Photomask structure

TWI939158BActive Publication Date: 2026-09-11NAN YA TECH
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Patent Information

Application Number
TW114130839
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Priority Date
2025-07-29
Filing Date
2025-08-13
Publication Date
2026-09-11
Estimated Expiration
2045-08-12

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  • Figure TWG2TB001910726_003
    Figure TWG2TB001910726_003
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Abstract

A photomask structure includes a substrate, a light-shielding pattern, a frame, a light-transmitting film, and a porous layer. The substrate has a patterned area and a peripheral area surrounding the patterned area. The light-shielding pattern is disposed on the substrate in the patterned area. The frame is disposed on the substrate in the peripheral area to surround the light-shielding pattern. The light-transmitting film is disposed on the top surface of the frame. The porous layer is disposed on the side surface of the frame and includes a plurality of holes. The light-transmitting film, the frame, and the substrate form a closed space, such that the light-shielding pattern and the porous layer are located within the closed space.
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Claims

1. A photomask structure, comprising: A substrate having a patterned area and a peripheral area surrounding the patterned area; a light-shielding pattern disposed on the substrate in the patterned area; A frame is disposed on the substrate in the peripheral area to surround the light-shielding pattern; a light-transmitting film is disposed on the top surface of the frame; A porous layer is disposed on the side surface of the frame and includes multiple pores, wherein the light-transmitting film, the frame and the substrate form a closed space, such that the light-shielding pattern and the porous layer are located in the closed space, and the multiple pores adsorb pollutants in the closed space.

2. The photomask structure as claimed in claim 1, wherein the material of the porous layer includes resin.

3. The photomask structure as claimed in claim 2, wherein the resin includes black resin.

4. The photomask structure as claimed in claim 1, wherein the porous layer is an anti-reflective porous layer.

5. The photomask structure as claimed in claim 1, wherein the porous layer does not contact the substrate.

6. The photomask structure as claimed in claim 1, wherein the porous layer does not contact the light-shielding pattern.

7. The photomask structure as claimed in claim 1, wherein the porous layer does not overlap with the light-shielding pattern.

8. The photomask structure as claimed in claim 1, wherein the aperture of the holes is in the range of 0.1 μm to 10 μm.

9. The photomask structure as claimed in claim 1 further includes an adhesive layer disposed between the bottom surface of the frame and the substrate.

10. The photomask structure as claimed in claim 1 further includes an adhesive layer disposed between the top surface of the frame and the light-transmitting film.

Citation Information

Patent Citations

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    CN112305854A

  • Pellicle assembly and fabrication methods thereof

    TW201642019A

  • Pellicle and method of using the same

    US6713200B2