Digital lithography system and method of using digital lithography system

Abstract

Embodiments of this disclosure relate to a linear motor system and a digital lithography system having a linear motor system that compensates for potential parasitic forces applied to at least one station of the digital lithography system during operation. The digital lithography system includes one or more motor coils disposed between an upper and lower plate of a yoke of at least one track. Each motor coil is coupled to a mounting, which is coupled to a station. Each mounting includes one or more active compensators. During digital lithography operation, the active compensators communicate with a controller. The active compensators provide a force in the opposite direction to parasitic forces (such as vibration and other disturbances). Compensation for parasitic forces improves the quality of patterns printed by the digital lithography system.

Description

Technical Field

[0001] The embodiments of this disclosure generally relate to photolithography systems. More specifically, the embodiments of this disclosure relate to digital photolithography systems that compensate for vibrations during digital photolithography operations. Prior Technology

[0002] Photolithography is widely used in the manufacture of semiconductor devices, such as for back-end processing of semiconductor devices, and in display devices, such as liquid crystal displays (LCDs). For example, large-area substrates are frequently used in the manufacture of LCDs. LCDs (or flat panel displays) are commonly used in active matrix displays, such as computers, touch panel devices, personal digital assistants (PDAs), mobile phones, television monitors, and the like. Typically, a flat panel display includes a layer of liquid crystal material as a phase-change material at each pixel, sandwiched between two plates. When power from a power supply is applied across or through the liquid crystal material, the amount of light passing through the liquid crystal material is controlled at the pixel location, that is, selectively modulated, thereby enabling the generation of an image on the display.

[0003] Traditional digital lithography systems utilize linear motors to move the station during pattern printing. During system operation, this station movement generates parasitic forces in the motor, such as vibrations and other disturbances. It is difficult to compensate for these parasitic forces acting perpendicular to the direction of movement of the station and linear motor. These forces can lead to mura or other undesirable effects in the mask pattern.

[0004] Therefore, what is needed in this field is a linear motor system and a digital lithography system with a linear motor system. Summary of the Invention

[0005] In one embodiment, a digital lithography system is provided. The system includes one or more tracks disposed on a thick plate. Each of the one or more tracks has a yoke. The yoke includes a lower plate and an upper plate coupled to the thick plate. The system further includes one or more motor coils. Each motor coil is disposed between the lower plate and the upper plate. The system further includes one or more mounts having one or more active compensators for vibration during operation of the digital lithography system. Each mount is coupled to a corresponding motor coil of the one or more motor coils. The system further includes a station coupled to each of the one or more mounts.

[0006] In another embodiment, a digital lithography system is provided. The system includes a thick plate. The system further includes a station disposed above the thick plate. The station is configured to support a substrate. The system further includes one or more tracks disposed on the thick plate. The station is configured to move along the one or more tracks. Each of the one or more tracks has a yoke. The yoke includes a lower plate and an upper plate coupled to the thick plate. The system further includes one or more motor coils. Each motor coil is disposed between the lower plate and the upper plate. The system further includes one or more mounts having one or more active compensators for vibration during operation of the digital lithography system. Each mount is coupled to a corresponding motor coil of the one or more motor coils. The station is coupled to each of the one or more mounts.

[0007] In yet another embodiment, a method using a digital lithography system is provided. The method includes the steps of: moving a station along one or more tracks. The station is coupled to one or more mounts. Each of the one or more mounts has one or more active compensators. Each of the one or more mounts is coupled to a corresponding motor coil of one or more motor coils disposed between upper and lower plates of the one or more tracks. The upper and lower plates have arrays of magnets disposed on their inner surfaces. The method further includes the step of: measuring vibrations from the motor coils during operation of the digital lithography system by means of accelerometers disposed in each of the one or more active compensators. The method further includes the step of: actuating a moving mass disposed in each of the one or more active compensators in a direction opposite to the vibrations from the motor coils. Simple Explanation of the Diagram

[0008] To gain a more detailed understanding of the features described above in this disclosure, a more specific description of the disclosure, which has been briefly summarized above, can be obtained by referring to the embodiments, some of which are shown in the accompanying drawings. However, it should be noted that the accompanying drawings only show exemplary embodiments and should therefore not be considered as limiting its scope, and other equivalent embodiments are permissible.

