Charged particle beam device and charged particle gun

Abstract

A charged particle beam device is provided that enables more suitable position adjustment of a charged particle source. The charged particle beam device includes: a charged particle source support member (106) that directly or indirectly supports a charged particle source (103); a moving mechanism (107) that moves the charged particle source support member (106); the moving mechanism (107) has the following functions: a first function that defines the direction of travel of the charged particles emitted from the charged particle source (103) as the Z direction, defines the direction orthogonal to the Z direction as the X direction, and defines the direction orthogonal to the Z and X directions as the Y direction, thereby moving the charged particle source support member (106) in the X, Y, and Z directions; and a second function that, different from the first function, moves the charged particle source support member (106) in the Z direction from outside the vacuum chamber (101).

Description

[Technical Field]

[0001] This invention relates to a charged particle beam device and a charged particle gun. [Previous Technology]

[0002] As prior art in this technical field, patent documents 1 and 2 below describe techniques for adjusting the position of, for example, an electron source, i.e., a charged particle source. The descriptions in these documents are incorporated herein by reference as part of this specification. [Prior Art Documents] [Patent Documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. Hei 10-255711 [Patent Document 2] Japanese Patent Application Publication No. 2007-19045 [Summary of the Invention]

[0004] [Problem to be Solved by the Invention] However, in the above-described technology, there is still a desire to achieve a more suitable position adjustment of the charged particle source. The present invention was created in view of the above reasons, and its object is to provide a charged particle beam device and a charged particle gun capable of achieving suitable position adjustment of the charged particle source. [Technical Means for Solving the Problem]

[0005] To solve the above-mentioned problems, the charged particle beam device of the present invention includes a charged particle gun for irradiating a charged particle beam and a focusing lens. The charged particle beam device is characterized in that the focusing lens focuses the charged particles onto the sample using an electric field or magnetic field. The charged particle gun includes: a charged particle source for emitting charged particles; a vacuum chamber surrounding the charged particle source; a charged particle source support member for directly or indirectly supporting the charged particle source; and a moving mechanism for moving the charged particle source support member. The supporting member moves; the aforementioned moving mechanism includes: a first function that defines the direction of travel of the charged particles emitted from the aforementioned charged particle source as the Z direction, the direction orthogonal to the aforementioned Z direction as the X direction, and the direction orthogonal to the aforementioned Z direction and the aforementioned X direction as the Y direction, thereby moving the aforementioned charged particle source supporting member in the aforementioned X direction, the aforementioned Y direction, and the aforementioned Z direction; and a second function that, different from the aforementioned first function, moves the aforementioned charged particle source supporting member from outside the aforementioned vacuum chamber in the aforementioned Z direction. [Effects of the Invention]

[0006] According to the present invention, it is possible to achieve appropriate position adjustment of the charged particle source.

Implementation Method

[0008] [Summary of Embodiments] A charged particle beam apparatus includes a charged particle gun that emits a charged particle beam. For example, in the case of a SEM (Scanning Electron Microscope), an electron gun is included. Furthermore, the charged particle gun has a charged particle source, from which a charged particle beam is emitted and exited from the charged particle gun. In the case of an SEM, an electron beam is emitted from an electron source provided in the electron gun and exited from the electron gun. For example, tungsten crystals are used as the electron source.

[0009] In recent years, to achieve high throughput with high-current probes, many short-focus or magnetic field superposition type charged particle guns with close proximity between the charged particle source and the focusing lens have been developed. In charged particle beam devices, a mechanism for adjusting the position of the charged particle source is crucial. This is because the position of the charged particle source may deviate from its designed position due to assembly tolerances, etc. In the case of SEM, if the position of the electron source deviates, the aperture angle or aberration coefficient on the sample will change from its designed value, which is expected to result in a failure to obtain target resolution.

[0010] Therefore, it is ideal for a charged particle beam device to have a charged particle source moving mechanism that allows the charged particle source to move. In this specification, the direction of travel of the charged particle beam emitted from the charged particle source will be defined as the Z direction, and the first and second directions orthogonal to the Z direction will be referred to as the X direction and Y direction, respectively. If the technology of Patent Document 1 is applied, it is contemplated that an ultra-high vacuum surface observation device can be realized, which has a mechanism in the vacuum chamber that allows the charged particle source to move independently in the X, Y, and Z directions, made of piezoelectric elements. Furthermore, if the technology of Patent Document 2 is applied, it is contemplated that an electron beam application device can be realized, which has a mechanism outside the vacuum chamber that allows the charged particle source to move independently in the X and Y directions.

[0011] However, if the vacuum chamber is constructed with an XYZ movement mechanism made of piezoelectric elements as in the technology of Patent Document 1, a problem arises that limits the baking temperature of the charged particle gun. Since a charged particle beam passes through the charged particle gun, the interior is generally set to a high vacuum to ultra-high vacuum. Therefore, a baking process is typically performed on the charged particle gun. If a piezoelectric element is installed in the vacuum chamber, the upper limit of the baking temperature will decrease, and it is expected that the release of gas from the charged particle gun will not be sufficient, resulting in a worse ultimate vacuum. Although it is conceivable to replace the piezoelectric element with an XYZ movement mechanism using a motor in the vacuum chamber, the problem of a lower baking temperature will still arise in either case.

