Method for manufacturing a bidirectional electrochromic antibacterial device

Abstract

A method for manufacturing a bidirectional electrochromic antibacterial device extends the traditional five-layer structure to an eleven-layer composite architecture, featuring low-voltage operation, high durability, and reliability. A high-capacity ion storage layer is prepared using a pulsed dual-gun magnetron sputtering process, and the edges are encapsulated with UV-curable adhesive to prevent moisture penetration. A nanofilm is formed on the device surface, exhibiting antibacterial and photocatalytic properties. After atmospheric plasma modification, it becomes hydrophilic, spontaneously forming a water film to inhibit bacteria, prevent fogging, and maintain optical stability. The overall structure effectively improves device lifespan, transparency, and market competitiveness.

Claims

1. A method for manufacturing a bidirectional electrochromic antibacterial device, comprising at least the following steps: Step 1: placing a first substrate in a vacuum sputtering chamber, depositing a first transparent conductive layer on the upper surface of the first substrate in a mixed atmosphere of argon (Ar) and oxygen (O2) to form a first electrode structure, and depositing a second transparent conductive layer on the lower surface of the first substrate to form a second electrode structure, wherein the materials of the first and second transparent conductive layers are selected from indium tin oxide (ITO), and the thickness is between 200 and 300 nanometers (nm); Step 2: Thin film deposition is performed on the surfaces of the first and second transparent conductive layers using a dual-gun plasma source, which includes an arc plasma source and a pulsed magnetron sputtering source. A first electrochromic layer is deposited on the surface of the first transparent conductive layer and a second electrochromic layer is deposited on the surface of the second transparent conductive layer in an atmosphere of argon and oxygen. The materials of the first and second electrochromic layers are selected from tungsten trioxide (WO3) or molybdenum trioxide (MoO3), and the thickness is between 500 and 600 nm. Step 3: Take a second substrate and a third substrate, place the second and third substrates into the vacuum sputtering chamber, and deposit a third transparent conductive layer on the surface of the second substrate in an argon and oxygen mixed atmosphere to form a third electrode structure, and deposit a fourth transparent conductive layer on the surface of the third substrate to form a fourth electrode structure, wherein the thickness of the third and fourth transparent conductive layers is between 200 and 300 nanometers (nm); Step 4: Perform thin film deposition using pulsed dual-gun magnetron sputtering, deposit a first ion storage layer on the surface of the third transparent conductive layer in an argon and oxygen mixed atmosphere, and deposit a second ion storage layer on the surface of the fourth transparent conductive layer, wherein the material of the first and second ion storage layers is selected from nickel oxide (NiO), and the thickness is between 500 and 600 nm; Step 5: Form a first electrolyte layer between the second electrochromic layer and the first ion storage layer, and form a second electrolyte layer between the first electrochromic layer and the second ion storage layer to form a sandwich stacked structure, wherein the materials of the first and second electrolyte layers are selected from polyvinyl alcohol (PVA) hydrogel with high water content and containing lithium salt; and Step 6: Deposit a nano antibacterial film on the surface of the sandwich stacked structure using pulsed magnetron sputtering, and perform atmospheric plasma surface modification treatment to convert the surface of the nano antibacterial film to hydrophilicity to form a bidirectional electrochromic antibacterial device, wherein the material of the nano antibacterial film is selected from WO3 and the thickness is between 10 and 100 nm.

2. A method for manufacturing the bidirectional electrochromic antibacterial device as described in claim 1, wherein, The pressure in this vacuum sputtering chamber is less than 10⁻⁵ torr.

3. A method for manufacturing the bidirectional electrochromic antibacterial device as described in claim 1, wherein, The materials of the first, second and third substrates are selected from glass substrates or flexible plastic substrates.

4. A method for manufacturing the bidirectional electrochromic antibacterial device as described in claim 1, wherein, Step two further includes doping with tin (Sn) metal ions during the deposition of the first and second electrochromic layers, with a doping concentration of 1 to 5 atomic percentages (at.%).

5. A method for manufacturing the bidirectional electrochromic antibacterial device as described in claim 1, wherein, Step four further includes doping with tin metal ions during the deposition of the first and second ion storage layers, with a doping concentration of 1 to 5 at.

6. A method for manufacturing the bidirectional electrochromic antibacterial device as described in claim 1, wherein, The lithium salt is lithium bis(trifluoromethanesulfonyl)imide (LiTFSI).

7. A method for manufacturing the bidirectional electrochromic antibacterial device as described in claim 1, wherein, The preparation of the first and second electrolyte layers includes the following steps: selecting PVA with a molecular weight between 89,000 and 98,000 as the substrate and dissolving it in a solvent system composed of dimethyl sulfoxide (DMSO) and deionized water (H2O) in a volume ratio of 80:20 to prepare a PVA solution with a concentration of 10% by weight (wt%); and subjecting the PVA solution to two freeze-thaw cycles under vacuum conditions to induce physical cross-linking between polymer segments and form the PVA hydrogel containing lithium salt.

8. A method for manufacturing the bidirectional electrochromic antibacterial device as described in claim 1, wherein, Step five, after forming the sandwich stack structure, further includes applying a transparent encapsulating adhesive to the edge of the structure and sealing the edge by ultraviolet (UV) curing.

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