Columnar resistor and method of laser trimming for manufacturing the same

Abstract

This invention provides a columnar resistive element and a laser-modified resistive method for manufacturing it. The method includes a resistive layer disposed on the surface of a columnar substrate. The resistive layer includes a resistance-determining region, a first resistance-adjusting region, and a second resistance-adjusting region. The resistance-determining region is configured to form a first cutting line and achieve a first resistance value through a first laser cut. The first resistance-adjusting region is configured to form a second cutting line and achieve a second resistance value through a second laser cut. By utilizing a two-stage resistive layer modification method, the resistance value can be finely adjusted, thereby improving the stability of product manufacturing.

Description

Technical Field

[0001] This invention relates to the technical field of columnar resistive elements, and more particularly to a columnar resistive element and a laser-assisted resistive method for manufacturing the same. Prior Technology

[0002] Traditional columnar resistor manufacturing methods involve sputtering a thin-film resistive layer onto a substrate surface, followed by sequential processes such as capping or coating to form terminal electrodes, resistor repair, and coating. The manufacturing process includes many steps that cause aging of the various components of the columnar resistor, resulting in deviations in resistance values ​​and inconsistent quality. Therefore, it is difficult to manufacture columnar resistor elements with low-accuracy resistance values.

[0003] Furthermore, as electronic products are becoming increasingly miniaturized, the size of columnar resistors must be reduced while improving product performance. Therefore, in practice, it is difficult to rework columnar resistors that do not meet specifications, resulting in low product yield and stability. Summary of the Invention

[0004] In view of this, the present invention provides a laser resistance correction method for manufacturing columnar resistive elements, comprising:

[0005] A resistive layer is formed on the surface of a columnar substrate, the resistive layer including a resistance determining region, a first resistance adjusting region, and a second resistance adjusting region;

[0006] A metal layer is formed at both ends of the columnar substrate, and the metal layer is connected to the resistive layer to form two electrodes;

[0007] The resistance-determining region is first laser-cut to form a first cutting line and achieve a first resistance value; and

[0008] The first resistance adjustment area is laser-cut a second time to form a second cutting line and achieve a second resistance value, which is greater than the first resistance value by 0.1% to 1%.

[0009] Preferably, the surface area of ​​the resistance determining region is greater than the surface area of ​​the first resistance adjusting region and the surface area of ​​the second resistance adjusting region.

[0010] Preferably, the surface area ratio of the resistance determining region, the first resistance adjusting region, and the second resistance adjusting region is 50~70:15~25:15~25.

[0011] Preferably, the interval between the first cutting line and the second cutting line is equal to or greater than the interval between the first cutting lines.

[0012] Furthermore, the present invention provides a columnar resistive element comprising:

[0013] A columnar substrate;

[0014] A resistive layer is disposed on a surface of the columnar substrate, and the resistive layer includes a resistance-determining region, a first resistance-adjusting region, and a second resistance-adjusting region; and

[0015] A metal layer is disposed at both ends of a columnar substrate, and the metal layer is connected to the resistive layer to form two electrodes;

[0016] The resistance determining region is configured to form a first cutting line and achieve a first resistance value by a first laser cutting, and the first resistance adjusting region is configured to form a second cutting line and achieve a second resistance value by a second laser cutting, and the second resistance value is greater than 0.1% to 1% of the first resistance value.

[0017] Preferably, the surface area of ​​the resistance determining region is greater than the surface area of ​​the first resistance adjusting region and the surface area of ​​the second resistance adjusting region.

[0018] Preferably, the surface area ratio of the resistance determining region, the first resistance adjusting region, and the second resistance adjusting region is 50~70:15~25:15~25.

[0019] Preferably, the interval between the first cutting line and the second cutting line is equal to or greater than the interval between the first cutting lines.

[0020] Preferably, the standard deviation of the resistance value of the columnar resistive element is less than 0.030 and / or the error accuracy is less than 0.03%.

