3D interposer with through glass vias – method of increasing adhesion between copper and glass surfaces and articles therefrom
TWI939408BActive Publication Date: 2026-09-21CORNING INC
Patent Information
- Application Number
- TW110142175
- Authority / Receiving Office
- TW · TW
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2020-11-16
- Filing Date
- 2021-11-12
- Publication Date
- 2026-09-21
- Estimated Expiration
- 2041-11-11
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Abstract
In some embodiments, the method includes forming a pilot hole or damage track through a laminated glass structure using a laser. The laminated glass structure includes a first layer and a second layer adjacent to the first layer. The first layer is formed of a first glass composition. The second layer is formed of a second glass composition different from the first glass composition. After forming the pilot hole, the laminated glass structure is exposed to etching conditions in which the first glass composition is etched at a first etch rate and the second glass composition is etched at a second etch rate, wherein the first etch rate is different from the second etch rate, to form an etched hole.
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Citation Information
Patent Citations
3D interposer with through glass vias – method of increasing adhesion between copper and glass surfaces and articles therefrom
TW202028146A
Method for producing glass substrate with through-electrode, and glass substrate
WO2016051781A1
Method for producing glass substrate, and plate-like glass
WO2016063460A1