[0012] Furthermore, if a mechanism for moving the position of the charged particle source is constructed outside the vacuum chamber as in the technique described in Patent Document 2, the positioning accuracy will deteriorate due to the pressure difference. In particular, in order to move the position of the charged particle source in the Z direction from outside the vacuum chamber, it is conceivable to provide a component that separates the inside and outside of the vacuum chamber and supports the charged particle source, and a mechanism for moving this component in the Z direction. However, due to the pressure difference between the inside and outside of the vacuum chamber, a force greater than that caused by atmospheric pressure is required to move the component in the Z direction. Under such conditions, it is difficult to move the position of the charged particle source in the Z direction with precision.

[0013] On the other hand, if it is a short-focus type or a magnetic field superposition type charged particle gun, the sensitivity to deviation of the charged particle source position relative to the focusing lens will be higher than that of conventional charged particle guns. Therefore, there is a need to set the XYZ position of the charged particle source with higher precision than before. Especially regarding the Z position, since the distance between the charged particle source and the focusing lens is closer, the longitudinal magnification of the optical system is larger, and higher precision positioning is important. If the technology of Patent Document 2 is applied, it is conceivable that the charged particle source can be moved in the XY direction from outside the charged particle gun. However, Patent Document 2 does not describe in detail the method of moving the charged particle source in the Z direction.

[0014] To solve the aforementioned problems, the charged particle gun and charged particle beam device disclosed herein include a moving mechanism for moving a charged particle source support member. This moving mechanism has a first function of moving the charged particle source support member in the XYZ directions, and a second function, distinct from this first function, of moving the charged particle source support member from outside the vacuum chamber.

[0015] Furthermore, the charged particle beam device provided in this disclosure is configured to include: a drive unit for adjusting the position of the charged particle source support member; a detector; and a user interface device; the position of the charged particle source support member can be adjusted so that the parameters displayed on the user interface device are optimal.

[0016] According to the embodiment of this disclosure, the second function shares the force caused by the pressure difference, and the position of the charged particle source support member can be adjusted in the X, Y, and Z directions by means of the first function, which becomes unaffected by atmospheric pressure. In the configuration of this disclosure, it is not necessary to install piezoelectric elements or motors inside the vacuum chamber, so the baking temperature of the charged particle gun can be set to a high temperature to fully release the gas. Furthermore, according to the embodiment of this disclosure, the charged particle source can be moved in the X, Y, and Z directions, so that more than one parameter displayed on the user interface device is optimal.

[0017] The embodiments will be described below with reference to the accompanying drawings. In the drawings described below, components having the same or similar functions are labeled with the same symbols, and sometimes the descriptions are not repeated. Furthermore, in the embodiments described below, the main examples of charged particle beam devices and charged particle guns are those applicable to SEM (scanning electron microscope) and electron guns. However, the embodiments described below are not limited to these and may also be applied to ion beam devices or ion guns, for example.

[0018] [First Embodiment] FIG1 is a model diagram of an electron gun 100 according to the first embodiment. The electron gun 100 of this embodiment, as an example of a charged particle beam device, is mainly applicable to SEM. In this case, the charged particle gun of the charged particle beam device in the following example is an electron gun, and similarly, the charged particle beam and the charged particle source are an electron beam and an electron source, respectively.

[0019] In Figure 1, the electron gun 100 (charged particle gun, charged particle beam device) includes a vacuum chamber 101, an electron source 103 (charged particle source), a focusing coil 105 (focusing lens), an electron source support member 106 (charged particle source support member), and a moving mechanism 107. A high vacuum space 102 is formed inside the vacuum chamber 101. The electron source 103 and the focusing coil 105 are disposed inside the vacuum chamber 101. The electron source 103 emits an electron beam 104 (charged particle beam). Furthermore, the focusing coil 105 is a coil that focuses the charged particle beam, i.e., the electron beam 104. That is, current is supplied to the focusing coil 105 to generate a magnetic field, and the electron beam 104 is focused by this magnetic field.

[0020] However, the electron beam 104 does not necessarily need to be focused by a magnetic field; it can also be focused by an electric field. In this case, two or more electrodes (not shown) with a potential difference can be used instead of the focusing coil 105. Furthermore, the components for focusing the electron beam (the focusing coil 105 or the aforementioned electrodes) do not need to be located inside the electron gun 100; they can also be located in the lens barrel (not shown) which is lower than the electron gun 100.

[0021] The electron source 103 is directly or indirectly supported inside the vacuum chamber 101 by the electron source support member 106. The meaning of the expression "directly or indirectly supported" will be explained here. The electron source support member 106 is made of a metal such as SUS (stainless steel) and has a cylindrical shape. It is conceivable that the electron source 103 is joined to the lower end of the electron source support member 106, thereby supporting the electron source 103. In this configuration, the electron source support member 106 can be said to directly support the electron source 103.

