Anti-glare film and image display device

Abstract

This invention provides an anti-glare film with excellent anti-glare properties and the ability to suppress reflected and scattered light. The anti-glare film has an anti-glare layer and an uneven surface. AM1 is defined as the sum of the amplitudes corresponding to spatial frequencies of 0.005 μm⁻¹, 0.010 μm⁻¹, and 0.015 μm⁻¹ in the amplitude spectrum of the uneven surface elevation, and AM2 is defined as the amplitude at a spatial frequency of 0.300 μm⁻¹. AM1 is defined as 0.070 μm or more and 0.400 μm or less, AM2 is 0.0050 μm or more, and AM2 < AM1.

Description

Anti-glare film and image display device This invention relates to an anti-glare film and an image display device. Sometimes, anti-glare films are applied to the surface of display devices such as televisions, laptops, and desktop PCs to suppress the reflection of lighting and backgrounds such as people. Anti-glare films have a basic structure consisting of an anti-glare layer with an uneven surface on a transparent substrate. Examples of such anti-glare films include Patent Documents 1-4. [Prior Art Documents][Patent Documents] Patent Document 1: Japanese Patent Application Publication No. 2005-234554; Patent Document 2: Japanese Patent Application Publication No. 2009-86410; Patent Document 3: Japanese Patent Application Publication No. 2009-265500; Patent Document 4: International Publication No. W02013 / 015039 [Problem to be Solved by the Invention] Conventional anti-glare films, such as those in Patent Documents 1-4, impart anti-glare properties but blur reflected images, making it difficult to adequately suppress the reflection of background elements such as lighting and people. On the other hand, by increasing the surface roughness of the anti-glare layer, reflection can be adequately suppressed, thus improving anti-glare performance. However, simply increasing the surface roughness increases reflected and scattered light, resulting in a loss of contrast in the image display device. The objective of this invention is to provide an anti-glare film with excellent anti-glare properties and the ability to suppress reflected and scattered light. [Technical means to solve the problem] The present invention provides the following [1] to [5] anti-glare film and display device. [1] An anti-glare film having an anti-glare layer, and the anti-glare film having an uneven surface, wherein the spatial frequencies of the amplitude spectrum of the uneven surface are 0.005 μm. -1 0.010 μm -1 0.015 μm -1 The sum of the amplitudes corresponding to the time interval is defined as AM1, with a spatial frequency of 0.300 μm. -1 When the amplitude of time is defined as AM2, AM1 is above 0.070 μm and below 0.400 μm, AM2 is above 0.0050 μm, and AM2 < AM1. [2] An anti-glare film having an anti-glare layer, the anti-glare film having an uneven surface, and the smoothed reflected light intensity measured under the following measurement conditions satisfies conditions 1 and 2 below. <Measurement conditions> (1) In the transmission measurement mode of the angle photometer, visible light is emitted from the light source of the angle photometer in the form of parallel light rays, and the intensity of the emitted light is measured at an opening angle of 1 degree without passing through the sample, and the standard is checked with a maximum intensity of 100,000. (2) A black plate is attached to the surface of the anti-glare film opposite to the uneven surface by means of a transparent adhesive layer, thereby creating a sample α having the uneven surface formed by laminating the anti-glare film, the transparent adhesive layer and the black plate. (3) Place the above sample α on a variable angle photometer, and illuminate the above uneven surface of the sample α with visible light in the form of parallel rays from the light source of the variable angle photometer, and measure the intensity of reflected light with an opening angle of 1 degree; the illumination angle of the parallel rays is set to be inclined at +45 degrees from the normal direction of the sample α. The intensity of reflected light is measured from 0 degrees to -85 degrees from the normal direction of the sample α at 1-degree intervals; in order to maintain the standard verification effect of (1), the intensity of reflected light is measured in the transmission measurement mode. (4) Perform the smoothing process shown in the following formula (i) at each angle from 0 degrees to -85 degrees, and set the intensity of reflected light after smoothing as the smoothed reflected light intensity at each angle. The smoothed reflected light intensity at degree n = ([reflected light intensity at degree n-2] + [reflected light intensity at degree n-1] + [reflected light intensity at degree n] + [reflected light intensity at degree n+1] + [reflected light intensity at degree n+2]) / 5 (i) <Condition 1> When the smoothed reflected light intensity at degree n is defined as Rn, and the smoothed reflected light intensity at degree n-1 is defined as Rn-1, the maximum absolute value of the difference between Rn and Rn-1 is 2.00 or less. <Condition 2> The smoothed reflected light intensity at degree -35 is 4.0 or less. [3] An anti-glare film having an anti-glare layer, wherein the anti-glare film has an uneven surface, wherein the three-dimensional arithmetic mean roughness Sa of the uneven surface is 0.30 μm or more, and the three-dimensional average peak spacing Smp is 10.00 μm or less. [4] An anti-glare film having an anti-glare layer, the anti-glare film having an uneven surface, and having any one of the following three components: the first component, the second component, and the third component. The first component has a spatial frequency of 0.005 μm in the amplitude spectrum of the elevation of the uneven surface. -1 0.010 μm -1 0.015 μm -1 The sum of the amplitudes corresponding to the time interval is defined as AM1, with a spatial frequency of 0.300 μm. - 1 When the amplitude is defined as AM2, AM1 is 0.070 μm or more and 0.400 μm or less, AM2 is 0.0050 μm or more, and AM2 < AM1. The smoothed reflected light intensity measured under the following measurement conditions in the "Second Composition" satisfies the following conditions 1 and 2. <Measurement Conditions> (1) In the transmission measurement mode of the angle photometer, visible light is emitted from the light source of the angle photometer in the form of parallel light rays. The intensity of the emitted light is measured at an opening angle of 1 degree without passing through the sample. The standard is checked with a maximum intensity of 100,000. (2) A black plate is attached to the surface opposite to the above-mentioned uneven surface of the anti-glare film through a transparent adhesive layer, thereby creating a sample α having the above-mentioned uneven surface formed by laminating the above-mentioned anti-glare film, transparent adhesive layer and black plate. (3) Place the above sample α on a variable angle photometer, and illuminate the above uneven surface of the sample α with visible light in the form of parallel light from the light source of the variable angle photometer, and measure the intensity of reflected light with an opening angle of 1 degree; the illumination angle of the parallel light is set to be inclined at +45 degrees from the normal direction of the sample α; the intensity of reflected light is measured at 1 degree intervals from 0 degrees to -85 degrees from the normal direction of the sample α; in order to maintain the standard verification effect of (1), the intensity of reflected light is measured in the transmission measurement mode. (4) Perform the smoothing process shown in the following formula (i) at each angle from 0 degrees to -85 degrees, and set the intensity of reflected light after smoothing as the smoothed reflected light intensity at each angle. The smoothed reflected light intensity at degree n = ([reflected light intensity at degree n-2] + [reflected light intensity at degree n-1] + [reflected light intensity at degree n] + [reflected light intensity at degree n+1] + [reflected light intensity at degree n+2]) / 5 (i) <Condition 1> When the smoothed reflected light intensity at degree n is defined as Rn, and the smoothed reflected light intensity at degree n-1 is defined as Rn-1, the maximum absolute value of the difference between Rn and Rn-1 is 2.00 or less. <Condition 2> The smoothed reflected light intensity at degree -35 is 4.0 or less. 《Third Composition》 The three-dimensional arithmetic mean roughness Sa of the above-mentioned uneven surface is 0.30 μm or more, and the three-dimensional average peak spacing Smp is 10.00 μm or less. [5] An image display device comprising: placing an anti-glare film as described in any one of [1] to [4] above onto a display element with the surface of the uneven surface facing the side opposite to the display element, and placing the anti-glare film on the outermost surface. [Effects of the Invention] The anti-glare film and image display device of the present invention have excellent anti-glare performance and can suppress reflected and scattered light. The embodiments of the present invention will be described below. [Anti-glare film of the first embodiment] The anti-glare film of the first embodiment of the present invention has an anti-glare layer, and the anti-glare film has an uneven surface, wherein the spatial frequencies of the amplitude spectrum of the uneven surface are 0.005 μm. -1 0.010 μm -1 0.015 μm -1 The sum of the amplitudes corresponding to the time interval is defined as AM1, with a spatial frequency of 0.300 μm. - 1 When the amplitude of time is defined as AM2, AM1 is above 0.070 μm and below 0.400 μm, AM2 is above 0.0050 μm, and AM2 < AM1. In this specification, AM1 is the sum of the amplitudes of three spatial frequencies, expressed by the following formula. When stated as "In this specification, 'xxx'", unless otherwise specified, "xxx" is a common description of the anti-glare film in the first, second, and third embodiments. For example, unless otherwise specified, "In this specification, AM1 is expressed by the following formula" is synonymous with "In the anti-glare film of the first, second, and third embodiments, AM1 is expressed by the following formula." AM1 = spatial frequency of 0.005 μm -1 The temporal amplitude plus the spatial frequency is 0.010 μm. -1 The temporal amplitude plus the spatial frequency is 0.015 μm. - 1 Amplitude of time The spatial frequency is a discrete value that depends on the length of one side; therefore, it is impossible to obtain a value with a length of 0.005 μm. -1 0.010 μm -1 0.015 μm -1 and 0.300 μm - 1 In the case of a consistent spatial frequency, when no spatial frequency exists that matches the above value, the amplitude of the spatial frequency closest to the above value is selected. Figure 1 is a schematic cross-sectional view of the anti-glare film 100 according to the first embodiment of the present invention. The anti-glare film 100 in Figure 1 includes an anti-glare layer 20 and has an uneven surface. In Figure 1, the surface of the anti-glare layer 20 is the uneven surface of the anti-glare film. The anti-glare film 100 in Figure 1 has an anti-glare layer 20 on a transparent substrate 10. The anti-glare layer 20 in Figure 1 includes an adhesive resin 21 and organic particles 22. Figure 1 is a schematic cross-sectional view. That is, for ease of illustration, the proportions of each layer constituting the anti-glare film 100, the proportions of each material, and the proportions of the uneven surface are shown schematically, and are different from the actual proportions. The same applies to Figures 2 to 4 and Figures 19 to 21. The anti-glare film of the first embodiment of the present invention is not limited to the laminated structure shown in FIG1. ​​It can be any anti-glare layer having an uneven surface with AM1 of 0.070 μm or more and 0.400 μm or less, and AM2 of 0.0050 μm or more and AM2 < AM1. For example, the anti-glare film can be a single-layer structure of the anti-glare layer, or it can have a transparent substrate and layers other than the anti-glare layer, such as an anti-reflective layer and an anti-fouling layer. When other layers are present on the anti-glare layer, it is sufficient that the surfaces of the other layers are the uneven surfaces of the anti-glare film. In the first embodiment, a preferred embodiment of the anti-glare film is one in which an anti-glare layer is present on a transparent substrate, and the surface of the anti-glare layer opposite to the transparent substrate is an uneven surface. <Transparent substrate> From the viewpoint of ease of manufacture and operability of the anti-glare film, the anti-glare film of the first embodiment, as well as the anti-glare films of the second and third embodiments described below, preferably have a transparent substrate. In embodiments 1, 2, and 3, the transparent substrate is preferably a material possessing excellent light transmittance, smoothness, heat resistance, and mechanical strength. Examples of such transparent substrates include: polyester, triacetyl cellulose (TAC), cellulose diacetate, cellulose acetate butyrate, polyamide, polyimide, polyether ether, polyurethane, polypropylene, polymethyl methacrylate, polyvinyl chloride, polyvinyl acetal, polyetherketone, polymethyl methacrylate, polycarbonate, polyurethane, and amorphous olefins (Cyclo-Olefin-Polymer: COP). The transparent substrate can be formed by laminating two or more plastic films together. To improve mechanical strength and dimensional stability, polyesters such as polyethylene terephthalate and polyethylene naphthalate that have undergone stretching processing, especially biaxial stretching processing, are preferred. For better light transmittance and optical isotropy, TAC and acrylic are preferred. For superior weather resistance, COP and polyester are preferred. In the first, second, and third embodiments, the thickness of the transparent substrate is preferably 5 μm or more and 300 μm or less, more preferably 20 μm or more and 200 μm or less, and even more preferably 30 μm or more and 120 μm or less. When the anti-glare film is to be thinned, the upper limit of the thickness of the transparent substrate is preferably 60 μm, and more preferably 50 μm. When the transparent substrate is a low-moisture-permeability substrate such as polyester, COP, or acrylic, the upper limit of the thickness of the transparent substrate used for thinning is preferably 40 μm, and more preferably 20 μm. Even in the case of large screens, as long as the upper limit of the thickness of the transparent substrate is within the above range, it is less prone to strain, which is also preferable. The thickness of the transparent substrate can be measured using a digital standard micrometer (Mitutoyo, model "MDC-25SX") or similar device. Regarding the thickness of the transparent substrate, the average value obtained by measuring any 10 points is the value mentioned above. In the first, second, and third embodiments, examples of embodiments with a preferred range of thickness for the transparent substrate include: 5 μm or more and 300 μm or less, 5 μm or more and 200 μm or less, 5 μm or more and 120 μm or less, 5 μm or more and 60 μm or less, 5 μm or more and 50 μm or less, 5 μm or more and 40 μm or less, 5 μm or more and 20 μm or less, 20 μm or more and 300 μm or less, 20 μm or more and 200 μm or less, 20 μm or more and 120 μm or less, 20 μm or more and 60 μm or less, 20 μm or more and 50 μm or less, 30 μm or more and 300 μm or less, 30 μm or more and 200 μm or less, 30 μm or more and 120 μm or less, 30 μm or more and 60 μm or less, and 30 μm or more and 50 μm or less. In the first, second, and third embodiments, in order to improve adhesion, physical or chemical treatments such as corona discharge treatment can be applied to the surface of the transparent substrate to form an easy-to-adhere layer. The anti-glare film of the first embodiment requires an uneven surface. The anti-glare film of the first embodiment requires that, in the amplitude spectrum of the elevation of the uneven surface, AM1 is 0.070 μm or more and 0.400 μm or less, AM2 is 0.0050 μm or more, and AM2 < AM1. When there are no other layers on the anti-glare layer, it is sufficient that the surface of the anti-glare layer meets the above-mentioned conditions for an uneven surface. When there are other layers on the anti-glare layer, it is sufficient that the surfaces of the other layers meet the above-mentioned conditions for an uneven surface. In this specification, the term "elevation of the uneven surface" refers to the straight-line distance between any point P on the uneven surface and an imaginary plane M with an average height of uneven surface, in the direction of the normal V of the anti-glare film (see Figure 4). The reference for the elevation of the imaginary plane M is set to 0 μm. The direction of the normal V is defined as the normal direction on the imaginary plane M. When the elevation of any point P is higher than the average height, the elevation is positive; when the elevation of any point P is lower than the average height, the elevation is negative. In this specification, unless otherwise specified, the term "elevation" refers to the elevation based on the aforementioned average height. Spatial frequency and amplitude can be obtained by performing a Fourier transform on the three-dimensional coordinate data of the uneven surface. The method for calculating spatial frequency and amplitude from the three-dimensional coordinate data of the uneven surface is described below. Regarding the amplitude spectra of the elevations of uneven surfaces in AM1 and AM2, it can be said that the spatial frequency is roughly related to the reciprocal of the interval between the convex parts, and the amplitude is roughly related to the change in elevation of the convex parts with a specific interval. Spatial frequency: 0.005 μm -1 This indicates an interval of approximately 200 μm and a spatial frequency of 0.010 μm. -1 This indicates an interval of approximately 100 μm and a spatial frequency of 0.015 μm. -1 This indicates an interval of approximately 67 μm and a spatial frequency of 0.300 μm. -1 This indicates an interval of approximately 3 μm. It can be said that the "variation in elevation of protrusions with a specific interval" is roughly proportional to the absolute value of the height of each protrusion with a specific interval. Therefore, it can be said that a group of protrusions with AM1 being 0.070 μm or more and 0.400 μm or less, AM2 being 0.0050 μm or more, and AM2 < AM1, is indirectly defined as having the following groups of protrusions i and ii. <Group of protrusions i> A plurality of protrusions i are arranged at intervals of approximately 67 μm or more and 200 μm or less, and the absolute value of the height of protrusion i is within a specific range. <Group of protrusions ii> A plurality of protrusions ii are arranged at intervals of approximately 3 μm, and the absolute value of the height of protrusion ii is above a specific value but below the absolute value of the height of protrusion i. The uneven surface of the protrusion group possessing the above-mentioned i and ii is considered to exhibit excellent anti-glare properties and suppress reflected and scattered light mainly due to the reasons (x1) to (x5) below. Hereinafter, FIG2 will be used for explanation. In FIG2, the protrusion with a larger interval between its protrusions represents protrusion i. In FIG2, the protrusion with a smaller interval between its protrusions and concave parts between protrusions i, and the protrusion with a smaller interval between its protrusions and concave parts at the left and right ends of FIG2, represent protrusion ii. In FIG2, the outer edge of the protrusion with a larger absolute height value is drawn with a smooth line, but the outer edge may also have fine irregularities. It is believed that, for example, the anti-glare films of Examples 1-1 to 1-7 have fine irregularities at the outer edge of the protrusion with a larger absolute height value. (x1) In the group of convex lobes i, the interval between adjacent convex lobes i is not very long, and convex lobes i have a specific height. Therefore, most of the reflected light reflected from the surface of any convex lobe i is incident on the adjacent convex lobe i. Then, total internal reflection is repeatedly performed inside the adjacent convex lobe i, and finally propagates to the side opposite to the observer 200 (image of the solid line in Figure 2). (x2) The reflected light incident on the steep slope of any convex lobe i will propagate to the side opposite to the observer 200, and will not be related to the adjacent convex lobe i (image of the dashed line in Figure 2). (x3) Generally, the region between convex lobe i tends to form a generally flat region that produces specular reflection. However, in the first embodiment, a group of convex lobes ii is formed in the region between convex lobe i, so the proportion of specular reflection in the reflected light reflected in the above region can be reduced. (x4) The reflected light reflected in the region between convex lobe i tends to hit adjacent peaks. Therefore, the angular distribution of reflected light in the aforementioned region is approximately equal, without any bias towards a specific angle. (x5) The reflected light incident on the gentle slope of convex part i will propagate towards the observer 200 (image of the single-point chain in Figure 2). The angular distribution of the gentle slope of convex part i is equal; therefore, the angular distribution of the reflected light is also equal, without any bias towards a specific angle. First, it is believed that due to the reasons (x1) to (x3) mentioned above, reflected and scattered light can be suppressed, thus improving anti-glare performance to a certain extent. Furthermore, due to the reasons (x4) and (x5) mentioned above, even if a small amount of reflected and scattered light is generated, the angular distribution of the reflected and scattered light can be made uniform. Even if the amount of reflected and scattered light is small, when the angular distribution of the reflected and scattered light is biased at a specific angle, it is still recognized as reflected light. Therefore, due to the reasons (x4) and (x5) mentioned above, the anti-glare performance can be made excellent. Moreover, due to the reasons (x1) to (x5) mentioned above, the observer can hardly perceive the reflected and scattered light, thus giving the anti-glare film a sense of darkness, and further, giving the image display device a high-end feel. By making AM1 ≥ 0.070 μm and ≤ 0.400 μm, AM2 ≥ 0.0050 μm, and AM2 < AM1, the effects of (x1) to (x5) mentioned above can be easily produced. Therefore, the anti-glare performance can be improved, and a sense of darkness can be easily given by suppressing reflected and scattered light. To facilitate the effects described in (x1) to (x5), AM1 is preferably 0.090 μm or more and 0.390 μm or less, more preferably 0.130 μm or more and 0.380 μm or less, and even more preferably 0.150 μm or more and 0.370 μm or less. If AM is too small, the anti-glare performance is particularly prone to being insufficient. On the other hand, if AM1 is too large, the image resolution tends to decrease. Furthermore, if AM1 is too large, the ratio of light totally reflected on the uneven surface increases, thus the transmittance of image light and other light incident from the side opposite to the uneven surface tends to decrease. Also, if AM1 is too large, the number of convex portions with larger absolute height values ​​increases, thereby increasing the ratio of light reflected to the observer's side, resulting in a situation where reflected and scattered light tends to become more pronounced. Therefore, in order to suppress the decrease in resolution and transmittance, and further suppress reflected and scattered light, it is advisable not to make AM1 too large. Among the first, second, and third embodiments, the preferred embodiments for AM1 include: 0.070 μm and above and 0.400 μm and below; 0.070 μm and above and 0.390 μm and below; 0.070 μm and above and 0.380 μm and below; 0.070 μm and above and 0.370 μm and below; 0.090 μm and above and 0.400 μm and below; 0.090 μm and above and 0.390 μm and below; 0.090 μm and above and 0.380 μm and below; 0.090 μm and above and 0.370 μm and below; 0.130 μm and above and 0.400 μm and below; 0.130 μm and above and 0.390 μm and below; 0.130 μm and above and 0.380 μm and below; 0.130 μm and above and 0.37 ... Below μm, above 0.150 μm and below 0.400 μm, above 0.150 μm and below 0.390 μm, above 0.150 μm and below 0.380 μm, above 0.150 μm and below 0.370 μm. To facilitate the effects described in (x1) to (x5), AM2 is preferably 0.0055 μm or more and 0.0550 μm or less, more preferably 0.0060 μm or more and 0.0500 μm or less, further preferably 0.0070 μm or more and 0.0450 μm or less, and even more preferably 0.0080 μm or more and 0.0400 μm or less. If AM2 is too large, the image resolution tends to decrease. Therefore, to suppress the decrease in resolution, it is advisable not to make AM2 too large. Among the first, second, and third embodiments, the preferred embodiments for AM2 include: 0.0050 μm and above and 0.0550 μm, 0.0050 μm and above and 0.0500 μm, 0.0050 μm and above and 0.0450 μm, 0.0050 μm and above and 0.0400 μm, 0.0055 μm and above and 0.0550 μm, 0.0055 μm and above and 0.0500 μm, 0.0055 μm and above and 0.0450 μm, 0.0055 μm and above and 0.0400 μm, 0.0060 μm and above and 0.0550 μm, 0.0060 μm and above and 0.050 ... below and 0.0060 μm and above and below and 0.0060 μm and above and below and 0.0060 μm and above and below and 0.0060 μm and above and below and 0.0 ≥0.0450 μm, ≥0.0060 μm, ≥0.0400 μm, ≥0.0070 μm, ≥0.0550 μm, ≥0.0070 μm, ≥0.0500 μm, ≥0.0070 μm, ≥0.0450 μm, ≥0.0070 μm, ≥0.0400 μm, ≥0.0080 μm, ≥0.0550 μm, ≥0.0080 μm, ≥0.0500 μm, ≥0.0080 μm, ≥0.0450 μm, ≥0.0080 μm, ≥0.0400 μm. In this specification, the values ​​related to the amplitude spectrum of AM1 and AM2 elevations, the values ​​related to optical properties such as haze and total light transmittance, the values ​​related to surface shapes such as Sa and Smp, and the values ​​related to the smoothed reflected light intensity of Embodiment 2 refer to the average values ​​of the measurements at 16 locations. In this specification, regarding the 16 measurement locations, it is preferable to leave a 1 cm area from the outer edge of the sample as a blank area. For the area further inward than this blank area, a line is drawn that divides the longitudinal and transverse directions into 5 equal parts, and the 16 points where these lines intersect are used as the measurement centers. For example, when the sample is quadrilateral, it is preferable to leave a 1 cm area from the outer edge of the quadrilateral as a blank area, and use a dotted line to divide the area further inward than the blank area into 5 equal parts along the longitudinal and transverse directions. The 16 points where these lines intersect are used as centers for measurement, and the parameters are calculated from the average value. When the sample being measured is a shape other than a quadrilateral such as a circle, ellipse, triangle, or pentagon, it is preferable to draw a quadrilateral inscribed in the shape and measure 16 parts of the drawn quadrilateral in the manner described above. Unless otherwise specified in this specification, the optical properties such as the amplitude spectrum of AM1 and AM2 elevations, haze, and total light transmittance, the surface shapes such as Sa and Smp, and the smoothed reflected light intensity of Embodiment 2 are all measured under conditions of a temperature of 23±5℃ and a humidity of 40% to 65%. Furthermore, before each measurement, the sample is exposed to the aforementioned gaseous environment for at least 30 minutes before the measurement is performed. In this specification, AM1 is defined as the sum of the amplitudes of three spatial frequencies. That is, in this specification, AM1 takes into account three intervals as the intervals of the protrusions. Thus, in this specification, since AM1 takes into account multiple intervals, by setting AM1 to a specific value, it is easy to suppress the increase in reflected light caused by the uniformity of the protrusion intervals. In the first embodiment, the spatial frequencies are 0.005 μm. -1 0.010 μm -1 0.015 μm -1 When the average amplitude corresponding to a given time is defined as AM1ave, AM1ave is preferably 0.023 μm or more and 0.133 μm or less, more preferably 0.030 μm or more and 0.130 μm or less, further preferably 0.043 μm or more and 0.127 μm or less, and further preferably 0.050 μm or more and 0.123 μm or less. AM1ave can be expressed by the following formula: AM1ave = (spatial frequency is 0.005 μm) -1The temporal amplitude plus the spatial frequency is 0.010 μm. -1 The temporal amplitude plus the spatial frequency is 0.015 μm. -1 (Amplitude of time) / 3 Among the first, second, and third embodiments, the preferred embodiments for AM1ave include: 0.023 μm and above and 0.133 μm and below; 0.023 μm and above and 0.130 μm and below; 0.023 μm and above and 0.127 μm and below; 0.023 μm and above and 0.123 μm and below; 0.030 μm and above and 0.133 μm and below; 0.030 μm and above and 0.130 μm and below; 0.030 μm and above and 0.127 μm and below; 0.030 μm and above and 0.123 μm and below; 0.043 μm and above and 0.133 μm and below; 0.043 μm and above and 0.130 μm and below; 0.043 μm and above and 0.127 μm and below; 0.043 μm and above and 0.123 ... Below μm, above 0.050 μm and below 0.133 μm, above 0.050 μm and below 0.130 μm, above 0.050 μm and below 0.127 μm, above 0.050 μm and below 0.123 μm. In the first embodiment, the spatial frequency is 0.005 μm. -1 The amplitude corresponding to the time is defined as AM1-1, with a spatial frequency of 0.010 μm. -1 The amplitude corresponding