Nozzle cleaning device for developing equipment and developing equipment system

Abstract

A nozzle cleaning device for a developing equipment includes a substrate, a tank, and a through-hole. The substrate has a top surface and a bottom surface, with a first liquid inlet and a second liquid inlet disposed on the bottom surface. The through-hole is disposed in the substrate and adjacent to the top surface, and includes a plurality of through holes. The tank is disposed in the substrate and away from the top surface. Liquid from the first and second liquid inlets flows into the tank through the plurality of through holes. This allows the developing nozzles to be automatically cleaned by the nozzle cleaning device, preventing contaminant accumulation in the developing nozzles and thereby improving product process yield.

Claims

1. A nozzle cleaning device for a developing equipment, comprising: A substrate having a top surface and a bottom surface, the substrate including a first liquid inlet and a second liquid inlet, the first liquid inlet and the second liquid inlet being disposed on the bottom surface; a through-hole portion disposed in the substrate and adjacent to the top surface, the through-hole portion including a plurality of through holes; a tank disposed in the substrate, connected to the through-hole portion and located away from the top surface; wherein liquid from the first liquid inlet and the second liquid inlet flows into the tank through the plurality of through holes.

2. The nozzle cleaning apparatus as claimed in claim 1, wherein, The base includes an air inlet that is connected to the tank.

3. The nozzle cleaning apparatus as claimed in claim 1, wherein, The base includes a row of outlets disposed on the bottom surface and connected to the tank.

4. The nozzle cleaning apparatus as claimed in claim 1, wherein, Multiple through holes are located on the side of the through hole portion adjacent to the top surface and away from the groove.

5. The nozzle cleaning apparatus as claimed in claim 1, wherein, Multiple through holes are arranged along the length of the substrate.

6. The nozzle cleaning apparatus as claimed in claim 1, wherein, The groove further includes a limiting portion connected to the through hole portion and protruding from the through hole portion along the width direction of the base.

7. The nozzle cleaning apparatus as claimed in claim 1, further comprising: A liquid channel is disposed in the substrate and communicates with the first liquid inlet, the second liquid inlet, and a plurality of through holes.

8. The nozzle cleaning apparatus as claimed in claim 7, wherein, The substrate includes an air inlet that is not connected to the liquid channel or the through hole.

9. The nozzle cleaning apparatus as claimed in claim 7, further comprising: Multiple through-hole conduits, each of which is connected to a corresponding through-hole and liquid channel.

10. The nozzle cleaning apparatus as claimed in claim 7, further comprising: A first guide tube is disposed in the substrate and communicates with the first liquid inlet or the second liquid inlet; And a second guide tube, disposed in the substrate, communicating with the first guide tube and the liquid channel.

11. The nozzle cleaning apparatus as claimed in claim 10, further comprising: Multiple through-hole conduits, each of which is connected to a corresponding through-hole and liquid channel, wherein the liquid from the liquid channel flows into the tank via the multiple through-hole conduits.

12. A developing apparatus system comprising the nozzle cleaning device as described in claim 1, wherein, The first liquid inlet and the second liquid inlet are individually connected to a first liquid inlet pipe and a second liquid inlet pipe.

13. The developing apparatus system as claimed in claim 12, wherein, The first liquid inlet pipe and the second liquid inlet pipe are two-part pipes.

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