[0021] The columnar resistor element of this invention utilizes multi-segment laser cutting by setting a resistance determining area, a first resistance adjusting area, and a second resistance adjusting area. By controlling the different surface areas, cutting line intervals, cutting line widths, and current paths after cutting of the resistance determining area, the first resistance adjusting area, and the second resistance adjusting area, the resistance determining area, the first resistance adjusting area, and the second resistance adjusting area are connected in series with different resistance values, thereby precisely controlling the resistance value of the columnar resistor element. This solves the technical problems of inconsistent quality due to aging during the manufacturing process of columnar resistor elements and the difficulty in fine-tuning the resistance value of miniature columnar resistor elements. It also overcomes the manufacturing bottleneck of high standard deviation and error accuracy of the resistance value of traditional columnar resistor elements, which is beneficial for manufacturing high-precision and high-stability columnar resistor elements. Simple Explanation of the Diagram

[0022] Figure 1 is a schematic diagram of a first embodiment of the columnar resistive element of the present invention. Figure 2 is a schematic diagram of a second embodiment of the columnar resistive element of the present invention. Figure 3 is a flowchart of the laser resistance repair method for manufacturing columnar resistive elements according to the present invention. Figure 4 is a comparison chart of the standard deviation of resistance values ​​of columnar resistive elements manufactured by different embodiments of the laser resistance repair method for manufacturing columnar resistive elements according to the present invention. Figure 5 is a comparison diagram of the error accuracy of the resistance values ​​of different embodiments of columnar resistive elements manufactured by the laser resistance correction method for manufacturing columnar resistive elements according to the present invention. Implementation

[0023] The following embodiments, in conjunction with the accompanying drawings, are used to illustrate the spirit of the present invention, enabling those skilled in the art to clearly understand the technology of the present invention. However, they are not intended to limit the scope of the present invention, and the scope of the patent right of the present invention should be defined by the claims. It is particularly emphasized that the drawings are for illustrative purposes only and do not represent the actual size or quantity of the components. Some details may not be fully drawn in order to achieve the simplicity of the drawings.

[0024] For the sake of brevity, a cylindrical resistor is used as an example, but it should be understood that this is for illustrative purposes only and not to limit the invention. The cylindrical resistive element of the present invention can be implemented in any shape.

[0025] Please refer to Figures 1 to 3. Figure 1 is a schematic diagram of the first embodiment of the columnar resistive element of the present invention, Figure 2 is a schematic diagram of the second embodiment of the columnar resistive element of the present invention, and Figure 3 is a flowchart of the laser resistance repair method of the present invention.

[0026] The columnar resistive element 1 of the present invention comprises a columnar substrate 10, an electrode layer 20, a resistive layer 30, and a protective layer 40.

[0027] The laser resistance correction method of the present invention for manufacturing high-precision columnar resistive element 1 is as follows:

[0028] Step S01: A resistive layer 30 is formed on the surface of a columnar substrate 10. The resistive layer 30 includes a resistance-determining region R1, a first resistance-adjusting region R2, and a second resistance-adjusting region R3. The resistance-determining region R1 is connected between the first resistance-adjusting region R2 and the second resistance-adjusting region R3. The resistive layer 30 is formed by printing or sputtering onto the surface of the columnar substrate 10. The surface area of ​​the resistance-determining region R1 is larger than the surface areas of the first resistance-adjusting region R2 and the second resistance-adjusting region R3, respectively. The surface area ratio of the resistance-determining region R1, the first resistance-adjusting region R2, and the second resistance-adjusting region R3 is 50~70:15~25:15~25.

[0029] The columnar substrate 10 can be made of alumina, and the resistive layer 30 can be made of nickel-chromium, nickel-chromium-silicon, chromium-silicon, tantalum nitride compounds or combinations thereof.