to the time is defined as AM1-2, with a spatial frequency of 0.015 μm. -1 When the amplitude corresponding to AM1-3 is defined as AM1-3, AM1-1, AM1-2, and AM1-3 are preferably within the following range. By ensuring that AM1-1, AM1-2, and AM1-3 are within the following range, it is easy to suppress the uniformity of the spacing of the protrusions, and therefore, it is easy to suppress the increase of reflected light. In the first, second, and third embodiments, AM1-1 is preferably 0.020 μm or more and 0.150 μm or less, more preferably 0.030 μm or more and 0.140 μm or less, further preferably 0.040 μm or more and 0.130 μm or less, and further preferably 0.050 μm or more and 0.120 μm or less. Among the first, second, and third embodiments, the preferred embodiments for AM1-1 include: 0.020 μm and above and 0.150 μm and below; 0.020 μm and above and 0.140 μm and below; 0.020 μm and above and 0.130 μm and below; 0.020 μm and above and 0.120 μm and below; 0.030 μm and above and 0.150 μm and below; 0.030 μm and above and 0.140 μm and below; 0.030 μm and above and 0.130 μm and below; 0.030 μm and above and 0.120 μm and below; 0.040 μm and above and 0.150 μm and below; 0.040 μm and above and 0.140 μm and below; 0.040 μm and above and 0.130 μm and below; 0.040 μm and above and 0.120 μm and below; 0.040 μm and above and 0.120 μm and below; 0.040 μm and above and 0.120 μm and below; 0.040 μm and above and 0.150 μm and below; 0.040 μm and above and 0.14 ...30 μm and below; 0.040 μm and above and 0.120 μm and below; 0.040 μm and above and 0.150 μm and below; 0.040 μ Below μm, above 0.050 μm and below 0.150 μm, above 0.050 μm and below 0.140 μm, above 0.050 μm and below 0.130 μm, above 0.050 μm and below 0.120 μm. In the first, second, and third embodiments, AM1-2 is preferably 0.020 μm or more and 0.145 μm or less, more preferably 0.030 μm or more and 0.135 μm or less, further preferably 0.040 μm or more and 0.125 μm or less, and even more preferably 0.050 μm or more and 0.120 μm or less. Among the first, second, and third embodiments, the preferred embodiments for AM1-2 include: 0.020 μm and above and 0.145 μm and below; 0.020 μm and above and 0.135 μm and below; 0.020 μm and above and 0.125 μm and below; 0.020 μm and above and 0.120 μm and below; 0.030 μm and above and 0.145 μm and below; 0.030 μm and above and 0.135 μm and below; 0.030 μm and above and 0.125 μm and below; 0.030 μm and above and 0.120 μm and below; 0.040 μm and above and 0.145 μm and below; 0.040 μm and above and 0.135 μm and below; 0.040 μm and above and 0.125 μm and below; 0.040 μm and above and 0.120 μm and below. Below μm, above 0.050 μm and below 0.145 μm, above 0.050 μm and below 0.135 μm, above 0.050 μm and below 0.125 μm, above 0.050 μm and below 0.120 μm. In the first, second, and third embodiments, AM1-3 is preferably 0.020 μm or more and 0.145 μm or less, more preferably 0.030 μm or more and 0.135 μm or less, further preferably 0.040 μm or more and 0.125 μm or less, and further preferably 0.050 μm or more and 0.120 μm or less. Among the first, second, and third embodiments, the preferred embodiments for AM1-3 include: 0.020 μm and above and 0.145 μm and below; 0.020 μm and above and 0.135 μm and below; 0.020 μm and above and 0.125 μm and below; 0.020 μm and above and 0.120 μm and below; 0.030 μm and above and 0.145 μm and below; 0.030 μm and above and 0.135 μm and below; 0.030 μm and above and 0.125 μm and below; 0.030 μm and above and 0.120 μm and below; 0.040 μm and above and 0.145 μm and below; 0.040 μm and above and 0.135 μm and below; 0.040 μm and above and 0.125 μm and below; 0.040 μm and above and 0.120 ...45 μm and below; 0.040 μm and above and 0.145 μm and below; 0.040 μm and above and 0.145 μm and below; 0.040 μm and above and 0.145 μm and below; 0.040 μ Below μm, above 0.050 μm and below 0.145 μm, above 0.050 μm and below 0.135 μm, above 0.050 μm and below 0.125 μm, above 0.050 μm and below 0.120 μm. Regarding the anti-glare film of the first embodiment, in order to improve the balance of the protrusions with different cycles and facilitate the production of the above-mentioned (x1) to (x5) effects, AM1 / AM2 is preferably 1.0 or more and 60.0 or less, more preferably 2.0 or more and 50.0 or less, further preferably 3.0 or more and 40.0 or less, and further preferably 4.0 or more and 30.0 or less. Among the first, second, and third embodiments, the preferred embodiments for AM1 / AM2 include: 1.0 or higher and 60.0 or lower, 1.0 or higher and 50.0 or lower, 1.0 or higher and 40.0 or lower, 1.0 or higher and 30.0 or lower, 2.0 or higher and 60.0 or lower, 2.0 or higher and 50.0 or lower, 2.0 or higher and 40.0 or lower, 2.0 or higher and 30.0 or lower, 3.0 or higher and 60.0 or lower, 3.0 or higher and 50.0 or lower, 3.0 or higher and 40.0 or lower, 3.0 or higher and 30.0 or lower, 4.0 or higher and 60.0 or lower, 4.0 or higher and 50.0 or lower, 4.0 or higher and 40.0 or lower, and 4.0 or higher and 30.0 or lower. -Calculation Method of AM1 and AM2- In this specification, AM1 refers to the spatial frequency of the amplitude spectrum of the elevation on the uneven surface, which is 0.005 μm. -1 0.010 μm -1 0.015 μm -1 The sum of the amplitudes corresponding to the time intervals. Furthermore, in this specification, AM2 refers to a spatial frequency of 0.300 μm in the aforementioned amplitude spectrum. -1 Amplitude of time. The following explains the calculation methods for AM1 and AM2 in this specification. First, as mentioned above, in this specification, the term "elevation of the uneven surface" refers to the straight-line distance between any point P on the uneven surface and the imaginary plane M, which has the average height of the uneven surface, in the direction of the normal V of the anti-glare film (see Figure 4). The reference for the elevation of the imaginary plane M is set to 0 μm. The direction of the aforementioned normal V is set as the normal direction on the aforementioned imaginary plane M. When (x,y) represents the orthogonal coordinates within the uneven surface of the anti-glare film, the elevation of the uneven surface of the anti-glare film can be expressed as a two-dimensional function h(x,y) of the coordinates (x,y). The elevation of uneven surfaces is preferably measured using an interferometer. Examples of suitable interferometers include the Zygo "New View" series. The required horizontal resolution of the measuring instrument should be at least 5 μm, preferably 1 μm, and the vertical resolution should be at least 0.01 μm, preferably 0.001 μm. Considering a spatial frequency resolution of 0.0050 μm... -1 The area for measuring elevation is preferably set to be at least 200 μm × 200 μm. Next, the method for obtaining the amplitude spectrum of elevation based on the two-dimensional function h(x,y) will be explained. First, based on the two-dimensional function h(x,y), the amplitude spectrum Hx(fx) in the x-direction and the amplitude spectrum Hy(fy) in the y-direction are obtained by using the Fourier transform defined by the following equations (1a) and (1b). Where fx and fy are the frequencies in the x and y directions, respectively, and have a dimension that is the reciprocal of the length. In equations (1a) and (1b), π represents pi, and i represents the imaginary unit. The amplitude spectrum H(f) can be obtained by averaging the obtained amplitude spectrum Hx(fx) in the x direction and the amplitude spectrum Hy(fy) in the y direction. This amplitude spectrum H(f) represents the spatial frequency distribution of the uneven surface of the anti-glare film. The method for determining the amplitude spectrum H(f) of the elevation of the uneven surface of the anti-glare film will be further explained below. The three-dimensional information of the surface shape actually measured by the interferometric microscope is generally obtained as discrete values. That is, the three-dimensional information of the surface shape actually measured by the interferometric microscope is obtained as the elevation corresponding to many measurement points. Figure 5 is a schematic diagram showing the state of discretely obtaining the function h(x,y) representing the elevation. As shown in Figure 5, when (x,y) represents the orthogonal coordinates in the plane of the anti-glare layer, and the dashed lines represent the lines that divide the projection plane Sp along the x-axis at intervals of ∆x and along the y-axis at intervals of ∆y, in actual measurement, the elevation of the uneven surface is obtained as the discrete elevation value of each intersection point of the dashed lines on the projection plane Sp. The number of elevation values ​​obtained is determined by the measurement range, as well as ∆x and ∆y. As shown in Figure 5, when the measurement range in the x-axis direction is set to X = (M-1)∆x and the measurement range in the y-axis direction is set to Y = (N-1)∆y, the number of elevation values ​​obtained is M×N. As shown in Figure 5, when the coordinates of the focal point A on the projection plane Sp are set to (j∆x, k∆y), the elevation of point P on the concave-convex surface corresponding to the focal point A can be expressed as h(j∆x, k∆y). Here, j is greater than or equal to 0 and less than M-1, and k is greater than or equal to 0 and less than N-1. Here, the measurement intervals ∆x and ∆y depend on the horizontal resolution of the measuring machine. To accurately evaluate finely textured surfaces, as mentioned above, it is preferable that both ∆x and ∆y are 5 μm or less, more preferably 2 μm or less. As mentioned above, the measurement ranges X and Y are preferably both 200 μm or more. Thus, in actual measurements, the function representing the elevation of the uneven surface is obtained as a discrete function h(x,y) with M×N values. By performing the discrete Fourier transforms of the measured discrete function h(x,y) in the x and y directions respectively, as defined by the following equations (2a) and (2b), N discrete functions Hx(fx) and M discrete functions Hy(fy) are obtained. According to the following equation (2c), after obtaining their absolute values ​​(=amplitude), the average of all values ​​is obtained to obtain the amplitude spectrum H(f). In this specification, M=N and ∆x=∆y. In the following equations (2a) to (2c), "I" is an integer greater than or less than M / 2, and "m" is an integer greater than or less than N / 2. ∆fx and ∆fy are the frequency intervals in the x and y directions, respectively, defined by the following equations (3) and (4). The discrete function H(f) of the amplitude spectrum calculated in the above manner represents the spatial frequency distribution of the uneven surface of the anti-glare film. Figures 6-18 show the discrete function H(f) of the amplitude spectrum of the uneven surface elevation of Examples 1-1-1-7 and Comparative Examples 1-1-1-6. In the figures, the horizontal axis represents the spatial frequency (unit: μm). -1 The vertical axis represents the amplitude (in μm). The three-dimensional arithmetic mean roughness Sa of the uneven surface of the anti-glare film in the first embodiment of the method is preferably 0.30 μm or more. Furthermore, the three-dimensional average peak spacing Smp of the uneven surface of the anti-glare film in the first embodiment is preferably 10.00 μm or less. By ensuring that Sa and Smp are within the above ranges, it is easy to obtain an uneven surface with peaks of relatively high elevation existing at small intervals, and it is easy to ensure that AM1 and AM2 are within the above ranges. In the first, second, and third embodiments, Sa is preferably 0.40 μm or more, more preferably 0.50 μm or more, and even more preferably 0.55 μm or more. In the first, second, and third embodiments, Sa is preferably 1.00 μm or less, more preferably 0.80 μm or less, and even more preferably 0.70 μm or less. Among the first, second, and third embodiments, the preferred range of Sa can be exemplified by the following: 0.30 μm or more and 1.00 μm or less, 0.30 μm or more and 0.80 μm or less, 0.30 μm or more and 0.70 μm or less, 0.40 μm or more and 1.00 μm or less, 0.40 μm or more and 0.80 μm or less, 0.40 μm or more and 0.70 μm or less, 0.50 μm or more and 1.00 μm or less, 0.50 μm or more and 0.80 μm or less, 0.50 μm or more and 0.70 μm or less, 0.55 μm or more and 1.00 μm or less, 0.55 μm or more and 0.80 μm or less, and 0.55 μm or more and 0.70 μm or less. In the first, second, and third embodiments, Smp is preferably 8.00 μm or less, more preferably 6.00 μm or less, further preferably 4.50 μm or less, and further preferably 3.50 μm or less. In the first, second, and third embodiments, Smp is preferably 1.00 μm or more, more preferably 1.50 μm or more, and further preferably 2.00 μm or more. Among the first, second, and third embodiments, examples of preferred ranges for Smp include: 1.00 μm and above but less than 10.00 μm; 1.00 μm and above but less than 8.00 μm; 1.00 μm and above but less than 6.00 μm; 1.00 μm and above but less than 4.50 μm; 1.00 μm and above but less than 3.50 μm; 1.50 μm and above but less than 10.00 μm; 1.50 μm and above but less than 8.00 μm; 1.50 μm and above but less than 6.00 μm; 1.50 μm and above but less than 4.50 μm; 1.50 μm and above but less than 3.50 μm; 2.00 μm and above but less than 10.00 μm; 2.00 μm and above but less than 8.00 μm; and 2.00 μm and above but less than 6.00 μm. Below 2.00 μm, above 2.00 μm and below 4.50 μm, and above 2.00 μm and below 3.50 μm. The Sa / Smp ratio of the uneven surface of the anti-glare film in the first embodiment is preferably 0.05 or higher, more preferably 0.10 or higher, and even more preferably 0.13 or higher. By making Sa / Smp 0.05 or higher, the tendency for higher peaks to exist at small intervals on the uneven surface of the anti-glare layer can be further enhanced, and AM1 and AM2 can be easily placed within the above-mentioned range. Sa / Smp is preferably 0.50 or lower, more preferably 0.40 or lower, and even more preferably 0.25 or lower. Among the first, second, and third embodiments, the preferred ranges for Sa / Smp include: 0.05 or more and 0.50 or less, 0.05 or more and 0.40 or less, 0.05 or more and 0.25 or less, 0.10 or more and 0.50 or less, 0.10 or more and 0.40 or less, 0.10 or more and 0.25 or less, 0.13 or more and 0.50 or less, 0.13 or more and 0.40 or less, and 0.13 or more and 0.25 or less. The ratio of the three-dimensional ten-point average roughness Sz to Sa of the uneven surface of the anti-glare film in the first embodiment of the specification, i.e., Sz / Sa, is preferably 5.0 or higher, more preferably 5.5 or higher, and even more preferably 6.0 or higher. By making Sz / Sa 5.0 or higher, a certain degree of randomness is imparted to the uneven surface, making it less noticeable when defects such as scratches occur on the uneven surface. If Sz / Sa is too large, glare may occur due to specific areas on the uneven surface, or the darkness may be locally reduced. In this specification, glare refers to the phenomenon of slight brightness unevenness that can be observed in the image light. Therefore, Sz / Sa is preferably 10.0 or lower, more preferably 8.0 or lower, and even more preferably 7.5 or lower. Among the first, second, and third embodiments, the preferred ranges for Sz / Sa include: 5.0 or higher and 10.0 or lower, 5.0 or higher and 8.0 or lower, 5.0 or higher and 7.5 or lower, 5.5 or higher and 10.0 or lower, 5.5 or higher and 8.0 or lower, 5.5 or higher and 7.5 or lower, 6.0 or higher and 10.0 or lower, 6.0 or higher and 8.0 or lower, and 6.0 or higher and 7.5 or lower. The three-dimensional skewness Ssk of the uneven surface of the anti-glare film in the first embodiment of Ssk is preferably 0.60 or less, more preferably 0.20 or less, and even more preferably 0 or less. A smaller Ssk means that there are fewer areas on the uneven surface where specular reflection can occur at lower elevations. Therefore, by making Ssk 0.60 or less, it is easier to achieve the effects of anti-glare, suppression of reflected and scattered light, and a sense of darkness. If Ssk is too small, reflected and scattered light tend to increase due to the effects mentioned above (x5). Furthermore, if Ssk is too small, the lower parts of adjacent peaks may overlap, and the slope with a larger angle may disappear, reducing the effects mentioned above (x2). Therefore, Ssk is preferably -1.00 or more, more preferably -0.80 or more, and even more preferably -0.70 or more. Among the first, second, and third embodiments, the preferred ranges of Ssk can be listed as follows: -1.00 and above and 0.60 and below, -1.00 and above and 0.20 and below, -1.00 and above and 0 and below, -0.80 and above and 0.60 and below, -0.80 and above and 0.20 and below, -0.80 and above and 0 and below, -0.70 and above and 0.60 and below, -0.70 and above and 0.20 and below, -0.70 and above and 0 and below. Ssk represents the degree to which the elevation distribution is biased towards the positive or negative direction when the average elevation of the entire measured surface is used as a reference. When the elevation distribution is normal, Ssk is 0. If the elevation distribution is biased towards the negative direction, Ssk is positive; the greater the bias towards the negative direction, the larger the Ssk value in the positive direction. Conversely, if the elevation distribution is biased towards the positive direction, Ssk is negative; the greater the bias towards the positive direction, the larger the Ssk value in the negative direction. The uneven surface of the anti-glare film in the first embodiment of the "Tilt Angle" preferably has a specific tilt angle distribution. Specifically, regarding the tilt angle of the uneven surface of the anti-glare film in the first embodiment, a tilt angle exceeding 0 degrees but less than 1 degree is defined as θ1, a tilt angle exceeding 1 degree but less than 3 degrees is defined as θ2, a tilt angle exceeding 3 degrees but less than 10 degrees is defined as θ3, and a tilt angle exceeding 10 degrees but less than 90 degrees is defined as θ4. Furthermore, when the sum of θ1, θ2, θ3, and θ4 is set to 100%, the ratio of θ1, θ2, θ3, and θ4 is preferably within the following range. By ensuring that θ1, θ2, θ3, and θ4 are within the following range, AM1 and AM2 can be easily placed within the aforementioned range. θ1≦3.0% 0.5%≦θ2≦1 5.0% 7.0%≦θ3≦4 0.0% 50.0%≦θ4≦9 0.0% In the first, second, and third embodiments, the ratio of θ1 is preferably 2.0% or less, more preferably 1.5% or less, and even more preferably 1.2% or less. In the first, second, and third embodiments, the lower limit of the ratio of θ1 is not particularly limited, and is usually 0.1% or more. Among the first, second, and third embodiments, embodiments with a preferred range for the ratio of θ1 include: 0.1% or more and 2.0% or less, 0.1% or more and 1.5% or less, and 0.1% or more and 1.2% or less. In the first, second, and third embodiments, the ratio of θ2 is preferably 12.0% or less, more preferably 10.0% or less, and more preferably 8.0% or less. In the first, second, and third embodiments, the lower limit of the ratio of θ2 is preferably 1.0% or more, more preferably 1.5% or more, and more preferably 2.0% or more. Among the first, second, and third embodiments, examples of embodiments representing a preferred range for the ratio of θ2 include: 1.0% or more and 12.0% or less, 1.0% or more and 10.0% or less, 1.0% or more and 8.0% or less, 1.5% or more and 12.0% or less, 1.5% or more and 10.0% or less, 1.5% or more and 8.0% or less, 2.0% or more and 12.0% or less, 2.0% or more and 10.0% or less, and 2.0% or more and 8.0% or less. In the first, second, and third embodiments, the ratio of θ3 is preferably 8.5% or more, more preferably 10.0% or more, and more preferably 12.0% or more. Furthermore, in the first, second, and third embodiments, the ratio of θ3 is preferably 35.0% or less, more preferably 32.0% or less, and more preferably 30.0% or less. Among the first, second, and third embodiments, embodiments representing a preferred range for the ratio of θ3 include: 8.5% or more and 35.0% or less, 8.5% or more and 32.0% or less, 8.5% or more and 30.0% or less, 10.0% or more and 35.0% or less, 10.0% or more and 32.0% or less, 10.0% or more and 30.0% or less, 12.0% or more and 35.0% or less, 12.0% or more and 32.0% or less, and 12.0% or more and 30.0% or less. In the first, second, and third embodiments, the ratio of θ4 is preferably 55.0% or more, more preferably 57.5% or more, and more preferably 60.0% or more. Furthermore, in the first, second, and third embodiments, the ratio of θ4 is preferably 88.0% or less, more preferably 86.5% or less, and more preferably 85.0% or less. Among the first, second, and third embodiments, embodiments representing a preferred range for the ratio of θ4 include: 55.0% or more and 88.0% or less, 55.0% or more and 86.5% or less, 55.0% or more and 85.0% or less, 57.5% or more and 88.0% or less, 57.5% or more and 86.5% or less, 57.5% or more and 85.0% or less, 60.0% or more and 88.0% or less, 60.0% or more and 86.5% or less, and 60.0% or more and 85.0% or less. In this specification, the three-dimensional arithmetic mean roughness Sa is a three-dimensional extension of the two-dimensional roughness parameter Ra described in JIS B0601:1994. When the orthogonal coordinate axes X and Y are placed on the reference plane, the roughness surface is set as Z(x,y), and the size of the reference plane is set as Lx and Ly, Sa is calculated according to the following formula (i). In formula (i), A = Lx × Ly. In this specification, the three-dimensional average peak spacing Smp is determined as follows. A peak is defined as the portion of the three-dimensional roughness surface that is higher than the reference surface and surrounded by a region. The number of peaks in this case is set as Ps, and the area of ​​the entire measurement region (reference surface) is set as A. Smp is then calculated according to the following formula (ii). In this specification, the three-dimensional ten-point average roughness Sz is a three-dimensional extension of the two-dimensional roughness parameter, namely the ten-point average roughness Rz, described in JLS B0601:1994. A series of straight lines passing through the center of the reference surface are radially arranged 360 degrees to cover the entire area. Based on the cross-sectional curves obtained by cutting each line through the three-dimensional roughness surface, the ten-point average roughness on the aforementioned cross-sectional curves is calculated. Here, the ten-point average roughness is the sum of the average peak height from the highest peak to the fifth peak and the average valley depth from the deepest valley to the fifth valley. The upper 50% of the many ten-point average roughnesses obtained in this way are averaged to calculate Sz. In this specification, the three-dimensional skewness Ssk is a three-dimensional extension of the skewness Rsk of the roughness curve of the two-dimensional roughness parameter described in JLS B0601:1994. When the orthogonal coordinate axes X and Y are placed on the reference plane, the measured surface shape curve is set as z = f(x,y), and the size of the reference plane is set as Lx and Ly, Ssk is calculated according to the following equation (iii). In equation (iii), "Sq" is the root mean square deviation of the surface height distribution as defined by the following equation (iv). In this specification, the tilt angle distribution of the uneven surface can be calculated based on the three-dimensional roughness surface. The data of the three-dimensional roughness surface is represented by points arranged in a grid pattern at intervals of d on a reference surface with the horizontal axis as the x-axis and the vertical axis as the y-axis, and the height of each point. Let Z be the height of the i-th point in the x-axis direction and the j-th point in the y-axis direction. i,j At that time, the slope Sx relative to the x-axis and the slope Sy relative to the y-axis at any position (i,j) are calculated as follows. In this specification, the position of the i-th point in the x-axis direction and the j-th point in the y-axis direction are sometimes denoted as (i,j). Sx = (Z i ＋ 1,j -Z i － 1,j ) / 2dSy=(Z i,j ＋ 1-Z i,j － 1) / 2d Then, the slope St relative to the reference plane at (i,j) is calculated by the following formula (v). Furthermore, with tan -1 The tilt angle at (i,j) is calculated using (St). By performing the above calculations for each point, the tilt angle distribution of the three-dimensional roughness surface can be calculated. The aforementioned Sa, Smp, and tilt angle distributions are preferably measured using an interferometer. Examples of such interferometers include Zygo's "New View" series. Using the "MetroPro" software, which is included with the "New View" series of interferometers, the Sa, Smp, and tilt angle distributions can be easily calculated. In the first embodiment, the anti-glare layer is the core layer responsible for suppressing reflected and scattered light and for anti-glare properties. In the first, second, and third embodiments of the "Method for Forming an Anti-glare Layer," the anti-glare layer can be formed using methods such as: (A) using an embossing roller, (B) etching, (C) die forming, and (D) forming a coating film by coating. Among these methods, (C) die forming is preferred for easy acquisition of a stable surface shape, while (D) forming a coating film by coating is preferred for productivity and to accommodate multiple varieties. In the first, second, and third embodiments, when the anti-glare layer is formed by coating, for example, the following methods can be used: (d1) applying a coating liquid containing an adhesive resin and particles, with the particles forming an uneven surface; (d2) applying a coating liquid containing any resin and a resin with poor compatibility with the aforementioned resin, causing the resin phase to separate and forming an uneven surface. In the first embodiment, (d1) is preferred because (d1) is more likely to improve the balance between AM1 and AM2 compared to (d2). Also, in the first embodiment, (d1) is preferred because (d1) is more likely to suppress the deviations of Sa and Smp compared to (d2). Regarding the thickness, in embodiments 1, 2, and 3, to suppress curling and improve the balance of mechanical strength, hardness, and toughness, the thickness T of the anti-glare layer is preferably 2 μm or more and 10 μm or less, more preferably 4 μm or more and 8 μm or less. Examples of preferred ranges for the thickness T of the anti-glare layer in embodiments 1, 2, and 3 include: 2 μm or more and 10 μm or less, 2 μm or more and 8 μm or less, 4 μm or more and 10 μm or less, and 4 μm or more and 8 μm or less. In this specification, the thickness of the anti-glare layer can be calculated, for example, by taking cross-sectional photographs of the anti-glare film using a scanning transmission electron microscope (STEM), selecting any 20 locations, and calculating the thickness based on the average value. The accelerating voltage of the STEM is preferably set to 10 kV or more and 30 kV or less, and the magnification of the STEM is preferably set to 1000x or more and 7000x or less. In embodiments 1, 2, and 3, the anti-glare layer primarily contains resin, and may contain, as needed, organic and inorganic microparticles, refractive index adjusters, antistatic agents, antifouling agents, UV absorbers, light stabilizers, antioxidants, viscosity modifiers, and thermal polymerization initiators. In embodiments 1, 2, and 3, the anti-glare layer preferably contains adhesive resin and particles. In embodiments 1, 2, and 3, the particles may include organic and inorganic particles, but are preferably organic particles. That is, in embodiments 1, 2, and 3, the anti-glare layer more preferably contains adhesive resin and organic particles. -Particles- In embodiments 1, 2, and 3, examples of organic particles include particles composed of polymethyl methacrylate, polyacrylic acid-styrene copolymer, melamine resin, polycarbonate, polystyrene, polyvinyl chloride, benzoguanamine-melamine-formaldehyde condensate, polysiloxane, fluorinated resins, and polyester resins. In embodiments 1, 2, and 3, examples of inorganic particles include silicon dioxide, alumina, zirconium oxide, and titanium oxide, with silicon dioxide being preferred. Organic particles are lighter in density, so when used in conjunction with inorganic microparticles, they easily float to the vicinity of the surface of the anti-glare layer. Therefore, in the first embodiment, by using organic and inorganic microparticles together, organic particles easily form irregularities with longer periods, while inorganic microparticles easily form irregularities with shorter periods, thus easily placing AM1 and AM2 within the aforementioned range. Furthermore, since organic particles easily float to the vicinity of the surface of the anti-glare layer, surface shapes such as Sa and Smp easily fall within the aforementioned range. In the first embodiment, when only organic particles are used, it is preferable to increase the organic particle content ratio in the anti-glare layer to easily place AM1 and AM2 within the aforementioned range. By increasing the organic particle content ratio in the anti-glare layer, a shape with organic particles covering one side can be formed, creating irregularities with shorter periods, namely AM2. Furthermore, by partially forming stacked organic particles within a shape covering one side, irregularities with longer periods, namely AM1, can be formed. Furthermore, by using a shape that is covered with organic particles on one side, Smp can be easily reduced. Moreover, by using a shape that is covered with organic particles on one side and partially forming a shape of stacked organic particles, Sa can be easily increased. In the first, second, and third embodiments, the average particle size D of the particles, including organic and inorganic particles, is preferably 1.0 μm or more and 5.0 μm or less, more