[0009] Figure 1 is a perspective view of a digital lithography system according to an embodiment.

[0010] Figure 2A is a schematic perspective view of the linear motor system of the digital lithography system according to an embodiment.

[0011] Figure 2B is a schematic side view of the linear motor system of the digital lithography system according to an embodiment.

[0012] Figure 2C is a schematic side view of the active compensator according to an embodiment.

[0013] Figure 3 is a flowchart of a method using a digital lithography system according to an embodiment.

[0014] For ease of understanding, the same element symbols are used where possible to represent common elements in the drawings. It is anticipated that elements and features of one embodiment may be advantageously incorporated into other embodiments without further description. Implementation

[0015] The embodiments described herein provide a linear motor system and a digital lithography system having a linear motor system, the linear motor system compensating for potential parasitic forces applied to at least one station of the digital lithography system during operation. In one embodiment, a system is provided. The system includes one or more tracks disposed on a thick plate. Each of the one or more tracks has a yoke. The yoke includes a lower plate and an upper plate coupled to the thick plate. The system further includes one or more motor coils. Each of the motor coils is disposed between the lower plate and the upper plate. The system further includes one or more mounting members having one or more active compensators. Each mounting member is coupled to a corresponding motor coil of the one or more motor coils. The system further includes a station coupled to each of the one or more mounting members.

[0016] Figure 1 is a perspective view of a digital lithography system 100. The digital lithography system 100 includes at least one station 114 and a processing device 104. Although one station 114 is depicted in Figure 1, the digital lithography system 100 may include two or more stations 114. Station 114 is supported by one or more tracks 116 disposed on a plate 102. Substrate 120 is supported by station 114. Station 114 moves along one or more tracks 116 in the X direction, as indicated by the coordinate system shown in Figure 1. Station 114 can also move in the Y direction to process and / or index substrate 120. Station 114 is capable of independent operation and can scan substrate 120 in one direction and step in other directions. Encoder 118 is coupled to station 114 to provide information about the position of station 114 to controller 122.

[0017] An air bearing 124 is coupled to a thick plate 102. The air bearing 124 is located near the inner wall 126 of each of one or more tracks 116. The air bearing 124 facilitates the movement of the station 114. In one embodiment, which may be combined with other embodiments described herein, a position sensor 128 is disposed along the surface of the air bearing 124. The position sensor 128 detects the position of the station 114. The position sensor 128 can communicate with an encoder 118 and a controller 122 to provide the controller 122 with information about the position of the station 114. In one embodiment, which may be combined with other embodiments described herein, the position sensor 128 measures the speed of the station 114.

[0018] Controller 122 is typically designed to facilitate control and automation of the processing and compensation techniques described herein. Controller 122 may be coupled to or communicate with processing device 104, station 114, position sensor 128, multiple active compensators 212 (as shown in Figures 2A-2C), base accelerometer 218 (as shown in Figures 2A-2B), and encoder 118. Processing device 104 and encoder 118 may provide information about substrate processing and substrate alignment to controller 122. For example, processing device 104 may provide information to controller 122 to alert controller 122 that substrate processing is complete. A program (or computer instructions) readable by controller 122, which may be called an imaging program, determines which tasks can be performed on the substrate. The program includes mask pattern data and codes for monitoring and controlling processing time and substrate position. The mask pattern data corresponds to the pattern to be written to the photoresist using electromagnetic radiation.

[0019] The processing apparatus 104 includes a support 108 and a processing unit 106. The processing apparatus 104 spans one or more tracks 116 and is disposed on a thick plate 102, thereby including an opening 112 for the one or more tracks 116 and a station 114 to pass through below the processing unit 106. The processing unit 106 is supported above the thick plate 102 by the support 108. The processing unit 106 includes a plurality of image projection systems. In one embodiment, the processing unit 106 contains up to 84 image projection systems. Each image projection system is disposed within a housing 110. During a digital lithography operation, the station 114 moves in the X direction from a loading position as shown in Figure 1 to a processing position. The processing position is one or more locations below the processing unit 106. The trajectory of the station 114 from the loading position to the processing position is input to a controller 122 prior to the digital lithography operation.