[0030] In step S02, a metal layer is formed at both ends of the columnar substrate 10, and the metal layer is connected to the resistive layer 30 to form two electrodes. The metal layer is formed by side-dip coating, sputtering, or electroplating to cover the metal layer to form a metal cap-shaped electrode, and one electrode abuts against the first resistance adjustment region R2, while the other electrode abuts against the second resistance adjustment region R3.

[0031] The electrode layer 20 can be made of nickel-tin plating, nickel plating, nickel-phosphorus plating, or copper-nickel-tin plating.

[0032] Step S03: The resistor layer 30 in the resistance-determining region R1 is subjected to a first laser cutting to repair the resistance, forming a first cutting line 31 and achieving a first resistance value. The first cutting line 31 is formed by spiral cutting around the resistance-determining region R1, and the number of turns of the first cutting line 31 is less than 9, preferably 3 to 9. The first interval distance D1 between each turn of the first cutting line 31 is 20 to 35 µm.

[0033] Step S04: Perform a second laser cut on the first resistance adjustment area R2 and / or the second resistance adjustment area R3 to form a second cutting line 32 and / or a third cutting line 33, achieving a second resistance value that is 0.1% to 1% greater than the first resistance value. The second cutting line 32 and / or the third cutting line 33 are cut by a straight line or curve through the first resistance adjustment area R2 and / or the second resistance adjustment area R3. In other words, the second cutting line 32 and / or the third cutting line 33 do not wrap around the first resistance adjustment area R2 and / or the second resistance adjustment area R3, i.e., the number of wraps of the second cutting line 32 and / or the third cutting line 33 is less than 1 turn, preferably 0.5 to 1 turn, so that the ratio of the number of turns of the first cutting line 31 to the second cutting line 32 is 3 to 9: 0.5 to 1 and / or the ratio of the number of turns of the first cutting line 31, the second cutting line 32 and the third cutting line 33 is 3 to 9: 0.5 to 1: 0.5 to 1.

[0034] The first cutting line 31 and the second cutting line 32 can be either dashed lines or solid lines, and the line width of the first cutting line 31 and the second cutting line 32 is 25~35µm. The second interval distance D2 between the first cutting line 31 and the second cutting line 32 is 25~35µm, and the third interval distance D3 between the first cutting line 31 and the third cutting line 33 is 25~35µm. Furthermore, the second interval distance D2 or the third interval distance D3 is equal to or greater than the first interval distance D1 between the first cutting lines.

[0035] In step S05, a protective layer 40 is formed on the resistive layer 30. The material of the protective layer 40 is epoxy resin or a mixture of epoxy resins. The protective layer 40 is applied to the resistive layer 30 by roller coating.

[0036] The printing, sputtering, side-coating, electroplating, laser and roller coating processes used in this invention can be performed using conventional techniques to achieve the same effect. For the sake of brevity, this invention will not be described in detail.

[0037] Please refer to Figures 4 and 5. Figure 4 is a comparison chart of the standard deviation of the resistance value of different embodiments of the high-resistance columnar resistor element manufactured by the laser resistance correction method according to the present invention. Figure 5 is a comparison chart of the error accuracy of the resistance value of different embodiments of the columnar resistor element manufactured by the laser resistance correction method according to the present invention. The columnar resistor elements used in Figures 4 and 5 are shown in Table 1. The comparative example only performs one laser cut, while Examples 1 to 3 use the laser resistance correction method of the present invention to perform a first laser cut to correct the resistance determination area, and perform a second laser cut on one of the first resistance adjustment area and the second resistance adjustment area. [Table 1] Resistance-determining region Surface area (%) First resistance adjustment area Surface area (%) Second resistance adjustment area Surface area (%) Comparative example 90 0 0 Example 1 70 15 15 Example 2 60 20 20 Example 3 50 25 25

[0038] Figure 4 shows the standard deviation of the columnar resistor elements manufactured according to Table 1 when the resistance value error accuracy requirement is 0.1%. The standard deviation of the resistance value of the comparative example is 0.062, while the standard deviation of the resistance value of Examples 1 to 3 is 0.027~0.030. It can be seen that the laser resistance correction method of the present invention improves the yield of manufacturing high-precision columnar resistor elements and significantly reduces the standard deviation.