preferably 1.5 μm or more and 3.5 μm or less, and even more preferably 1.7 μm or more and 2.5 μm or less. In the first embodiment, by making the average particle size D 1.0 μm or more, it is easy to suppress AM1 from being too small, and it is easy to make Sa 0.30 μm or more. Furthermore, in the first embodiment, by making the average particle size D 5.0 ​​μm or less, it is easy to suppress AM1 from being too large, and it is easy to make Smp 10.00 μm or less. In this instruction manual, the average particle size of organic and inorganic particles can be calculated using the following operations (A1) to (A3). (A1) For the anti-glare film, an image of its transmission is captured using an optical microscope. The magnification is preferably 500x or higher and 2000x or lower. (A2) Select any 10 particles from the image and calculate the particle size of each particle. The particle size is determined by the distance between the two lines that have the largest distance when the cross-section of the particle is sandwiched between any two parallel lines. (A3) Perform the same operation 5 times on different images of the same sample, and take the average value obtained by averaging the total number of 50 particle sizes as the average particle size. In the first, second, and third embodiments, the ratio of the average particle size D to the thickness T of the anti-glare layer, i.e., D / T, is preferably 0.20 or more and 0.96 or less, more preferably 0.25 or more and 0.90 or less, further preferably 0.30 or more and 0.80 or less, and further preferably 0.35 or more and 0.70 or less. Among the first, second, and third embodiments, the preferred ranges for D / T include: 0.20 and above and 0.96 and below, 0.20 and above and 0.90 and below, 0.20 and above and 0.80 and below, 0.20 and above and 0.70 and below, 0.25 and above and 0.96 and below, 0.25 and above and 0.90 and below, 0.25 and above and 0.80 and below, 0.25 and above and 0.70 and below, 0.30 and above and 0.96 and below, 0.30 and above and 0.90 and below, 0.30 and above and 0.80 and below, 0.30 and above and 0.70 and below, 0.35 and above and 0.96 and below, 0.35 and above and 0.90 and below, 0.35 and above and 0.80 and below, 0.35 and above and 0.70 and below. In the first embodiment, by placing D / T within the aforementioned range, AM1 and AM2 can be easily placed within the aforementioned range. Furthermore, in the first embodiment, by placing D / T within the aforementioned range, the height of the peaks and the spacing between the peaks of the uneven surface can be easily placed within an appropriate range, and the surface shapes such as Sa and Smp can be easily placed within the aforementioned range. In the first, second, and third embodiments, the content of particles, including organic and inorganic particles, relative to 100 parts by mass of the adhesive resin is preferably 40 parts by mass and 200 parts by mass, more preferably 55 parts by mass and 170 parts by mass, and even more preferably 60 parts by mass and 150 parts by mass. Examples of preferred ranges of particle content relative to 100 parts by mass of the adhesive resin include: 40 parts by mass and 200 parts by mass, 40 parts by mass and 170 parts by mass, 40 parts by mass and 150 parts by mass, 55 parts by mass and 200 parts by mass, 55 parts by mass and 170 parts by mass, 55 parts by mass and 150 parts by mass, 60 parts by mass and 200 parts by mass, 60 parts by mass and 170 parts by mass, and 60 parts by mass and 150 parts by mass. In the first embodiment, by making the particle content 40 parts by mass or more, it is easy to suppress AM1 from being too small. Also, in the first embodiment, by making the particle content 40 parts by mass or more, it is easy to make Sa 0.30 μm or more and Smp 10.00 μm or less. Furthermore, in the first embodiment, by making the particle content 200 parts by mass or less, it is easy to suppress AM1 from being too large and to easily suppress particle detachment from the anti-glare layer. In the first embodiment, when the inorganic microparticles described below are not used, in order to exhibit the above-mentioned "stacked" state, the particle content is preferably set to a relatively large amount within the above-mentioned range. -Inorganic Microparticles- In the first, second, and third embodiments, the anti-glare layer preferably contains inorganic microparticles in addition to the adhesive resin and particles. In the first, second, and third embodiments, the anti-glare layer particularly preferably contains inorganic microparticles in addition to the adhesive resin and organic particles. In the first, second, and third embodiments, by including inorganic microparticles in the anti-glare layer, the difference between the refractive index of the organic particles and the refractive index of the components other than the organic particles in the anti-glare layer becomes smaller, thereby easily reducing internal haze. In the first embodiment, by containing inorganic microparticles in the anti-glare layer, relatively light organic particles easily float to the vicinity of the surface of the anti-glare layer. Furthermore, in the first embodiment, by containing inorganic microparticles in the anti-glare layer, fine irregularities based on inorganic microparticles are easily formed between the protrusions based on organic particles. For these reasons, AM1 and AM2 can be easily positioned within the aforementioned range. Also, because organic particles easily float to the vicinity of the surface of the anti-glare layer, surface shapes such as Sa and Smp can be easily positioned within the aforementioned range. In the first, second, and third embodiments, inorganic microparticles can be exemplified as microparticles composed of silicon dioxide, aluminum oxide, zirconium oxide, and titanium oxide. Among these, silicon dioxide, which readily suppresses internal haze generation, is preferred. In the first, second, and third embodiments, the average particle size of the inorganic microparticles is preferably 1 nm or more and 200 nm or less, more preferably 2 nm or more and 100 nm or less, and even more preferably 5 nm or more and 50 nm or less. Examples of embodiments in the first, second, and third embodiments that represent a preferred range for the average particle size of the inorganic microparticles include: 1 nm or more and 200 nm or less, 1 nm or more and 100 nm or less, 1 nm or more and 50 nm or less, 2 nm or more and 200 nm or less, 2 nm or more and 100 nm or less, 2 nm or more and 50 nm or less, 5 nm or more and 200 nm or less, 5 nm or more and 100 nm or less, and 5 nm or more and 50 nm or less. In this specification, the average particle size of inorganic microparticles can be calculated using the following operations (B1) to (B3). (B1) Take a cross-sectional image of the anti-glare film using TEM or STEM. The accelerating voltage of the TEM or STEM is preferably set to 10 kV or higher and 30 kV or lower, and the magnification is preferably set to 50,000x or higher and 300,000x or lower. (B2) Select any 10 inorganic microparticles from the observed image and calculate the particle size of each inorganic microparticle. Measure the distance between the two lines that have the largest distance between them when the cross-section of the inorganic microparticles is sandwiched between any two parallel lines as the particle size. (B3) Perform the same operation 5 times on different images of the same sample, and take the average value obtained by averaging the total number of 50 particle sizes as the average particle size of the inorganic microparticles. In the first, second, and third embodiments, the content of inorganic microparticles relative to 100 parts by mass of adhesive resin is preferably 40 parts by mass or more and 200 parts by mass or less, more preferably 50 parts by mass or more and 150 parts by mass or less, and even more preferably 60 parts by mass or more and 100 parts by mass or less. In the first, second, and third embodiments, examples of embodiments with a preferred range of inorganic microparticle content relative to 100 parts by weight of adhesive resin include: 40 parts by weight or more and 200 parts by weight, 40 parts by weight or more and 150 parts by weight, 40 parts by weight or more and 100 parts by weight, 50 parts by weight or more and 200 parts by weight, 50 parts by weight or more and 150 parts by weight, 50 parts by weight or more and 100 parts by weight, 60 parts by weight or more and 200 parts by weight, 60 parts by weight or more and 150 parts by weight, and 40 parts by weight or more and 100 parts by weight. In the first embodiment, by making the content of inorganic microparticles 40 parts by mass or more, the aforementioned effects based on inorganic microparticles can be easily obtained. Furthermore, in the first embodiment, by making the content of inorganic microparticles 200 parts by mass or less, the reduction in the coating strength of the anti-glare layer can be easily suppressed. -Adhesive resin-In the first embodiment, the second embodiment, and the third embodiment, in order to further improve mechanical strength, the adhesive resin is preferably a cured product containing a thermosetting resin composition or a cured product containing a free radiation curing resin composition, and more preferably a cured product containing a free radiation curing resin composition. In the first, second, and third embodiments, the thermosetting resin composition contains at least a thermosetting resin composition and is a resin composition that is cured by heating. Examples of thermosetting resins in the first, second, and third embodiments include: acrylic resins, amine resins, phenolic resins, urea-melamine resins, epoxy resins, unsaturated polyester resins, and polysiloxane resins. A curing agent is added to these curing resins as needed in the thermosetting resin composition. In the first, second, and third embodiments, the ionizing radiation-curing resin composition contains a compound having a ionizing radiation-curing functional group (hereinafter also referred to as "ionizing radiation-curing compound"). In the first, second, and third embodiments, examples of the ionizing radiation-curing functional group include: (meth)acrylic, vinyl, allyl, and other vinyl unsaturated groups, as well as epoxy and oxetanyl groups. In the first, second, and third embodiments, the ionizing radiation-curing compound is preferably a compound having an vinyl unsaturated group, more preferably a compound having two or more vinyl unsaturated groups, and even more preferably a multifunctional (meth)acrylate compound having two or more vinyl unsaturated groups. In embodiments 1, 2, and 3, both monomers and oligomers can be used as multifunctional (meth)acrylate compounds. In this specification, ionizing radiation refers to electromagnetic waves or charged particle beams containing energy quanta capable of polymerizing or cross-linking molecules. Ultraviolet (UV) or electron (EB) beams are commonly used; in addition, electromagnetic waves such as X-rays and gamma rays, as well as charged particle beams such as alpha rays and ionizing rays, can also be used. In embodiments 1, 2, and 3, examples of difunctional (meth)acrylate monomers in multifunctional (meth)acrylate compounds include: ethylene glycol dimethacrylate, tetraethoxybisphenol A diacrylate, tetrapropoxybisphenol A diacrylate, and 1,6-hexanediol diacrylate. In embodiments 1, 2, and 3, examples of trifunctional or more functional (meth)acrylate monomers include: trimethylolpropane trimethacrylate, neopentyltetroxide trimethacrylate, neopentyltetroxide tetramethacrylate, dinepentyltetroxide hexamethacrylate, dinepentyltetroxide tetramethacrylate, and isocyanuric acid-modified trimethacrylate. In embodiments 1, 2, and 3, the above-mentioned (meth)acrylate monomers may be modified as part of the molecular backbone, or may be modified by ethylene oxide, propylene oxide, caprolactone, isocyanuric acid, alkyl, cyclic alkyl, aromatic, bisphenol, etc. In the first, second, and third embodiments, examples of multifunctional (meth)acrylate oligomers include: (meth)acrylate amino esters, epoxy (meth)acrylates, polyester (meth)acrylates, polyether (meth)acrylates, and other acrylate polymers. In the first, second, and third embodiments, (meth)acrylate amino esters can be obtained, for example, by reacting a polyol and an organic diisocyanate with a (meth)acrylate hydroxyl ester. In the first, second, and third embodiments, the preferred epoxy (meth)acrylate is a (meth)acrylate obtained by reacting a trifunctional or higher aromatic epoxy resin, alicyclic epoxy resin, or aliphatic epoxy resin with (meth)acrylate; a (meth)acrylate obtained by reacting a difunctional or higher aromatic epoxy resin, alicyclic epoxy resin, or aliphatic epoxy resin with a polybasic acid and (meth)acrylate; and a (meth)acrylate obtained by reacting a difunctional or higher aromatic epoxy resin, alicyclic epoxy resin, or aliphatic epoxy resin with a phenol and (meth)acrylate. For purposes such as adjusting the viscosity of the anti-glare coating liquid, monofunctional (meth)acrylates may also be used in combination as ionizing radiation curing compounds in embodiments 1, 2, and 3. Examples of monofunctional (meth)acrylates in embodiments 1, 2, and 3 include: methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, amyl (meth)acrylate, hexyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, and isoborneol (meth)acrylate. One of the above-mentioned ionizing radiation curing compounds may be used alone, or two or more may be used in combination. In embodiments one, two, and three, when the ionizing radiation curing compound is an ultraviolet-curing compound, the ionizing radiation curing component preferably contains additives such as a photopolymerization initiator or a photopolymerization accelerator. In embodiments one, two, and three, examples of photopolymerization initiators include: acetophenone, benzophenone, α-hydroxyalkyl acetone, milchnerone, benzoin, benzoin, benzoin dimethyl ketal, benzoylbenzoate, α-acryloxime ester, and 9-oxosulfuron. One or more of the following. The photopolymerization accelerator is one that can reduce the inhibitory effect of air on polymerization during curing and thus accelerate the curing speed. In the first embodiment, the second embodiment, and the third embodiment, as a photopolymerization accelerator, examples include one or more selected from isoamyl p-dimethylaminobenzoate, ethyl p-dimethylaminobenzoate, etc. In the first, second, and third embodiments, when the adhesive resin contains a hardened product of a free radiation-curing resin composition, the following configuration (C1) or (C2) is preferred. (C1) In addition to the cured form of the ionizing radiation-curing resin composition, it also contains a thermoplastic resin as an adhesive resin. (C2) It substantially contains only the cured form of the ionizing radiation-curing resin composition as an adhesive resin, and substantially contains only monomer components as ionizing radiation-curing compounds contained in the ionizing radiation-curing resin composition. In the configuration of C1 described above, the viscosity of the anti-glare coating liquid increases due to the thermoplastic resin. Therefore, organic particles do not easily settle, and consequently, the adhesive resin does not easily flow down between the protrusions based on the organic particles. Therefore, in the first embodiment, in the configuration of C1 described above, it is easy to suppress AM1 and AM2 from being too small, and it is easy to keep the surface shapes such as Sa and Smp within the aforementioned range. In the first, second, and third embodiments, the thermoplastic resins include: polystyrene resins, polyolefin resins, ABS resins (including heat-resistant ABS resins), AS resins, AN resins, polyphenylene ether resins, polycarbonate resins, polyacetal resins, acrylic resins, polyethylene terephthalate resins, polybutylene terephthalate resins, polyurethane resins, and polyphenylene sulfide resins, etc. From the viewpoint of transparency, acrylic resins are preferred. In the first, second, and third embodiments, the weight-average molecular weight of the thermoplastic resin is preferably 20,000 or more and 200,000 or less, more preferably 30,000 or more and 150,000 or less, and even more preferably 50,000 or more and 100,000 or less. Examples of embodiments in the first, second, and third embodiments that represent a preferred range for the weight-average molecular weight of the thermoplastic resin include: 20,000 or more and 200,000 or less; 20,000 or more and 150,000 or less; 20,000 or more and 100,000 or less; 30,000 or more and 200,000 or less; 30,000 or more and 150,000 or less; 30,000 or more and 100,000 or less; 50,000 or more and 200,000 or less; 50,000 or more and 150,000 or less; and 50,000 or more and 100,000 or less. In this specification, the weight-average molecular weight is the average molecular weight measured by GPC analysis and converted to standard polystyrene. In the first, second, and third embodiments, the mass ratio of the cured product of the ionizing radiation-curable resin composition to the thermoplastic resin in the above-mentioned C1 is preferably 60:40 to 90:10, more preferably 70:30 to 80:20. Examples of embodiments in the first, second, and third embodiments that represent a preferred range of the above-mentioned mass ratio include: 60:40 to 90:10, 60:40 to 80:20, 70:30 to 90:10, and 70:30 to 80:20. In the first embodiment, the thermoplastic resin content is 10 or more relative to the cured part 90 of the ionizing radiation-curing resin composition, thereby easily achieving the effect of increased viscosity of the anti-glare coating liquid. Furthermore, in the first embodiment, the thermoplastic resin content is 40 or less relative to the cured part 60 of the ionizing radiation-curing resin composition, thereby easily suppressing the reduction in the mechanical strength of the anti-glare layer. In the first embodiment, with the configuration of C2 described above, the bottom of the anti-glare layer is covered with organic particles, and the organic particles are stacked in a certain area, forming a thin film-like adhesive resin covering the organic particles. In the configuration of C2, the stacked organic particles form a longer-period unevenness (AM1), and the unstacked organic particles form a shorter-period unevenness (AM2) between the longer-period unevenness. Therefore, in the first embodiment, with the configuration of C2 described above, AM1 and AM2 can be easily positioned within the aforementioned range. Furthermore, in the first embodiment, with the configuration of C2 described above, Sa can be easily positioned within the aforementioned range by means of the stacked organic particles, and Smp can be easily positioned within the aforementioned range by means of the covered organic particles. In the first embodiment, with the configuration of C2 described above, in order to easily achieve the above-described configuration of the organic particles, it is preferable to have a higher content of organic particles relative to the adhesive resin than in the configuration of C1 described above. In the first, second, and third embodiments, when C2 is configured as described above, the ratio of the cured component of the ionizing radiation-curing resin composition to the total amount of adhesive resin is preferably 90% by mass or more, more preferably 95% by mass or more, and even more preferably 100% by mass. Furthermore, in the first, second, and third embodiments, when C2 is configured as described above, the ratio of the monomer component to the total amount of the ionizing radiation-curing compound is preferably 90% by mass or more, more preferably 95% by mass or more, and even more preferably 100% by mass. The monomer component is preferably a polyfunctional (meth)acrylate compound. In embodiments 1, 2, and 3, solvents are typically used in the anti-glare coating liquid to adjust viscosity or to dissolve or disperse the components. Depending on the type of solvent, the surface shape of the anti-glare layer after coating and drying varies; therefore, it is preferable to select the solvent considering factors such as its saturated vapor pressure and its permeability to a transparent substrate. Examples of solvents in embodiments 1, 2, and 3 include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone. Ethers such as alkanes and tetrahydrofurans; aliphatic hydrocarbons such as hexane; alicyclic hydrocarbons such as cyclohexane; aromatic hydrocarbons such as toluene and xylene; carbon halogens such as dichloromethane and dichloroethane; esters such as methyl acetate, ethyl acetate, and butyl acetate; alcohols such as isopropanol, butanol, and cyclohexanol; ceroxythrins such as methyl ceroxythrin and ethyl ceroxythrin; glycol ethers such as propylene glycol monomethyl ether acetate; ceroxythrins such as acetate; ceroxythrins such as dimethyl sulfoxide; acetamides such as dimethylformamide and dimethyl acetamide, etc., and mixtures thereof are also possible. In the first, second, and third embodiments, the solvent in the anti-glare coating liquid is preferably a solvent with a fast evaporation rate as the main component. In this specification, "main component" means a component accounting for 50% or more by mass of the total solvent, preferably 70% or more by mass, and more preferably 80% or more by mass. In the first embodiment, by accelerating the evaporation rate of the solvent, the sedimentation of organic particles into the lower part of the anti-glare layer is suppressed, and the adhesive resin is less likely to flow down into the spaces between the protrusions based on the organic particles. Therefore, in the first embodiment, by accelerating the evaporation rate of the solvent, AM1 and AM2 can be easily placed within the aforementioned range, and the surface shapes such as Sa and Smp can be easily placed within the aforementioned range. In this specification, a solvent with a relatively fast evaporation rate means a solvent whose evaporation rate is 100 or higher when the evaporation rate of butyl acetate is set to 100. The evaporation rate of a solvent with a relatively fast evaporation rate is preferably 120 or higher and 300 or lower, and more preferably 150 or higher and 220 or lower. Examples of solvents with relatively fast evaporation rates include: methyl isobutyl ketone with an evaporation rate of 160, toluene with an evaporation rate of 200, and methyl ethyl ketone with an evaporation rate of 370. In the first, second, and third embodiments, the solvent in the anti-glare coating liquid preferably contains, in addition to a solvent with a faster evaporation rate, a small amount of a solvent with a slower evaporation rate. In the first, second, and third embodiments, the mass ratio of the solvent with a faster evaporation rate to the solvent with a slower evaporation rate is preferably 99:1 to 80:20, more preferably 98:2 to 85:15. In the first embodiment, by using a solvent with a slower evaporation rate, the organic particles are moderately aggregated, and the area ratio of the protrusions based on the organic particles in the uneven surface becomes an appropriate range. Therefore, AM1 and AM2 can be easily placed within the above-mentioned range, and surface shapes such as Sa and Smp can be easily placed within the above-mentioned range. In this specification, a solvent with a slow evaporation rate means a solvent whose evaporation rate does not reach 100 when the evaporation rate of butyl acetate is set to 100. The evaporation rate of a solvent with a slow evaporation rate is preferably 20 or higher and 60 or lower, and more preferably 25 or higher and 40 or lower. Examples of solvents with slow evaporation rates include cyclohexanone with an evaporation rate of 32 and propylene glycol monomethyl ether acetate with an evaporation rate of 44. In the first, second, and third embodiments, when the anti-glare layer is formed from the anti-glare coating liquid, it is preferable to control the drying conditions. In the first, second, and third embodiments, the drying conditions can be controlled based on the drying temperature and the air velocity inside the dryer. In the first, second, and third embodiments, the drying temperature is preferably 30°C or higher and 120°C or lower, and the drying air velocity is preferably 0.2 m / s or higher and 50 m / s or lower. In the first, second, and third embodiments, in order to control the surface shape of the anti-glare layer by drying, it is preferable to subject it to ionizing radiation irradiation after the coating liquid has dried. <Optical Properties> In the first, second, and third embodiments, the total light transmittance of the anti-glare film according to JIS K7361-1:1997 is preferably 70% or more, more preferably 80% or more, and even more preferably 85% or more. In the first, second, and third embodiments, the light incident surface when measuring the total light transmittance and the haze described below is set to the side opposite to the uneven surface. In the first, second, and third embodiments, the haze of the anti-glare film according to JIS K7136:2000 is preferably 60% or higher and 98% or lower, more preferably 66% or higher and 86% or lower, and even more preferably 70% or higher and 80% or lower. Examples of preferred haze ranges in the first, second, and third embodiments include: 60% or higher and 98% or lower, 60% or higher and 86% or lower, 60% or higher and 80% or lower, 66% or higher and 98% or lower, 66% or higher and 86% or lower, 66% or higher and 80% or lower, 70% or higher and 98% or lower, 70% or higher and 86% or lower, and 70% or higher and 80% or lower. In the first, second, and third embodiments, by achieving a haze of 60% or higher, anti-glare performance can be easily improved. Furthermore, in the first, second, and third embodiments, by keeping the haze below 98%, the reduction in image resolution can be easily suppressed. In the first, second, and third embodiments, to facilitate the improvement of image resolution and contrast, the internal haze of the anti-glare film is preferably 20% or less, more preferably 15% or less, and even more preferably 10% or less. The internal haze can be measured using conventional methods. For example, the internal haze can be measured by attaching a transparent sheet to an uneven surface via a transparent adhesive layer and then breaking up the unevenness of the surface. <Other Layers> In the first, second, and third embodiments, the anti-glare film may also have layers other than the aforementioned anti-glare layer and transparent substrate, i.e., other layers. Examples of other layers include: an anti-reflective layer, an anti-fouling layer, and an antistatic layer. In the first, second, and third embodiments, as a preferred embodiment having other layers, an embodiment in which an anti-glare layer has an anti-reflective layer on its uneven surface, and the surface of the anti-reflective layer is the aforementioned uneven surface, is an example. In the aforementioned preferred embodiment, it is even more preferable that the aforementioned anti-reflective layer has anti-fouling properties. That is, in the first, second, and third embodiments, it is even more preferable that the anti-glare layer has an anti-fouling anti-reflective layer, and the surface of the anti-fouling anti-reflective layer is the aforementioned uneven surface, is an embodiment in which the anti-glare layer has an anti-fouling anti-reflective layer, and the surface of the anti-fouling anti-reflective layer is the aforementioned uneven surface, is a given. In embodiments 1, 2, and 3, the antireflective layer can be, for example, a single-layer structure with a low refractive index layer; a two-layer structure with a high refractive index layer and a low refractive index layer; or a multi-layer structure with three or more layers. In embodiments 1, 2, and 3, the low refractive index layer and the high refractive index layer can be formed by conventional wet or dry methods. In the case of a wet method, a single-layer or two-layer structure is preferred, while in the case of a dry method, a multi-layer structure is preferred. -Single-layer or two-layer structure- In the first, second, and third embodiments, the anti-reflective layer, whether single-layer or two-layer, is preferably formed by a wet process. In the first, second, and third embodiments, the low-refractive-index layer is preferably disposed on the outermost surface of the anti-glare film. In the first, second, and third embodiments, when imparting antifouling properties to the anti-reflective layer, it is preferable that the low-refractive-index layer contains antifouling agents such as polysiloxane compounds and fluorine compounds. In the first, second, and third embodiments, the lower limit of the refractive index of the low refractive index layer is preferably 1.10 or higher, more preferably 1.20 or higher, more preferably 1.26 or higher, more preferably 1.28 or higher, and more preferably 1.30 or higher; and the upper limit is preferably 1.48 or lower, more preferably 1.45 or lower, more preferably 1.40 or lower, more preferably 1.38 or lower, and more preferably 1.32 or lower. In the first, second, and third embodiments, examples of preferred refractive index ranges for the low-refractive-index layer include: 1.10 or higher and 1.48 or lower; 1.10 or higher and 1.45 or lower; 1.10 or higher and 1.40 or lower; 1.10 or higher and 1.38 or lower; 1.10 or higher and 1.32 or lower; 1.20 or higher and 1.48 or lower; 1.20 or higher and 1.45 or lower; 1.20 or higher and 1.40 or lower; 1.20 or higher and 1.38 or lower; 1.20 or higher and 1.32 or lower; and 1.26 or higher and 1.4... 