[0020] Figure 2A is a schematic perspective view of the linear motor system 200 of the digital lithography system 100. Figure 2B is a schematic cross-sectional view of the linear motor system 200 of the digital lithography system 100. As shown in Figures 2A and 2B, the thick plate 102 includes one or more tracks 116 supporting at least one station 114. An air bearing 124 is coupled to the thick plate 102. The air bearing 124 is positioned adjacent to the inner wall 126 of each of the one or more tracks 116. In one embodiment that may be combined with other embodiments described herein, the station 114 includes a pair of protrusions 206. The pair of protrusions 206 are disposed adjacent to the air bearing 124 to assist the station 114 in moving along the air bearing 124. A position sensor 128 is disposed on the surface of the air bearing 124. The position sensor 128 transmits the position of the station 114 to a controller 122. In one embodiment that may be combined with other embodiments described herein, station 114 is an XY station, that is, station 114 is operable to move in the X and Y directions. In another embodiment that may be combined with other embodiments described herein, station 114 is an XYZ station, that is, station 114 is operable to move in the X, Y, and Z directions.

[0021] Each of one or more tracks 116 includes a yoke 205. The yoke 205 includes a lower plate 209 and an upper plate 207. The lower plate 209 is coupled to the thick plate 102. The lower plate 209 and the upper plate 207 each include an array of magnets 202 on their inner surfaces 203. In one embodiment that can be combined with other embodiments described herein, the yoke 205 is a metallic material. For example, the yoke 205 is steel. Each track 116 includes one or more motor coils 208 disposed between the lower plate 209 and the upper plate 207 of the yoke 205. In one embodiment that can be combined with other embodiments described herein, the one or more motor coils 208 are cast from epoxy resin. The one or more motor coils 208 are capable of linear movement along the array of magnets 202. The one or more motor coils 208 move due to the magnetic force generated by the array of magnets 202 of the lower plate 209 and the upper plate 207 of the yoke 205.

[0022] During a digital lithography operation using the digital lithography system 100, one or more motor coils 208 move along an array of magnets 202. Each motor coil 208 generates parasitic forces, such as vibrations and other disturbances, which propagate throughout the digital lithography system 100. When printing patterns, vibrations can cause mura and edge roughness. Compensating for the parasitic forces propagating in a direction perpendicular to the direction of movement of the one or more motor coils 208 can improve the quality of the pattern. To compensate for the parasitic forces in the digital lithography system 100, one or more motor coils 208 are each coupled to a mount 210, wherein a plurality of active compensators 212 are coupled to each mount 210.

[0023] One or more mounting pieces 210 are further coupled to station 114. One or more motor coils 208 move along the array of magnets 202, and station 114 coupled to one or more mounting pieces 210 will also move. Each of the one or more mounting pieces 210 includes a plurality of active compensators 212 disposed thereon. In some embodiments, station 114 may be coupled to one of the plurality of active compensators 212. Although three active compensators 212 are shown on the mounting piece 210 in Figures 2A and 2B, the mounting piece 210 is not limited to three active compensators 212. Each of the plurality of active compensators 212 is operable to compensate for vibration in one direction. For example, a first active compensator 212a compensates for vibration in the X direction, a second active compensator 212b compensates for vibration in the Y direction, and a third active compensator 212c compensates for vibration in the Z direction.

[0024] The thick plate 102 includes a base accelerometer 218. The base accelerometer 218 is coupled to the thick plate 102. The base accelerometer 218 measures the acceleration of the thick plate 102. For example, the base accelerometer 218 can detect and measure the displacement 102 of the thick plate, and thus detect and measure the displacement of the entire digital lithography system 100. The base accelerometer 218 communicates with a controller 122. The base accelerometer 218 can transmit the measured values ​​to the controller 122.

