Resistor composition and method for forming inhibitor pattern

TWI939677BActive Publication Date: 2026-09-21TOKYO OHKA KOGYO CO LTD
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Patent Information

Application Number
TW112115274
Authority / Receiving Office
TW · TW
Patent Type
Patents
Current Assignee / Owner
Priority Date
2022-04-25
Filing Date
2023-04-25
Publication Date
2026-09-21
Estimated Expiration
2043-04-24

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Abstract

This invention relates to a resist composition that, due to exposure, generates acid, thereby altering the solubility of the developer. The composition comprises a substrate component (A) that alters the solubility of the developer through the action of acid, and an acid-generating agent component (B) that generates acid through exposure. The acid-generating agent component (B) includes a first acid-generating agent and a second acid-generating agent. The first acid-generating agent comprises a compound (b1) represented by general formula (b1-1) in the specification, and the second acid-generating agent comprises a compound (b2) represented by general formula (b2-1) in the specification.
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Citation Information

Patent Citations

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    JP2012073565A

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    JP2014026179A

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