emitted from the plurality of laser light sources.

[0005] In another aspect of the present invention, an optical device includes: a plurality of laser light sources; a plurality of output modules, each having a light modulator; and a time divider, disposed between the plurality of laser light sources and the plurality of output modules, for temporally dividing the laser light emitted from the plurality of laser light sources.

[0006] In another aspect of the present invention, the optical device includes: a plurality of output modules, each having a light modulator; a time divider disposed between the plurality of laser light sources and the plurality of output modules, for temporally dividing the laser light emitted from the plurality of laser light sources; and a sub-divider disposed between the plurality of laser light sources and the time divider, or between the time divider and the plurality of output modules.

[0007] In another aspect of the present invention, an optical device includes: a laser light source; an output module; and a time divider disposed between the laser light source and the output module for temporally dividing laser light emitted from the laser light source. The time divider uses multiple reflective surfaces to divide the laser light.

[0008] In another aspect of the present invention, an optical device includes: a laser light source; a plurality of output modules; and a time divider disposed between the laser light source and the plurality of output modules for temporally dividing the laser light emitted from the laser light source. The time divider uses a plurality of reflective surfaces to divide the laser light.

[0009] In another aspect of the present invention, an optical device includes: a laser light source; an output module having a light modulator; and an acousto-optic element disposed between the laser light source and the output module.

[0010] In another aspect of the present invention, an optical device includes: a laser light source; a plurality of output modules, each having a light modulator; and an acousto-optic element disposed between the laser light source and the output modules.

[0011] In another aspect of the present invention, the optical device includes: a laser light source that emits pulsed light; an output module having a light modulator; a time divider disposed between the laser light source and the output module that divides the pulsed light in time; and a controller that controls the division of the pulsed light by the time divider based on the frequency of the pulsed light.

[0012] In another aspect of the present invention, the optical device includes: a laser light source that emits pulsed light; a plurality of output modules, each having a light modulator; a time divider disposed between the laser light source and the plurality of output modules for temporally dividing the pulsed light; and a controller for controlling the division of the pulsed light by the time divider based on the frequency of the pulsed light. Simple diagram description

[0013] FIG1(a) to FIG1(d) are schematic diagrams showing various examples of a laser beam system (optical device) including a laser light source. FIG. 2 ( a ) to ( d ) are schematic diagrams showing various other examples of a laser beam system (optical device) including a laser light source. FIG3(a) to FIG3(f) are diagrams showing an example of combining control of pulse laser beams. FIG4 (a) to (f) are diagrams showing an example of combining control of CW laser beams. FIG5(a) to FIG5(c) are diagrams showing examples of output light beams. FIG6 (a) to (c) are diagrams showing another example of the output light beam. FIG. 7 is a diagram showing an example of applying a polygon mirror device as a time divider (rotation device). FIG. 8 is a diagram showing an example of applying a polygon mirror device as a time divider (rotation device). FIG9 (a) to (c) are diagrams showing examples of applying an optical switching device as a time divider (rotation device). FIG. 10 is a diagram showing an example of applying an optical switching device as a time divider (rotation device). 11( a ) to ( c ) are diagrams showing examples of applying an optical switch device as a sub-divider (dynamic time divider) and applying a polygon mirror device as a time divider (dynamic time divider). FIG. 12 is a diagram showing an example in which an electro-optical modulator is used as a time divider and a polarization beam splitter is used as a sub-divider (static divider). FIG. 13 is a diagram showing an example of applying an electro-optical modulator as a sub-divider (dynamic time divider) and applying a polarization beam splitter as a sub-divider (static divider). FIG. 14 is a diagram showing an example in which an aperture device is provided on the optical path. FIG15 is a diagram schematically showing the overall structure of an exposure apparatus. FIG. 16 is a diagram showing a configuration example of an exposure apparatus. FIG. 17 is a diagram illustrating the relationship between the repetition frequency of a laser beam and the operating frequency of a spatial light modulator (SLM). FIG18(a) and (b) are diagrams for explaining a combination of a light source and an output module. FIG. 19 is a diagram showing an example of the configuration of an exposure apparatus that does not include an SLM. FIG. 20 is a diagram showing an example of the configuration of an exposure apparatus including an SLM. FIG. 21 is a diagram for explaining the relationship between pattern line width and light emission time. FIG22(a) and (b) are diagrams for explaining energy loss of a light beam. FIG. 23 is a diagram for explaining time division of a light beam. FIG. 24 is a diagram for explaining the deviation in projection position among a plurality of SLMs based on irradiation timing. FIG. 25 is a diagram for explaining mechanical and / or optical displacement adjustment. FIG. 26 is a diagram for explaining displacement adjustment corresponding to a scanning operation. FIG. 27 is a diagram for explaining displacement adjustment corresponding to another scanning operation. FIG. 28 is a diagram showing a configuration example of an exposure device required for displacement adjustment. FIG29 is a diagram showing a structural example of an exposure device. FIG30 is a diagram showing a structural example of an exposure device. FIG31 is a diagram showing a structural example of an exposure device. FIG32 is a diagram showing a structural example of an exposure device. FIG33 is a diagram showing a structural example of an exposure device. FIG34 is a diagram showing a structural example of an exposure device. FIG35 is a diagram showing an example of pattern exposure. FIG. 36 is a diagram showing a configuration example of an exposure device required for synchronous control. FIG37 is a diagram for explaining an example of rotation control of a polygon mirror. FIG38 is a diagram for explaining an example of synchronous control of a polygon mirror. FIG39 is a diagram for explaining the operation timing of a plurality of devices. FIG. 40 is a diagram for explaining an example of synchronous control of the rotating plate. FIG. 41 is a diagram for explaining an example of synchronous control of a rotating plate subjected to additional processing. Implementation Method

[0014] The following describes an embodiment of the present invention with reference to the accompanying drawings. The following detailed description of the present invention is for illustrative purposes only and does not limit the present invention. The same or identical reference numerals are used throughout the drawings and the following detailed description.

[0015] Figures 1(a) through 2(d) and 2(a) through 2(d) are schematic diagrams illustrating various embodiments of laser beam systems (optical devices) including a laser light source. In each of Figures 1(a), 1(b), 1(c), 1(d), 2(a), 2(b), 2(c), and 2(d), the laser beam system includes a laser light source 20.

[0016] In one embodiment, the laser beam system (optical device) includes: a laser light source 20, an output module 30, a controller 40, and a time divider 50 optically disposed between the laser light source 20 and the output module 30.

[0017] Various types of laser light sources can be used as the laser light source 20. Examples include gas lasers (helium-neon lasers, argon lasers, carbon dioxide lasers, excimer lasers, nitrogen lasers, etc.), semiconductor lasers, solid-state lasers (yttrium aluminum garnet (YAG) lasers, neodymium lasers, ruby lasers, fiber lasers, titanium lasers, etc.), metal lasers (copper vapor deposition lasers, helium cadmium lasers, gold vapor deposition lasers, etc.), and liquid lasers. The disclosed technology can be applied to various oscillation modes, including pulsed oscillation and continuous wave (CW) oscillation.

[0018] Output module 30 is configured based on the intended use of the laser beam. For example, laser beams can be used in optical devices such as laser processing equipment, laser melting equipment, laser welding equipment, laser marking equipment, laser length measurement equipment, semiconductor exposure equipment, flat panel display exposure equipment, circuit board exposure equipment, laser lighting equipment, laser display equipment, laser detection equipment, laser propulsion equipment, laser inspection equipment, laser microscopes, and laser medical equipment. The disclosed technology can be applied to devices in various fields, including these devices.

[0019] In certain embodiments, the output module 30 includes a spatial light modulator (SLM) 60. For example, the SLM 60 includes a liquid crystal element, a digital mirror device (a digital micro-mirror device (DMD)), a magneto-optical spatial light modulator (MOSLM), etc.

[0020] The time splitter (time allocator, dynamic time splitter, optical time splitter, optical switch, optical shutter, dynamic switch, dynamic shutter, dynamic separator, optical path switcher) 50 is controlled by the controller 40 and is configured to temporally split the laser beam. Examples of the time splitter 50 include a polygon mirror device, a galvanometer mirror device, an electro-optical modulator (EOM), an acousto-optic modulator (AOM), a vibrator device, and other optical switching devices (such as a liquid crystal switch). The time-split beams can be selectively utilized. Furthermore, the multiple time-split beams can be combined, mixed, and / or converged. For example, the selectively extracted beams from the time splitter 50 enter the output module 30. In one example, the time-split beams are guided to multiple optical paths at predetermined intervals on the time axis. The multiple time-split beams (the multiple allocated beams) are supplied to the multiple paths.