[0025] Although four motor coils 208 are shown in Figure 2A, each of the one or more tracks 116 may retain one or more motor coils 208. Each of the one or more motor coils 208 includes a plurality of active compensators 212 coupled to a corresponding mount 210 of one or more mounts 210. In one embodiment that may be combined with other embodiments described herein, each of the one or more tracks 116 includes at least two motor coils 208. In another embodiment that may be combined with other embodiments described herein, each of the one or more tracks 116 includes one motor coil 208. In yet another embodiment that may be combined with other embodiments described herein, a track 116 is disposed on a thick plate 102 to support a station 114.

[0026] Figure 2C is a schematic side view of the active compensator 212. The active compensator 212 includes an accelerometer 220, a moving mass 222, and a voice coil 224. The active compensator 212 is coupled to one or more mounting members 210. In one embodiment that may be combined with other embodiments described herein, one or more active compensators 212 may be coupled to each of the one or more mounting members 210. Each of the one or more active compensators 212 communicates with a controller 122.

[0027] An accelerometer 220 is disposed in the active compensator 212. The accelerometer 220 is a sensor operable to detect acceleration as the motor coil 208 moves along one or more tracks 116. In one embodiment, which may be combined with other embodiments described herein, the accelerometer 220 communicates with a controller 122 to transmit the acceleration of the motor coil 208 to the controller 122. Depending on the position of the active compensator 212, the accelerometer 220 can measure the acceleration of the motor coil 208 in the X, Y, and Z directions.

[0028] The active compensator 212 includes a moving mass 222 to generate a force. The moving mass 222 can generate a force in the opposite direction to vibrations and other disturbances. For example, based on measurements from accelerometer 220, the moving mass 222 will generate a force and accelerate in the opposite direction to vibrations or other disturbances to counteract them. In one embodiment that may be combined with other embodiments described herein, a plurality of active compensators 212 may be used to compensate for vibrations and other disturbances in multiple directions. For example, one or more active compensators 212 may be positioned to compensate for vibrations in the X, Y, and Z directions as indicated by the coordinate system shown in Figures 2A and 2B.

[0029] Furthermore, a position sensor 128 disposed along the surface of the air bearing 124 transmits the positions of one or more motor coils 208 and station 114 to the controller 122. In conjunction, the acceleration of one or more motor coils 208, the position of one or more motor coils 208, and the trajectory of station 114 are transmitted to the controller 122. The controller 122 communicates with a voice coil 224. The controller 122 receives the acceleration of one or more motor coils, the position of one or more motor coils 208, and the trajectory of station 114, and communicates with the voice coil 224. The voice coil 224 is operable to actuate a moving mass 222 in a desired direction. The moving mass 222 counteracts parasitic forces, such as vibrations and other disturbances, of the digital lithography system 100 by providing force in the opposite direction to vibrations and other disturbances.

[0030] In one embodiment that can be combined with other embodiments described herein, the active compensator 212 may be filtered so that active compensation will not occur, while other active compensators 212 may compensate for parasitic forces. For example, a first active compensator 212a (shown in Figures 2A and 2B) operable to compensate in the X direction and a second active compensator 212b (shown in Figures 2A and 2B) operable to compensate in the Y direction may be filtered by the controller 122. Thus, a third active compensator 212c (shown in Figures 2A and 2B) will only compensate for vibrations in the Z direction. The active compensators 212 can provide force in any desired direction while filtering acceleration measurements in undesired directions. Each active compensator 212 communicates with the controller 122. Furthermore, each accelerometer 220 communicates with the controller 122 and each voice coil 224 communicates with the controller 122.

[0031] Figure 3 is a flowchart of method 300 using a digital lithography system 100. A controller 122 is operable to facilitate the operation of method 300. At operation 301, station 114 moves along one or more tracks 116. Station 114 is coupled to one or more mounts 210. Each of the one or more mounts 210 includes one or more active compensators 212. Each of the one or more mounts 210 is coupled to a corresponding motor coil 208 disposed between an upper plate 207 and a lower plate 209 of the one or more tracks 116. The upper plate 207 and the lower plate 209 include an array of magnets 202 disposed on their inner surfaces 203.