[0022] Alternatively, as another method, it is conceivable to fabricate the electron source support member 106 using an insulator. The electron source support member 106 further includes a metal wire, which is used to connect the electron source 103 to the electron source 103 to support the electron source 103. In this configuration, the electron source support member 106 indirectly supports the electron source 103 through the metal wire. In the example of Figure 1, the electron source support member 106 is shown to directly support the electron source 103. However, other components provided on the electron source support member 106 can also be used to support the electron source 103 as described above.

[0023] The moving mechanism 107 moves the electron source support member 106 in the XYZ directions. Here, "moving in the XYZ directions" means moving the desired distance in each of the three directions: X, Y, and Z. In Figure 1, the electron source support member 106 is held in the vacuum chamber 101 by the moving mechanism 107; however, the electron source support member 106 can also be held directly in the vacuum chamber 101.

[0024] Furthermore, the moving mechanism 107 has a first function of moving the electron source support member 106 in the XYZ directions, and a second function, different from this first function, of moving the electron source support member 106 from outside the vacuum chamber 101. Here, "outside the vacuum chamber 101" means the external air pressure environment that is not in contact with the high vacuum space 102.

[0025] By possessing the second function described above, the force generated by the pressure difference between the outside of the vacuum chamber 101 and the first function can be counteracted. In this way, when the electron source support member 106 is moved to the desired position in the XYZ direction by means of the first function, precise positioning can be achieved.

[0026] [Second Embodiment] FIG2 is a model diagram of an electron gun 100 according to a second embodiment. In the second embodiment, the moving mechanism 107 includes a first moving device 10 and a second moving device 30. The first moving device 10 performs a first function of moving the electron source support member 106 in the XYZ directions. Furthermore, the second moving device 30 performs a second function, different from the first moving device 10, of moving the electron source support member 106 in the Z direction.

[0027] Here, the second moving device 30 is disposed outside the vacuum chamber 101. The second moving device 30 applies a force to the electron source support member 106 to counteract the force generated by the pressure difference, thereby preventing the first moving device 10 from being subjected to the force caused by the pressure difference. Under this condition, the first moving device 10 moves the electron source support member 106 to a desired position in the XYZ direction. In this way, precise positioning can be achieved when the electron source support member 106 is moved by the first moving device 10. The configuration of the second embodiment other than the above is the same as that of the first embodiment.

[0028] [Third Embodiment] FIG3 is a schematic perspective view of the main parts of the electron gun 100 according to the third embodiment. That is, FIG3 shows the second moving device 30, a portion of the upper part of the vacuum chamber 101, and a portion of the electron source support member 106 in the electron gun 100. The third embodiment provides a specific configuration for the second moving device 30 in the second embodiment. As shown in FIG3, the second moving device 30 is disposed outside the vacuum chamber 101, that is, above the vacuum chamber 101.

[0029] The electron source support member 106 and the vacuum chamber 101 are joined together by the connecting member 112. The connecting member 112 is a member that maintains the vacuum state of the vacuum chamber 101 while enabling the movement of the electron source support member 106 in the XYZ directions. For example, it can be constructed using a basalt.

[0030] In the example shown, the second moving device 30 has a cylindrical portion 32 and three set screws 34. The cylindrical portion 32 is formed in the cylindrical shape, and through holes (unmarked) are formed in the Z direction at three equal positions in the circumferential direction. Female threads (not shown) are threaded into these through holes.

[0031] Furthermore, the cylindrical portion 32 abuts against the cylindrical electron source support member 106 on its inner circumferential surface and is fixed to the electron source support member 106. Each fixing screw 34 is formed in a slightly cylindrical shape, and male threads (not shown) are threaded onto its outer circumferential surface. Each fixing screw 34 is threaded into the through hole formed in the cylindrical portion 32 on one side and inserted into the other. The lower end of each fixing screw 34 abuts against the upper surface of the vacuum chamber 101.

[0032] When the fixing screw 34 is rotated with its lower end in contact with the upper surface of the vacuum chamber 101, a force is applied to the electron source support member 106 in the negative Z-axis direction through the cylindrical portion 32. By rotating the fixing screw 34 by just the right amount, the force caused by the atmospheric pressure applied to the electron source support member 106 is counteracted. In this way, the electron source support member 106 can be precisely positioned by the freed first moving device 10 (see Figure 2).

[0033] Furthermore, components such as screws or blocks (not shown) other than the fixing screw 34 can be provided to the second moving device 30. That is, the second moving device 30 can be moved by these components, and the force caused by atmospheric pressure applied to the first moving device 10 (see Figure 2) can also be counteracted. For example, it is conceivable to engrave male threads on the circumferential surface of the electron source support member 106 and female threads on the inner circumferential surface of the cylindrical portion 32, so that the two are screwed together. In this way, by rotating the cylindrical portion 32, a force in the negative direction of the Z-axis can be applied to the electron source support member 106, and the force caused by atmospheric pressure applied to the first moving device 10 can also be counteracted.

[0034] [Fourth Embodiment] FIG4 is a model cross-sectional view of the main parts of the electron gun 100 according to the fourth embodiment. That is, FIG4 mainly illustrates the first moving device 10 and its surrounding parts in the electron gun 100.