[0021] In a specific embodiment, the time divider 50 is controlled to be driven synchronously with the SLM 60 of the output module 30. For example, the time-divided light beam is supplied to the SLM 60 in accordance with the driving timing of the SLM 60. For example, the operating frequency of the SLM 60 (e.g., the image update frequency) is generally lower than the repetition frequency of the pulsed light beam. The light beam corresponding to the operating timing of the SLM 60 is selectively utilized within the time-divided light beam. The remaining light beams within the time-divided light beam can be used for other purposes. In another embodiment, the time divider 50 can be controlled to be driven asynchronously with the SLM 60 of the output module 30.

[0022] In a specific embodiment, the laser beam system includes multiple laser light sources 20. The number of laser light sources 20 can be arbitrarily set. For example, the number of laser light sources 20 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, or more. In one example, the beams from the multiple laser light sources 20 are combined, mixed, and / or converged via a predetermined device and then enter the time divider 50. Even after being divided by the time divider 50, the beams from the multiple laser light sources 20 can have relatively high energy values. In another example, the beams from the multiple laser light sources 20 enter the time divider 50 independently. In one example, the beams from the multiple pulsed laser light sources 20 are set so that the pulse width and peak value (pulse waveform, waveform profile) are substantially the same. In another example, the beams from the plurality of pulse laser light sources 20 are set to be different from each other in at least one of pulse width and peak value (pulse waveform, waveform profile).

[0023] In a configuration combining multiple laser light sources 20 with an output module 30 having an SLM 60, for example, laser beam energy loss is reduced, energy efficiency is improved, laser beam output intensity is appropriately controlled, and / or speckle is suppressed. In one example, the beam from the time divider 50 is supplied to the SLM 60 at an appropriate timing. With the beam supplied to the SLM 60 at the optimal timing, energy loss in the SLM 60 is reduced, and a high-energy beam (high-power beam) is output from the output module 30.

[0024] In certain embodiments, the laser beam system includes multiple output modules 30. For example, a first time-divided beam is supplied to a first output module 30, and a second time-divided beam is supplied to a second output module 30. The number of output modules 30 can be arbitrarily set. For example, the number of output modules 30 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 25, 30, 35, 40, 45, 50, or more.

[0025] In a specific embodiment, each of the multiple output modules 30 includes an SLM 60. The multiple SLMs 60 are driven synchronously or asynchronously with one another. In one example, the first, second, third, and fourth SLMs 60 are driven at the same timing corresponding to a certain time-divided beam. In another example, the first and second SLMs 60 are driven at the same timing corresponding to the first time-divided beam, and the third and fourth SLMs 60 are driven at another timing corresponding to the second time-divided beam. In yet another example, the first SLM 60 is driven at a timing corresponding to the first time-divided beam, the second SLM 60 is driven at another timing corresponding to the second time-divided beam, the third SLM 60 is driven at yet another timing corresponding to the third time-divided beam, and the fourth SLM 60 is driven at yet another timing corresponding to the fourth time-divided beam.

[0026] In a configuration combining a time divider 50 with multiple SLMs 60, for example, energy loss in the laser beam is reduced, energy efficiency is improved, laser beam output intensity is appropriately controlled, beam output timing is appropriately controlled, and / or output beam waveform is appropriately controlled. In one example, the beam from the laser light source 20 is directed to the multiple SLMs 60 in a manner corresponding to the drive timing of each of the multiple SLMs 60. Reducing the beam shielding period (the period during which the beam is not in use) helps improve energy efficiency, reduce light leakage, and / or prevent thermal effects.

[0027] In certain embodiments, the laser beam system further includes a sub-divider (time divider, dynamic time divider, optical time divider, optical switch, optical shutter, dynamic switch, dynamic shutter, dynamic splitter, optical path switcher) 70 optically positioned between the laser light source 20 and the time divider 50, or between the time divider 50 and the output module 30. The sub-divider 70 can be a dynamic splitter or a static splitter, configured to polarization-separate, frequency-separate, or time-divide the laser beam. A dynamic splitter is a structure that separates or divides the laser beam as the splitter is driven, while a static splitter is a structure that separates or divides the laser beam independently of the splitter. For example, the dynamic splitter can be similar to the time divider described above. Examples of static splitters include polarization beam splitters, half mirrors, dichroic mirrors, and frequency splitters. In one example, a time splitter 50 and a static splitter serving as a sub-divider 70 are sequentially arranged on the optical axis along the direction of travel of the light beam. In another example, a static splitter serving as a sub-divider 70 and the time splitter 50 are sequentially arranged on the optical axis along the direction of travel of the light beam. In yet another example, a time splitter (front position, front-stage time splitter) 70 and a time splitter (rear position, rear-stage time splitter) 50 are sequentially arranged on the optical axis along the direction of travel of the light beam. In one example, multiple time splitters 50 and 70 are combined. In another example, one time splitter 50 is combined with multiple static splitters serving as sub-dividers 70. In yet another example, multiple time splitters 50 are combined with one static splitter serving as sub-dividers 70. In yet another example, multiple time splitters 50 are combined with multiple static splitters serving as sub-dividers 70. The number of time dividers 50 and sub-dividers 70 can be set arbitrarily. For example, the total number of time dividers 50 and sub-dividers 70 can be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, or more.

[0028] In a configuration combining the time divider 50 with a static divider serving as a sub-divider 70, for example, energy loss in the laser beam is reduced, energy efficiency is improved, the output intensity of the laser beam is appropriately controlled, the beam output timing is appropriately controlled, and / or the output beam waveform is appropriately controlled. In one example, the number of beam divisions is increased and / or the beam is divided into multiple parts based on wavelength range.

[0029] In a configuration combining the time divider (front position) 70 and the time divider (rear position) 50, for example, energy loss of the laser beam is reduced, energy efficiency is improved, laser beam output intensity is appropriately controlled, beam output timing is appropriately controlled, and / or the output beam waveform is appropriately controlled. In one example, the number of beam divisions is increased, and / or the use of unstable and / or non-optimal regions in the time divider is avoided while suppressing energy loss.

[0030] In one example, during the first span on the time axis, the time-divided light beam from the front time divider 70 enters the rear time divider 50, allowing the stable region and / or preferred region of the rear time divider 50 to be specifically and / or preferentially used. On the other hand, during the second span on the time axis, the time-divided light beam from the front time divider 70 does not substantially enter the rear time divider 50, thereby avoiding the use of the unstable region and / or non-preferred region of the rear time divider 50. For example, by alternately supplying the time-divided light beam to the first and second time dividers 50 at the rear position, the light beam can be substantially continuously utilized while avoiding the use of the unstable region and / or non-preferred region of the time divider 50. In other words, each of the multiple time dividers 50 at the rear position has a stable region (preferred region) and an unstable region (non-preferred region). The multiple time dividers 50 at the rear position are driven so that the stable states during driving occur at different times. The time-divided light beams from the time dividers 70 at the front positions are dispatched in a manner that matches the stable states of the respective time dividers 50 at the rear positions.

[0031] In a specific embodiment, the output module 30 includes an optical fiber. The optical fiber is configured to receive multiple time-divided light beams from the time divider 50 or the sub-divider 70. In one example, one optical fiber is provided for each output module 30. In another example, multiple optical fibers are provided for each output module 30. In this example, multiple time-divided light beams from multiple optical fibers are incident on one output module 30.

[0032] In a specific embodiment, the laser beam system includes multiple output modules 30. Each of the multiple output modules 30 includes an optical fiber. For example, a time-divided beam at a first timing is supplied to a first optical fiber, and a time-divided beam at a second timing is supplied to a second optical fiber. In one example, a single optical fiber is provided for each of the multiple output modules 30. In another example, multiple optical fibers are provided for each of the multiple output modules 30. In this example, multiple time-divided beams from the multiple optical fibers are incident on each of the multiple output modules 30.

[0033] Figures 3(a) through 3(f) illustrate examples of pulsed laser beam synthesis control. Figures 4(a) through 4(f) illustrate examples of CW laser beam synthesis control. Figures 5(a) through 5(c) and 6(a) through 6(c) illustrate examples of output beams. In each example, a laser beam with controlled power is output from the laser beam system.

