Manufacturing methods for structures, color filters, solid-state imaging elements, and image display devices.

Abstract

This invention provides a method for manufacturing a structure, comprising: a process of forming a colored photosensitive composition layer on the support including the regions divided by the partitions by coating a colored photosensitive composition onto a support having a plurality of regions divided by partitions; a process of exposing the colored photosensitive composition layer formed on the support to form a pattern; and a process of forming pixels in the regions divided by the partitions by developing and removing the unexposed portions of the colored photosensitive composition layer with a developing solution. In the aforementioned method for manufacturing the structure, an alkaline aqueous solution containing a chelating agent and 0.02 to 0.22% by mass of an alkaline agent is used as the developing solution. This invention also provides a method for manufacturing a color filter incorporating the aforementioned method for manufacturing the structure, a method for manufacturing a solid-state imaging element, and a method for manufacturing an image display device.

Description

[Technical Field] This invention relates to a method for manufacturing a structure that forms pixels within a region divided by partitions. Furthermore, this invention relates to a method for manufacturing a color filter, a solid-state imaging element, and an image display device. [Previous Technology] In recent years, the demand for solid-state imaging components such as charge-coupled device (CCD) image sensors has increased significantly due to the widespread use of digital cameras and mobile phones with built-in cameras. Color filters are used as core components in displays and optical elements. For example, a color filter is manufactured by forming a colored photosensitive composition layer on a support using a colored photosensitive composition, exposing the colored photosensitive composition layer to a pattern, and then using a developing solution to remove the unexposed portions of the colored photosensitive composition layer to form pixels. As a developing solution, as described in Patent Documents 1 and 2, an alkaline aqueous solution containing an alkali agent and a chelating agent is known (see Patent Documents 1 and 2). [Patent Document 1] Japanese Patent Application Publication No. Hei 03-198046 [Patent Document 2] Japanese Patent Application Publication No. 2000-162785 When exposing and developing pixels, it is desirable to have minimal development residue and a low surface roughness on the developed pixel surface. Furthermore, in recent years, research has been conducted on methods such as placing partitions between pixels to improve the light-gathering ability of transmitted pixels or to prevent color mixing with adjacent pixels. When pixels are formed between partitions, a higher level of rectangularity is required for the formed pixels. Furthermore, in recent years, solid-state imaging sensors have sometimes been used in harsher environments. Meanwhile, regarding color filters used in solid-state imaging sensors, there is a desire for those with excellent temperature cycling resistance. "Temperature cycling resistance" refers to the strength of the adhesion between the pixel and the support when the pixel formed on the support is subjected to repeated high and low temperature cycles. According to the inventor's research, it is known that when pixels are formed in areas divided by partitions using conventionally known developing solutions, it is not easy to maintain these characteristics at a high level. [Summary of the Invention] Therefore, the object of the present invention is to provide a method for manufacturing a structure capable of forming pixels with excellent properties such as suppressing development residue, low surface roughness, rectangularity, and temperature cycling resistance within a region divided by partitions, a method for manufacturing a color filter, a method for manufacturing a solid-state imaging element, and a method for manufacturing an image display device. As a result of in-depth research, the inventors discovered that the above-mentioned objectives could be achieved using the method described later, thus completing the present invention. Therefore, the present invention provides the following: <1> A method for manufacturing a structure, comprising: a process of forming a colored photosensitive composition layer on a support having a plurality of regions divided by partitions by coating a colored photosensitive composition onto the support having a plurality of regions divided by partitions; a process of exposing the colored photosensitive composition layer formed on the support to form a pattern; and a process of forming pixels in the regions divided by partitions by developing and removing the unexposed portions of the colored photosensitive composition layer using a developing solution, wherein the developing solution used in the above method for manufacturing a structure is an alkaline aqueous solution containing a chelating agent and 0.02 to 0.22% by mass of an alkaline agent. <2> The method for manufacturing a structure as described in <1>, wherein the developing solution contains 0.10 to 0.18% by mass of an alkaline agent. <3> A method for manufacturing a structure as described in <1> or <2>, wherein the developing solution contains 0.01 to 0.20% by mass of a chelating agent. <4> A method for manufacturing a structure as described in any one of <1> to <3>, wherein the alkali agent is an organic alkali compound. <5> A method for manufacturing a structure as described in any one of <1> to <4>, wherein the developing solution further contains a surfactant. <6> A method for manufacturing a structure as described in <5>, wherein the surfactant is a nonionic surfactant. <7> A method for manufacturing a structure as described in <6>, wherein the nonionic surfactant is an alkyl compound having 10 to 20 carbon atoms. <8> A method for manufacturing a structure as described in <6>, wherein the nonionic surfactant is an alkyl compound having 12 to 15 carbon atoms. <9> A method for manufacturing a structure as described in any one of <6> to <8>, wherein the nonionic surfactant is a compound comprising a polyoxyethylene structure. <10> A method for manufacturing a structure as described in any one of <1> to <9>, wherein the coloring photosensitive composition contains 30-70% by mass of a colorant in its total solids content. <11> A method for manufacturing a structure as described in any one of <1> to <10>, wherein the coloring photosensitive composition comprises a resin with an acid value of 10-100 mg KOH / g and an vinyl unsaturated bond value of 1.0-2.0 mmol / g. <12> A method for manufacturing a structure as described in any one of <1> to <11>, wherein the coloring photosensitive composition contains a polymeric compound comprising six or more polymeric groups. <13> A method for manufacturing a structure as described in any one of <1> to <12>, wherein after forming an organic layer on the surface of the partition wall, a coloring photosensitive composition is coated on the support to form the coloring photosensitive composition layer.<14> A method for manufacturing the structure as described in <13>, wherein an organic layer is formed on the surface of the partition wall using an organic layer forming composition comprising a compound having an ethylene unsaturated bond group. <15> A method for manufacturing a color filter, comprising the method for manufacturing the structure described in any one of <1> to <14>. <16> A method for manufacturing a solid-state imaging element, comprising the method for manufacturing the structure described in any one of <1> to <14>. <17> A method for manufacturing an image display device, comprising the method for manufacturing the structure described in any one of <1> to <14>. [Effects of the Invention] According to the present invention, a method for manufacturing a pixel structure capable of forming a pixel structure that suppresses development residue and has low surface roughness, excellent rectangularity and temperature cycling resistance within a region divided by a partition wall, a method for manufacturing a color filter, a method for manufacturing a solid-state imaging element, and a method for manufacturing an image display device are provided.