[0032] At operation 302, vibrations from the motor coil 208 are measured during operation of the digital lithography system 100. The vibrations are measured using accelerometers 218 disposed in each active compensator 212. Depending on the position of the active compensator 212, accelerometers 220 can measure the acceleration of the motor coil 208 in the X, Y, and Z directions. In other embodiments, the position of one or more motor coils 208 and the trajectory of station 114 are also measured. A position sensor 128 disposed along the surface of the air bearing 124 transmits the position of one or more motor coils 208 and station 114 to controller 122. Prior to the digital lithography operation, the trajectory of station 114 from the loading position to the processing position is input to controller 122.

[0033] At operation 303, a moving mass 222 disposed in each active compensator 212 is actuated. The moving mass 222 is actuated in the direction opposite to the vibration from the motor coil 208. Controller 122 receives the acceleration of one or more motor coils 208 and communicates with voice coil 224. Voice coil 224 is operable to actuate the moving mass 222 in the desired direction. Controller 122 also receives the position of one or more motor coils 208 and the trajectory of station 114 and communicates with voice coil 224. The moving mass 222 counteracts parasitic forces (such as vibration and other disturbances) of the digital lithography system 100 by providing force in the direction opposite to vibration and other disturbances.

[0034] In summary, embodiments of this disclosure relate to a digital lithography system that compensates for vibrations during digital lithography operations. The digital lithography system includes one or more motor coils disposed between an upper and lower plate of a yoke of at least one track. Each motor coil is coupled to a mounting, which is coupled to a station. Each mounting includes one or more active compensators. During digital lithography operations, the active compensators communicate with a controller. The active compensators provide a force in the opposite direction to parasitic forces (such as vibrations and other disturbances). Compensation for vibrations and other disturbances improves the quality of the patterns printed by the digital lithography system.

[0035] While the foregoing contains examples of this disclosure, other and further examples of this disclosure may be designed without departing from its essential scope, and the scope thereof is determined by the following claims.

[0036] 100: Digital Lithography System 102:thick plate 104: Processing equipment 106: Processing Unit 108: Support component 110: Outer shell 112: Opening 114: Station 116: Track 118: Encoder 120:Substrate 122: Controller 124: Air bearing 126: Inner wall 128: Position Sensor 200: Linear Motor System 202: Magnet 203: Inner surface 205: Yoke 206: Protrusion 207:On the board 208: Motor coil 209: Lower board 210: Installation components 212: Active compensator 212a: First Active Compensator 212b: Second Active Compensator 212c: Third Active Compensator 218: Basic Accelerometer / Accelerometer 220: Accelerometer 222: Moving Mass 224: Voice Coil 300: Method 301: Operation 302: Operation 303: Operation

[0037] Domestic storage information (please note in order of storage institution, date, and number) none Overseas storage information (please note in the order of storage country, institution, date, and number) none

Claims

1. A digital lithography system comprising: one or more tracks disposed on a thick plate, each of the one or more tracks having a yoke, the yoke comprising: A lower plate coupled to the thick plate; and an upper plate; one or more motor coils, each of which is disposed between the lower plate and the upper plate; one or more mounting members having one or more active compensators for multiple vibrations during operation of the digital lithography system, each of the one or more mounting members being coupled to a corresponding motor coil of the one or more motor coils, and the one or more active compensators including one or more first active compensators configured to compensate for vibrations in a first direction, one or more second active compensators configured to compensate for vibrations in a second direction, and one or more third active compensators configured to compensate for vibrations in a third direction, wherein the first direction, the second direction, and the third direction are perpendicular to each other; and a station coupled to each of the one or more mounting members, the station including a pair of protrusions disposed adjacent to an air bearing disposed on the thick plate below the station, wherein each protrusion of the pair of protrusions is disposed on an opposite side of the air bearing.