[0035] The first moving device 10 illustrated in FIG4 includes a rotating member 12, a protrusion 14, and a fixing screw 16. Furthermore, the electron source support member 106 has a male thread portion 106a with male threads threaded onto its circumferential surface. The rotating member 12 is, for example, formed in a cylindrical shape, with female threads (unmarked) threaded onto its inner circumferential surface. This female thread engages with the male thread portion 106a of the electron source support member 106, thereby assembling the rotating member 12 onto the electron source support member 106.

[0036] Protrusions 14 are provided at four equally spaced positions in the circumferential direction around the rotating member 12, that is, positive and negative positions in the X direction and positive and negative positions in the Y direction. However, only two protrusions 14 at the positive and negative positions in the X direction are shown in FIG4. Each protrusion 14 is provided in such a way that it protrudes upward from the top of the vacuum chamber 101. Furthermore, a through hole (not shown) is formed in each protrusion 14 from the outer peripheral side to the inner peripheral side of each protrusion 14, and female threads are threaded into these through holes.

[0037] A total of four fixing screws 16 are provided, which are screwed into the through holes (not shown) formed in each protrusion 14. However, only two fixing screws 16 are shown in Figure 4. If the fixing screw 16 is rotated, the tip of the fixing screw 16 will cause the rotating member 12 to move in the pushing direction, thereby moving the electron source support member 106. For example, if the two fixing screws 16 shown in Figure 4 are rotated, the electron source support member 106 will move in the X direction through the rotating member 12.

[0038] Here, the procedure for positioning the electron source support member 106 will be described using the first moving device 10 and the second moving device 30. • Procedure #1: First, in the first moving device 10, loosen the fixing screw 16 so that no force from the fixing screw 16 is applied to the rotating member 12. Then, rotate the rotating member 12 in the release direction so that the rotating member 12 moves away from the top of the vacuum chamber 101.

[0039] ・Procedure #2: Next, using the second moving device 30, a coarse adjustment is made to the Z-direction position of the electron source support member 106. By moving the electron source support member 106 in the Z-direction using the second moving device 30, the rotating member 12 also moves along with the electron source support member 106. During the coarse adjustment, the Z-direction position of the electron source support member 106 can be set slightly lower than the ideal position.

[0040] ・Procedure #3: Next, in the first moving device 10, the rotating member 12 is gradually rotated in the locking direction, and finally the rotating member 12 will contact the top of the vacuum chamber 101. In this contact state, the rotating member 12 is further rotated in the locking direction, and the electron source support member 106 will gradually move upward.

[0041] Conversely, with the rotating member 12 in contact with the vacuum chamber 101, rotating the rotating member 12 in the release direction will cause the electron source support member 106 to gradually move downwards. This allows for fine adjustment of the Z-direction position of the electron source support member 106 by operating the rotating member 12. As described above, the force caused by atmospheric pressure applied to the electron source support member 106 is almost entirely offset by the second moving device 30 (e.g., the one in Figure 3). Therefore, the user can rotate the rotating member 12 with relatively weak force. This allows the user to achieve precise Z-direction position adjustment of the electron source support member 106 by operating the rotating member 12. • Procedure #4: Next, rotate the four fixing screws 16 to adjust the X and Y-direction positions of the electron source support member 106.

[0042] Thus, according to this embodiment, after the user makes the first moving device 10 unaffected by atmospheric pressure by using the second moving device 30, the user can use the first moving device 10 to make fine adjustments to the Z-direction position of the electron source support member 106 by operating the rotating member 12. According to this embodiment, it is not necessary to include piezoelectric elements inside the vacuum chamber 101, so an electron gun 100 can be constructed that can bake the vacuum chamber 101 at high temperature and can also move the electron source 103 in the Z-direction. Furthermore, the configuration of the fourth embodiment other than the above is the same as any one of the first to third embodiments.

[0043] [Fifth Embodiment] FIG5 is a model diagram of an electron gun 100 according to the fifth embodiment. The fifth embodiment is formed by providing a position detection unit 130 in one of the second to fourth embodiments. This position detection unit 130 is a device for detecting the position in the Z direction of the electron source support member 106 that is adjusted by the first moving device 10 (see FIG2). In FIG5, the position detection unit 130 includes a pad 131, a micrometer 132, a continuity detection unit 133, and a micrometer support member 136.

[0044] The micrometer support member 136 includes an insulating part 136a and an assembly part 136b. The assembly part 136b is assembled to the micrometer support member 136 and supports the insulating part 136a. The insulating part 136a is formed by forming an insulating member such as resin into a ring shape, and female threads (not shown) are threaded on its inner circumferential surface.

[0045] The micrometer 132 includes a male thread portion 132a formed in the shape of a male thread, which is screwed to the insulating portion 136a. The tip of the male thread portion 132a of the micrometer 132 protrudes downward from the micrometer support member 136. The micrometer 132 measures the protruding length of this male thread portion 132a, measured from the micrometer support member 136.