[0034] In one example, multiple laser beams emitted from multiple light sources 20 are combined. Combination can be performed using an optical system including lenses, beam splitters, halving mirrors, or mirrors. The combined laser beams are incident on a time divider 50. The combined beam corresponding to the first repetition timing (the combined beam of the first pulse) is guided by the time divider 50 to the first optical fiber 80 (Figures 3(b) and 4(b)). The combined beam corresponding to the second repetition timing (the combined beam of the second pulse) is guided by the time divider 50 to the second optical fiber 80 (Figures 3(c) and 4(c)). The combined beam corresponding to the third repetition timing (the combined beam of the third pulse) is guided by the time divider 50 to the third optical fiber 80 (Figures 3(d) and 4(d)). The combined beam corresponding to the fourth repetition timing (the combined beam of the fourth pulse) is guided by the time divider 50 to the fourth optical fiber 80 (Figures 3(e) and 4(e)). The composite beam corresponding to the fifth repetition timing (the composite beam of the fifth pulse) is guided to the fifth optical fiber 80 (Figures 3(f) and 4(f)) via the time divider 50. The first repetition timing, the second repetition timing, the third repetition timing, the fourth repetition timing, and the fifth repetition timing are sequentially time-shifted. This allows a high-energy (high-power) composite beam to be guided to each optical fiber 80. For example, in an output module 30 equipped with an SLM 60, the composite beam is guided to the optical fiber 80 in accordance with the operating timing of the relatively slow SLM 60.

[0035] In another example, by combining time division and combining, the output powers of multiple output modules 30 can be controlled to differ. For example, a first output module 30 outputs a beam with relatively high energy (high power) ( FIG5( a )). A second output module 30 outputs a beam with intermediate energy (intermediate power) ( FIG5( b )). A third output module 30 outputs a beam with relatively low energy (low power) ( FIG5( c )).

[0036] In another example, by applying a combination of time division and synthesis, the output beam waveforms from one or more output modules 30 are appropriately controlled ( FIG. 6( a ) and FIG. 6 ( b ) ). And / or, the timing of beam output from one or more output modules 30 is appropriately controlled ( FIG. 6( c )).

[0037] In a specific embodiment, a rotary device (rotary switch) is used as the time divider 50. The rotary device is controlled by the controller 40 to be rotatable and is configured to divide the laser beam in time.

[0038] In one example, a polygon mirror device (Figure 7) is used as a rotation device. The light beam from the laser light source 20 is reflected by the multiple reflecting surfaces 52 of the polygon mirror 51 in the polygon mirror device, which serves as the time divider 50. Each of the multiple output modules 30 includes an optical fiber 80 with an entrance. The polygon mirror device, serving as the time divider 50, temporally divides the light beam according to the rotation angle of the polygon mirror 51. Depending on the rotation angle of the polygon mirror 51, the light beam reflected by the polygon mirror 51 is directed toward one of the entrances (incident surfaces) of the multiple optical fibers 80. Specifically, as the polygon mirror 51 rotates, the angle of the reflecting surface relative to the light beam changes, and the direction of the light beam reflected by the reflecting surface changes with time. Therefore, the light beam of the first pulse from the laser light source 20 is incident on the first optical fiber, while the light beam of the second pulse is incident on the second optical fiber, which is located at a different position from the first optical fiber. Multiple optical fibers 80 can be arranged for a single polygon mirror 51. The time-divided light beam from the polygon mirror 51 is distributed to any of the multiple optical fibers 80. In other words, the polygon mirror 51 switches the optical fiber into which the light beam is incident. Alternatively, the polygon mirror 51 switches the position of the light beam's optical path. At least one lens 85 or 86 (Figure 8) is positioned between the polygon mirror 51 and the optical fiber 80, as needed. For example, if the entrance (incident surface) of the optical fiber 80 is conjugate with the reflection surface of the polygon mirror 51, the rotation of the polygon mirror 51 reduces the deviation (positional deviation) of the light beam's incident position relative to the optical fiber 80. Furthermore, the slight change in the light beam's incident angle relative to the optical fiber 80 caused by the rotation of the polygon mirror 51 contributes to speckle reduction. This embodiment can also employ CW beams instead of pulsed beams.

[0039] In another example, a circular plate optical switch device is used as a rotating device (Figures 9(a)-(c)). In the multiple circular plate optical switch devices serving as the time divider 50, the light beam is temporally divided according to the rotation angle of the rotating plate 55. For example, the light beam from the laser light source 20 is reflected or transmitted by the optical surfaces 56 and 57 of the rotating plate 55 serving as the multiple optical switch devices serving as the time divider 50, depending on the rotation angle of the rotating plate 55 (Figure 9(a)). The rotating plate 55 has an optical surface (transmitting surface) 56 and an optical surface (reflecting surface) 57 arranged along the circumference. For example, the light beam that passes through the rotating plate 55 travels along a first path "A," while the light beam that is reflected by the rotating plate 55 travels along a second path "B" (Figure 10). Alternatively, for example, the light beam from the laser light source 20 is reflected in different directions by the optical surfaces 56 and 57 of the rotating plate 55 serving as the multiple optical switch devices serving as the time divider 50, depending on the rotation angle of the rotating plate 55 (Figure 9(b)). The rotating plate 55 has an optical surface (first reflecting surface) 56 and an optical surface (second reflecting surface) 57 that face different directions. For example, a light beam reflected by the optical surface (first reflecting surface) 56 of the rotating plate 55 follows a first path "A," while a light beam reflected by the optical surface (second reflecting surface) 57 of the rotating plate 55 follows a second path "B." Furthermore, for example, the light beam from the laser light source 20 is reflected at different heights of the rotating plate 55 depending on the rotation angle of the rotating plate 55 (Figure 9(c)). The rotating plate 55 has an optical surface (first reflecting surface) 56 and an optical surface (second reflecting surface) 57 that face different heights along the rotation axis. For example, a light beam reflected by the optical surface (first reflecting surface) 56 of the rotating plate 55 follows a first path "A," while a light beam that passes through the optical surface (first reflecting surface) 56 and reflects by the optical surface (second reflecting surface) 57 of the rotating plate 55 follows a second path "B." Furthermore, the number of beam divisions in the plurality of rotary optical switch devices serving as the time divider 50 is not limited to 2. The number of divisions may be 3, 4, 5, 6, 7, 8, 9, 10, or more. For example, the rotating plate 55 may have three or more reflective surfaces facing different directions.

[0040] In a specific embodiment, the circular plate optical switch device is used as the sub-divider (dynamic time divider) 70, and the polygonal mirror device is used as the time divider (dynamic time divider) 50 (Figures 11(a)-(c)). In this embodiment, the use of the corners of the polygonal mirror 51 as unstable and / or non-preferred regions 59 can be avoided. For example, in the first span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 travels along path "A" toward the first position within the reflective surface 52 of the polygonal mirror device serving as the time divider 50. It is then specifically and / or preferentially reflected and time-divided by the stable region 58 of the polygonal mirror 51 (reflective surface 52A). During the second time span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 travels along path "B" toward reflective surface 52B, which is different from reflective surface 52A of the polygonal mirror device serving as the time divider 50. It is preferentially and / or preferentially reflected by the stable region 58 of the polygonal mirror 51 (reflective surface 52B) and time-divided. The light beam is alternately supplied to the reflective surfaces 52A and 52B of the polygonal mirror 51. During the first time span, the light beam does not enter reflective surface 52B, thus avoiding the use of the unstable region (corner) 59 of the polygonal mirror 51 (reflective surface 52A), i.e., the intersection (boundary) between the reflective surfaces of the polygonal mirror 51. During the second time span, the light beam does not enter reflective surface 52A, thus avoiding the use of the unstable region (corner) 59 of the polygonal mirror 51 (reflective surface 52B). By allocating the time-divided light beams, the light beam can be utilized substantially continuously while avoiding the use of the unstable region of the polygonal mirror 51 (time divider 50). The details of how the polygon mirror 51 (time divider 50) can be avoided using unstable regions will be described later. Furthermore, the reflection surfaces 52A and 52B change over time as the polygon mirror 51 rotates. Specifically, reflection surface 52A is the surface on which the light beam along path "A" enters the polygon mirror element serving as the time divider 50. Meanwhile, reflection surface 52B is the surface on which the light beam along path "B" enters the polygon mirror element serving as the time divider 50.