Implementation Method

Claims

1. A method for manufacturing a structure, comprising: The manufacturing method of the aforementioned structure comprises a process of forming a colored photosensitive composition layer on the aforementioned support, including the regions divided by the aforementioned partitions, by coating a colored photosensitive composition onto a support having a plurality of regions divided by partitions; a process of exposing the aforementioned colored photosensitive composition layer formed on the aforementioned support to form a pattern; and a process of forming pixels in the regions divided by the aforementioned partitions by developing and removing the aforementioned colored photosensitive composition layer in unexposed areas using a developing solution. In the aforementioned method of manufacturing the structure, the developing solution used contains 0.04% to 0.10% by mass of a chelating agent. An alkaline aqueous solution containing 0.10% to 0.18% by mass of an alkali agent, wherein the aforementioned alkali agent comprises at least one selected from tetramethylammonium hydroxide, diethylene glycolamine, and diethanolamine, and the aforementioned chelating agent comprises at least one selected from ethylenediaminetetraacetic acid and ethylenediamine, wherein the aforementioned coloring photosensitive composition contains a polymeric compound comprising 6 to 15 polymeric groups, and wherein the aforementioned coloring photosensitive composition comprises a resin with an acid value of 10 mg KOH / g to 100 mg KOH / g and an ethylene unsaturated bond value of 1.0 mmol / g to 2.0 mmol / g.

2. The method for manufacturing the structure as described in claim 1, wherein the aforementioned developing solution further comprises a surfactant.

3. The method for manufacturing the structure as described in claim 2, wherein the aforementioned surfactant is a nonionic surfactant.

4. A method for manufacturing the structure as described in claim 3, wherein the aforementioned nonionic surfactant is a compound having an alkyl group having 10 to 20 carbon atoms.

5. A method for manufacturing the structure as described in claim 3, wherein the aforementioned nonionic surfactant is a compound having an alkyl group having 12 to 15 carbon atoms.

6. A method for manufacturing the structure as described in claim 3, wherein the aforementioned nonionic surfactant is a compound comprising a polyoxyethylene structure.

7. A method for manufacturing the structure as described in claim 1, wherein the aforementioned coloring photosensitive composition contains 30% to 70% by mass of a colorant in the total solids composition.

8. A method for manufacturing the structure as claimed in claim 1, wherein after forming an organic layer on the surface of the aforementioned partition wall, a coloring photosensitive composition is coated onto the aforementioned support to form the aforementioned coloring photosensitive composition layer.

9. A method for manufacturing the structure as claimed in claim 8, wherein the aforementioned organic layer is formed on the surface of the aforementioned partition wall using an organic layer forming composition comprising a compound having ethylene unsaturated bond groups.

10. A method of manufacturing a color filter, comprising a method of manufacturing a structure as described in any one of claims 1 to 9.

11. A method for manufacturing a solid-state imaging element, comprising a method for manufacturing a structure as described in any one of claims 1 to 9.

12. A method for manufacturing an image display device, comprising a method for manufacturing a structure as described in any one of claims 1 to 9.

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