[0046] The pad portion 131 is a sheet-like component assembled on the upper surface of the vacuum chamber 101, and includes an insulating sheet portion 131a and a conductor sheet portion 131b. The insulating sheet portion 131a is an insulator formed into a sheet shape by resin or the like, and is assembled on the upper surface of the vacuum chamber 101. Furthermore, the conductor sheet portion 131b is a sheet-like conductor bonded to the upper surface of the insulating sheet portion 131a.

[0047] The continuity detection unit 133 detects whether the pad portion 131 and the micrometer 132 are in contact. More specifically, the continuity detection unit 133 detects whether the male thread portion 132a of the micrometer 132 and the conductor plate portion 131b of the pad portion 131 are conductive.

[0048] Here, the method of using the position detection unit 130 will be explained. First, the micrometer 132 is operated so that the protruding length of the male thread portion 132a, measured from the micrometer support member 136, becomes a length corresponding to the desired Z-direction position of the electron source support member 106. Next, the electron source support member 106 is moved by the first moving device 10 (see Figure 2). In this way, the continuity detection unit 133 detects contact between the pad portion 131 and the micrometer 132 by an appropriate amount of movement. At this time, the Z-direction position of the electron source support member 106 can be fixed. In this way, by providing the position detection unit 130, the position of the electron source support member 106 can be quantitatively detected while moving the electron source support member 106.

[0049] [Sixth Embodiment] FIG6 is a model diagram of an electron gun 100 according to the sixth embodiment. The electron gun 100 of this embodiment, like that of the first embodiment (see FIG1), includes a vacuum chamber 101, an electron source 103, a focusing coil 105, an electron source support member 106, and a moving mechanism 107. Furthermore, the electron gun 100 of this embodiment includes a drive unit 210 and a controller 208.

[0050] The controller 208 outputs a position indication signal indicating the position of the electronic source support member 106. The drive unit 210 drives the moving mechanism 107 based on the position indication signal. For example, when the second moving device 30 shown in FIG3 is used, the controller 208 and the drive unit 210 can rotate the fixing screw 34 by means of a motor (not shown).

[0051] Furthermore, when the first moving device 10 shown in FIG. 4 is used, the controller 208 and the drive unit 210 can rotate the rotating member 12 and the protrusion 14 by means of a motor (not shown). Alternatively, a suitable actuator (not shown) can be provided to replace the rotating member 12 and the fixing screw 16, and the controller 208 and the drive unit 210 can move the electronic power supply support member 106 by driving this actuator. In this way, by having the controller 208 and the drive unit 210, the user does not need to directly adjust the position of the electronic power supply support member 106, thus achieving the effect of reducing maintenance time.

[0052] Furthermore, in Figure 4, when a motor or actuator is used to replace the rotating member 12 and the fixing screw 16, the temperature limitation during baking, which is the problem to be solved, as described at the beginning of this document, obviously does not cause a problem in this embodiment. The reason is that the moving mechanism 107 in this disclosure can adjust the position of the electron source support member 106 from outside the vacuum chamber 101.

[0053] At the location where the moving mechanism 107 is installed outside the vacuum chamber 101, the temperature will not rise to the level inside the vacuum chamber 101, and a motor or actuator can be installed. Furthermore, if necessary, the design can be made such that the motor or actuator can be disassembled during baking. Additionally, when control is employed via an actuator or motor, a linked control system can be used that allows automatic movement in both the X and Y directions as well as in the Z direction.

[0054] [Seventh Embodiment] FIG7 is a model diagram of a charged particle beam apparatus 200 according to the seventh embodiment. Like the first to sixth embodiments, the charged particle beam apparatus 200 can be applied, for example, to SEM. The charged particle beam apparatus 200 includes an electron gun 100, a vacuum chamber 201, an aperture 202, a focusing coil 203, and a detector 204. A sample 205 is placed at a predetermined location in the vacuum chamber 201. The configuration of the electron gun 100 is the same as in the first embodiment. Furthermore, the high vacuum space 102 of the vacuum chamber 101 is connected to the internal space of the vacuum chamber 201.

[0055] The electron beam 104 emitted by the electron gun 100 is guided to the downstream vacuum chamber 201 and focused to irradiate the sample 205. At this time, the electron beam 104 is focused by the focusing coil 105, cut by the aperture 202, and further focused by the focusing coil 203 to irradiate the sample 205.

[0056] However, this embodiment illustrates an example of an optical system that irradiates a sample with a focused charged particle beam, and does not limit the scope of this disclosure. For example, the charged particle beam device 200 may also have electrodes instead of the focusing coil 203, and may also have both a focusing coil 203 and electrodes to focus the electron beam 104 by an electric field.

[0057] Regarding the components for focusing the electron beam 104, it is conceivable that one or more can be provided in any number. Regarding the aperture 202, two or more can also be provided. Furthermore, as in the other embodiments described above, the focusing coil 105 or the aperture 202 can be provided either inside or outside the electron gun 100.

