Cleaning device
Patent Information
- Application Number
- TW114119560
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2025-05-23
- Publication Date
- 2026-09-11
- Estimated Expiration
- 2045-05-22
Smart Images

Figure TWG2TB001910596_001 
Figure TWG2TB001910596_002 
Figure TWG2TB001910596_003
Abstract
Claims
1. A cleaning device, comprising: A spray gun includes: a rod body comprising a main rod and an extension rod, one end of the extension rod passing through the interior of the main rod and retracting relative to the main rod, the overall length of the rod body being adjusted by the retraction and extension of the extension rod; a balance tail rod connected to the tail end of the main rod of the rod body, having the function of automatically adjusting its angle, length, or position; and a nozzle assembly including: a first rotating shaft, the first rotating axis being parallel to the longitudinal axis of the rod body; a front rod portion, one end of which is pivotally connected to the extension rod of the rod body through the first rotating shaft; and a second rotating shaft, the second rotating axis being perpendicular to the longitudinal axis of the rod body. An axis; and a nozzle, which is pivotally connected to the other end of the front rod via the second rotating shaft; wherein the nozzle assembly rotates relative to the rod via the first rotating shaft, and the nozzle rotates relative to the front rod via the second rotating shaft, and the spray angle of the nozzle is adjusted by the rotation of the first rotating shaft and the second rotating shaft; wherein, by adjusting the overall length of the rod and adjusting the spray angle of the nozzle, and in conjunction with the automatic adjustment of the angle, length or position of the balance tail rod, the spray position of the nozzle can be changed, thereby adapting to the cleaning needs of a target object at different distances or angles.
2. The cleaning apparatus as claimed in claim 1, wherein the nozzle assembly is rotated relative to the rod via the first rotation axis, the rotation angle ranging from 0° to 270°.
3. The cleaning apparatus as claimed in claim 1, wherein the nozzle rotates up and down about the second rotation axis, with the rotation angle ranging from 0° to 135°.
4. The cleaning device as claimed in claim 1, wherein the cleaning device is mounted on an aircraft, and when the cleaning device flies in front of the target object via the aircraft, the cleaning device includes a control unit that determines the position information of each face of the target object based on an image captured by a camera, the position information including distance and azimuth, and controls the spray gun to adjust the extension length of the rod and the spray angle of the nozzle based on the position information.
5. The cleaning apparatus as claimed in claim 1, wherein when the cleaning apparatus cleans the side of the target object, the spraying position of the nozzle is guided to the side area of the target object by adjusting the overall length of the rod and the spraying angle of the nozzle, and the outlet direction of the nozzle forms an angle with respect to the longitudinal axis of the rod, the angle being between 45° and 90°.
6. The cleaning apparatus as claimed in claim 1, wherein when the cleaning apparatus cleans the back of the target object, by adjusting the overall length of the rod and the spray angle of the nozzle, the spray position of the nozzle is guided to the back area of the target object, so that the nozzle bends backward relative to the rod and forms a hook-shaped bend with the rod.
7. The cleaning apparatus as claimed in claim 6, wherein when the cleaning apparatus cleans the back side of the target object, the outlet direction of the nozzle forms an angle with respect to the longitudinal axis of the rod, the angle being between 110° and 135°.
8. The cleaning apparatus as claimed in claim 1, wherein the outlet direction of the nozzle forms an angle with respect to the longitudinal axis of the rod, the range of which is adjusted according to the shape of the target object or the cleaning requirements.
9. The cleaning equipment as claimed in claim 4, wherein the cleaning equipment further includes a water tank section comprising a self-supporting water tank unit and an external water tank unit, the self-supporting water tank unit being mounted on the aircraft, and the external water tank unit being directly mounted on the ground or mounted on a ground vehicle; a pressurizing device extracts liquid from the self-supporting water tank unit or the external water tank unit and delivers the extracted liquid to the nozzle via a water pipe; or, the pressurizing device simultaneously extracts liquid from both the self-supporting water tank unit and the external water tank unit, mixes the liquids extracted from the self-supporting water tank unit and the external water tank unit respectively, and delivers the mixture to the nozzle via the water pipe.
10. The cleaning apparatus as claimed in claim 1, wherein the nozzle is an automated rotary nozzle having water jet and water mist modes, wherein when the cleaning apparatus performs cleaning operations on the target object, the nozzle switches to water jet mode, and the nozzle outlet provides a high-pressure water jet to clean dirt from the surface of the target object; and when the cleaning apparatus performs surface protection operations on the target object, the nozzle switches to water mist mode, and the nozzle outlet provides a low-pressure water mist to spray a protective agent onto the surface of the target object.
11. The cleaning equipment as claimed in claim 4, wherein when the aircraft carries the spray gun, the stabilizer bar of the spray gun automatically adjusts its angle, length or position to adjust the center of gravity of the spray gun to its central position, thereby improving the directional stability of the aircraft when performing flight and cleaning operations on the target object.
Citation Information
Patent Citations
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CN112509968A
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