[0041] In a specific embodiment, an electro-optical modulator (EOM, EO) is used as the time divider 50, and a polarization beam splitter (PBS) is used as the sub-divider (static splitter) 70 (Figure 12). In one example, the EOM, serving as the time divider 50, and the PBS, serving as the sub-divider 70, are sequentially arranged on the optical axis along the direction of travel of the light beam. In this embodiment, the light beam from the EOM, serving as the time divider 50, is split into multiple beams by the PBS, serving as the sub-divider 70, based on wavelength ranges. For example, the p-polarized beam of the time-divided light beam from the EOM, serving as the time divider 50, passes through the PBS, serving as the sub-divider 70. The s-polarized beam of the time-divided light beam from the EOM, serving as the time divider 50, is reflected by the PBS, serving as the sub-divider 70.

[0042] In a specific embodiment, an electro-optical modulator (EOM, EO) is used as a sub-divider (dynamic time divider) 70, a polarization beam splitter (PBS) is used as a sub-divider (static time divider) 70, and multiple polygon mirror devices are used as time dividers 50 (Figure 13). The polygon mirrors 51A and 51B of the multiple polygon mirror devices are arranged in parallel with respect to the optical path. In one example, the EOM (sub-divider 70), the PBS (sub-divider 70), and the polygon mirror device (time divider 50) are sequentially arranged on the optical axis along the direction of travel of the light beam. In this embodiment, the light beam from the EOM (sub-divider 70) is split according to the wavelength range by the PBS (sub-divider 70). The p-polarized light beam that passes through the PBS (sub-divider 70) is time-divided by the first polygon mirror 51A, while the s-polarized light beam reflected by the PBS (sub-divider 70) is time-divided by the second polygon mirror 51B.

[0043] In a specific embodiment, the laser beam system further includes an aperture device 90, optically positioned between the time divider 50 (or sub-divider 70) and the optical fiber 80 (or output module 30) (Figure 14). The aperture device 90 includes an aperture 91, the area of the opening through which the light beam passes being controlled by the controller 40. The aperture 91 has multiple openings. In this embodiment, for example, the beam from the time divider 50 that passes through the first opening of the aperture 91 enters the first optical fiber as the first time-divided beam, while the beam that passes through the second opening enters the second optical fiber as the second time-divided beam. Furthermore, by controlling the opening area of the aperture 91, the light intensity of each time-divided beam can be adjusted. This embodiment is particularly suitable for beams such as CW laser beams with relatively long emission times.

[0044] In one embodiment, a laser beam system is used in a photolithography system for manufacturing devices (electronic devices or microdevices) such as semiconductor devices, liquid crystal display devices, and organic EL devices. In one example, a batch exposure device such as a stepper or a scanning exposure device such as a scanning stepper is used. For example, in the exposure device, a predetermined pattern is formed on each exposure area of a substrate such as a wafer or a glass plate via a projection optical system.

[0045] In one example of an exposure apparatus, a pattern formed on a mask (or reticle) held on a mask stage is transferred to a substrate by irradiation with exposure light via a projection optical system.

[0046] In another example of an exposure device, a spatial light modulator (SLM) is used instead of a mask to generate a variable pattern on the object plane of the projection optical system (maskless exposure device).

[0047] Regarding at least a portion of the structures of various exposure devices, for example, the disclosures of US2009 / 0117494A1, US2010 / 0099049A1, US2013 / 0222781A1, US2013 / 0278912A1, US2013 / 0314683A1, US2014 / 0320835A1, US2015 / 0077732A1, and US6552775B1 can be cited in this specification.

[0048] In a specific embodiment, the laser beam system can be applied to an exposure device as a photography system for manufacturing flat panel displays (such as liquid crystal display devices and organic EL display devices).

[0049] FIG15 and FIG16 schematically illustrate the structure of one embodiment of a maskless exposure apparatus 1000. Exposure apparatus 1000 includes a light source module 1100 including a laser light source 20, a distribution module (combining and distributing module) 1200 including a time divider 50 and a sub-divider 70, an illumination system 1300 including an output module 30 (including an optical fiber 80, an illumination system (illumination system) 1310, an SLM 60, and a projection system (projection lens 1330), a substrate stage 1400 for mounting a substrate (workpiece) 1410, and a control system 1500 including a controller 40 and a data transmission unit.

[0050] In Figures 15 and 16 , the light source module 1100 emits a laser beam as light energy. The beam from the light source module 1100 enters the illumination optical system 1310 via the distribution module 1200. The beam from the illumination optical system 1310 illuminates the SLM 60. The controller 40 generates pattern data based on the exposure pattern to be formed on the substrate 1410. The controller 40 transmits the pattern data to the SLM 60 and controls the SLM 60. The SLM 60, controlled by the controller 40, directs the beam from the illumination system toward the substrate 1410 based on the pattern data (also simply referred to as image data or image). The projection lens 1330 projects the beam from the SLM 60 onto the substrate 1410, forming an image on a predetermined area on the substrate 1410. Furthermore, when the exposure pattern is formed on the substrate 1410 by the plurality of SLMs 60 , the controller 40 divides the generated pattern data into data for each SLM 60 and sends the divided pattern data to each SLM 60 .

[0051] In a scanning exposure device using an SLM, a laser beam is emitted while the substrate stage 1400, which carries the substrate, moves. The laser beam is then guided to the SLM via the illumination optical system 1310. The image to be formed on the SLM is preferably exposed with a single burst of laser light. If the image to be formed on the SLM is exposed with two or more bursts of laser light, the same pattern data is projected onto the substrate with each burst. Since the substrate 1410 moves between bursts of laser light via the substrate stage 1400, the same pattern data projected onto the substrate is exposed as if the image is flowing. Increasing the scanning speed to improve throughput increases the distance traveled between bursts of laser light, resulting in a more fluid image. To increase the scanning speed to improve throughput while also preventing image flow, the burst time must be shortened. When the single emission time is short, the energy of the laser beam irradiated onto substrate 1410 via the SLM becomes low, resulting in insufficient exposure energy and the possibility of exposure failure (photosensitive failure). Generally, the operating frequency of the SLM (e.g., image update frequency) is lower than the repetition frequency (oscillation frequency) of the laser beam, for example, several kHz to several tens of kHz. In the comparative example of Figure 17, the laser beam is 50 kHz (10 W) and the SLM is 10 kHz. As shown in the comparative examples of Figures 17 and 18 (a), to prevent image flow, a high-energy light source with a low oscillation frequency that does not cause exposure failure is ideal. However, if wavelength conditions are also taken into consideration, the current options for laser light sources are extremely limited. The values described above are examples and the present invention is not limited to these values.

[0052] In one embodiment, as described previously using Figures 3(a)-(f) and 4(a)-(f), a low-frequency, high-energy beam output can be achieved by combining the synthesis and time division of multiple beams. In the example of Figure 18(b), the distribution module 1200 synthesizes and time-divides the beams from five light sources 20. The beams emitted from the five light sources at a frequency of 50 kHz are synthesized to form a high-energy beam. The synthesized beam (50 kHz, high energy) is time-divided by the distribution module 1200 and guided to each of the five SLMs 60 (and five projection lenses 1330). As a result, the high-energy beam reaches each of the first through fifth SLMs at a frequency of 10 kHz. Furthermore, in both the comparative example of Figure 18(a) and the example of Figure 18(b), a total of 50 W of light is used in the five modules. Furthermore, in the comparative example of Figure 17 , the laser beam is 50 kHz (10 W) and the SLM is 10 kHz. Therefore, distribution module 1200 distributes (distributes, switches) the light to five SLMs. The oscillation frequency of the laser beam is preferably an integer multiple of the image update frequency of the SLM. In other words, distribution module 1200 distributes the laser beam to a number of SLMs that is an integer multiple of the aforementioned frequency. These values are merely examples and are not intended to limit the present invention.

[0053] In one example, the intensity (e.g., pulse energy, average power) E2 of the laser beam irradiating an SLM is equal to or greater than the intensity (e.g., pulse energy, average power) E1 of the laser beam emitted from a laser light source. For example, E2 / E1 can be approximately 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 25, 30, 35, 40, 45, 50, 100, or greater. Furthermore, the frequency (irradiation frequency) F2 of the beam irradiating an SLM or the image update frequency F3 of the SLM is lower than the repetition frequency (oscillation frequency, light source frequency) F1 of the laser light source. For example, F2 / F1 (or F3 / F1) may be about 1 / 2, 1 / 3, 1 / 4, 1 / 5, 1 / 6, 1 / 7, 1 / 8, 1 / 9, 1 / 10, 1 / 11, 1 / 12, 1 / 13, 1 / 14, 1 / 15, 1 / 16, 1 / 17, 1 / 18, 1 / 19, 1 / 20, 1 / 25, 1 / 30, 1 / 35, 1 / 40, 1 / 45, 1 / 50, 1 / 100, or less.