[0058] The sample 205 is irradiated by the focused electron beam 104, and the detector 204 detects the signal generated by the irradiation of the electron beam. Here, various signals can be conceived as the signal being detected. In the SEM of this embodiment, secondary electrons emitted from the sample are typically detected, but in the case of TEM (Transmission Electron Microscope), it is the penetrating electrons that interact with the sample. In addition, depending on the application, it is also conceivable to detect electromagnetic waves such as X-rays or cathode rays.

[0059] In Figure 7, detector 204 detects secondary electrons emitted from sample 205 that have a negative Z-axis direction. However, as previously stated, various detection objects can be conceived, and the scope of this disclosure is not limited by the configuration of Figure 7. The signal detected by detector 204 is captured by computer system 207, processed, and displayed on GUI device 206 (user interface device) with GUI (Graphical User Interface) functionality.

[0060] In this embodiment, the position of the electron source support member 106 can be adjusted using the moving mechanism 107 while referring to one or more signals displayed on the GUI device 206. For example, the signals displayed on the GUI device 206 could be an image obtained by irradiating the electron beam 104, or a current value obtained by capturing the electron beam 104.

[0061] To adjust the position of the electron source support member 106 while viewing the GUI device 206, the following method can be considered, for example. During the adjustment stage of the charged particle beam device 200 after mounting the electron gun 100, it is anticipated that the axes of the electron source 103 and the aperture 202 will not match due to assembly tolerances. Therefore, their axes are aligned. First, pre-adjustment is performed so that the axis of the member lower than the aperture 202 is aligned with the center of the screen on the GUI device 206.

[0062] Next, no current is flowed through the focusing coils 105 and 203, so that the electron beam emitted from the sample 205 is displayed on the GUI device 206. When the axes of the electron source 103 and the aperture 202 are not aligned, the image of the electron beam emitted from the sample 205 will be displayed off-center from the center of the screen on the GUI device 206. Therefore, the electron source support member 106 is moved using the XY movement mechanism of the movement mechanism 107 so that the image of the electron beam is located at the center of the screen on the GUI device 206. This allows the axis of the electron source 103 to be aligned with the axis of the aperture 202.

[0063] Furthermore, in the adjustment method utilizing the Z-direction movement function of the moving mechanism 107, there is, for example, the following method. First, the current value of the focusing coils 105 and 203 is adjusted so that the electron beam emitted from the desired electron source 103 at the Z-coordinate is focused onto the sample 205. Here, if the Z-coordinate of the electron source 103 is not in the desired position, the SEM image displayed on the GUI device 206 will become blurred. In this case, the Z-direction movement function of the moving mechanism 107 can be used to adjust the Z-coordinate of the electron source 103 so that the focal point of the SEM image is aligned. In this way, the Z-coordinate of the electron source 103 can be adjusted to the desired position.

[0064] [Eighth Embodiment] FIG8 is a model diagram of a charged particle beam device 200 according to the eighth embodiment. In this embodiment, the moving mechanism 107 is configured as in the second embodiment (see FIG2). That is, the moving mechanism 107 includes a first moving device 10 and a second moving device 30 that moves the electron source support member 106 in the Z direction from outside the vacuum chamber 101. The configuration of this embodiment other than the above is the same as that of the seventh embodiment (see FIG7). According to this embodiment, as in the second embodiment described above, an electron gun 100 can be configured that does not limit the baking temperature and allows the electron source support member 106 to be adjusted in the XYZ directions.

[0065] [Ninth Embodiment] FIG9 is a model diagram of a charged particle beam device 200 according to the ninth embodiment. In this embodiment, the charged particle beam device 200, in addition to the configuration of the eighth embodiment (see FIG8), further includes a controller 208 and a drive unit 210. As in the sixth embodiment (see FIG6), the controller 208 outputs a position indication signal indicating the position of the electron source support member 106. Furthermore, the drive unit 210 drives the moving mechanism 107 based on the position indication signal.

[0066] In this embodiment, the user can remotely operate the moving mechanism 107 via the controller 208 and the drive unit 210. This allows the user to adjust the position of the electron source support member 106 to optimize various parameters while referring to the SEM image displayed on the GUI device 206. Furthermore, the position adjustment of the electron source support member 106 is not limited to manual operation by the user; it can also be performed automatically by the computer system 207.

[0067] [Computer Configuration] Figure 10 is a block diagram of computer 980. The GUI device 206, computer system 207, and controller 208 shown in Figures 6 to 9 each include one or more computers 980 as shown in Figure 10. In Figure 10, computer 980 includes a CPU 981, a memory unit 982, a communication I / F (interface) 983, an input / output I / F 984, and a media I / F 985.

[0068] Here, the memory unit 982 includes RAM 982a, ROM 982b, and SSD (Solid State Drive) 982c. Communication I / F 983 is connected to communication circuit 986. Input / output I / F 984 is connected to input / output device 987. Media I / F 985 reads and writes data from recording media 988. ROM 982b stores IPL (Initial Program Loader) and other data that are executed by the CPU. SSD 982c stores control programs and various data. CPU 981 executes control programs and other data read from SSD 982c into RAM 982a, thereby realizing various functions.