8 and below, 1.26 and above but below 1.45, 1.26 and above but below 1.40, 1.26 and above but below 1.38, 1.26 and above but below 1.32, 1.28 and above but below 1.48, 1.28 and above but below 1.45, 1.28 and above but below 1.40, 1.28 and above but below 1.38, 1.28 and above but below 1.32, 1.30 and above but below 1.48, 1.30 and above but below 1.45, 1.30 and above but below 1.40, 1.30 and above but below 1.38, 1.30 and above but below 1.32. In the first, second, and third embodiments, the lower limit of the thickness of the low-refractive-index layer is preferably 80 nm or more, more preferably 85 nm or more, and more preferably 90 nm or more; the upper limit is preferably 150 nm or less, more preferably 110 nm or less, and more preferably 105 nm or less. Examples of preferred ranges for the thickness of the low-refractive-index layer in the first, second, and third embodiments include: 80 nm or more and 150 nm or less; 80 nm or more and 110 nm or less; 80 nm or more and 105 nm or less; 85 nm or more and 150 nm or less; 85 nm or more and 110 nm or less; 85 nm or more and 105 nm or less; 90 nm or more and 150 nm or less; 90 nm or more and 110 nm or less; and 90 nm or more and 105 nm or less. In the first, second, and third embodiments, the high refractive index layer is preferably disposed on the side of the lower refractive index layer closer to the anti-glare layer. In the first, second, and third embodiments, the lower limit of the refractive index of the high refractive index layer is preferably 1.53 or higher, more preferably 1.54 or higher, more preferably 1.55 or higher, and more preferably 1.56 or higher; the upper limit is preferably 1.85 or lower, more preferably 1.80 or lower, more preferably 1.75 or lower, and more preferably 1.70 or lower. In the first, second, and third embodiments, examples of embodiments with a preferred range of refractive index for the high refractive index layer include: 1.53 or higher and 1.85 or lower, 1.53 or higher and 1.80 or lower, 1.53 or higher and 1.75 or lower, 1.53 or higher and 1.70 or lower, 1.54 or higher and 1.85 or lower, 1.54 or higher and 1.80 or lower, 1.54 or higher and 1.75 or lower, 1.54 or higher and 1.70 or lower, 1.55 or higher and 1.85 or lower, 1.55 or higher and 1.80 or lower, 1.55 or higher and 1.75 or lower, 1.55 or higher and 1.70 or lower, 1.56 or higher and 1.85 or lower, 1.56 or higher and 1.80 or lower, 1.56 or higher and 1.75 or lower, and 1.56 or higher and 1.70 or lower. In the first, second, and third embodiments, the upper limit of the thickness of the high refractive index layer is preferably 200 nm or less, more preferably 180 nm or less, and even more preferably 150 nm or less; the lower limit is preferably 50 nm or more, more preferably 70 nm or more. Examples of preferred ranges for the thickness of the high refractive index layer in the first, second, and third embodiments include: 50 nm or more and 200 nm or less; 50 nm or more and 180 nm or less; 50 nm or more and 150 nm or less; 70 nm or more and 200 nm or less; 70 nm or more and 180 nm or less; and 70 nm or more and 150 nm or less. -Multi-layer structure with 3 or more layers- In the first, second, and third embodiments, it is preferable that the multi-layer structure formed by the dry process consists of 3 or more alternating layers of high-refractive-index and low-refractive-index layers. In the multi-layer structure, it is also preferable to place the low-refractive-index layer on the outermost surface of the anti-glare film. In the first, second, and third embodiments, when the antireflective layer has a multilayer structure, the thickness of the high refractive index layer is preferably 10 nm or more and 200 nm or less, and the refractive index is preferably 2.1 or more and 2.4 or less. More preferably, the thickness of the high refractive index layer is 20 nm or more and 70 nm or less. In the first, second, and third embodiments, when the antireflective layer has a multilayer structure, the thickness of the low refractive index layer is preferably 5 nm or more and 200 nm or less, and the refractive index is preferably 1.33 or more and 1.53 or less. More preferably, the thickness of the low refractive index layer is 20 nm or more and 120 nm or less. <Size, Shape, etc.> In the first, second, and third embodiments, the anti-glare film can be in the form of sheets cut to a specific size, or in the form of a roll formed by rolling long strips into a cylinder. The size of the sheet is not particularly limited, but the maximum diameter is approximately 2 inches to 500 inches. The term "maximum diameter" refers to the maximum length when any two points of the anti-glare film are connected. For example, when the anti-glare film is rectangular, the diagonal of the rectangle is the maximum diameter. When the anti-glare film is circular, the diameter of the circle is the maximum diameter. In the first, second, and third embodiments, the width and length of the cylinder are not particularly limited, but generally, the width is approximately 500 mm to 3000 mm, and the length is approximately 500 m to 5000 m. The cylinder-shaped anti-glare film can be cut into sheets according to the size of the image display device, etc., for use. When cutting, it is preferable to exclude the unstable end of the roll. In the first, second, and third embodiments, the shape of the sheet is not particularly limited; for example, it can be a polygon, a circle, or a random irregular shape. When the anti-glare film is quadrilateral, the aspect ratio is not particularly limited, as long as it is suitable for displaying images. For example, aspect ratios of 1:1, 4:3, 16:10, 16:9, and 2:1 can be used. However, for highly design-oriented automotive applications or digital signage, these aspect ratios are not limited. In the first, second, and third embodiments, the surface shape of the anti-glare film on the side opposite to the uneven surface is not particularly limited, but it is preferably generally smooth. In this specification, "generally smooth" means that the arithmetic mean roughness Ra of JIS B0601:1994 at a critical value of 0.8 mm does not reach 0.03 μm, and Ra is preferably 0.02 μm or less. [Anti-glare film of the second embodiment] The anti-glare film of the second embodiment of the present invention is formed by having an anti-glare layer and having an uneven surface, and the smoothed reflected light intensity measured under the following measurement conditions satisfies the following conditions 1 and 2. <Measurement Conditions> (1) In the transmission measurement mode of the angle photometer, visible light is emitted from the light source of the angle photometer in the form of parallel rays. The intensity of the emitted light is measured at an opening angle of 1 degree without passing through the sample. Standard verification is performed with a maximum intensity of 100,000. (2) A black plate is attached to the surface opposite to the above-mentioned uneven surface of the anti-glare film through a transparent adhesive layer, thereby creating a sample α with the above-mentioned uneven surface formed by laminating the anti-glare film, the transparent adhesive layer and the black plate. (3) The above-mentioned sample α is placed in the angle photometer. Visible light is irradiated from the light source of the angle photometer in the form of parallel rays to the above-mentioned uneven surface of the sample α. The intensity of the reflected light is measured at an opening angle of 1 degree. The irradiation angle of the parallel rays is set to a direction inclined at +45 degrees from the normal direction of the above-mentioned sample α. The intensity of the reflected light is measured at 1-degree intervals from 0 degrees to -85 degrees from the normal direction of the above-mentioned sample α. Furthermore, in order to maintain the effect of the standard check in (1), the intensity of reflected light is measured in the manner of maintaining the transmission measurement mode. (4) Smoothing is performed at each angle from 0 degrees to -85 degrees as shown in the following formula (i), and the intensity of reflected light after smoothing is set as the smoothed reflected light intensity at each angle. Smoothed reflected light intensity at n degrees = ([reflected light intensity at n-2 degrees] + [reflected light intensity at n-1 degrees] + [reflected light intensity at n degrees] + [reflected light intensity at n+1 degrees] + [reflected light intensity at n+2 degrees]) / 5 (i) <Condition 1> When the smoothed reflected light intensity of n degrees is defined as Rn, and the smoothed reflected light intensity of n-1 degrees is defined as Rn-1, the maximum absolute value of the difference between Rn and Rn-1 is less than 2.00. <Condition 2> The smoothed reflected light intensity of -35 degrees is less than 4.0. Figure 19 is a schematic cross-sectional view of the anti-glare film 100 according to the second embodiment of the present invention. The anti-glare film 100 in Figure 19 includes an anti-glare layer 20 with an uneven surface. In Figure 19, the surface of the anti-glare layer 20 is the uneven surface of the anti-glare film. The anti-glare film 100 in Figure 19 has the anti-glare layer 20 on a transparent substrate 10. The anti-glare layer 20 in Figure 19 includes an adhesive resin 21 and organic particles 22. The anti-glare film of the second embodiment of the present invention is not limited to the laminated structure shown in FIG19, as long as conditions 1 and 2 are met. For example, the anti-glare film can be a single-layer structure of the anti-glare layer, or it can have a transparent substrate and layers other than the anti-glare layer, such as an anti-reflective layer and an anti-fouling layer. When other layers are present on the anti-glare layer, it is sufficient that the surfaces of the other layers are the uneven surfaces of the anti-glare film. In the second embodiment, a preferred embodiment of the anti-glare film is that the anti-glare layer is present on the transparent substrate, and the surface of the anti-glare layer opposite to the transparent substrate is the uneven surface of the anti-glare film. <Transparent Substrate> From the viewpoint of ease of manufacturing and operability of the anti-glare film, the anti-glare film of the second embodiment is preferably a transparent substrate. The embodiment of the transparent substrate of the second embodiment is as described above. <Uneven Surface> The anti-glare film of the second embodiment of the present invention has an uneven surface. When there are no other layers on the anti-glare layer, the surface of the anti-glare layer is the uneven surface of the anti-glare film. When there are other layers on the anti-glare layer, the surfaces of the other layers are the uneven surface of the anti-glare film. <Condition 1, Condition 2> The anti-glare film of the second embodiment of the present invention has an uneven surface, and the smoothed reflected light intensity measured under the following measurement conditions satisfies conditions 1 and 2. 《Measurement Conditions》 (1) In the transmission measurement mode of the angle photometer, visible light is emitted from the light source of the angle photometer in the form of parallel rays. The intensity of the emitted light is measured at an opening angle of 1 degree without passing through the sample. Standard verification is performed with a maximum intensity of 100,000. (2) On the surface opposite to the above-mentioned uneven surface of the anti-glare film, a black plate is attached by means of a transparent adhesive layer, thereby creating a sample α with the above-mentioned uneven surface formed by laminating the anti-glare film, the transparent adhesive layer and the black plate. (3) The above-mentioned sample α is placed in the angle photometer. Visible light is irradiated from the light source of the angle photometer in the form of parallel rays to the above-mentioned uneven surface of the sample α. The intensity of the reflected light is measured at an opening angle of 1 degree. The irradiation angle of the parallel rays is set to a direction inclined at +45 degrees from the normal direction of the above-mentioned sample α. The intensity of the reflected light is measured at 1-degree intervals from 0 degrees to -85 degrees from the normal direction of the above-mentioned sample α. Furthermore, in order to maintain the effect of the standard check in (1), the intensity of reflected light is measured in the manner of maintaining the transmission measurement mode. (4) Smoothing is performed at each angle from 0 degrees to -85 degrees as shown in the following formula (i), and the intensity of reflected light after smoothing is set as the smoothed reflected light intensity at each angle. Smoothed reflected light intensity at n degrees = ([reflected light intensity at n-2 degrees] + [reflected light intensity at n-1 degrees] + [reflected light intensity at n degrees] + [reflected light intensity at n+1 degrees] + [reflected light intensity at n+2 degrees]) / 5 (i) Step (1) of the measurement conditions is a standard verification step. By performing step (1), even when the light intensity of the light source of the angle photometer is different, the reflective characteristics of the anti-glare film can be evaluated based on the absolute value of the reflected light intensity in step (3) and the absolute value of the smoothed reflected light intensity in step (4). When measuring the reflected light intensity in step (3) for multiple samples, the standard verification of step (1) is performed for each sample. In step (1), the direction of the parallel light rays is aligned with the normal direction of the light receiver to perform the standard verification. As a variable angle photometer, for example, the product name "GC5000L" manufactured by Nippon Denshoku Kogyo Co., Ltd. can be cited. In the following embodiment, the product name GC5000L manufactured by Nippon Denshoku Kogyo Co., Ltd. (beam diameter: about 3 mm, beam inclination angle: within 0.8 degrees, aperture angle of the photodetector: 1 degree) is used as a variable angle photometer. Step (2) of the measurement conditions is the step of preparing the sample for measurement, namely sample α. For sample α, in the measurement of reflected light intensity in step (3) below, a black plate is attached to the side of the anti-glare film opposite to the uneven surface to eliminate reflection at the interface between the side of the anti-glare film opposite to the uneven surface and the air. The refractive index difference between the component on the side of the anti-glare film in contact with the transparent adhesive layer and the transparent adhesive layer is preferably set to within 0.15, more preferably within 0.10, further preferably within 0.05, further preferably within 0.02, and further preferably within 0.01. As the component on the side of the anti-glare film in contact with the transparent adhesive layer, transparent substrates can be listed. The black plate is preferably of a total light transmittance of less than 1% according to JIS K7361-1:1997, more preferably of a total light transmittance of 0% according to JIS K7361-1:1997. The difference between the refractive index of the resin constituting the black plate and the refractive index of the transparent adhesive layer is preferably set to within 0.15, more preferably within 0.10, even more preferably within 0.05, even more preferably within 0.02, and even more preferably within 0.01. Step (3) of the measurement conditions involves irradiating the uneven surface of sample α with visible light in the form of parallel rays and measuring the intensity of reflected light. In order to maintain the standard verification effect of step (1), the measurement of reflected light intensity in step (3) is carried out in the manner of maintaining the transmission measurement mode. In step (3), the incident angle of the visible light is set to a direction inclined at +45 degrees from the normal direction of sample α. In Figure 20, the dashed line represents the normal direction of sample α, i.e., 0 degrees, and the arrow of the solid line represents the parallel light ray irradiated from the light source. In step (3), the intensity of reflected light is measured at 1-degree intervals from the normal direction of sample α, i.e., 0 degrees, to -85 degrees. In Figure 20, the direction of the dashed line represents 0 degrees, and the direction of the single-point chain line represents -85 degrees. In step (3), when measuring the intensity of reflected light, the aperture angle of the receiver used for detection is set to 1 degree. For example, in the measurement of 0 degrees, the measurement is performed in the range of -0.5 degrees to +0.5 degrees; in the measurement of -35 degrees, the measurement is performed in the range of -34.5 degrees to -35.5 degrees; and in the measurement of -85 degrees, the measurement is performed in the range of -85.5 degrees to -84.5 degrees. Step (4) of the measurement conditions involves performing the smoothing process shown in equation (i) below, and setting the smoothed reflected light intensity as the smoothed reflected light intensity at each angle. Smoothed reflected light intensity at n degrees = ([reflected light intensity at n-2 degrees] + [reflected light intensity at n-1 degrees] + [reflected light intensity at n degrees] + [reflected light intensity at n+1 degrees] + [reflected light intensity at n+2 degrees]) / 5 (i) Regarding equation (i), there is a situation where the measured value of reflected light intensity repeatedly increases or decreases within a short period. The area that a person can clearly see in their field of vision, namely the "central field of vision," is "approximately 5 degrees." Therefore, in equation (i), data from 5 points is used for smoothing. Since the measurement range is from 0 degrees to -85 degrees, in equation (i), the average is calculated at 3 points for 0 degrees and -85 degrees, and at 4 points for -1 degrees and -84 degrees, instead of 5 points. However, at 0 degrees, -1 degrees, -84 degrees, and -85 degrees, the distance from the specular reflection direction of the incident light (i.e., -45 degrees) is relatively large, and the absolute value of the reflected light intensity is small. Therefore, it can be said that it will not affect condition 1. Conditions 1 and 2: The anti-glare film of the second embodiment of the present invention must satisfy conditions 1 and 2 when the smoothed reflected light intensity is measured under the above-mentioned measurement conditions. -Condition 1- When the smoothed reflected light intensity of n degrees is defined as Rn and the smoothed reflected light intensity of n-1 degrees is defined as Rn-1, the maximum absolute value of the difference between Rn and Rn-1 is less than 2.00. Meeting condition 1 means that the variation in the intensity of smoothed reflected light is small at each angle. That is, light incident on the uneven surface of the anti-glare film that meets condition 1 and reflected will not be biased towards the direction of specular reflection, but will be diffusely reflected at various angles. Therefore, by meeting condition 1, anti-glare performance can be improved. In condition 1, the maximum absolute value of the aforementioned difference is preferably below 1.00, more preferably below 0.50, more preferably below 0.20, more preferably below 0.10, and more preferably below 0.05. If the absolute value of the difference in condition 1 is too small, the image resolution tends to decrease. Therefore, the maximum absolute value of the aforementioned difference is preferably above 0.01, and more preferably above 0.02. Examples of preferred implementations of the maximum absolute value of the aforementioned differences include: 0.01 or more and 2.00 or less, 0.01 or more and 1.00 or less, 0.01 or more and 0.50 or less, 0.01 or more and 0.20 or less, 0.01 or more and 0.10 or less, 0.01 or more and 0.05 or less, 0.02 or more and 2.00 or less, 0.02 or more and 1.00 or less, 0.02 or more and 0.50 or less, 0.02 or more and 0.20 or less, 0.02 or more and 0.10 or less, and 0.02 or more and 0.05 or less. -Condition 2--The smoothed reflected light intensity at 35 degrees is below 4.0. Meeting condition 2 means that the intensity of smoothed reflected light at a direction 10 degrees away from the specular reflection direction (-45 degrees), i.e., -35 degrees, is relatively low. Normally, when people observe objects, they observe from an angle where there is no specular reflection. Therefore, the intensity of reflected and scattered light (≒ whiteness) can be evaluated from an angle other than the specular reflection direction (-45 degrees), and is consistent with what people see. Therefore, by meeting condition 2, reflected and scattered light can be suppressed, thereby improving the contrast of the image display device. The intensity of smoothed reflected light at -35 degrees is usually the same as that at -55 degrees. Therefore, the intensity of smoothed reflected light at -55 degrees is also preferably below 4.0. Satisfying both condition 2 and condition 1 means that even if a small amount of reflected and scattered light is generated, the angular distribution of the reflected and scattered light is equal and there is no bias. Therefore, by satisfying conditions 1 and 2, the observer can hardly perceive the reflected and scattered light, giving the anti-glare film a sense of darkness and giving the image display device a high-end feel. In condition 2, the smoothed reflected light intensity at -35 degrees is preferably 2.0 or less, more preferably 1.5 or less, more preferably 1.0 or less, more preferably 0.5 or less, and more preferably 0.3 or less. The smoothed reflected light intensity at -55 degrees is also preferably the above values. If the smoothed reflected light intensity at -35 degrees in condition 2 is too low, the image resolution tends to decrease. Therefore, the smoothed reflected light intensity at -35 degrees is preferably 0.1 or more. The smoothed reflected light intensity at -55 degrees is also preferably the above values. Examples of preferred ranges for the smoothed reflected light intensity at -35 degrees include: 0.1 or more and 4.0 or less, 0.1 or more and 2.0 or less, 0.1 or more and 1.5 or less, 0.1 or more and 1.0 or less, 0.1 or more and 0.5 or less, and 0.1 or more and 0.3 or less. Condition 3: The anti-glare film of the second embodiment of the present invention has a better smoothed reflected light intensity measured under the above-mentioned measurement conditions, which satisfies the following condition 3. -Condition 3--The smoothed reflected light intensity at 45 degrees is below 8.0. Meeting condition 3 means that the intensity of smoothed reflected light is lower in the mirror reflection direction, i.e., at -45 degrees. Therefore, by meeting condition 3, reflected and scattered light can be suppressed in all directions, further improving the anti-glare performance of the anti-glare film, the contrast of the image display device, and the blackness of the anti-glare film. In condition 3, the smoothed reflected light intensity at -45 degrees is preferably 4.0 or less, more preferably 2.0 or less, and more preferably 1.5 or less. If the smoothed reflected light intensity at -45 degrees in condition 3 is too low, the image resolution tends to decrease. Therefore, the smoothed reflected light intensity at -45 degrees is preferably 0.1 or more. Examples of preferred ranges for the smoothed reflected light intensity at -45 degrees include: 0.1 or more and 8.0 or less, 0.1 or more and 4.0 or less, 0.1 or more and 2.0 or less, and 0.1 or more and 1.5 or less. To facilitate the fulfillment of conditions 1 to 3, it is preferable to have a configuration in which peaks of relatively high elevation are present at small intervals on the uneven surface of the anti-glare film. It is believed that in the case of the above configuration, conditions 1 to 3 are easily satisfied mainly for the reasons (y1) to (y5) below. (y1) Because adjacent peaks are close together, most of the reflected light from the surface of any peak is incident on the adjacent peak. Then, it undergoes repeated total internal reflection within the adjacent peak, eventually advancing towards the side opposite to observer 200 (image of the solid line in Figure 21). (y2) The reflected light from the steep slope of any peak advances towards the side opposite to observer 200, and is independent of adjacent peaks (image of the dashed line in Figure 21). (y3) Because adjacent peaks are close together, there are fewer roughly flat areas that produce specular reflection. (y4) The reflected light in the relatively flat areas is more likely to hit adjacent peaks. Therefore, the angular distribution of the reflected light in the roughly flat areas is roughly equal, without being biased towards a specific angle. (y5) The reflected light from the gentle slope of any peak advances towards observer 200 (image of the single-point chain in Figure 21). The angle distribution of the gently sloping peaks is uniform; therefore, the angle distribution of the reflected light is also uniform and does not deviate to a specific angle. First, it is believed that due to the reasons (y1) to (y3) mentioned above, reflected and scattered light can be suppressed, thus improving anti-glare performance to a certain extent. Furthermore, due to the reasons (y4) and (y5) mentioned above, even if a small amount of reflected and scattered light is generated, the angular distribution of the reflected and scattered light can be made uniform, easily satisfying conditions 1 to 3. Even if the amount of reflected and scattered light is small, it is still recognized as reflected light when the angular distribution of the reflected and scattered light is biased at a specific angle. Therefore, due to the reasons (y4) and (y5) mentioned above, the anti-glare performance can be made excellent. Moreover, due to the reasons (y1) to (y5) mentioned above, the observer can hardly perceive the reflected and scattered light, thus giving the anti-glare film a sense of darkness, and further, giving the image display device a high-end feel. The three-dimensional arithmetic mean roughness Sa of the uneven surface of the anti-glare film in the second embodiment of "Sa, Smp" is preferably 0.30 μm or more. Furthermore, the three-dimensional average peak spacing Smp of the uneven surface of the anti-glare film in the second embodiment is preferably 10.00 μm or less. By ensuring that Sa and Smp are within the above ranges, it is easy to obtain an uneven surface with peaks of relatively high elevation existing at small intervals, thus easily satisfying conditions 1 to 3. The preferred embodiments of Sa and Smp in the second embodiment are as described above. In the second embodiment, the Sa / Smp ratio of the uneven surface of the anti-glare film is preferably 0.05 or higher, more preferably 0.10 or higher, and even more preferably 0.13 or higher. By making Sa / Smp 0.05 or higher, the tendency for higher peaks to exist at small intervals on the uneven surface of the anti-glare layer can be further enhanced, and conditions 1 to 3 can be easily satisfied. Furthermore, Sa / Smp is preferably 0.50 or lower, more preferably 0.40 or lower, and even more preferably 0.25 or lower. The preferred implementation of Sa / Smp in the second embodiment is as described above. The ratio of the three-dimensional ten-point average roughness Sz to Sa of the uneven surface of the anti-glare film in the second embodiment of Sz / Sa is preferably 5.0 or higher, more preferably 5.5 or higher, and even more preferably 6.0 or higher. By making Sz / Sa 5.0 or higher, a certain degree of randomness is imparted to the uneven surface, making it less noticeable when defects such as scratches occur on the uneven surface. If Sz / Sa is too large, glare may occur due to specific areas on the uneven surface, or the darkness may be locally reduced. Therefore, Sz / Sa is preferably 10.0 or lower, more preferably 8.0 or lower, and even more preferably 7.5 or lower. The preferred embodiment of Sz / Sa in the second embodiment is as described above. The three-dimensional skewness Ssk of the uneven surface of the anti-glare film in the second embodiment of Ssk is preferably 0.60 or less, more preferably 0.20 or less, and even more preferably 0 or less. A smaller Ssk means that there is a smaller proportion of areas with lower elevations on the uneven surface. Therefore, by making Ssk 0.60 or less, the effects of (y3) and (y4) mentioned above are easily achieved, and the effects of anti-glare, suppression of reflected and scattered light, and blackness can be more easily exerted. If Ssk is too small, reflected and scattered light tend to increase due to the effect of (y5) mentioned above. Furthermore, if Ssk is too small, the lower parts of adjacent peaks may overlap, the slope with larger angles may disappear, and the effect of (y2) mentioned above will be reduced. Therefore, Ssk is preferably -1.00 or more, more preferably -0.80 or more, and even more preferably -0.70 or more. The preferred implementation of Ssk in the second implementation is as described above. The uneven surface of the anti-glare film in the second embodiment of the "Tilt Angle" preferably has a specific tilt angle distribution. Specifically, regarding the tilt angle of the uneven surface of the anti-glare film in the second embodiment, a tilt angle exceeding 0 degrees but less than 1 degree is defined as θ1, a tilt angle exceeding 1 degree but less than 3 degrees is defined as θ2, a tilt angle exceeding 3 degrees but less than 10 degrees is defined as θ3, and a tilt angle exceeding 10 degrees but less than 90 degrees is defined as θ4. Furthermore, when the sum of θ1, θ2, θ3, and θ4 is set to 100%, the ratio of θ1, θ2, θ3, and θ4 is preferably within the following range. By ensuring that θ1, θ2, θ3, and θ4 are within the following range, conditions 1 to 3 can be easily satisfied. θ1≦3.0% 0.5%≦θ2≦1 5.0% 7.0%≦θ3≦4 0.0% 50.0%≦θ4≦9 0.0% The preferred range of θ1 in the second embodiment is as described above. The preferred range of θ2 in the second embodiment is as described above. The preferred range of θ3 in the second