[0054] Alternatively, a combination of combining multiple beams and time-division, as shown in Figure 19, can also be applied to systems without an SLM (e.g., exposure equipment). In the example of Figure 19 (exposure equipment 1000), multiple time-divided beams (multiple allocated beams) are generated for each predetermined span on the time axis. A relatively low-frequency, high-energy beam is supplied to each of the multiple modules 30.

[0055] As described above, the number of output modules 30 (distribution number) can be arbitrarily set. In the example of Figure 20, the distribution module 1200 combines and time-divides the light beams from the four light sources 20. The time-divided light beams are respectively supplied to the four SLMs 60 (modules 30).

[0056] In the example of Figure 21 , the pattern line width is 2 μm, and the scanning speed is 400 mm / s. For example, if 10% of the pattern line width is allowed, the required luminescence time is within 0.5 μs. These values are examples only, and the present invention is not limited to these values.

[0057] In the comparative example of Figure 22(a), the SLM's operating frequency (image update frequency) is 10 kHz. Under the same specifications as the example of Figure 21, 10 kHz corresponds to 100 μs. With a CW light source, if the required emission time is 0.5 μs, then if the SLM is illuminated after 0.5 μs, the image on the SLM is not updated, resulting in the same projected image on the moving substrate 1410, which appears to be image flow, as described above. To prevent image flow, the SLM is not illuminated from 0.5 μs until the next image update on the SLM. For example, the light beam is shielded from the light path from the CW light source to the SLM. In this case, the time from 0.5 μs until the next image update on the SLM is essentially idle time. In this comparative example, substrate 1410 is exposed with only 1 / 200 of the energy from the light source.

[0058] Similarly, in the comparative example of Figure 22(b), the SLM's operating frequency (image update frequency) is 10 kHz. Of the light beams from the pulsed light source, only those at which the SLM synchronizes with the pulsed light source can be used. In this comparative example, when the light source frequency is 400 kHz, the SLM's operating frequency / light source frequency = 1 / 40, utilizing only 1 / 40 of the light source's energy. This means that of the 40 pulses oscillating from the pulsed light source, only one pulse illuminates the SLM. In other words, 39 pulses do not illuminate the SLM, and these 39 pulses do not contribute to the exposure of substrate 1410. Therefore, in the comparative example of Figures 22(a) and 22(b), the exposure energy is insufficient, potentially leading to poor exposure (poor photosensitivity). These numerical values are merely examples, and the present invention is not limited to these values.

[0059] In the example of FIG23 , the time-divided light beams from the distribution module 1200 are directed to multiple SLMs 60 (projection lens 1330 ) including a first SLM, a second SLM, and a third SLM along a non-scanning direction (non-scanning direction, Y direction) that intersects the scanning direction (scanning direction, X direction) in which the substrate 1410 moves during exposure. The first, second, and third SLMs are arranged in a non-scanning direction that intersects the scanning direction in which the substrate 1410 moves during exposure. The timing of the light beam irradiating the second SLM differs from the timing of the light beam irradiating the first SLM. Similarly, the timing of the light beam irradiating the third SLM differs from the timing of the light beam irradiating the first and second SLMs. For example, the irradiation timings of the multiple SLMs 60 are sequentially shifted in time. Thus, by distributing the energy from the light source that does not contribute to exposure, as shown in the comparative examples of FIG22 (a) and (b), to different SLMs, the substrate 1410 can be exposed.

[0060] As shown in FIG24, in an exposure device, when the irradiation timings of multiple SLMs are different, the image on the SLM is updated at the same timing, and there is a possibility that the projection position (exposure position) of the pattern will shift due to the difference in the timing of the light beam irradiation. For example, the projection position of the second pulse corresponding to the second SLM (SLM (2)) is displaced in the scanning direction compared to the first pulse corresponding to the first SLM (SLM (1)). In addition, the projection position of the third pulse corresponding to the third SLM (SLM (3)) is further displaced in the scanning direction compared to the second pulse corresponding to the second SLM (SLM (2)).

[0061] As shown in Figure 25, by mechanically and / or optically adjusting the exposure device, even when the irradiation timing differs between multiple SLMs, variations in the projection position (exposure position) of the pattern are compensated. In one example, the shapes, mounting positions, and / or postures of the multiple SLMs are mechanically adjusted based on variations in the irradiation timing of the multiple SLMs so that the projected images from the multiple SLMs have a predetermined positional relationship. Alternatively and / or additionally, the exposure device is optically adjusted so that the projected images from the multiple SLMs have a predetermined positional relationship based on variations in the irradiation timing of the multiple SLMs. For example, the position of the projected image on substrate 1410 is shifted by adjusting optical elements within the projection optical system (projection lens 1330), or by moving the SLMs relative to the light beam.

[0062] As shown in Figure 26, by adjusting the pattern drawing data supplied to multiple SLMs, variations in the pattern projection position (exposure position) can be compensated for even when the irradiation timing differs between the multiple SLMs. For example, data corresponding to projection positions that are sequentially shifted along the scanning direction are supplied to each of the multiple SLMs. In one example, at least a portion of the pattern data is corrected based on variations in the irradiation timing of the multiple SLMs so that the projected images from the multiple SLMs have a predetermined positional relationship. For example, the pattern data supplied to at least one of the multiple SLMs includes correction data for a predetermined direction shift relative to a reference position, based on differences in irradiation timing. Alternatively and / or additionally, the pattern data may determine the amount of displacement in the predetermined direction relative to the reference position based on at least one of the movement speed of the substrate stage 1400, the display update frequency of the SLMs, the oscillation frequency of the laser beam, the rotation speed of the polygon mirror device (rotation device) serving as the time divider 50, the number of SLMs 60 (projection lenses 1330), and so on.

[0063] As shown in FIG27 , in an exposure apparatus that exposes a pattern on a substrate 1410 by switching the scanning direction (e.g., the substrate stage's movement direction) between a positive direction and a negative direction (between one direction and its opposite direction), the pattern data supplied to multiple SLMs can be adjusted based on the scanning direction at the corresponding timing. For example, the pattern data supplied to at least one of the multiple SLMs includes first correction data for a positive shift in the scanning direction relative to a reference position, and second correction data for a negative shift in the scanning direction relative to the reference position.

[0064] Alternatively and / or additionally, in an exposure device in which the scanning direction (for example, the movement direction of the substrate carrier) switches between a + direction and a - direction (between one direction and its opposite direction), the exposure device can be mechanically and / or optically adjusted each time the scanning direction is switched.

[0065] As shown in Figure 28, the exposure apparatus (optical apparatus) 1000 may include a drive mechanism 1510 for mechanical adjustment and a drive mechanism 1520 for optical adjustment. Furthermore, the exposure apparatus 1000 may include a database 1530 (or storage unit) storing setting parameters and / or programs for data correction. This displacement adjustment may be performed based on the output of a reference system 1540, which includes, for example, a reference sensor. Furthermore, when the SLM is mounted on the exposure apparatus 1000, if the mounting position is pre-shifted, the drive mechanism 1510 may be omitted. Furthermore, even when the SLM is pre-shifted, the drive mechanism 1510 may be used to compensate for mounting errors.

[0066] In an example of an exposure apparatus 1000 in which the timing of irradiating a light beam differs between multiple SLMs, the control system 1500 can control at least one of (a-1) mechanical adjustment of the exposure apparatus 1000 using the drive mechanism 1510, (a-2) optical adjustment of the exposure apparatus 1000 using the drive mechanism 1520, or (a-3) correction of pattern data using the database 1530 based on the irradiation timing of each of the multiple SLMs. For example, displacement adjustment can be performed by combining all of (a-1), (a-2), and (a-3). Alternatively, displacement adjustment can be performed based on a combination of one or two of (a-1), (a-2), and (a-3). In one example, pattern data correction is suitable for relatively large and / or coarse displacement adjustments, while mechanical and / or optical adjustment is suitable for relatively small and / or fine displacement adjustments. In another example, other methods than those described above can be applied.

[0067] Alternatively and / or additionally, the displacement adjustment can be performed based on the timing of beam usage. Even when the beam is not used for a specified period (e.g., when no pulses are used), the displacement adjustment can compensate for variations in the pattern projection position (exposure position). For example, deviations in the pattern projection position can be avoided by not using the beam during periods of relatively unstable periods and selectively using a stable beam.