[0069] [Modifications] This disclosure is not limited to the embodiments described above, and various modifications are possible. The embodiments described above are examples for the purpose of easily understanding and explaining this disclosure, and are not limited to having all the components described. Furthermore, a part of one embodiment can be replaced with the components of another embodiment, or the components of another embodiment can be added to the components of one embodiment. Furthermore, for a part of the components of each embodiment, other components can be deleted, added, or replaced. In addition, the control lines or information lines shown in the figures are those deemed necessary for the illustration, and do not necessarily represent all control lines or information lines necessary for the actual product. In practice, it can be considered that almost all components are interconnected. Possible modifications to the above embodiments are as follows.

[0070] (1) In the above embodiments, the configuration position or number of focusing coils 105 and 203 can also be changed appropriately, or the focusing coils 105 and 203 can be replaced with electrodes as described above.

[0071] (2) The hardware of the GUI device 206, computer system 207 and controller 208 in the above embodiments can be implemented by a general computer. Therefore, the programs that perform the above processing can be stored in a memory medium (a computer with the program can read the recording medium) or distributed through a transmission path.

[0072] (3) The various processes executed by the GUI device 206, computer system 207, and controller 208 in the above embodiments are described as software processes of the application program in the above embodiments. However, they can also be partially or completely replaced by hardware processes using ASIC (Application Specific Integrated Circuit) or FPGA (Field Programmable Gate Array).

[0073] (4) The various processes executed by the GUI device 206, computer system 207 and controller 208 in the above embodiments can also be executed by the server computer via a network not shown. The various data stored in the above embodiments can also be designed to be stored by the server computer.

[0074] [Effects of the Embodiment] As described above, according to the above embodiment, the moving mechanism 107 in the charged particle beam apparatus (100, 200) has a first function to move the charged particle source support member (106) in the X, Y, and Z directions, and a second function, different from the first function, to move the charged particle source support member (106) in the Z direction from outside the vacuum chamber 101. In this way, the force applied to the charged particle source support member (106) in the Z direction is shared by the first and second functions, and therefore, high-precision position adjustment can be performed by both, enabling proper position adjustment of the charged particle source.

[0075] Furthermore, it is preferable that the moving mechanism 107 includes a first moving device 10 having a first function and a second moving device 30 having a second function, with the second moving device 30 disposed outside the vacuum chamber 101. In this way, by disposing of the second moving device 30 outside the vacuum chamber 101, the second moving device 30 can be easily accessed, and the temperature of the second moving device 30 can be suppressed.

[0076] Furthermore, it is preferable that the charged particle source support member (106) has a cylindrical shape with a male thread portion 106a formed on its outer peripheral surface, and the first moving device 10 includes a rotating member 12, which has a female thread portion that engages with the male thread portion 106a. When rotated, the charged particle source support member (106) moves in the Z direction. In this way, the charged particle source support member (106) can be moved by rotating the rotating member 12.

[0077] Furthermore, it is preferable to have a position detection unit 130, which detects the position of the charged particle source support member (106) that has been adjusted by the first moving device 10. In this way, the charged particle source support member (106) can be moved while quantitatively detecting the position of the charged particle source support member (106).

[0078] Furthermore, it is preferable that the charged particle beam device (100, 200) further includes a controller 208 that outputs a position command signal indicating the position of the charged particle source support member (106), and a drive unit 210 that drives the moving mechanism 107 based on the position command signal. In this way, the user can remotely operate the moving mechanism 107.

[0079] Furthermore, the charged particle beam apparatus 200 of embodiments 7 to 9, according to other viewpoints, includes: one or more detectors 204 for detecting charged particles penetrating the sample 205, charged particles emitted from the sample 205, or electromagnetic waves emitted from the sample 205; and a user interface device (206); the user interface device (206) is equipped with the function of displaying the output signal when the detector 204 detects charged particles or electromagnetic waves, and the function of adjusting the position of the charged particle source (103) by means of the moving mechanism 107 based on the user's operation. In this way, the user can adjust the position of the charged particle source (103) by means of the moving mechanism 107 while referring to various signals displayed on the user interface device (206). [Simplified Explanation of the Diagram]

[0007] [Figure 1] Model diagram of an electron gun according to the first embodiment. [Figure 2] Model diagram of an electron gun according to the second embodiment. [Figure 3] Schematic perspective view of the main parts of an electron gun according to the third embodiment. [Figure 4] Schematic cross-sectional view of the main parts of an electron gun according to the fourth embodiment. [Figure 5] Model diagram of an electron gun according to the fifth embodiment. [Figure 6] Model diagram of an electron gun according to the sixth embodiment. [Figure 7] Model diagram of a charged particle beam device according to the seventh embodiment. [Figure 8] Model diagram of a charged particle beam device according to the eighth embodiment. [Figure 9] Model diagram of a charged particle beam device according to the ninth embodiment. [Figure 10] Block diagram of a computer.