2. The digital lithography system as claimed in claim 1 further includes a position sensor disposed on the air bearing, the position sensor being operable to measure the position of the station and the one or more motor coils.

3. The digital lithography system as described in claim 2 further includes a controller that communicates with the position sensor.

4. The digital lithography system as claimed in claim 1, wherein each of the one or more active compensators comprises: One accelerometer; One moving mass; and one voice coil.

5. The digital lithography system as described in claim 1, further comprising a controller that communicates with each of the one or more active compensators.

6. The digital lithography system as described in claim 1 further includes a base accelerometer that communicates with a controller.

7. The digital lithography system as described in claim 1, wherein the station is configured to support a substrate.

8. The digital lithography system as described in claim 1, wherein the station is configured to move along one or more tracks.

9. The digital lithography system as claimed in claim 1, further comprising a processing device having: a support member coupled to the plate, the support member having an opening below which the station passes; and a plurality of image projection systems disposed above the station.

10. The digital lithography system as claimed in claim 1, wherein the station is operable to step or scan in a digital lithography operation.

11. The digital lithography system as claimed in claim 1, wherein each of the lower plate and the upper plate has an inner surface having an array of a plurality of magnets coupled thereto.

12. A digital lithography system comprising: a thick plate; a station disposed above the thick plate, the station configured to support a substrate, the station including a pair of protrusions disposed adjacent to an air bearing disposed on the thick plate, the air bearing located below the station, wherein each protrusion of the pair of protrusions is disposed on an opposite side of the air bearing; one or more tracks disposed on the thick plate, the station configured to move along the one or more tracks, each of the one or more tracks having a yoke comprising: A lower plate coupled to the thick plate; and an upper plate; one or more motor coils, each of which is disposed between the lower plate and the upper plate; and one or more mountings having one or more active compensators for multiple vibrations during operation of the digital lithography system, each of the one or more mountings being coupled to a corresponding motor coil of the one or more motor coils, the station being coupled to each of the one or more mountings, and the one or more active compensators including one or more first active compensators configured to compensate for vibrations in a first direction, one or more second active compensators configured to compensate for vibrations in a second direction, and one or more third active compensators configured to compensate for vibrations in a third direction, wherein the first direction, the second direction, and the third direction are perpendicular to each other.

13. The digital lithography system as claimed in claim 12 further includes a position sensor disposed on the air bearing, the position sensor being operable to measure the position of the station and the one or more motor coils.

14. The digital lithography system as claimed in claim 12, wherein each of the lower plate and the upper plate has an inner surface having an array of a plurality of magnets coupled thereto.

15. The digital lithography system as claimed in claim 12, wherein each of the one or more active compensators comprises: One accelerometer; One moving mass; and one voice coil.

16. A method using a digital lithography system, comprising the steps of: moving a station along one or more tracks disposed on a thick plate, the station being coupled to one or more mounts and including a pair of protrusions disposed adjacent to an air bearing disposed on the thick plate below the station, wherein each of the pair of protrusions is disposed on an opposite side of the air bearing, each of the one or more mounts having one or more active compensators, each of the one or more mounts being coupled to a corresponding motor coil of one or more motor coils disposed between an upper plate and a lower plate of the one or more tracks, the upper plate and the lower plate having an array of a plurality of magnets disposed on an inner surface thereon, and the one or more active compensators including one or more first active compensators configured to compensate for vibrations in a first direction, one or more second active compensators configured to compensate for vibrations in a second direction, and one or more third active compensators configured to compensate for vibrations in a third direction, wherein the first direction, the second direction, and the third direction are perpendicular to each other; During operation of the digital lithography system, multiple vibrations from the motor coils are measured by an accelerometer disposed in each of the one or more active compensators; and a moving mass disposed in each of the one or more active compensators is actuated in a direction opposite to the vibrations from the motor coils.

17. The method of using a digital lithography system as described in claim 16, wherein the station is disposed below a processing device having: a support member coupled to the plate having an opening below the station; and a plurality of image projection systems disposed above the station.

Images