Metal compound thin film, method of forming the same and thin flim catalyst for water electrolysis
Patent Information
- Application Number
- TW115113750
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2023-10-31
- Publication Date
- 2026-09-11
- Estimated Expiration
- 2043-10-30
Smart Images

Figure TWG2TB001911008_001 
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Abstract
Claims
1. A method for manufacturing a metal compound thin film, comprising: Provide a substrate; The substrate is subjected to at least one inkjet printing operation to form the metal compound film on the substrate, wherein the metal compound film comprises a plurality of films that do not contact each other, and each of the inkjet printing operations comprises: depositing a first precursor on the substrate using a first printhead of an inkjet system; and depositing a second precursor on the substrate using a second printhead of the inkjet system, wherein the first precursor and the second precursor undergo a chemical reaction to form a metal compound, and the metal compound film comprises at least one layer of the metal compound.
2. A method for manufacturing a metal compound thin film as claimed in claim 1, wherein at least one of the thin films is a continuous thin film.
3. The method for manufacturing a metal compound thin film as claimed in claim 1, wherein one of the first precursor and the second precursor has a pH value of 2 to 7.
4. The method for manufacturing a metal compound thin film as claimed in claim 1, wherein each of the inkjet printing operations further comprises: depositing at least one third precursor using at least one third printhead of the inkjet system.
5. A method for manufacturing a metal compound thin film as claimed in claim 4, wherein the at least one third precursor is doped into the metal compound.
6. A method for manufacturing a metal compound thin film as claimed in claim 1, wherein the chemical reaction is a redox reaction, and the first precursor and the second precursor have different oxidation potentials.
7. The method for manufacturing a metal compound thin film as claimed in claim 1 further comprises: performing a cleaning operation after each inkjet printing operation up to ten times, wherein the cleaning operation comprises rinsing the substrate with deionized water.
8. A method for manufacturing a metal compound thin film as claimed in claim 1, wherein the metal compound thin film comprises 10 to 150 layers of the metal compound.
9. A metal compound thin film, prepared by any one of claims 1 to 8.
10. A thin-film catalyst for water electrolysis reaction, comprising the metal compound thin film described in claim 9.
Citation Information
Patent Citations
Method for depositing metal oxide film in liquid environment
TW202023953A