[0068] In one embodiment, as shown in FIG29 , an exposure apparatus 1000 includes: multiple laser light sources 20; multiple output modules 30 having multiple SLMs 60; and a polygon mirror device (rotation device) serving as a time divider 50, disposed between the multiple laser light sources 20 and the output module 30, to temporally divide the laser beams emitted and combined from the multiple laser light sources 20. The beams from the laser light sources 20 are reflected by the multiple reflecting surfaces 52 of the polygon mirror 51 in the polygon mirror device serving as the time divider 50. The beams are temporally divided according to the rotation angle of the polygon mirror 51. The beams reflected by the polygon mirror 51 are distributed to the multiple SLMs 60 via multiple optical fibers 80 according to the rotation angle of the polygon mirror 51. In one example, the time-divided beams from the polygon mirror 51 are distributed to five SLMs 60. For example, the beams corresponding to the first pulse, the sixth pulse, and so on are incident on the first SLM. The beams corresponding to the second pulse, the seventh pulse, and so on are incident on the second SLM.

[0069] In one embodiment, as shown in FIG30 , an exposure apparatus 1000 includes: a plurality of laser light sources 20; a plurality of output modules 30 having a plurality of SLMs 60; a polygon mirror device (rotating device) serving as a time divider 50, disposed between the plurality of laser light sources 20 and the plurality of output modules 30, and temporally dividing the laser beams emitted from the plurality of laser light sources 20 and synthesized; and an optical switch device serving as a sub-divider 70, disposed between the plurality of laser light sources 20 and the polygon mirror device serving as the time divider 50. In one example, during a first span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 travels along a path "A" toward a first position of the polygon mirror device serving as the time divider 50, and is reflected by the polygon mirror 51 (reflection surface 52A). During a second span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 travels along a path "B" toward a second position of the polygon mirror device serving as the time divider 50, and is reflected by the polygon mirror 51 (reflection surface 52B). The light beam is alternately supplied to the first and second positions of polygon mirror 51. The light beam is further temporally divided according to the rotation angle of polygon mirror 51. In other words, in this example, two time dividers are arranged in series along the optical path, temporally dividing the light beam into two segments. In one example, the time-divided light beam from polygon mirror 51 is distributed to ten SLMs 60. For example, the light beams corresponding to the first pulse, the eleventh pulse, and so on, are incident on the first SLM. The light beams corresponding to the second pulse, the twelfth pulse, and so on, are incident on the second SLM. In other words, the light beam reflected by reflective surface 52A of polygon mirror 51 is directed to the first group of SLMs (from the first to the fifth SLM in Figure 30), while the light beam reflected by reflective surface 52B is directed to the second group of SLMs (from the sixth to the tenth SLM in Figure 30).

[0070] In one embodiment, as shown in FIG31 , an exposure apparatus 1000 includes: multiple laser light sources 20; multiple output modules 30 having multiple SLMs 60; multiple polygon mirror devices (rotating devices) serving as time dividers 50, arranged between the multiple laser light sources 20 and the multiple output modules 30, to temporally divide the laser beams emitted from the multiple laser light sources 20 and synthesized; and an optical switch device serving as a sub-divider 70, arranged between the multiple laser light sources 20 and the multiple polygon mirror devices serving as the time dividers 50. The multiple polygon mirrors 51A and 51B of the multiple polygon mirror devices serving as the time dividers 50 are arranged in parallel with respect to the optical path. In one example, during a first span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 is directed toward polygon mirror 51A and reflected by the reflective surface of polygon mirror 51A. During a second span on the time axis, the light beam from the optical switch device serving as the sub-divider 70 is directed toward polygon mirror 51B and reflected by the reflective surface of polygon mirror 51B. The beam is further temporally split based on the rotation angles of polygon mirrors 51A and 51B. In one example, the time-split beam from polygon mirror 51A is distributed to five SLMs 60. The time-split beam from polygon mirror 51B is distributed to another five SLMs 60. For example, the beams corresponding to the first pulse, the eleventh pulse, and so on are incident on the first SLM. The beams corresponding to the sixth pulse, the sixteenth pulse, and so on are incident on the sixth SLM. In other words, the beam reflected by polygon mirror 51A is directed to the first group of SLMs (from the first to the fifth SLM in Figure 31), while the beam reflected by polygon mirror 51B is directed to the second group of SLMs (from the sixth to the tenth SLM in Figure 30).

[0071] In one embodiment, as shown in FIG32 , an exposure apparatus 1000 includes: multiple laser light sources 20; multiple output modules 30 having multiple SLMs 60; multiple optical switching devices serving as time dividers 50, arranged between the multiple laser light sources 20 and the multiple output modules 30, to temporally divide the laser beams emitted from the multiple laser light sources 20 and synthesized; and an optical switching device serving as a sub-divider 70, arranged between the multiple laser light sources 20 and the multiple optical switching devices serving as the time dividers 50. The multiple optical components 55A, 55B, and 55C of the multiple optical switching devices serving as the time dividers 50 are arranged in parallel with respect to the optical path. In one example, during a first span on the time axis, the beam from the optical switching device serving as the sub-divider 70 is directed toward optical component 55A and time-divided by optical component 55A. During a second span on the time axis, the beam from the optical switching device serving as the sub-divider 70 is directed toward optical component 55B and time-divided by optical component 55B. During the third span on the time axis, the light beam from the optical switch device serving as sub-divider 70 is directed toward optical component 55C and time-divided by optical component 55C. In one example, the time-divided light beam from optical component 55A is distributed to three SLMs 60. The time-divided light beam from optical component 55B is distributed to another three SLMs 60. The time-divided light beam from optical component 55C is further distributed to another three SLMs 60. For example, the light beams corresponding to the first pulse, the tenth pulse, and so on are incident on the first SLM. The light beams corresponding to the fourth pulse, the thirteenth pulse, and so on are incident on the fourth SLM. The light beams corresponding to the seventh pulse, the sixteenth pulse, and so on are incident on the seventh SLM. In other words, the light beam time-divided by the optical component 55A is guided to the first SLM group (from the first SLM to the third SLM in Figure 32), the light beam time-divided by the optical component 55B is guided to the second SLM group (from the fourth SLM to the sixth SLM in Figure 32), and the light beam time-divided by the optical component 55C is guided to the third SLM group (from the seventh SLM to the ninth SLM in Figure 32).

[0072] In one embodiment, as shown in FIG33 , an exposure apparatus 1000 includes: a laser light source 20; multiple SLMs 60; multiple polygon mirrors 51A, 51B, and 51C disposed between the laser light source 20 and the multiple SLMs 60, serving as a time divider 50; and multiple optical switch devices (optical components 75A and 75B) disposed between the laser light source 20 and the multiple polygon mirrors 51A, 51B, and 51C, serving as a sub-divider 70. For example, optical components 75A and 75B are rotating plates having reflective and transmissive regions arranged circumferentially. In one example, during a first span on the time axis, a light beam reflected by optical component 75A travels toward polygon mirror 51A and is reflected by the reflective surface of polygon mirror 51A. During a second span on the time axis, a light beam transmitted through optical component 75A and reflected by optical component 75B travels toward polygon mirror 51B and is reflected by the reflective surface of polygon mirror 51B. During the third span on the time axis, the light beam passing through optical component 75B travels toward polygon mirror 51C and is reflected by its reflective surface. The light beam is further divided in time based on the rotation angles of polygon mirrors 51A, 51B, and 51C. The slight changes in the light beam's incident angle due to the rotation of polygon mirrors 51A and 51C contribute to speckle reduction.

[0073] In one embodiment, as shown in FIG34 , an exposure apparatus 1000 includes: a plurality of laser light sources 20; a plurality of SLMs 60; a plurality of polygon mirrors 51A, 51B, 51C, 51D, 51E, and 51F disposed between the laser light sources 20 and the SLMs 60 as a time divider 50; and a plurality of optical switching devices (optical components 75A, 75B, 75C, 75D, 75E, and 75F) disposed between the laser light sources 20 and the polygon mirrors 51A through 51F as a sub-divider 70. For example, optical components 75A through 75F are AOMs (acousto-optic modulators). In one example, in the first span on the time axis, the light beam branched by optical component 75C is directed toward polygon mirror 51C, while the light beam branched by optical component 75F is directed toward polygon mirror 51F. During the second span on the time axis, the light beam branched by optical component 75B is directed toward polygon mirror 51B, while the light beam branched by optical component 75E is directed toward polygon mirror 51E. During the third span on the time axis, the light beam branched by optical component 75A is directed toward polygon mirror 51A, while the light beam branched by optical component 75D is directed toward polygon mirror 51D. The light beam is further divided in time based on the rotation angles of polygon mirrors 51A-51F. The slight changes in the light beam's incident angle due to the rotation of polygon mirrors 51A-51F contribute to speckle reduction.