embodiment is as described above. The preferred range of θ4 in the second embodiment is as described above. The amplitude spectrum of the elevation of the uneven surface of the anti-glare film in Embodiment 2 of the "Elevation Amplitude Spectrum" preferably meets specific conditions. The spatial frequencies of the elevation amplitude spectrum of the uneven surface are 0.005 μm. -1 0.010 μm -1 0.015 μm -1 The sum of the amplitudes corresponding to the time interval is defined as AM1, with a spatial frequency of 0.300 μm. -1 The amplitude of the time is defined as AM2. Under the above conditions, the AM1 of the anti-glare film in the second embodiment is preferably 0.070 μm or more and 0.400 μm or less. Furthermore, the AM2 of the anti-glare film in the second embodiment is preferably 0.0050 μm or more. Furthermore, the anti-glare film in the second embodiment is preferably AM2 < AM1. Furthermore, under the above conditions, the anti-glare film in the second embodiment is more preferably AM1 is 0.070 μm or more and 0.400 μm or less, AM2 is 0.0050 μm or more, and AM2 < AM1. As mentioned above, AM1 is the sum of the amplitudes of the three spatial frequencies, expressed by the following formula: AM1 = spatial frequency of 0.005 μm. -1 The temporal amplitude plus the spatial frequency is 0.010 μm. -1 The temporal amplitude plus the spatial frequency is 0.015 μm. -1The spatial frequency of the amplitude at time is a discrete value that depends on the length of one side; therefore, it is impossible to obtain a value with a length of 0.005 μm. -1 0.010 μm -1 0.015 μm -1 and 0.300 μm -1 In the case of consistent spatial frequencies, if no spatial frequency matches the above value, select the amplitude of the spatial frequency that is closest to the above value. Spatial frequency and amplitude can be obtained by performing a Fourier transform on the three-dimensional coordinate data of the uneven surface. The method for calculating spatial frequency and amplitude based on the three-dimensional coordinate data of the uneven surface is described in the first embodiment. Regarding the amplitude spectra of the elevations of uneven surfaces in AM1 and AM2, it can be said that the spatial frequency is roughly related to the reciprocal of the interval between the convex parts, and the amplitude is roughly related to the change in elevation of the convex parts with a specific interval. Furthermore, the spatial frequency is 0.005 μm. -1 This indicates an interval of approximately 200 μm and a spatial frequency of 0.010 μm. -1 This indicates an interval of approximately 100 μm and a spatial frequency of 0.015 μm. -1 This indicates an interval of approximately 67 μm and a spatial frequency of 0.300 μm. -1 This indicates an interval of approximately 3 μm. Furthermore, it can be said that the "variation in the elevation of protrusions with a specific interval" is roughly proportional to the absolute value of the height of each protrusion with a specific interval. Therefore, it can be said that a group of protrusions i and ii is indirectly defined for uneven surfaces where AM1 is 0.070 μm or more and 0.400 μm or less, AM2 is 0.0050 μm or more, and AM2 < AM1. <Group of protrusions i> A plurality of protrusions i are arranged at intervals of approximately 67 μm or more and 200 μm or less, and the absolute value of the height of protrusion i is within a specific range. <Group of protrusions ii> A plurality of protrusions ii are arranged at intervals of approximately 3 μm, and the absolute value of the height of protrusion ii is above a specific value but below the absolute value of the height of protrusion i. It is believed that the uneven surface possessing the convex groups of i and ii described above first achieves the effects of (y1) to (y5) mentioned above through the convex group of i described above. Furthermore, the uneven surface possessing the convex group of i and ii described above can form the convex portion of the convex group of ii described above in a generally flat region between adjacent peaks, thus reducing the proportion of specular reflection light in the reflected light reflected in the generally flat region. Therefore, it is believed that the uneven surface possessing the convex group of i and ii described above easily improves the effects of anti-glare, suppression of reflected and scattered light, and the sense of darkness. To achieve the aforementioned effects, AM1 is preferably 0.090 μm or more and 0.390 μm or less, more preferably 0.130 μm or more and 0.380 μm or less, and even more preferably 0.150 μm or more and 0.370 μm or less. If AM is too small, the anti-glare performance is particularly prone to being insufficient. On the other hand, if AM1 is too large, the image resolution tends to decrease. Furthermore, if AM1 is too large, the proportion of light that is totally internally reflected on the uneven surface increases, thus the transmittance of image light and other light incident from the side opposite to the uneven surface tends to decrease. Also, if AM1 is too large, the number of convex portions with larger absolute height values ​​increases, thereby increasing the proportion of light reflected to the observer's side, and thus the reflected and scattered light tends to become more noticeable. Therefore, in order to suppress the decrease in resolution and transmittance, and further suppress reflected and scattered light, it is advisable not to make AM1 too large. The preferred embodiment of AM1 in the second embodiment is as described above. To achieve the aforementioned effects, AM2 is preferably 0.0055 μm or higher and 0.0550 μm or lower, more preferably 0.0060 μm or higher and 0.0500 μm or lower, further preferably 0.0070 μm or higher and 0.0450 μm or lower, and even more preferably 0.0080 μm or higher and 0.0400 μm or lower. Furthermore, if AM2 is too large, the image resolution tends to decrease. Therefore, to suppress the decrease in resolution, AM2 should not be made too large. The preferred embodiment of AM2 in the second embodiment is as described above. In the second embodiment, the spatial frequencies are 0.005 μm. -1 0.010 μm -1 0.015 μm -1When the average amplitude corresponding to a given time is defined as AM1ave, AM1ave is preferably 0.023 μm or more and 0.133 μm or less, more preferably 0.030 μm or more and 0.130 μm or less, further preferably 0.043 μm or more and 0.127 μm or less, and further preferably 0.050 μm or more and 0.123 μm or less. AM1ave can be expressed by the following formula: AM1ave = (spatial frequency is 0.005 μm) -1 The temporal amplitude plus the spatial frequency is 0.010 μm. -1 The temporal amplitude plus the spatial frequency is 0.015 μm. -1 (Amplitude of time) / 3 In the second embodiment, the spatial frequency is 0.005 μm. -1 The amplitude corresponding to the time is defined as AM1-1, with a spatial frequency of 0.010 μm. -1 The amplitude corresponding to the time is defined as AM1-2, with a spatial frequency of 0.015 μm. -1 When the amplitude corresponding to AM1-3 is defined as AM1-3, AM1-1, AM1-2, and AM1-3 are preferably within the above range. By ensuring that AM1-1, AM1-2, and AM1-3 are within the above range, it is easy to suppress the uniformity of the spacing of the protrusions, and therefore, it is easy to suppress the increase of reflected light. The preferred embodiment of AM1-1 in the second embodiment is as described above. The preferred embodiment of AM1-2 in the second embodiment is as described above. The preferred embodiment of AM1-3 in the second embodiment is as described above. In order to improve the balance of the protrusions with different cycles and facilitate the production of the above-mentioned (y1) to (y5) effects, the AM1 / AM2 of the anti-glare film in the second embodiment is preferably 1.0 or more and 60.0 or less, more preferably 2.0 or more and 50.0 or less, more preferably 3.0 or more and 40.0 or less, and more preferably 4.0 or more and 30.0 or less. The preferred embodiment of AM1 / AM2 in the second embodiment is as described above. In the second embodiment, the anti-glare layer is the core layer responsible for suppressing reflected and scattered light and for its anti-glare properties. The method for forming the anti-glare layer in the second embodiment of the "Method for Forming Anti-glare Layer" is as described above. In the second embodiment, (d1) is preferred because (d1) is more effective at suppressing deviations in surface shapes such as Sa and Smp compared to (d2). Furthermore, in the second embodiment, (d1) is preferred because (d1) is more effective at improving the balance between AM1 and AM2 compared to (d2). In the second embodiment, the preferred range of the thickness T of the anti-glare layer is as described above. In the second embodiment of the "Composition", the composition of the anti-glare layer is as described above. That is, in the second embodiment, the anti-glare layer mainly contains resin components, and may contain, as needed, particles such as organic and inorganic microparticles, refractive index adjusters, antistatic agents, antifouling agents, ultraviolet absorbers, light stabilizers, antioxidants, viscosity adjusters, and thermal polymerization initiators. -Particle- The second implementation form of the particle type is as described above. Organic particles have a lower specific gravity, so by using them in combination with inorganic microparticles, they can easily float to the vicinity of the surface of the anti-glare layer. Therefore, in the second embodiment, by using organic particles and inorganic microparticles in combination, conditions 1 to 3 can be easily satisfied, which is preferable in this respect. Furthermore, in the second embodiment, by using organic particles and inorganic microparticles in combination, organic particles easily form irregularities with longer periods, while inorganic microparticles easily form irregularities with shorter periods, making it easy to place AM1 and AM2 within the aforementioned range. Also, since organic particles easily float to the vicinity of the surface of the anti-glare layer, surface shapes such as Sa and Smp can be easily placed within the aforementioned range. In the second embodiment, when only organic particles are used as particles, in order to easily satisfy conditions 1 to 3, it is preferable to increase the content ratio of organic particles in the anti-glare layer. By increasing the proportion of organic particles in the anti-glare layer, it is easy to form a shape with one side covered with organic particles, and further, it is easy to partially form a shape with stacked organic particles within the aforementioned shape. By adopting this shape, the effects of (y1) to (y5) mentioned above can be easily obtained. Furthermore, by increasing the proportion of organic particles, a shape with one side covered with organic particles can be formed with a shorter period of unevenness, namely AM2. Furthermore, by partially forming a shape with stacked organic particles within a shape with one side covered with organic particles, a shape with a longer period of unevenness, namely AM1, can be formed. Also, by forming a shape with one side covered with organic particles, Smp can be easily reduced. Furthermore, by partially forming a shape with stacked organic particles within a shape with one side covered with organic particles, Sa can be easily increased. The preferred range of the average particle size D in the second embodiment is as described above. In the second embodiment, by keeping the average particle size D within the above-described range, the height of the peaks and the peak spacing of the uneven surface are easily kept within an appropriate range, and conditions 1 to 3 can be easily satisfied. Furthermore, in the second embodiment, by keeping the average particle size D at 1.0 μm or more, AM1 can be easily suppressed from being too small, and Sa can be easily kept at 0.30 μm or more. Furthermore, in the second embodiment, by keeping the average particle size D at 5.0 μm or less, AM1 can be easily suppressed from being too large, and Smp can be easily kept at 10.00 μm or less. In the second embodiment, the preferred range of the ratio of the average particle size D to the thickness T of the anti-glare layer, i.e., D / T, is as described above. In the second embodiment, by keeping D / T within the aforementioned range, the height and spacing of the peaks on the uneven surface are easily kept within an appropriate range, thus easily satisfying conditions 1 to 3. Furthermore, in the second embodiment, by keeping D / T within the aforementioned range, AM1 and AM2 are easily kept within the aforementioned range. Also, in the second embodiment, by keeping D / T within the aforementioned range, the height and spacing of the peaks on the uneven surface are easily kept within an appropriate range, thus easily keeping surface shapes such as Sa and Smp within the aforementioned range. In the second embodiment, the preferred range of particle content is as described above. In the second embodiment, by making the particle content 40 parts by mass or more, it is easy to make the height and spacing of the peaks on the uneven surface within an appropriate range, and conditions 1 to 3 can be easily satisfied. Furthermore, in the second embodiment, by making the particle content 40 parts by mass or more, it is easy to suppress AM1 from being too small. Furthermore, in the second embodiment, by making the particle content 40 parts by mass or more, it is easy to make Sa 0.30 μm or more and Smp 10.00 μm or less. In the second embodiment, by making the particle content 200 parts by mass or less, it is easy to suppress particle detachment from the anti-glare layer. In the second embodiment, when the inorganic microparticles described below are not used, in order to facilitate the expression of the above-mentioned "covered" and "stacked" states, the particle content is preferably set to a relatively large amount within the above-mentioned range. -Inorganic microparticles- As described above, in the second embodiment, the anti-glare layer preferably contains inorganic microparticles in addition to the adhesive resin and particles. The anti-glare layer is even more preferably containing inorganic microparticles in addition to the adhesive resin and organic particles. In the second embodiment, by including inorganic microparticles in the anti-glare layer, relatively light organic particles easily float to the vicinity of the anti-glare layer's surface. Therefore, the surface shapes of Sa and Smp are easily within the aforementioned range, thus easily satisfying conditions 1 to 3. Furthermore, in the second embodiment, by including inorganic microparticles in the anti-glare layer, fine irregularities are easily formed between the peaks of the uneven surface, thus reducing specular reflection. Therefore, conditions 1 to 3 are easily satisfied. Furthermore, in the second embodiment, by including inorganic microparticles in the anti-glare layer, fine irregularities are easily formed between the peaks of the uneven surface, thus easily ensuring that AM1 and AM2 are within the aforementioned range. The types of inorganic microparticles in the second embodiment are as described above. The preferred range of the average particle size of the inorganic microparticles in the second embodiment is as described above. The preferred range of the inorganic microparticle content in the second embodiment is as described above. In the second embodiment, by making the inorganic microparticle content 40 parts by mass or more, the aforementioned effects based on inorganic microparticles can be easily obtained. Furthermore, in the second embodiment, by making the inorganic microparticle content 200 parts by mass or less, the reduction in the coating strength of the anti-glare layer can be easily suppressed. - Adhesive resin - The types of adhesive resins in the second embodiment are as described above. In the configuration of C1 described above, the viscosity of the anti-glare coating liquid increases due to the thermoplastic resin. Therefore, organic particles do not easily settle, and consequently, the adhesive resin does not easily flow down between the peaks. Thus, in the second embodiment, with the configuration of C1 described above, it is easy to keep the height and spacing of the peaks on the uneven surface within an appropriate range, easily satisfying conditions 1 to 3. Furthermore, in the second embodiment, with the configuration of C1 described above, it is easy to prevent AM1 and AM2 from being too small, and it is easy to keep surface shapes such as Sa and Smp within the aforementioned range. The preferred range of the weight average molecular weight of the thermoplastic resin in the second embodiment is as described above. In the second embodiment, the preferred range of the mass ratio of the cured product of the ionizing radiation-curing resin composition to the thermoplastic resin in the aforementioned C1 composition is as described above. In the second embodiment, the thermoplastic resin content is 10 or more relative to the cured product 90 of the ionizing radiation-curing resin composition, thereby easily leveraging the effect of increased viscosity of the anti-glare coating liquid. Furthermore, in the second embodiment, the thermoplastic resin content is 40 or less relative to the cured product 60 of the ionizing radiation-curing resin composition, thereby easily suppressing the reduction in the mechanical strength of the anti-glare layer. In the second embodiment, with the configuration of C2 described above, the bottom of the anti-glare layer is covered with organic particles, and organic particles are stacked in a certain area, forming a shape where a thin film of adhesive resin covers the organic particles. By adopting this shape, the effects of (y1) to (y5) described above can be easily obtained, and conditions 1 to 3 can be easily satisfied. Furthermore, in the configuration of C2, the stacked organic particles form a longer period of unevenness, namely AM1, and the unstacked organic particles form a shorter period of unevenness, namely AM2, between the longer period of unevenness. Therefore, in the second embodiment, with the configuration of C2 described above, AM1 and AM2 can be easily placed within the aforementioned range. Furthermore, in the second embodiment, with the configuration of C2 described above, Sa can be easily placed within the aforementioned range by means of stacked organic particles, and Smp can be easily placed within the aforementioned range by means of covered organic particles. Furthermore, in the second embodiment, in the case of the above-mentioned C2 configuration, in order to facilitate the adhesive resin to be in a thin film form, it is preferable that the amount of adhesive resin relative to the organic particles is less than that in the above-mentioned C1 configuration. As described above, in the second embodiment, a solvent is typically used in the anti-glare coating liquid to adjust the viscosity or to dissolve or disperse the components. The type of solvent and the drying speed of the solvent in the second embodiment are as described above. As described above, in the second embodiment, the solvent in the anti-glare coating liquid is preferably a solvent with a fast evaporation rate as the main component. In the second embodiment, by accelerating the evaporation rate of the solvent, the sedimentation of organic particles into the lower part of the anti-glare layer is suppressed, and consequently, the adhesive resin is less likely to flow down to the spaces between peaks. Therefore, in the second embodiment, by accelerating the evaporation rate of the solvent, the height and spacing of the peaks on the uneven surface are easily kept within an appropriate range, and conditions 1 to 3 can be easily satisfied. Furthermore, by accelerating the evaporation rate of the solvent, AM1 and AM2 can be easily kept within the aforementioned range, and surface shapes such as Sa and Smp can be easily kept within the aforementioned range. As described above, in the second embodiment, the solvent in the anti-glare coating liquid preferably contains, in addition to a solvent with a faster evaporation rate, a small amount of a solvent with a slower evaporation rate. The preferred range of the mass ratio of the faster-evaporating solvent to the slower-evaporating solvent in the second embodiment is as described above. In the second embodiment, by using a solvent with a slower evaporation rate, the organic particles are agglomerated, making it easy to bring the height and spacing of the peaks on the uneven surface within an appropriate range, thus easily satisfying conditions 1 to 3. Furthermore, in the second embodiment, by using a solvent with a slower evaporation rate to moderately agglomerate the organic particles, AM1 and AM2 can be easily brought within the aforementioned range, and surface shapes such as Sa and Smp can be easily brought within the aforementioned range. <Optical Properties> The preferred range of total light transmittance, haze, and internal haze of the anti-glare film in the second embodiment is as described above. <Other Layers> As described above, the anti-glare film of the second embodiment may also have layers other than the anti-glare layer and the transparent substrate, i.e., other layers. The embodiments of the other layers in the second embodiment are as described above. <Size, shape, etc.> The size and shape of the anti-glare film in the second embodiment are as described above. [Anti-glare film of the third embodiment] The anti-glare film of the third embodiment of the present invention has an anti-glare layer, and the anti-glare film has an uneven surface, wherein the three-dimensional arithmetic mean roughness Sa of the uneven surface is 0.30 μm or more, and the three-dimensional average peak interval Smp is 10.00 μm or less. Figure 19 is a schematic cross-sectional view of the anti-glare film 100 according to the third embodiment of the present invention. The anti-glare film 100 in Figure 19 includes an anti-glare layer 20 with an uneven surface. In Figure 19, the surface of the anti-glare layer 20 is the uneven surface of the anti-glare film. The anti-glare film 100 in Figure 19 has the anti-glare layer 20 on a transparent substrate 10. The anti-glare layer 20 in Figure 19 includes an adhesive resin 21 and organic particles 22. The anti-glare film of the third embodiment of the present invention is not limited to the laminated structure shown in FIG19, as long as it has an uneven surface with Sa of 0.30 μm or more and Smp of 10.00 μm or less. For example, the anti-glare film can be a single-layer structure of the anti-glare layer, or it can have a transparent substrate and layers other than the anti-glare layer, such as an anti-reflective layer and an anti-fouling layer. When other layers are present on the anti-glare layer, it is sufficient that the surfaces of the other layers are the uneven surfaces of the anti-glare film. In the third embodiment, a preferred embodiment of the anti-glare film is one in which the anti-glare layer is present on a transparent substrate, and the surface of the anti-glare layer opposite to the transparent substrate is the uneven surface of the anti-glare film. <Transparent Substrate> From the viewpoint of ease of manufacturing and operability of the anti-glare film, the anti-glare film of the third embodiment is preferably a transparent substrate. The embodiments of the transparent substrate of the third embodiment are as described above. The anti-glare film in the third embodiment of the <uneven surface> needs to have an uneven surface, and the Sa of the uneven surface is 0.30 μm or more, and the Smp is 10.00 μm or less. When there are no other layers on the anti-glare layer, it is sufficient that the surface of the anti-glare layer meets the above-mentioned uneven surface condition. When there are other layers on the anti-glare layer, it is sufficient that the surfaces of the other layers meet the above-mentioned uneven surface condition. The uneven surface with Sa being 0.30 μm or more and Smp being 10.00 μm or less indicates that the peaks with higher elevations exist at small intervals. Thus, it is believed that when the peaks with higher elevations exist at small intervals, excellent anti-glare performance and suppression of reflected and scattered light can be achieved mainly due to the reasons described below (z1) to (z5). (z1) Because adjacent peaks are close together, most of the reflected light from the surface of any peak is incident on the adjacent peak. Then, it undergoes repeated total internal reflection within the adjacent peak, eventually advancing towards the side opposite to observer 200 (image of the solid line in Figure 21). (z2) The reflected light from the steep slope of any peak advances towards the side opposite to observer 200, and is independent of adjacent peaks (image of the dashed line in Figure 21). (z3) Because adjacent peaks are close together, there are fewer roughly flat areas that produce specular reflection. (z4) The reflected light in the relatively flat areas is more likely to hit adjacent peaks. Therefore, the angular distribution of the reflected light in the roughly flat areas is roughly equal, without being biased towards a specific angle. (z5) The reflected light from the gentle slope of any peak advances towards observer 200 (image of the single-point chain in Figure 21). The angle distribution of the gently sloping peaks is uniform; therefore, the angle distribution of the reflected light is also uniform and does not deviate to a specific angle. First, it is believed that due to the reasons (z1) to (z3) mentioned above, reflected and scattered light can be suppressed, thus improving anti-glare performance to a certain extent. Furthermore, due to the reasons (z4) and (z5) mentioned above, even if a small amount of reflected and scattered light is generated, the angular distribution of the reflected and scattered light can be made uniform. Even if the amount of reflected and scattered light is small, when the angular distribution of the reflected and scattered light is biased at a specific angle, it is still recognized as reflected light. Therefore, due to the reasons (z4) and (z5) mentioned above, the anti-glare performance can be made excellent. Moreover, due to the reasons (z1) to (z5) mentioned above, the observer can hardly perceive the reflected and scattered light, thus giving the anti-glare film a sense of darkness, and further, giving the image display device a high-end feel. To more easily achieve the effects of anti-glare, suppression of reflected and scattered light, and a sense of darkness, Sa is preferably 0.40 μm or more, more preferably 0.50 μm or more, and even more preferably 0.55 μm or more. If Sa is too large, the image resolution tends to decrease. Furthermore, if Sa is too large, the proportion of light that is totally reflected on the uneven surface increases, and therefore, the transmittance of light such as image light incident from the side opposite to the uneven surface tends to decrease. Therefore, Sa is preferably 1.00 μm or less, more preferably 0.80 μm or less, and even more preferably 0.70 μm or less. The preferred implementation of Sa in the third implementation is as described above. From the viewpoint of anti-glare performance, suppression of reflected and scattered light, and uniformity of the effect of darkness within the surface, the deviation of Sa is preferably 0.090 μm or less, more preferably 0.070 μm or less, and even more preferably 0.050 μm or less. The lower limit of the deviation of Sa is not particularly limited, but is generally 0.010 μm or more, and preferably 0.020 μm or more. In this specification, deviation refers to the standard deviation σ. In this specification, the deviation of various parameters refers to the deviation of the measured values ​​of the above 16 locations. Examples of preferred deviation ranges for Sa include: 0.010 μm and 0.090 μm, 0.010 μm and 0.070 μm, 0.010 μm and 0.050 μm, 0.020 μm and 0.090 μm, 0.020 μm and 0.070 μm, and 0.020 μm and 0.050 μm. To more effectively achieve anti-glare properties, suppression of reflected and scattered light, and a sense of darkness, Smp is preferably 8.00 μm or less, more preferably 6.00 μm or less, and even more preferably 4.50 μm or less, and even more preferably 3.50 μm or less. If Smp is too small, the lower parts of adjacent peaks may overlap, the steeper slopes may disappear, and the aforementioned effect (z2) will be reduced. Therefore, Smp is preferably 1.00 μm or more, more preferably 1.50 μm or more, and even more preferably 2.00 μm or more. The preferred implementation of the third implementation of Smp is as described above. From the perspective of anti-glare performance, suppression of reflected and scattered light, and uniformity of black level within the surface, the deviation of Smp is preferably 3.00 μm or less, more preferably 2.00 μm or less, further preferably 1.00 μm or less, and even more preferably 0.50 μm or less. If the deviation of Smp is too small, ripples may occur due to the pixel combination with the display element. Therefore, the deviation of Smp is preferably 0.05 μm or more, more preferably 0.10 μm or more, and even more preferably 0.15 μm or more. Examples of preferred deviation ranges for Smp include: 0.05 μm and above and 3.00 μm and below, 0.05 μm and above and 2.00 μm and below, 0.05 μm and above and 1.00 μm and below, 0.05 μm and above and 0.50 μm and below, 0.10 μm and above and 3.00 μm and below, 0.10 μm and above and 2.00 μm and below, 0.10 μm and above and 1.00 μm and below, 0.10 μm and above and 0.50 μm and below, 0.15 μm and above and 3.00 μm and below, 0.15 μm and above and 2.00 μm and below, 0.15 μm and above and 1.00 μm and below, and 0.15 μm and above and 0.50 μm and below. The anti-glare film in the third embodiment preferably has a Sa / Smp ratio of 0.05 or higher, more preferably 0.10 or higher, and even more preferably 0.13 or