[0039] Figure 5 shows the resistance value error accuracy of the columnar resistor elements manufactured according to Table 1. The resistance value error accuracy of the comparative example is only 0.102%, while the resistance value error accuracy of Examples 1 to 3 reaches 0.015~0.03%. It can be seen that the laser resistance correction method of the present invention overcomes the manufacturing bottleneck of the error accuracy of columnar resistor elements, achieving an error accuracy as low as 0.015%.

[0040] The columnar resistor element of this invention utilizes multi-segment laser cutting by setting a resistance determining area, a first resistance adjusting area, and a second resistance adjusting area. By controlling the different surface areas, cutting line intervals, cutting line widths, and current paths after cutting of the resistance determining area, the first resistance adjusting area, and the second resistance adjusting area, the resistance determining area, the first resistance adjusting area, and the second resistance adjusting area are connected in series with different resistance values, thereby precisely controlling the resistance value of the columnar resistor element. This solves the technical problems of inconsistent quality due to aging during the manufacturing process of columnar resistor elements and the difficulty in fine-tuning the resistance value of miniature columnar resistor elements. It also overcomes the manufacturing bottleneck of high standard deviation and error accuracy of the resistance value of traditional columnar resistor elements, which is beneficial for manufacturing high-precision and high-stability columnar resistor elements.

[0041] 1: Columnar resistive element 10: Columnar substrate 20: Electrode layer 30: Resistive layer 31: First cutting line 32: Second cutting line 33: Third cutting line 40: Protective layer D1~D3: Distance from the first interval to the third interval R1: Resistance-determining region R2: First resistance adjustment area R3: Second resistor adjustment area S01~S05: Steps

Claims

1. A laser resistance correction method for manufacturing a columnar resistive element, comprising: forming a resistive layer on the surface of a columnar substrate, the resistive layer including a resistance determining region, a first resistance adjusting region, and a second resistance adjusting region; forming a metal layer at both ends of the columnar substrate, the metal layer being connected to the resistive layer to form two electrodes; performing a first laser cut on the resistance determining region to form a first cutting line and achieve a first resistance value; and performing a second laser cut on the first resistance adjusting region to form a second cutting line and achieve a second resistance value, wherein the second resistance value is greater than 0.1% to 1% of the first resistance value; wherein the spacing between the first cutting line and the second cutting line is equal to or greater than the spacing between the first cutting lines.

2. The method as described in claim 1, wherein a surface area of ​​the resistance determining region is greater than a surface area of ​​the first resistance adjusting region and a surface area of ​​the second resistance adjusting region.

3. The method as described in claim 1, wherein the surface area ratio of the resistance determining region, the first resistance adjusting region, and the second resistance adjusting region is 50-70:15-25:15-25.

4. A columnar resistive element, comprising: a columnar substrate; a resistive layer disposed on a surface of the columnar substrate, the resistive layer including a resistance determining region, a first resistance adjusting region, and a second resistance adjusting region; and a metal layer disposed at both ends of the columnar substrate, the metal layer being connected to the resistive layer to form two electrodes; wherein the resistance determining region is configured to form a first cutting line and achieve a first resistance value by a first laser cutting, the first resistance adjusting region is configured to form a second cutting line and achieve a second resistance value by a second laser cutting, and the second resistance value is greater than 0.1% to 1% of the first resistance value, and the spacing between the first cutting line and the second cutting line is equal to or greater than the spacing between the first cutting lines.

5. The columnar resistive element as claimed in claim 4, wherein the surface area of ​​the resistance determining region is greater than the surface area of ​​the first resistance adjusting region and the surface area of ​​the second resistance adjusting region.

6. The columnar resistive element as claimed in claim 4, wherein the surface area ratio of the resistance determining region, the first resistance adjusting region, and the second resistance adjusting region is 50-70:15-25:15-25.

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