[0074] In the example shown in FIG35 , substrate 1410 is sequentially exposed using light beams from multiple output modules according to the timing of pulsed light emission. Specifically, multiple patterns are sequentially projected onto substrate 1410 based on the light beams from multiple output modules (1, 2, 3, ..., n) according to the timing of pulsed light emission.

[0075] In one embodiment, as shown in FIG36 , exposure apparatus 1000 includes a master clock (an oscillator that generates the master clock) 4010, which serves as a synchronization reference. In exposure apparatus 1000 of FIG36 , at least the laser light source 20, the time divider (e.g., a polygon mirror device) 50, the sub-divider (e.g., an optical switch device) 70, the SLM (e.g., a DMD) 60, and the substrate stage 1400 are driven based on master clock 4010. As shown in FIG37 , an origin sensor 4020 is provided for each of these components as needed.

[0076] 37 , the control system 1500 obtains information about the rotation of the polygon mirror 51 based on output data from the origin sensor 4020. The control system 1500 can control each device based on information from each device and information from the master clock 4010.

[0077] As shown in Figure 38 , the control system 1500 adjusts the rotational speed of the polygon mirror 51 based on the rotational information of the polygon mirror 51 to match the clock frequency of the master clock 4010. Furthermore, the control system 1500 adjusts the phase of the polygon mirror 51 to match the clock timing of the master clock 4010. As a result, the polygon mirror 51 is rotationally controlled in synchronization with the master clock 4010. The sub-divider (the optical switching device serving as the sub-divider 70) ( Figure 36 ) can also be adjusted in the same manner.

[0078] Furthermore, the control system 1500 can control the trigger signal for starting image display in the SLM 60, using the master clock 4010 as a reference, thereby controlling the image update frequency. The control system 1500 can also control the operation of the substrate stage 1400, which supports the substrate, using the master clock 4010 as a reference. Furthermore, the control system 1500 can control the operation of the SLM stage 1430, which supports the SLM 60, to eliminate positional deviations with the substrate stage 1400. By operating the SLM stage 1430, the position of the projected image on the substrate 1410 can be moved as described above. As shown in FIG39 , by referencing the master clock 4010, the operating timing of each component is appropriately adjusted, and the relationship between the operating timings of multiple components is appropriately set.

[0079] Here, in the time divider 50 and sub-divider 70, if a light beam strikes the boundary between the multiple regions provided for time division, the emitted light beam may become unstable. For example, in the rotating plate 55 shown in FIG9(b) above, if a light beam strikes the top or bottom of the boundary between the optical surface (first reflective surface) 56 and the optical surface (second reflective surface) 57, the reflected light beam may scatter or its direction may become disturbed.

[0080] As shown in Figure 40, by appropriately controlling the rotation of rotating plate 55 according to the oscillation timing of laser light source 20, the light beam can be prevented from entering the boundary between optical surface (first reflective surface) 56 and optical surface (second reflective surface) 57 of rotating plate 55. For example, between the (n+1)th and (n+2)th pulses, the rotation of rotating plate 55 is controlled so that the optical boundary (top or bottom) of rotating plate 55 is located at the target irradiation position of the light beam. This improves light beam utilization efficiency.

[0081] Alternatively and / or additionally, the optical boundary used for division in the time divider 50 (or sub-divider 70) can be processed differently than other areas. In one example, as shown in FIG41 , additional processing is performed near the boundary (near the bottom) between the optical surface (first reflective surface) 56 and the optical surface (second reflective surface) 57 of the rotating plate 55. For example, relatively high-precision additional processing is performed near the boundary of the rotating plate 55. The high surface accuracy of the area near the optical boundary improves the efficiency of light beam utilization.

[0082] In the example of Figure 41 , steps 55a and 55b are formed near the boundary (near the bottom) between the optical surface (first reflective surface) 56 and the optical surface (second reflective surface) 57 of the rotating plate 55, serving as additional processing marks. By appropriately controlling the rotation of the rotating plate 55 according to the oscillation timing of the laser light source 20, the light beam can be prevented from entering the steps 55a and 55b of the rotating plate 55. For example, between the (n)th and (n+1)th pulses, the rotation of the rotating plate 55 is controlled so that the step 55a of the rotating plate 55 is positioned at the target irradiation position of the light beam. Furthermore, between the (n+2)th and (n+3)th pulses, the rotation of the rotating plate 55 is controlled so that the step 55b of the rotating plate 55 is positioned at the target irradiation position of the light beam.

[0083] In one embodiment, an exposure device (exposure device 1000) for exposing a predetermined pattern on a substrate includes: a light source (laser light source 20); a spatial light modulator (SLM60) for spatially modulating light from the light source (laser light source 20) based on pattern data describing the predetermined pattern; a projection optical system (projection lens 1330) for projecting an image of the spatially modulated light onto the substrate; and an optical path switcher (time divider 50, sub-divider 70) for switching the optical path of light sequentially oscillated from the light source (laser light source 20) and sequentially guiding the light to a plurality of the spatial light modulators (SLM60). ) in a manner that switches the optical path of the light, and the optical path switch (time divider 50, sub-divider 70) includes a first switch (sub-divider 70) and a second switch (time divider 50). The first switch (sub-divider 70) switches the optical path to either a first optical path or a second optical path, and the second switch (time divider 50) switches the light directed to the first optical path to a spatial light modulator (SLM60) of a first group among a plurality of spatial light modulators, and switches the light directed to the second optical path to a spatial light modulator (SLM60) of a second group among a plurality of spatial light modulators, thereby guiding the light respectively.

[0084] In one example, the first switch (sub-divider 70) includes: a first area that guides the light oscillated from the light source (laser light source 20) during a first period to the first optical path; and a second area that guides the light oscillated from the light source (laser light source 20) during a second period different from the first period to the second optical path.

[0085] For example, the first area reflects the light, and the second area transmits the light.

[0086] For example, the first area is arranged at a first angle relative to the light, reflects the light and guides the light to the first light path, and the second area is arranged at a second angle relative to the light that is different from the first angle, reflects the light and guides the light to the second light path.

[0087] In another example, the second switch (time divider 50) has a first reflecting surface (reflecting surface 52A) that reflects the light toward the spatial light modulator (SLM60) of the first group, and a second reflecting surface (reflecting surface 52B) that reflects and guides the light toward the spatial light modulator (SLM60) of the second group.

[0088] The second switch (time divider 50) has a first switch (time divider 50, polygon mirror 51A) that guides the light to the spatial light modulator (SLM60) of the first group, and a second switch (time divider 50, polygon mirror 51B) that guides the light to the spatial light modulator (SLM60) of the second group.

[0089] Alternatively and / or additionally, the exposure device (exposure device 1000) includes a data sending unit (control system 1500) that sends the pattern data to the spatial light modulator (SLM60), and the spatial light modulator (SLM60) has a plurality of first spatial light modulators (SLM60) and second spatial light modulators (SLM60) arranged in a second direction intersecting with the first direction in which the substrate moves during exposure. The data sending unit (control system 1500) divides the pattern data into first pattern data sent to the first spatial light modulator (SLM60) and second pattern data sent to the second spatial light modulator (SLM60), and causes the positions of the first pattern data and the second pattern data to be relatively displaced with respect to the first direction.

[0090] Alternatively and / or additionally, the exposure device (exposure device 1000) includes a data sending unit (control system 1500) that sends the pattern data to the spatial light modulator (SLM60), and the spatial light modulator (SLM60) has a first spatial light modulator (SLM60) and a second spatial light modulator (SLM60), and the data sending unit (control system 1500) divides the pattern data into first pattern data sent to the first spatial light modulator (SLM60) and second pattern data sent to the second spatial light modulator (SLM60), and causes the positions of the first pattern data and the second pattern data to be relatively displaced.

[0091] For example, the second switch (time divider 50) is a polygon mirror.