higher. By making Sa / Smp 0.05 or higher, the tendency for higher peaks to exist at small intervals on the uneven surface of the anti-glare film can be further enhanced, making it easier to exert the effects of anti-glare, suppression of reflected and scattered light, and a sense of darkness. If Sa / Smp is too large, the effects of excessively large Sa and excessively small Smp may occur. Therefore, Sa / Smp is preferably 0.50 or lower, more preferably 0.40 or lower, and even more preferably 0.25 or lower. The preferred implementation of Sa / Smp in the third implementation is as described above. The ratio of the three-dimensional ten-point average roughness Sz to Sa of the uneven surface of the anti-glare film in the third embodiment of Sz / Sa is preferably 5.0 or higher, more preferably 5.5 or higher, and even more preferably 6.0 or higher. By making Sz / Sa 5.0 or higher, a certain degree of randomness is imparted to the uneven surface, making it less noticeable when defects such as scratches occur on the uneven surface. If Sz / Sa is too large, glare may occur due to specific areas on the uneven surface, or the darkness may be locally reduced. Therefore, Sz / Sa is preferably 10.0 or lower, more preferably 8.0 or lower, and even more preferably 7.5 or lower. The preferred embodiment of Sz / Sa in the third embodiment is as described above. The three-dimensional skewness Ssk of the uneven surface of the anti-glare film in the third embodiment of Ssk is preferably 0.60 or less, more preferably 0.20 or less, and even more preferably 0 or less. A smaller Ssk means that there is a smaller proportion of areas with lower elevations on the uneven surface. Therefore, by making Ssk 0.60 or less, the effects of (z3) and (z4) mentioned above are easily achieved, and the effects of anti-glare, suppression of reflected and scattered light, and blackness can be more easily exerted. If Ssk is too small, reflected and scattered light tend to increase due to the effect of (z5) mentioned above. Furthermore, if Ssk is too small, the lower parts of adjacent peaks may overlap, the slope with larger angles may disappear, and the effect of (z2) mentioned above will be reduced. Therefore, Ssk is preferably -1.00 or more, more preferably -0.80 or more, and even more preferably -0.70 or more. The preferred implementation of the third implementation of Ssk is as described above. The anti-glare film of the third embodiment of the "Tilt Angle" preferably has a specific tilt angle distribution on its uneven surface. Specifically, regarding the tilt angle of the uneven surface of the anti-glare film, a tilt angle greater than 0 degrees but less than 1 degree is defined as θ1, a tilt angle greater than 1 degree but less than 3 degrees is defined as θ2, a tilt angle greater than 3 degrees but less than 10 degrees is defined as θ3, and a tilt angle greater than 10 degrees but less than 90 degrees is defined as θ4. Furthermore, when the sum of θ1, θ2, θ3, and θ4 is set to 100%, the ratio of θ1, θ2, θ3, and θ4 is preferably within the following range. By making θ1, θ2, θ3, and θ4 within the following range, the effects described above (z1) to (z5) can be easily generated, and the reduction in resolution can be easily suppressed. θ1≦3.0% 0.5%≦θ2≦1 5.0% 7.0%≦θ3≦4 0.0% 50.0%≦θ4≦9 0.0% The preferred range of θ1 in the third embodiment is as described above. The preferred range of θ2 in the third embodiment is as described above. The preferred range of θ3 in the third embodiment is as described above. The preferred range of θ4 in the third embodiment is as described above. The amplitude spectrum of the elevation on the uneven surface of the anti-glare film in Embodiment 3 of the "Elevation Amplitude Spectrum" preferably meets specific conditions. The spatial frequencies of the elevation amplitude spectrum on the uneven surface are 0.005 μm. -1 0.010 μm -1 0.015 μm -1 The sum of the amplitudes corresponding to the time interval is defined as AM1, with a spatial frequency of 0.300 μm. -1The amplitude of the time is defined as AM2. Under the above conditions, the AM1 of the anti-glare film in the third embodiment is preferably 0.070 μm or more and 0.400 μm or less. Furthermore, the AM2 of the anti-glare film in the third embodiment is preferably 0.0050 μm or more. Furthermore, the anti-glare film in the third embodiment is preferably AM2 < AM1. Furthermore, under the above conditions, the anti-glare film in the third embodiment is more preferably AM1 is 0.070 μm or more and 0.400 μm or less, AM2 is 0.0050 μm or more, and AM2 < AM1. As mentioned above, AM1 is the sum of the amplitudes of the three spatial frequencies, expressed by the following formula: AM1 = spatial frequency of 0.005 μm. -1 The temporal amplitude plus the spatial frequency is 0.010 μm. -1 The temporal amplitude plus the spatial frequency is 0.015 μm. -1 The spatial frequency of the amplitude at time is a discrete value that depends on the length of one side; therefore, it is impossible to obtain a value with a length of 0.005 μm. -1 0.010 μm -1 0.015 μm -1 and 0.300 μm -1 In the case of consistent spatial frequencies, if no spatial frequency matches the above value, select the amplitude of the spatial frequency that is closest to the above value. Spatial frequency and amplitude can be obtained by performing a Fourier transform on the three-dimensional coordinate data of the uneven surface. The method for calculating spatial frequency and amplitude based on the three-dimensional coordinate data of the uneven surface is described in the first embodiment. Regarding the amplitude spectra of the elevations of uneven surfaces in AM1 and AM2, it can be said that the spatial frequency is roughly related to the reciprocal of the interval between the convex parts, and the amplitude is roughly related to the change in elevation of the convex parts with a specific interval. Furthermore, the spatial frequency is 0.005 μm. -1 This indicates an interval of approximately 200 μm and a spatial frequency of 0.010 μm. -1 This indicates an interval of approximately 100 μm and a spatial frequency of 0.015 μm. -1 This indicates an interval of approximately 67 μm and a spatial frequency of 0.300 μm. -1This indicates an interval of approximately 3 μm. Furthermore, it can be said that the "variation in the elevation of protrusions with a specific interval" is roughly proportional to the absolute value of the height of each protrusion with a specific interval. Therefore, it can be said that a group of protrusions i and ii is indirectly defined for uneven surfaces where AM1 is 0.070 μm or more and 0.400 μm or less, AM2 is 0.0050 μm or more, and AM2 < AM1. <Group of protrusions i> A plurality of protrusions i are arranged at intervals of approximately 67 μm or more and 200 μm or less, and the absolute value of the height of protrusion i is within a specific range. <Group of protrusions ii> A plurality of protrusions ii are arranged at intervals of approximately 3 μm, and the absolute value of the height of protrusion ii is above a specific value but below the absolute value of the height of protrusion i. It is believed that the uneven surface possessing the convex groups of i and ii described above first achieves the effects of (z1) to (z5) mentioned above through the convex group of i described above. Furthermore, the uneven surface possessing the convex group of i and ii described above can form the convex portion of the convex group of ii described above in a generally flat region between adjacent peaks, thus reducing the proportion of specular reflection light in the reflected light reflected in the generally flat region. Therefore, it is believed that the uneven surface possessing the convex group of i and ii described above easily improves the effects of anti-glare, suppression of reflected and scattered light, and the sense of darkness. To achieve the aforementioned effects, AM1 is preferably 0.090 μm or more and 0.390 μm or less, more preferably 0.130 μm or more and 0.380 μm or less, and even more preferably 0.150 μm or more and 0.370 μm or less. If AM is too small, the anti-glare performance is particularly prone to being insufficient. On the other hand, if AM1 is too large, the image resolution tends to decrease. Furthermore, if AM1 is too large, the proportion of light that is totally internally reflected on the uneven surface increases, thus the transmittance of image light and other light incident from the side opposite to the uneven surface tends to decrease. Also, if AM1 is too large, the number of convex portions with larger absolute height values ​​increases, thereby increasing the proportion of light reflected to the observer's side, and thus the reflected and scattered light tends to become more noticeable. Therefore, in order to suppress the decrease in resolution and transmittance, and further suppress reflected and scattered light, it is advisable not to make AM1 too large. The preferred embodiment of AM1 in the third embodiment is as described above. To achieve the aforementioned effects, AM2 is preferably 0.0055 μm or higher and 0.0550 μm or lower, more preferably 0.0060 μm or higher and 0.0500 μm or lower, further preferably 0.0070 μm or higher and 0.0450 μm or lower, and even more preferably 0.0080 μm or higher and 0.0400 μm or lower. Furthermore, if AM2 is too large, the image resolution tends to decrease. Therefore, to suppress the decrease in resolution, AM2 should not be made too large. The preferred implementation of AM2 in the third implementation is as described above. In the third embodiment, the spatial frequencies are 0.005 μm. -1 0.010 μm -1 0.015 μm -1 When the average amplitude corresponding to a given time is defined as AM1ave, AM1ave is preferably 0.023 μm or more and 0.133 μm or less, more preferably 0.030 μm or more and 0.130 μm or less, further preferably 0.043 μm or more and 0.127 μm or less, and further preferably 0.050 μm or more and 0.123 μm or less. AM1ave can be expressed by the following formula: AM1ave = (spatial frequency is 0.005 μm) -1 The temporal amplitude plus the spatial frequency is 0.010 μm. -1 The temporal amplitude plus the spatial frequency is 0.015 μm. -1 (Amplitude of time) / 3 In the third embodiment, the spatial frequency is 0.005 μm. -1 The amplitude corresponding to the time is defined as AM1-1, with a spatial frequency of 0.010 μm. -1 The amplitude corresponding to the time is defined as AM1-2, with a spatial frequency of 0.015 μm. -1 When the amplitude corresponding to AM1-3 is defined as AM1-3, AM1-1, AM1-2, and AM1-3 are preferably within the above range. By ensuring that AM1-1, AM1-2, and AM1-3 are within the above range, it is easy to suppress the uniformity of the spacing of the protrusions, and therefore, it is easy to suppress the increase of reflected light. The preferred embodiment of AM1-1 in the third embodiment is as described above. The preferred embodiment of AM1-2 in the third embodiment is as described above. The preferred embodiment of AM1-3 in the third embodiment is as described above. In order to improve the balance of the protrusions with different cycles and facilitate the production of the above-mentioned (z1) to (z5) effects, the AM1 / AM2 of the anti-glare film in the third embodiment is preferably 1.0 or more and 60.0 or less, more preferably 2.0 or more and 50.0 or less, more preferably 3.0 or more and 40.0 or less, and more preferably 4.0 or more and 30.0 or less. The preferred implementation of AM1 / AM2 in the third implementation is as described above. In the third embodiment, the anti-glare layer is the core layer responsible for suppressing reflected and scattered light and for its anti-glare properties. The method for forming the anti-glare layer in the third embodiment of the "Method for Forming Anti-glare Layer" is as described above. In the third embodiment, (d1) is preferred because (d1) is more effective at suppressing deviations in surface shapes such as Sa and Smp compared to (d2). Furthermore, in the third embodiment, (d1) is preferred because (d1) is more effective at improving the balance between AM1 and AM2 compared to (d2). In the third embodiment, the preferred range of the thickness T of the anti-glare layer is as described above. In the third embodiment of the "Composition", the composition of the anti-glare layer is as described above. That is, in the third embodiment, the anti-glare layer mainly contains resin components, and may contain, as needed, particles such as organic and inorganic microparticles, refractive index adjusters, antistatic agents, antifouling agents, ultraviolet absorbers, light stabilizers, antioxidants, viscosity adjusters, and thermal polymerization initiators. -Particle- The types of particles in the third implementation form are as described above. Organic particles are lighter in density, so by combining them with inorganic microparticles, they can easily float to the vicinity of the anti-glare layer surface. Therefore, in the third embodiment, by combining organic and inorganic microparticles, the surface shapes such as Sa, Smp, and Ssk can be easily made within the aforementioned range, which is preferable in this respect. Furthermore, in the third embodiment, by combining organic and inorganic microparticles, organic particles easily form irregularities with longer periods, while inorganic microparticles easily form irregularities with shorter periods, making it easier to make AM1 and AM2 within the aforementioned range. In the third embodiment, when only organic particles are used as particles, in order to easily make the surface shapes such as Sa and Smp within the aforementioned range, it is preferable to increase the organic particle content ratio in the anti-glare layer. By increasing the organic particle content ratio in the anti-glare layer, a shape covered with organic particles on one side is easily formed, which reduces Smp. Furthermore, by partially forming a stacked organic particle shape within the aforementioned shape, Sa can be easily increased. Furthermore, by increasing the content ratio of organic particles, it is possible to form a shape with a shorter period of concavity and convexity, namely AM2, by forming a shape with organic particles covering one side. Moreover, by partially forming a shape with stacked organic particles in a shape with organic particles covering one side, a shape with a longer period of concavity and convexity, namely AM1, can be formed. The preferred range of the average particle size D in the third embodiment is as described above. By making the average particle size D 1.0 μm or more, it is easy to make Sa 0.30 μm or more, and it is easy to suppress AM1 from being too small. Furthermore, by making the average particle size D 5.0 ​​μm or less, it is easy to make Smp 10.00 μm or less, and it is easy to suppress AM1 from being too large. In the third embodiment, the preferred range of the ratio of the average particle size D to the thickness T of the anti-glare layer, i.e., D / T, is as described above. In the third embodiment, by keeping D / T within the aforementioned range, it is easy to keep the height and spacing of the peaks on the uneven surface within an appropriate range, and it is easy to keep surface shapes such as Sa and Smp within the aforementioned range. Furthermore, in the third embodiment, by keeping D / T within the aforementioned range, it is easy to keep AM1 and AM2 within the aforementioned range. In the third embodiment, the preferred range of particle content is as described above. In the third embodiment, by setting the particle content to 40 parts by mass or more, it is easy to make Sa 0.30 μm or more, Smp 10.00 μm or less, and Ssk 0.40 or less. Furthermore, in the third embodiment, by setting the particle content to 40 parts by mass or more, it is easy to suppress AM1 from being too small. In the third embodiment, by setting the particle content to 200 parts by mass or less, it is easy to suppress particle detachment from the anti-glare layer. In the third embodiment, when the inorganic microparticles described below are not used, in order to facilitate the expression of the above-described "stacked" state, the particle content is preferably set to a relatively large amount within the above-described range. -Inorganic microparticles- As described above, in the third embodiment, the anti-glare layer preferably contains inorganic microparticles in addition to the adhesive resin and particles. The anti-glare layer is even more preferably containing inorganic microparticles in addition to the adhesive resin and organic particles. In the third embodiment, by including inorganic microparticles in the anti-glare layer, relatively light organic particles easily float to the vicinity of the anti-glare layer's surface. Therefore, surface shapes such as Sa, Smp, and Ssk can be easily positioned within the aforementioned range. Furthermore, in the third embodiment, by including inorganic microparticles in the anti-glare layer, fine irregularities are easily formed between the peaks of the uneven surface, thus easily reducing specular reflection. Furthermore, by including inorganic microparticles in the anti-glare layer, fine irregularities are easily formed between the peaks of the uneven surface, thus easily positioning AM1 and AM2 within the aforementioned range. The types of inorganic microparticles in the third embodiment are as described above. The preferred range of the average particle size of the inorganic microparticles in the third embodiment is as described above. The preferred range of the inorganic microparticle content in the third embodiment is as described above. In the third embodiment, by making the inorganic microparticle content 40 parts by mass or more, the aforementioned effects based on inorganic microparticles can be easily obtained. Furthermore, in the third embodiment, by making the inorganic microparticle content 200 parts by mass or less, the reduction in the coating strength of the anti-glare layer can be easily suppressed. -Adhesive resin- The types of adhesive resins in the third embodiment are as described above. In the configuration of C1 described above, the viscosity of the anti-glare coating liquid increases due to the thermoplastic resin. Therefore, organic particles do not easily settle, and consequently, the adhesive resin does not easily flow down between the peaks. Thus, in the third embodiment, with the configuration of C1 described above, the surface shapes such as Sa and Smp can be easily kept within the aforementioned range. Furthermore, in the third embodiment, with the configuration of C1 described above, excessively small AM1 and AM2 can be easily prevented. The preferred range of the weight average molecular weight of the thermoplastic resin in the third embodiment is as described above. In the third embodiment, the preferred range of the mass ratio of the cured product of the ionizing radiation-curing resin composition to the thermoplastic resin in the aforementioned C1 composition is as described above. In the third embodiment, the thermoplastic resin content is 10 or more relative to the cured product 90 of the ionizing radiation-curing resin composition, thereby easily leveraging the effect of increased viscosity of the anti-glare coating liquid. Furthermore, in the third embodiment, the thermoplastic resin content is 40 or less relative to the cured product 60 of the ionizing radiation-curing resin composition, thereby easily suppressing the reduction in the mechanical strength of the anti-glare layer. In the third embodiment, with the aforementioned configuration of C2, the bottom of the anti-glare layer is covered with organic particles, and organic particles are stacked in a certain area, forming a thin film-like adhesive resin covering the organic particles. Therefore, in the third embodiment, with the aforementioned configuration of C2, the stacked organic particles easily ensure that Sa is within the aforementioned range, and the covered organic particles easily ensure that Smp is within the aforementioned range. Furthermore, in the third embodiment, with the aforementioned configuration of C2, the stacked organic particles form a longer-period unevenness (AM1), and the unstacked organic particles form a shorter-period unevenness (AM2) between the longer-period unevenness. Therefore, in the third embodiment, with the aforementioned configuration of C2, AM1 and AM2 can be easily placed within the aforementioned range. Furthermore, in the third embodiment, in the case of the above-mentioned C2 configuration, in order to facilitate the adhesive resin to be in a thin film form, it is preferable that the amount of adhesive resin relative to the organic particles is less than that in the above-mentioned C1 configuration. As described above, in the third embodiment, a solvent is typically used in the anti-glare coating liquid to adjust the viscosity or to dissolve or disperse the components. The type of solvent and the drying speed of the solvent in the third embodiment are as described above. As described above, in the third embodiment, the solvent in the anti-glare coating liquid is preferably a solvent with a fast evaporation rate as the main component. In the third embodiment, by accelerating the evaporation rate of the solvent, the sedimentation of organic particles into the lower part of the anti-glare layer is suppressed, and consequently, the adhesive resin is less likely to flow down to the spaces between peaks. Therefore, in the third embodiment, by accelerating the evaporation rate of the solvent, the surface shapes such as Sa and Smp can be easily made to be within the aforementioned range. Furthermore, in the third embodiment, by accelerating the evaporation rate of the solvent, AM1 and AM2 can be easily made to be within the aforementioned range. As described above, in the third embodiment, the solvent in the anti-glare coating liquid preferably contains, in addition to a solvent with a faster evaporation rate, a small amount of a solvent with a slower evaporation rate. The preferred range of the mass ratio of the faster-evaporating solvent to the slower-evaporating solvent in the third embodiment is as described above. In the third embodiment, by using a solvent with a slower evaporation rate to cause organic particles to agglomerate, it is easy to bring Sa and Smp within the aforementioned range. Furthermore, in the third embodiment, by using a solvent with a slower evaporation rate to cause organic particles to moderately agglomerate, it is easy to bring AM1 and AM2 within the aforementioned range. <Optical Properties> The preferred range of total light transmittance, haze, and internal haze of the anti-glare film in the third embodiment is as described above. <Other Layers> As described above, the anti-glare film in the third embodiment may also have layers other than the anti-glare layer and the transparent substrate, i.e., other layers. The embodiments of the other layers in the third embodiment are as described above. <Size, shape, etc.> The size and shape of the anti-glare film in the third embodiment are as described above. [Image Display Device] The image display device of the present invention is formed by disposing an anti-glare film on a display element in any of the first, second and third embodiments such that the surface of the concave-convex surface faces the side opposite to the display element, and the anti-glare film is disposed on the outermost surface (see Figure 3). Examples of display elements include: liquid crystal display elements, organic EL display elements, inorganic EL display elements, plasma display elements, and LED display elements such as micro-LED display elements. These display elements may have a touch panel function internally. Examples of liquid crystal display methods include: IPS, VA, multi-domain, OCB, STN, and TSTN. When the display element is a liquid crystal display element, a backlight is required. The backlight is located on the side opposite to the side of the liquid crystal display element where the anti-glare film is located. The image display device of the present invention can be an image display device with a touch panel having a touch panel between the display element and the anti-glare film. In this case, it is sufficient to provide an anti-glare film on the outermost surface of the image display device with the touch panel, and to ensure that the surface of the anti-glare film with its concave and convex surfaces faces the opposite side to the display element. There is no particular limitation on the size of the image display device, but the maximum diameter of the effective display area is approximately 2 inches to 500 inches. The effective display area of ​​an image display device refers to the area capable of displaying images. For example, when the image display device has a housing surrounding the display element, the area inside the housing is the effective image area. The maximum diameter of the effective image area refers to the maximum length connecting any two points within the effective image area. For example, when the effective image area is rectangular, the diagonal of the rectangle is the maximum diameter. When the effective image area is circular, the diameter of the circle is the maximum diameter. [Example] Secondly, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples in any way. Unless otherwise specified, "parts" and "%" are used as mass units. 《Examples and Comparative Examples of the First Embodiment》 1. Measurement and Evaluation As described above, the anti-glare films of the examples and comparative examples were measured and evaluated. The gas environment for each measurement and evaluation was set to a temperature of 23±5°C and a humidity of 40% or more and 65% or less. Furthermore, before starting each measurement and evaluation, the sample was exposed to the above-mentioned gas environment for more than 30 minutes before the measurement and evaluation were performed. The results are shown in Table 1 or Table 2. 1-1. Measurement of AM1 and AM2: The anti-glare films of the examples and comparative examples were cut into 10 cm × 10 cm pieces. After visually confirming the absence of dirt, scratches, or other abnormalities, the cutting points were randomly selected. Using Panac's optically transparent adhesive sheet (trade name: PANACLEAN PD-S1, thickness 25 μm), the transparent substrate side of the cut anti-glare film was adhered to a 10 cm × 10 cm glass plate (2.0 mm thick) to prepare Sample 1. Using a white interference microscope (New View 7300, Zygo), Sample 1 was placed on the measuring stage to ensure it was fixed and in close contact with the stage. Under the following measurement conditions 1 and analysis conditions 1, the elevation of the uneven surface of the anti-glare film was measured and analyzed, thereby calculating AM1 and AM2. The measurement analysis software used was MetroPro ver9.0.10 Microscope Application. (Measurement Condition 1) Objective lens: 50x; Image zoom: 1x; Measurement area: 218 μm × 218 μm; Resolution (interval between points): 0.22 μm; Instrument: NewView7000 Id 0 SN 073395; Acquisition mode: Scan; Scan type: Bipolar; Camera mode: 992 × 992 48 Hz; Subtract Sys Err: Off; Sys Err File: SysErr.dat; AGC: Off; Phase Res: High; Connection order: Location; Discon Action: Filter; Min Mod (%): 0.01; Min Area Size: 7; Remove Edges. Fringes: Off • Number of Averages: 0 • FDA Noise Threshold: 10 • Scan Length: 15 μm (bipolar) (6 sec) • Extended Scan Length: 1000 μm • FDA Res Resolution: High 2G (Analysis Condition 1) • Removed: None • Data Fill: On • Data Fill Max: 10000 • Filter: HighPass • Filter Type: Gaussian Spline • Filter Window Size: 3 • Filter Trim: Off • Filter Low Wavelength: 800 μm • Min Area Size: 0 • Remove Spikes: On • Spike Height (xRMS): 2.5 Low wavelength is equivalent to the critical value λc in the roughness parameters. (Calculation steps for AM1 and AM2) A "Save Data" button is displayed on the Surface Map screen, saving the parsed 3D surface roughness data in "XYZ File (*.xyz)" format. Next, it is exported to Microsoft Excel (registered trademark) to obtain the 2D function h(x,y) for elevation. The original data consists of 992 columns × 992 rows = 984,064 points, with a side length (MΔx or NΔy) of 218 μm. However, by repeatedly deleting the peripheral data 41 times, data of 910 columns × 910 rows = 828,100 points with a side length of 200 μm is obtained. Secondly, using the statistical analysis software R (ver 3.6.3), the one-dimensional amplitude spectrum Hx'(fx) and Hy'(fy) of each column and row in the two-dimensional function (910 columns x 910 rows) of elevation were calculated. The amplitude values ​​corresponding to each spatial frequency value were averaged to obtain the one-dimensional amplitude spectrum H"(f). For each sample, the one-dimensional function H"(f) of elevation was measured on the surface of 16 locations, and the amplitude values ​​corresponding to each spatial frequency value were averaged. The result was used as the one-dimensional amplitude spectrum H(f). Then, AM2 was selected from the obtained data, and AM1 was calculated. Furthermore, a spatial frequency of 0.005 μm was used... -1 The corresponding amplitude AM1-1 and spatial frequency are 0.010 μm. -1 The corresponding amplitude AM1-2 and spatial frequency are 0.015 μm. -1The values ​​of the amplitude AM1-3 corresponding to the time are shown in Table 1. Figures 6-18 show the discrete function H(f) of the amplitude spectrum of the elevation of the uneven surface of the anti-glare film of Examples 1-1-1-7 and Comparative Examples 1-1-1-6. In the figures, the horizontal axis represents the spatial frequency (unit: μm). -1 The vertical axis represents the amplitude (in μm). 