Physical vapor deposition equipment and its magnetron adjustment mechanism

Abstract

This invention relates to a physical vapor deposition (PVD) apparatus and its magnetron adjustment mechanism, comprising: a mounting base with a fixed rotating shaft, wherein an eccentric portion of the magnetron is rotatably connected to the rotating shaft, allowing the magnetron to rotate around the rotating shaft and change its relative position to the mounting base; a revolution shaft, fixedly connected to the mounting base and capable of being driven to rotate, allowing the mounting base and the magnetron to rotate synchronously with the revolution shaft; a traction rope connected to the magnetron, capable of pulling the magnetron to rotate around the rotating shaft, causing the magnetron to move closer to or away from the center region of the target material; and an elastic reset element connected between the magnetron and the mounting base, used to provide an elastic reset force opposite to the direction of the traction rope's tension after the magnetron deviates from its initial position. This invention enables continuous adjustment of the magnetron position, thereby meeting the requirements of etching and thin film deposition processes, and features a simple mechanical structure and convenient maintenance.

Claims

1. A magnetron adjustment mechanism for adjusting the position of a magnetron, characterized in that it comprises: A mounting base is fixedly provided with a rotation axis, and the eccentric part of the magnetron is rotatably connected to the rotation axis. The magnetron can rotate around the rotation axis to change its relative position with the mounting base. A revolution axis is fixedly connected to the mounting base and can be driven to rotate. The mounting base and the magnetron can rotate synchronously with the revolution axis. A traction rope is connected to the magnetron and can pull the magnetron to rotate around the rotation axis, so that the magnetron moves closer to or away from the center of the target material. An elastic reset member is connected between the magnetron and the mounting base to provide an elastic reset force opposite to the direction of the traction rope tension after the magnetron deviates from its initial position.

2. The magnetron adjustment mechanism as described in claim 1, further comprising: A rotary motor, located at the top of the revolution shaft and fixedly connected to the revolution shaft, is used to provide the driving force for the rotation of the revolution shaft.

3. The magnetron adjustment mechanism as described in claim 2, wherein, It also includes: a lifting motor and a lifting rotating shaft; the top end of the lifting rotating shaft is connected to the lifting motor via a bearing, the bottom end is connected to the traction rope, and it is axially movable to the revolution shaft; the lifting rotating shaft is driven by the lifting motor to move up and down, and rotates synchronously with the revolution shaft.

4. The magnetron adjustment mechanism as described in claim 3, wherein, It also includes a guide wheel assembly, which is located below the revolution axis and between the magnetron. The end of the traction rope that is not connected to the lifting and rotating shaft extends downward in a vertical direction, and after being changed to a horizontal direction by the guide wheel assembly, it is fixedly connected to the position of the magnetron that is not connected to the rotation axis.

5. The magnetron adjustment mechanism as described in claim 3, wherein, The traction rope passes through the axis of the revolution shaft.

6. The magnetron adjustment mechanism as described in claim 3, wherein, The bottom end of the lifting and rotating shaft extends into the interior of the revolution shaft and is axially movable to the inner surface of the revolution shaft.

7. The magnetron adjustment mechanism as described in claim 6, wherein, The outer surface of the bottom end of the lifting and rotating shaft is connected to the inner surface of the revolution shaft by a sealing ring.

8. The magnetron adjustment mechanism as described in claim 6, wherein, The outer surface of the bottom end of the lifting and rotating shaft is engaged with the inner surface of the revolution shaft.

9. The magnetron adjustment mechanism as described in claim 1, wherein, The mounting base is an elliptical plate, the revolution axis is located on the upper side of the mounting base and close to the center of the target material, and the magnetron is located on the lower side of the mounting base and away from the center of the target material.

10. The magnetron adjustment mechanism as described in claim 1, wherein, It also includes: a connecting component, wherein the magnetron is fixedly connected to the connecting component, and the connecting component is provided with a mounting hole, which is rotatably connected to the rotation shaft.

11. The magnetron adjustment mechanism as described in claim 10, wherein, The projection of the mounting hole is located at the off-center part of the magnetron.

12. The magnetron adjustment mechanism as described in claim 3, wherein, It also includes a control unit, which is signal-connected to both the rotary motor and the lifting motor, for controlling the start and stop of the rotary motor and / or the lifting motor.

13. A physical vapor deposition apparatus, characterized in that it comprises: cavity; A target material disposed within a cavity; a magnetron adjustment mechanism as described in any one of claims 1 to 12, disposed within the cavity and above the target material; wherein the magnetron can be rotated about its rotation axis by being pulled by a traction rope, thereby moving the magnetron closer to or further away from the central region of the target material.

14. The physical vapor deposition apparatus as described in claim 13, further comprising: An auxiliary magnetron is fixedly connected to the mounting base of the magnetron adjustment mechanism and is located on opposite sides of the revolution axis.

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