[0092] In one embodiment, an exposure device (exposure device 1000) exposes a predetermined pattern to a substrate moving in a first direction via a first spatial light modulator (SLM60) and a second spatial light modulator (SLM60) arranged in a second direction intersecting the first direction. The exposure device (exposure device 1000) includes: a light source (laser light source 20); a data transmission unit (control system 1500) that transmits pattern data described based on the predetermined pattern to the first spatial light modulator (SLM60) and the second spatial light modulator (SLM60); a first projection optical system (projection lens 1330) that projects a projection image of the light from the light source (laser light source 20) spatially modulated by the first spatial light modulator (SLM60) based on the first pattern data onto the substrate, the first pattern data being a part of the pattern data and transmitted by the data transmission unit (control system 1500); and a second projection optical system (projection lens 1330) that transmits a projection image of the light from the light source (laser light source 20) spatially modulated by the second spatial light modulator (SLM60) based on the second pattern data. The device (SLM60) spatially modulates the light from the light source (laser light source 20) and projects a projection image of the light onto the substrate. The second pattern data is another part of the pattern data and is sent by the data sending unit (control system 1500). An optical path switcher (time divider 50) switches the optical paths of the light sequentially oscillated from the light source (laser light source 20) and guides them in the order of the first spatial light modulator (SLM60) and the second spatial light modulator (SLM60). The data sending unit (control system 1500) divides the pattern data into the first pattern data and the second spatial data, so that the positions of the first pattern data and the second pattern data with respect to the first direction are relatively displaced.

[0093] In one example, an exposure device (exposure device 1000) includes an oscillator (master clock 4010) that emits a master clock that synchronizes at least two of the light source (laser light source 20), the spatial light modulator (SLM60), and the optical path switch (time divider 50).

[0094] For example, the exposure device further includes a synthesizer (distribution module 1200) that synthesizes the light emitted from multiple light sources (laser light sources 20), and the optical path switcher (time divider 50) switches the optical path of the light synthesized by the synthesizer (distribution module 1200).

[0095] In one embodiment, a method for manufacturing a flat panel display includes: exposing the substrate using the exposure device (exposure device 1000); and developing the exposed substrate.

[0096] In one embodiment, a device manufacturing method includes: exposing the substrate using the exposure device (exposure device 1000); and developing the exposed substrate.

[0097] Furthermore, the exposure apparatus 1000 can also be used as, for example, a semiconductor photolithography system for exposing integrated circuit patterns on a wafer or a photolithography system for manufacturing thin-film magnetic heads.

[0098] Furthermore, in the various embodiments described above, it was explained that a low-frequency, high-energy beam output can be achieved by combining the synthesis and time division of multiple beams, but this is not limiting. When a high-energy beam is output from a laser light source, it is not necessary to synthesize multiple beams.

[0099] Furthermore, combining multiple beams includes combining the optical axes of the laser beams emitted from multiple light sources so that they align. Furthermore, even if the optical axes of the laser beams emitted from multiple light sources do not align, if the optical axes are sufficiently close together, this also includes producing a high-energy beam output or combining the beams.

[0100] The photolithography system can be constructed by assembling various subsystems to maintain the required mechanical, electrical, and optical precision. In order to maintain the various precisions before and after assembly, each optical system is adjusted in a manner to achieve its optical precision. Similarly, the mechanical and electrical systems are adjusted in a manner to achieve mechanical and electrical precision. The process of assembling the subsystems in the photolithography system includes mechanical interfaces, circuit wiring connections, and air pressure piping connections between the subsystems. Before assembling the photolithography system from the various subsystems, there is also a process of assembling the subsystems. If the photolithography system is temporarily assembled using the various subsystems, all adjustments are performed in a manner that reliably maintains the precision of the complete photolithography system. Furthermore, it is ideal to manufacture the exposure system in a clean room where temperature and cleanliness can be controlled.

[0101] Furthermore, the substrate to be exposed is not limited to a glass plate; for example, it may be a wafer, a ceramic substrate, a film member, a blank mask, or other objects. Furthermore, when the exposure object is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a film (a flexible sheet-like member) may be used. Furthermore, the exposure apparatus of this embodiment is particularly effective when the exposure object is a substrate having a side length or a diagonal length of 500 mm or greater.

[0102] Electronic devices such as liquid crystal display elements (or semiconductor elements) are manufactured through the following steps: designing the device's functions and performance; creating a mask (or reticle) based on this design; creating a glass substrate (or wafer); a lithography step in which the mask (reticle) pattern is transferred to the glass substrate using the exposure apparatus and exposure method described in each embodiment; a development step in which the exposed glass substrate is developed; an etching step in which exposed components are removed from areas other than those where resist remains; a resist removal step in which unnecessary resist is removed after etching; a device assembly step; and an inspection step. In this case, in the lithography step, the device pattern is formed on the glass substrate using the exposure apparatus described in each embodiment and the exposure method described, thereby enabling the manufacture of highly integrated devices with high productivity.

[0103] According to the system disclosed above, the objectives and effects can be achieved. These are merely examples of implementations and are not intended to limit the structure or design in detail.

[0104] 20: Laser light source 30: Output module 40:Controller 50:Time Splitter 51, 51A, 51B, 51C, 51D, 51E, 51F: polygonal mirror 52, 52A, 52B: Reflective surface 55: Rotating plate 55A, 55B, 55C: Optical components 55a, 55b: step difference 56: Optical surface 57: Optical surface 58: Stable Zone 59: Unstable area and / or non-preferred area (corner part) 60:Spatial Light Modulator (SLM) 70: Sub-divider 75A, 75B, 75C, 75D, 75E, 75F: Optical components 80: Fiber Optic 85, 86: Lens 90: Aperture device 91: Aperture 1000: Exposure device (optical device) 1100: Light source module 1200: Allocation module 1300: Lighting system 1310: Department of Illumination Optics 1330: Projection lens 1400: Substrate carrier 1410:Substrate 1430:SLM stage 1500: Control System 1510: Driving mechanism for mechanical adjustment 1520: Drive mechanism for optical adjustment 1530: Database 1540: Reference System 4010: Main clock (oscillator) 4020: Origin sensor A, B: Path X, Y: direction

Claims

1. An exposure apparatus, comprising: A light source that emits pulsed light with a predetermined oscillation frequency; A first spatial light modulator, wherein pulsed light is incident on the first spatial light modulator and the resulting image is updated at a predetermined image update frequency; a platform, holding an exposed object illuminated by light from the first spatial light modulator and moving the exposed object relative to the first spatial light modulator in a first direction; an oscillator, emitting a clock with a predetermined frequency; and adjusting at least two of the predetermined oscillation frequency, the predetermined image update frequency, and the movement of the platform based on the predetermined frequency of the clock.

2. The exposure apparatus as claimed in claim 1, wherein the predetermined image update frequency of the first spatial light modulator is controlled based on the predetermined frequency of the clock.

3. The exposure apparatus as described in claim 1, wherein a trigger signal controlling the predetermined image update frequency is input to the first spatial light modulator.

4. The exposure apparatus as claimed in any one of claims 1 to 3, wherein the predetermined oscillation frequency, the predetermined image update frequency, and the movement of the platform are adjusted based on the predetermined frequency of the clock.

5. The exposure apparatus according to any one of claims 1 to 3, wherein the moving speed of the platform is adjusted based on the emission time of one pulse of the pulsed light.

6. The exposure apparatus according to any one of claims 1 to 3, comprising: Second spatial light modulator; Third-space optical modulator; An optical path switcher, wherein the pulsed light includes a first pulse, a second pulse, and a third pulse arranged at predetermined time intervals, the optical path switcher guides the first pulse to a first optical path equipped with a first spatial light modulator, guides the second pulse to a second optical path equipped with a second spatial light modulator, and guides the third pulse to a third optical path equipped with a third spatial light modulator; the optical path switcher switches between the first optical path, the second optical path, and the third optical path based on the predetermined frequency of the clock.

7. The exposure apparatus as claimed in claim 6, comprising: The first projection optics system projects a projected image of light from the first spatial light modulator onto the exposed object; A second projection optics system projects a projected image of light from the second spatial light modulator onto the exposure object; and a third projection optics system projects a projected image of light from the third spatial light modulator onto the exposure object.

8. The exposure apparatus of claim 7, wherein pattern data adjusted in such a manner as to offset the projection position of the projected image in the exposed object in the first direction is output to the first spatial light modulator, the second spatial light modulator, and the third spatial light modulator based on at least one of the platform's moving speed, the predetermined image update frequency, and the predetermined oscillation frequency.

9. The exposure apparatus of claim 7, wherein at least one of the positions and orientations of at least one of the first spatial light modulator, the second spatial light modulator, and the third spatial light modulator is set based on at least one of the platform's moving speed, the predetermined image update frequency, and the predetermined oscillation frequency, such that the projection position of the projected image in the exposed object is offset in the first direction; or, the optical elements of at least one of the first spatial light modulator, the second spatial light modulator, and the third spatial light modulator are adjusted.

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