1-2. Total Light Transmittance (Tt) and Haze (Hz): The anti-glare films of the examples and comparative examples were cut into 10 cm squares. After visually confirming the absence of dirt, scratches, or other abnormalities, the cut sections were randomly selected. Using a haze meter (HM-150, manufactured by Murakami Color Technology Research Institute), the total light transmittance of each sample according to JIS K7361-1:1997 and the haze according to JIS K7136:2000 were measured. After turning on the power switch of the device in advance, it was waited for more than 15 minutes to allow the light source to stabilize. Calibration was performed with nothing placed at the entrance opening. Then, the measurement sample was placed at the entrance opening for measurement. The light incident surface was set to the transparent substrate side. 1-3. Anti-glare performance 1 (anti-glare performance in the direction of specular reflection) The anti-glare films of the examples and comparative examples were cut into 10 cm × 10 cm pieces. After visually confirming that there were no abnormalities such as dirt or scratches, the cutting points were selected from random locations. Using Panac's optically transparent adhesive sheet (trade name: PANACLEAN PD-S1, thickness 25 μm), the transparent substrate side of the cut anti-glare film was adhered to a black plate (Kuraray, trade name: COMOGLAS DFA2CG 502K (black) series, thickness 2 mm) measuring 10 cm × 10 cm, to create sample 2. Sample 2 was placed on a horizontal platform at a height of 70 cm with the uneven surface facing up. In a bright room environment, the reflection of the illumination light onto the uneven surface was evaluated according to the following evaluation criteria from the angle of specular reflection of the illumination light. During the evaluation, the position of sample 2 relative to the illumination was adjusted so that the angle of incidence of the light emitted from the center of the illumination relative to sample 2 was 10 degrees. The lighting system used Hf32 type straight-tube three-wavelength daylight fluorescent lamps, positioned vertically 2 m above the horizontal platform. Evaluation was conducted on the sample's uneven surface with an illuminance between 500 lux and 1000 lux. The observer's eye position was approximately 160 cm above the floor. Observers were healthy individuals over 30 years old with visual acuity of 0.7 or better. <Evaluation Criteria> A: No lighting outline, position unknown B: No lighting outline, but position vaguely known C: Lighting outline and position vaguely known D: Lighting outline not very vague, position clearly known 1-4. Anti-glare performance 2 (anti-glare performance at various angles): Holding the sample 2 prepared in 1-3 in both hands, evaluate the performance while changing the height and angle of sample 2. In addition to changing the above aspects, evaluate the reflection of the illumination light onto the uneven surface in the same way as in 1-3. The above-mentioned angle changes are implemented within the range of 10 degrees or more and 70 degrees or less of the angle of incidence of the light emitted from the center of the illumination onto sample 2. 1-5. Reflected Scattered Light (≒ Pitch Black) The sample 2 prepared in 1-3 is placed on a 70 cm high horizontal platform with its uneven surface facing upwards. The position of sample 2 relative to the illumination is adjusted so that the strongest angle of light emitted from the illumination is barely obscured from sample 2. Based on this adjustment, the sample is positioned further away from the observer than the sample in 1-3. With sample 2 positioned as described above, the degree of reflected scattered light is evaluated according to the following evaluation criteria. The observer's line of sight is set approximately 160 cm from the floor. The observer is a healthy person in their 30s with visual acuity of 0.7 or higher. <Evaluation Criteria> A: No whiteness of the scattered light is perceived; it is sufficiently black. B: A slight whiteness of the scattered light is perceived, but not noticeable. C: The whiteness of the scattered light is clearly perceived. 1-6. Surface shape was measured using a white interference microscope (New View 7300, Zygo). Sample 1, prepared in 1-1, was placed on the measuring stage to ensure it was fixed and in close contact with the stage. The surface shape of the anti-glare film was then measured and analyzed. The measurement and analysis conditions were the same as those in 1-1. The measurement and analysis software used was MetroPro ver9.0.10 (64-bit) Microscope Application. Examples 1-6 and 1-7, and Comparative Examples 1-3 and 1-6, were excluded from the surface shape measurement. The Surface Map screen displays "Ra", "SRz", and "Rsk", with each value serving as Sa, Sz, and Ssk for each measurement area. Next, a "Save Data" button is displayed on the Surface Map screen to save the analyzed 3D surface roughness data. Then, using Advanced Texture Application, the saved data is read in, and the following analysis condition 2 is applied. (Analysis Condition 2) • High FFT Filter: Off • Low FFT Filter: Off • Calc High Frequency: On • Calc Low Frequency: On • Filter Trim: On • Remove spikes: Off • Spike Height (xRMS): 5.00 • Noise Filter Size: 0 • Noise Filter Type: 2 Sigma • Fill Data: Off • Data Fill Max: 25 • Trim: 0 • Trim Mode: All • Remove: Plane • Reference Band: 0 μm • Min Peaks / Valleys Area: 0 μm 2 • Maximum Peaks / Valleys Area: 0 μm 2 Next, the "Peaks / Valleys" screen is displayed, with "Reference Band: 0 μm" and "Min Peaks / Valleys Area: 0 μm". 2 "Max Peaks / Valleys Area: 0 μm" 2 The conditions for analysis are used to determine the Smp of each measurement area, and the values ​​displayed on "Peak Spacing" are used as the values ​​of each measurement area. Next, the Slope Mag Map screen was displayed using the aforementioned analysis software (MetroPro ver9.0.10 (64-bit) Microscope Application). In this screen, a histogram was displayed with the horizontal axis as the value (μm / mm) and the vertical axis as the count. The horizontal axis was converted into angles using the arctangent function, thereby obtaining histogram data of the three-dimensional surface tilt angle distribution. For each measurement sample, the value of nBins was adjusted to ensure that each measurement sample could obtain a histogram of the angle distribution with a tilt angle change of less than 1 degree. Based on the obtained histogram data, tilt angles exceeding 0 degrees but less than 1 degree (θ1), tilt angles exceeding 1 degree but less than 3 degrees (θ2), tilt angles exceeding 3 degrees but less than 10 degrees (θ3), and tilt angles exceeding 10 degrees but less than 90 degrees (θ4) were calculated. 2. Preparation of Anti-glare Film [Example 1-1] The anti-glare coating liquid 1 of the following formulation was coated onto a transparent substrate (80 μm thick triacetyl cellulose resin film (TAC), FUJIFILM Corporation, TD80UL). After drying at 70°C and a wind speed of 5 m / s for 30 seconds, the cumulative light intensity was measured to be 100 mJ / cm under a nitrogen atmosphere with an oxygen concentration of less than 200 ppm. 2 The anti-glare layer is formed by irradiating the film with ultraviolet light in a certain manner, thereby obtaining the anti-glare film of Example 1-1. The thickness of the anti-glare layer is 5.0 μm. The Ra of the side of the anti-glare film opposite to the anti-glare layer is 0.012 μm. <Anti-glare Coating Solution 1> • 58.2 parts neopentyl terephthalol triacrylate (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • 18.2 parts acrylate oligomer (DIC Corporation, trade name: V-4000BA) • 23.6 parts thermoplastic resin (acrylic polymer, Mitsubishi Rayon Co., Ltd., molecular weight 75,000) • 63.6 parts organic particles (Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer) (average particle size 2.0 μm, refractive index 1.515) (particle size ratio of 1.8 μm or larger and 2.2 μm or smaller is 90% or larger) • 230 parts inorganic microparticle dispersion (Nissan Chemical Co., Ltd., silicon dioxide with surface-introduced reactive functional groups, solvent: MIBK, solid content: 35.5%) (average particle size 12 nm) (effective component of inorganic microparticles: 81.9 parts) • 5.5 parts photopolymerization initiator (IGM) Resins BV (trade name: Omnirad 184) • Photopolymerization initiator 1.8 parts (IGM Resins BV (trade name: Omnirad 907)) • Polysiloxane leveling agent 0.2 parts (Momentive Advanced Materials (trade name: TSF 4460)) • Solvent (toluene) 346.8 parts • Solvent (cyclohexanone) 17.9 parts [Examples 1-2 to 1-7] and [Comparative Examples 1-1 to 1-6] were obtained in the same manner as in Example 1-1, except that the anti-glare coating liquid 1 was replaced with the anti-glare coating liquids listed in Table 1. The compositions of anti-glare coating liquids 2 to 13 are shown below. Anti-glare coating liquids 1 to 13 were sometimes also used in the embodiments of the second and third embodiments. <Anti-glare coating liquid 2> except that the organic particles of anti-glare coating liquid 1 are changed to organic particles with an average particle size of 4.0 μm and a refractive index of 1.515 (Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer, with a particle size of 3.8 μm or more and 4.2 μm or less, accounting for 90% or more) are coating liquids with the same composition as anti-glare coating liquid 1. <Anti-glare Coating Liquid 3> • 100 parts neopentyl terephthalate triacrylate (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • 129.8 parts organic particles (Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer) (average particle size 2.0 μm, refractive index 1.515) (particles with a diameter of 1.8 μm or larger and 2.2 μm or smaller account for more than 90%) • 6.4 parts photopolymerization initiator (IGM Resins BV, trade name: Omnirad184) • 1.0 part photopolymerization initiator (IGM Resins BV, trade name: Omnirad907) • 0.1 part polysiloxane leveling agent (Momentive Advanced Materials Co., Ltd., trade name: TSF4460) • 498.4 parts solvent (toluene) • 55.4 parts solvent (cyclohexanone) <Anti-glare Coating Solution 4> • 100 parts neopentyl terephthalate triacrylate (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • 99.6 parts organic particles (Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer) (average particle size 2.0 μm, refractive index 1.515) (particles with a diameter of 1.8 μm or larger and 2.2 μm or smaller account for 90% or more) • 10 parts silica particles (average particle size: 4.1 μm) (manufactured by Fuji Silysia Chemical Co., Ltd., gel-process amorphous silica) • 6.1 parts photopolymerization initiator (IGM Resins BV, trade name: Omnirad184) • 1.1 parts photopolymerization initiator (IGM Resins BV, trade name: Omnirad907) • 452.9 parts solvent (toluene) • 50.3 parts solvent (cyclohexanone) • 2.6 parts solvent (ethyl acetate) <Anti-glare coating liquid 5> is a coating liquid composed of the same composition as anti-glare coating liquid 1, except that the amount of organic particles added in anti-glare coating liquid 1 is changed from 63.6 parts to 50.0 parts, and the amount of inorganic microparticle dispersion added is changed from 230 parts to 187 parts. <Anti-glare Coating Solution 6> • 100 parts neopentyl terephthalate triacrylate (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • 14 parts silica particles (average particle size: 4.1 μm) (manufactured by Fuji Silysia Chemical Co., Ltd., gel-process amorphous silica) • 5 parts photopolymerization initiator (IGM Resins BV Co., Ltd., trade name: Omnirad184) • 0.2 parts polysiloxane leveling agent (Momentive Advanced Materials Co., Ltd., trade name: TSF4460) • 150 parts solvent (toluene) • 35 parts solvent (MIBK) • 5.2 parts solvent (ethyl acetate) <Anti-glare Coating Solution 7> • 65 parts neopentyl terephthalol triacrylate (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • 35 parts acrylate oligomer (DIC Corporation, trade name: V-4000BA) • 14 parts organic particles (Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer) (average particle size 3.5 μm, refractive index 1.550) • 6 parts silica particles (average particle size: 12 nm) (manufactured by NIPPON AEROSIL, fuming silica) • 5 parts photopolymerization initiator (IGM Resins BV, trade name: Omnirad184) • 0.025 parts polysiloxane leveling agent (Momentive Advanced Materials Co., Ltd., trade name: TSF4460) • 100 parts solvent (toluene) • 20 parts solvent (cyclohexanone) • 55 parts solvent (isopropanol) <Anti-glare Coating Liquid 8> • 33 parts neopentyl terephthalol triacrylate (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • 52 parts EO-modified triacrylate isocyanurate (Toa Synthetic Co., Ltd., trade name: M-313) • 15 parts thermoplastic resin (acrylic polymer, Mitsubishi Rayon Co., Ltd., molecular weight 75,000) • 16 parts organic particles (Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer) (average particle size 3.5 μm, refractive index 1.555) (particle size ratio of 3.2 μm or larger and 3.8 μm or smaller is 90% or larger) • 158 parts inorganic microparticle dispersion (Nissan Chemical Co., Ltd., silicon dioxide with reactive functional groups introduced on the surface, solvent: MIBK, solid content: 40%) (average particle size: 12 nm) • 5 parts photopolymerization initiator (IGM Resins) BV Company (trade name: Omnirad 184) • Polysiloxane leveling agent 0.20 parts (Momentive Advanced Materials Co., Ltd., trade name: TSF4460) • Solvent (toluene) 211 parts • Solvent (propylene glycol monomethyl ether acetate) 165 parts <Anti-glare Coating Liquid 9> • 91.5 parts neopentyl terephthalate triacrylate (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • 8.5 parts acrylate oligomer (DIC Corporation, trade name: V-4000BA) • 2 parts organic particles (manufactured by Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer) (average particle size 5.0 μm, refractive index 1.550) • 15 parts silica particles (average particle size: 4.1 μm) (manufactured by Fuji Silysia Chemical Co., Ltd., gel-processed amorphous silica) • 1.9 parts photopolymerization initiator (IGM Resins BV, trade name: Omnirad184) • 7 parts photopolymerization initiator (IGM Resins BV, trade name: Omnirad907) • 0.1 parts polysiloxane leveling agent (Momentive Advanced Materials Co., Ltd., trade name: TSF4460) • Solvent (toluene) 161.1 parts • Solvent (cyclohexanone) 69 parts • Solvent (ethyl acetate) 3.9 parts <Anti-glare Coating Liquid 10> • Neopentyl terephthalate triacrylate 50.6 parts (Nippon Kayaku Co., Ltd., trade name: KAYARAD-PET-30) • Acrylate oligomer 49.4 parts (DIC Corporation, trade name: V-4000BA) • Organic particles 3 parts (Sekisui Chemicals Co., Ltd., spherical polyacrylic acid-styrene copolymer) (average particle size 2.0 μm, refractive index 1.545 μm) • Silica particles 1 part (average particle size: 12 nm) (manufactured by NIPPON AEROSIL, fuming silica) • Photopolymerization initiator 1 part (IGM Resins BV, trade name: Omnirad184) • Photopolymerization initiator 0.2 parts (IGM Resins BV Company, trade name: Omnirad 907) • Photopolymerization initiator 1.5 parts (Lamberti Company, ESACUREONE) • Polysiloxane leveling agent 0.1 parts (Momentive Advanced Materials, trade name: TSF4460) • Solvent (toluene) 98.6 parts • Solvent (cyclohexanone) 38.7 parts • Solvent (isopropanol) 44.1 parts • Solvent (MIBK) 2.4 parts <Anti-glare coating liquid 11> is a coating liquid composed of the same composition as anti-glare coating liquid 3, except that the amount of organic particles added to anti-glare coating liquid 3 is changed to 300 parts. <Anti-glare coating liquid 12> is a coating liquid composed of the same composition as anti-glare coating liquid 3, except that the average particle size of the organic particles in anti-glare coating liquid 3 is changed to 3.5 μm. <Anti-glare coating liquid 13> is a coating liquid composed of the same composition as anti-glare coating liquid 3, except that the average particle size of the organic particles in anti-glare coating liquid 3 is changed to 1.5 μm and the amount of organic particles added is changed to 160 parts. [Table 1] [Table 2] Based on the results in Table 1, it can be confirmed that the anti-glare film of the first embodiment has excellent anti-glare performance, suppresses reflected and scattered light, and has excellent blackness. 《Examples and Comparative Examples of the Second Embodiment》3. Measurement and Evaluation The anti-glare films of the examples and comparative examples were measured and evaluated as follows. The gas environment for each measurement and evaluation was set to a temperature of 23±5°C and a humidity of 40% or more and 65% or less. Furthermore, before each measurement and evaluation, the sample was exposed to the above-mentioned gas environment for at least 30 minutes before the measurement and evaluation were performed. The results are shown in Tables 3 to 5. 3-1. Measurement of Reflected Light Intensity The reflected light intensity of the anti-glare films of the Examples and Comparative Examples was measured by the following steps, and the smoothed reflected light intensity was calculated. Table 3 shows the maximum absolute value of the difference under condition 1, and the values ​​under conditions 2 and 3. Figures 22-30 show the smoothed reflected light intensity of the anti-glare films of the Examples and Comparative Examples at each angle. The horizontal axis represents the angle of light received (degrees), and the vertical axis represents the smoothed reflected light intensity (logarithmic scale). (0) For the angle photometer (product name "GC5000L" manufactured by Nippon Denshoku Kogyo Co., Ltd., beam diameter: about 3 mm, beam inclination angle: within 0.8 degrees, aperture angle of the light receiver: 1 degree), after turning on the power switch of the device in advance, wait for more than 20 minutes to allow the light source to stabilize before performing zero-point calibration. Zero-point calibration is performed by setting a zero cap on the sample stage of the angle photometer and pressing the "zero-point calibration" button on the accompanying software under 45-degree light illumination. (1) In the transmission measurement mode (light sensitivity 1000 times) of the above-mentioned angle photometer, visible light is emitted from the light source of the angle photometer in the form of parallel light rays. The intensity of the emitted light is measured at an aperture angle of 1 degree without passing through the sample. Standard verification is performed with a maximum intensity of 100,000. (2) Subsequently, a black plate (Kuraray, COMOGLAS DFA2CG 502K (black) series, 2 mm thick) was bonded to the surface opposite to the uneven surface of the anti-glare film of the examples and comparative examples through a transparent adhesive layer (Panac Corporation, trade name: PANACLEAN PD-S1) with a thickness of 25 μm, to create a sample α of 10 cm × 10 cm. The sample α is composed of an anti-glare film, a transparent adhesive layer and a black plate in sequence, and has an uneven surface. The uneven surface of the sample α is the uneven surface of the anti-glare film. (3) The above sample α was placed in the above-mentioned angle photometer, and visible light was irradiated with parallel light from the light source of the angle photometer onto the above-mentioned uneven surface of the sample α, and the intensity of reflected light was measured with an opening angle of 1 degree. The irradiation angle of the parallel light was set to a direction inclined at +45 degrees from the normal direction of the above sample α. The reflected light intensity was measured at 1-degree intervals from 0 degrees to -85 degrees along the normal direction of the sample α. Furthermore, to maintain the standard verification effect of (1), the reflected light intensity was measured in the transmission measurement mode. (4) Smoothing was performed at each angle from 0 degrees to -85 degrees as shown in equation (i), and the smoothed reflected light intensity was calculated as the smoothed reflected light intensity for each angle. Smoothed reflected light intensity at n degrees = ([reflected light intensity at n-2 degrees] + [reflected light intensity at n-1 degrees] + [reflected light intensity at n degrees] + [reflected light intensity at n+1 degrees] + [reflected light intensity at n+2 degrees]) / 5 (i) 3-2. Surface shape determination: The surface shape of the anti-glare film of the examples and comparative examples was determined by the same method as described in 1-6 above, and Sa, Sz, Ssk, Smp, θ1 to θ4 were calculated. 3-3. Total light transmittance (Tt) and haze (Hz) The total light transmittance and haze of the anti-glare films of the examples and comparative examples were measured by the same method as described in 1-2 above. 3-4. Anti-glare performance 1 (anti-glare performance in the direction of specular reflection) The anti-glare performance of the anti-glare films of the embodiments and comparative examples in the direction of specular reflection was evaluated by means of the same method as described in 1-3 above. 3-5. Anti-glare performance 2 (anti-glare performance at various angles) The anti-glare performance of the anti-glare films of the embodiments and comparative examples at various angles was evaluated by means of the same method as described in 1-4 above. 3-6. Reflected and scattered light (≒ Pitch black) The reflected and scattered light of the anti-glare films of the embodiments and comparative examples were evaluated by the same method as described in 1-5 above. 3-7. AM1 and AM2 were measured using the same method as described in 1-1 above. AM1 and AM2 of the anti-glare films of the examples and comparative examples were measured. 4. Preparation of Anti-glare Film [Example 2-1] The anti-glare coating liquid 1 of the above formulation was coated on a transparent substrate (80 μm thick triacetyl cellulose resin film (TAC), FUJIFILM Corporation, TD80UL). After drying at 70°C and a wind speed of 5 m / s for 30 seconds, the film was then subjected to nitrogen atmosphere with an oxygen concentration of less than 200 ppm, with a cumulative light intensity of 100 mJ / cm. 2 The anti-glare layer is formed by irradiating the film with ultraviolet light in a certain manner, thereby obtaining the anti-glare film of Example 2-1. The thickness of the anti-glare layer is 5.0 μm. The Ra of the side of the anti-glare film opposite to the anti-glare layer is 0.012 μm. [Examples 2-2 to 2-5] and [Comparative Examples 2-1 to 2-4] except that the anti-glare coating liquid 1 was changed to the anti-glare coating liquid listed in Table 3, the anti-glare films of Examples 2-2 to 2-5 and Comparative Examples 2-1 to 2-4 were obtained in the same manner as in Example 2-1. [Table 3] [Table 4] [Table 5] According to the results in Table 3, it can be confirmed that the anti-glare film of the second embodiment has excellent anti-glare performance, suppresses reflected and scattered light, and has excellent blackness. 5. Measurement and Evaluation of the Anti-glare Films in the Examples and Comparative Examples (Third Embodiment) As described below, the anti-glare films of the examples and comparative examples were measured and evaluated. The gas environment for each measurement and evaluation was set to a temperature of 23±5°C and a humidity of 40% or more and 65% or less. Furthermore, before each measurement and evaluation, the sample was exposed to the above-mentioned gas environment for at least 30 minutes. The results are shown in Tables 6 and 7. 5-1. Surface shape determination: The surface shape of the anti-glare film of the examples and comparative examples was determined by the same method as described in 1-6 above, and Sa, Sz, Ssk, Smp, θ1 to θ4 were calculated. 5-2. Total light transmittance (Tt) and haze (Hz) The total light transmittance and haze of the anti-glare films of the examples and comparative examples were measured by the same method as described in 1-2 above. 5-3. Anti-glare performance 1 (anti-glare performance in the direction of specular reflection) The anti-glare performance of the anti-glare films of the embodiments and comparative examples in the direction of specular reflection was evaluated by the same method as described in 1-3 above. 5-4. Anti-glare performance 2 (anti-glare performance at various angles) The anti-glare performance of the anti-glare films of the embodiments and comparative examples at various angles was evaluated by means of the same method as described in 1-4 above. 5-5. Reflected and scattered light (≒ Pitch black) The reflected and scattered light of the anti-glare films of the embodiments and comparative examples were evaluated by the same method as described in 1-5 above. 5-6. AM1 and AM2 were measured using the same method as described in 1-1 above. AM1 and AM2 of the anti-glare films in the examples and comparative examples were measured. Furthermore, comparative examples 3-5 and 3-6 were excluded from the AM1 and AM2 measurement. 6. Preparation of Anti-glare Film [Example 3-1] The anti-glare coating liquid 1 of the above formulation was coated on a transparent substrate (80 μm thick triacetyl cellulose resin film (TAC), FUJIFILM Corporation, TD80UL). After drying at 70°C and a wind speed of 5 m / s for 30 seconds, the film was then subjected to nitrogen atmosphere with an oxygen concentration of less than 200 ppm, with a cumulative light intensity of 100 mJ / cm². 2 The anti-glare layer is formed by irradiating the film with ultraviolet light in a certain manner, thereby obtaining the anti-glare film of Example 3-1. The thickness of the anti-glare layer is 5.0 μm. The Ra of the side of the anti-glare film opposite to the anti-glare layer is 0.012 μm. [Examples 3-2 to 3-7] and [Comparative Examples 3-1 to 3-6] were obtained in the same manner as in Example 3-1, except that the anti-glare coating liquid 1 was changed to the anti-glare coating liquid listed in Table 6. The compositions of the anti-glare coating liquids 14 and 15 are shown below. <Anti-glare coating liquid 14> is a coating liquid composed of the same composition as anti-glare coating liquid 3, except that the average particle size of the organic particles in the above-mentioned anti-glare coating liquid 3 is changed to 3.5 μm and the amount of organic particles added is changed to 160 parts. <Anti-glare coating liquid 15> is a coating liquid composed of the same composition as anti-glare coating liquid 3, except that the average particle size of the organic particles in the above-mentioned anti-glare coating liquid 3 is changed to 1.0 μm and the amount of organic particles added is changed to 160 parts. [Table 6] [Table 7] According to the results in Table 6, it can be confirmed that the anti-glare film of the third embodiment has excellent anti-glare performance, suppresses reflected and scattered light, and has excellent blackness. 10: Transparent substrate; 20: Anti-glare layer; 21: Adhesive resin; 22: Organic particles; 100: Anti-glare film; 110: Display element; 120: Image display device; 200: Observer [Figure 1] is a schematic cross-sectional view showing one embodiment of the anti-glare film of the present invention. [Figure 2] is a schematic diagram illustrating the behavior of light incident on the anti-glare layer. [Figure 3] is a cross-sectional view showing one embodiment of the image display device of the present invention. [Figure 4] is a diagram illustrating the method for calculating the amplitude spectrum of the elevation of an uneven surface. [Figure 5] is a diagram illustrating the method for calculating the amplitude spectrum of the elevation of an uneven surface. [Figure 6] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Embodiment 1-1. [Figure 7] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Embodiment 1-2. [Figure 8] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Embodiment 1-3. [Figure 9] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Embodiment 1-4. [Figure 10] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Embodiment 1-5. [Figure 11] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Comparative Example 1-1. [Figure 12] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Comparative Example 1-2. [Figure 13] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Comparative Example 1-3. [Figure 14] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Comparative Example 1-4. [Figure 15] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Comparative Example 1-5. [Figure 16] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Comparative Example 1-6. [Figure 17] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Examples 1-6. [Figure 18] is a graph showing the relationship between the spatial frequency and amplitude of the anti-glare film of Examples 1-7. [Figure 19] is a schematic cross-sectional view showing one embodiment of the anti-glare film of the present invention. [Figure 20] is a schematic diagram illustrating the method for measuring reflected light intensity. [Figure 21] is a schematic diagram illustrating the behavior of light incident on the anti-glare layer. [Figure 22] is a graph showing the smoothed reflected light intensity of the anti-glare film of Example 2-1 at each angle. [Figure 23] is a graph showing the smoothed reflected light intensity of the anti-glare film of Example 2-2 at each angle. [Figure 24] is a graph showing the smoothed reflected light intensity of the anti-glare film of Example 2-3 at each angle. [Figure 25] is a graph showing the smoothed reflected light intensity of the anti-glare film of Example 2-4 at each angle. [Figure 26] is a graph showing the smoothed reflected light intensity of the anti-glare film of Example 2-5 at each angle. [Figure 27] is a graph showing the smoothed reflected light intensity of the anti-glare film of Comparative Example 2-1 at each angle. [Figure 28] is a graph showing the smoothed reflected light intensity of the anti-glare film of Comparative Example 2-2 at each angle. [Figure 29] is a graph showing the smoothed reflected light intensity of the anti-glare film of Comparative Examples 2-3 at each angle. [Figure 30] is a graph showing the smoothed reflected light intensity of the anti-glare film of Comparative Examples 2-4 at each angle. 10: Transparent substrate 20: Anti-glare layer 21: Adhesive resin 22: Organic particles 100: Anti-glare film