Claims

1. A charged particle beam device comprising a charged particle gun for irradiating a charged particle beam and a focusing lens, characterized in that: the focusing lens focuses charged particles onto a sample by means of an electric field or a magnetic field; the charged particle gun comprises: a charged particle source for emitting charged particles; a vacuum chamber surrounding the charged particle source; a charged particle source support member for directly or indirectly supporting the charged particle source; and a moving mechanism for moving the charged particle source support member; the moving mechanism comprises: a first function of defining the direction of travel of the charged particles emitted from the charged particle source as the Z direction, defining a direction orthogonal to the Z direction as the X direction, and defining a direction orthogonal to the Z direction and the X direction as the Y direction, thereby moving the charged particle source support member in the X direction, the Y direction, and the Z direction; and a second function, different from the first function, of moving the charged particle source support member from outside the vacuum chamber toward the Z direction; The aforementioned second function shares the force in the Z direction caused by the pressure difference between the inside and outside of the aforementioned vacuum chamber, so that the aforementioned first function is not affected by this force.

2. The charged particle beam device as described in claim 1, wherein, The aforementioned moving mechanism includes a first moving device having the aforementioned first function and a second moving device having the aforementioned second function, wherein the aforementioned second moving device is disposed outside the aforementioned vacuum chamber.

3. The charged particle beam device as described in claim 2, wherein, The aforementioned charged particle source support member has a cylindrical shape with a male thread portion formed on its outer peripheral surface. The aforementioned first moving device includes a rotating member having a female thread portion that engages with the aforementioned male thread portion. If rotated, the aforementioned charged particle source support member moves in the Z direction.

4. The charged particle beam device as described in claim 2 or 3, wherein, It also includes: a position identification unit that identifies the position of the aforementioned charged particle source support member that has been adjusted by the aforementioned first moving device.

5. The charged particle beam device as described in claim 4, wherein, It also includes: a controller that outputs a position command signal indicating the position of the aforementioned charged particle source support member; and a drive unit that drives the aforementioned moving mechanism based on the aforementioned position command signal.

6. A charged particle beam device, which is a charged particle beam focused on a sample, characterized by comprising: a charged particle source for emitting charged particles; a vacuum chamber surrounding the charged particle source; a charged particle source support member for directly or indirectly supporting the charged particle source; a moving mechanism for moving the charged particle source support member; one or more detectors for detecting charged particles penetrating the sample, charged particles emitted from the sample, or electromagnetic waves emitted from the sample; and a user interface device; the user interface device comprising: a function to display an output signal when the detector detects charged particles or electromagnetic waves; and a function to adjust the position of the charged particle source by means of the moving mechanism based on user operation; the moving mechanism comprising: The first function is to define the direction of travel of charged particles emitted from the aforementioned charged particle source as the Z direction, the direction orthogonal to the aforementioned Z direction as the X direction, and the direction orthogonal to the aforementioned Z direction and the aforementioned X direction as the Y direction, thereby causing the aforementioned charged particle source support member to move in the aforementioned X direction, the aforementioned Y direction, and the aforementioned Z direction; a second function, different from the aforementioned first function, is to move the aforementioned charged particle source support member in the aforementioned Z direction from outside the aforementioned vacuum chamber; the aforementioned second function shares the force in the aforementioned Z direction caused by the pressure difference between the inside and outside of the aforementioned vacuum chamber, so that the aforementioned first function is not affected by the force.

7. The charged particle beam device as described in claim 6, wherein, The aforementioned moving mechanism includes: a first function that defines the direction of travel of the charged particles emitted from the aforementioned charged particle source as the Z direction, defines the direction orthogonal to the aforementioned Z direction as the X direction, and defines the direction orthogonal to the aforementioned Z direction and the aforementioned X direction as the Y direction, thereby moving the aforementioned charged particle source support member in the aforementioned X direction, the aforementioned Y direction, and the aforementioned Z direction; and a second function that, different from the aforementioned first function, moves the aforementioned charged particle source support member from outside the aforementioned vacuum chamber toward the aforementioned Z direction.

8. The charged particle beam device as described in claim 7, wherein, The aforementioned moving mechanism includes a first moving device having the aforementioned first function and a second moving device having the aforementioned second function, wherein the aforementioned second moving device is disposed outside the aforementioned vacuum chamber.

9. The charged particle beam device as described in any one of claims 6 to 8, wherein, It also includes: a controller that outputs a position indication signal indicating the position of the aforementioned charged particle source support member; and a drive unit that drives the aforementioned moving mechanism based on the aforementioned position instruction signal.

10. A charged particle gun, characterized by comprising: a charged particle source for emitting charged particles; a vacuum chamber surrounding the charged particle source; a charged particle source support member for directly or indirectly supporting the charged particle source; a moving mechanism for moving the charged particle source support member; the charged particle source support member having a cylindrical shape with male threaded portions formed on its outer peripheral surface; the moving mechanism comprising: a rotating member having female threaded portions that engage with the male threaded portions, wherein rotation causes the charged particle source support member to move in the Z direction, i.e., the direction of travel of the charged particles emitted from the charged particle source.

11. The charged particle gun as described in claim 10, wherein, The aforementioned moving mechanism can move the aforementioned charged particle source support member in the aforementioned Z direction from outside the aforementioned vacuum chamber.

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