Claims

1. An anti-glare film having an anti-glare layer, wherein the anti-glare film has an uneven surface, the three-dimensional arithmetic mean roughness Sa of the uneven surface is 0.30 μm or more, the three-dimensional average peak interval Smp is 10.00 μm or less, and regarding the amplitude spectrum of the elevation of the uneven surface, when the sum of the amplitudes corresponding to spatial frequencies of 0.005 μm-1, 0.010 μm-1, and 0.015 μm-1 is defined as AM1, and when the amplitude at a spatial frequency of 0.300 μm-1 is defined as AM2, AM1 is 0.070 to 0.400 μm, and AM2 < AM1.

2. The anti-glare film as requested in item 1 has a Sa / Smp ratio of 0.05 or higher.

3. The anti-glare film as requested in item 1 or 2, wherein, The three-dimensional skewness Ssk of the aforementioned uneven surface is less than 0.

60.

4. For anti-glare films requested in item 1 or 2, the haze of the film shall be 60% to 98% according to JIS K7136:2000.

5. The anti-glare film as requested in item 1 or 2, wherein, The aforementioned anti-glare layer contains adhesive resin and particles.

6. As in request item 5, the anti-glare film, wherein, When the thickness of the anti-glare layer is defined as T and the average particle size of the particles is defined as D, the ratio of D / T is 0.20 to 0.

96.

7. As in request item 5, the anti-glare film, wherein, The average particle size D of the above particles is 1.0 to 5.0 μm.

8. As in request item 5, the anti-glare film, wherein, The adhesive resin contains 40 to 200 parts by mass of the aforementioned particles, relative to 100 parts by mass of the adhesive resin.

9. As in request item 5, the anti-glare film, wherein, The aforementioned particles are organic particles.

10. As in request item 5, the anti-glare film, wherein, The aforementioned anti-glare layer further contains inorganic microparticles.

11. The anti-glare film as requested in item 10, wherein, Relative to 100 parts by weight of the above-mentioned adhesive resin, it contains 40 to 200 parts by weight of the above-mentioned inorganic microparticles.

12. As in request item 5, the anti-glare film, wherein, The aforementioned adhesive resin contains a hardened component of a free radiation-curable resin composition and a thermoplastic resin.

13. The anti-glare film as requested in item 1 or 2, wherein, The transparent substrate has the aforementioned anti-glare layer, and the surface of the anti-glare layer opposite to the transparent substrate is the aforementioned uneven surface.

14. The anti-glare film as requested in item 1 or 2, wherein, An anti-reflective layer is further provided on the aforementioned anti-glare layer, and the surface of the aforementioned anti-reflective layer is the aforementioned uneven surface.

15. An image display device comprising disposing of an anti-glare film of any one of claims 1 to 14 on a display element such that the surface of the uneven surface faces the side opposite to the display element, and the anti-glare film being disposed on the outermost surface.

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