Inclined optical path laser processing device

TWM688500UActive Publication Date: 2026-10-11刘松哲
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW115205575
Authority / Receiving Office
TW · TW
Patent Type
Utility models
Current Assignee / Owner
Filing Date
2026-06-17
Publication Date
2026-10-11
Estimated Expiration
2036-06-16

Smart Images

  • Figure TWG2TB001916091_001
    Figure TWG2TB001916091_001
  • Figure TWG2TB001916091_002
    Figure TWG2TB001916091_002
  • Figure TWG2TB001916091_003
    Figure TWG2TB001916091_003
Patent Text Reader

Abstract

This disclosure provides a tilted optical path laser processing apparatus, comprising: a laser light source unit for generating a laser beam; an optical path adjustment mechanism disposed in the optical path of the laser light source unit for adjusting a tilt angle relative to the normal direction of a glass plate, wherein one incident axis of the laser beam is tilted; a work platform unit comprising a stage for supporting the glass plate; and a control unit electrically connected to the laser light source unit, the optical path adjustment mechanism, and the work platform unit for coordinating and controlling the corresponding operations to ensure that the tilt angle is consistent with a target bevel angle, thereby preventing the laser beam from directly entering the bevel area, thus achieving processing quality with zero edge chipping and zero micro-cracks.
Need to check novelty before this filing date? Find Prior Art

Claims

1. A tilted optical path laser processing apparatus, comprising: a laser light source unit for generating a laser beam; an optical path adjustment mechanism disposed in the optical path of the laser light source unit for adjusting a tilt angle relative to the normal direction of a glass plate along an incident axis of the laser beam; a work platform unit including a stage for supporting the glass plate; and a control unit electrically connected to the laser light source unit, the optical path adjustment mechanism, and the work platform unit for coordinating and controlling the corresponding operations to ensure that the tilt angle is consistent with a target bevel angle.

2. The tilted optical path laser processing apparatus as described in claim 1, wherein, The optical path adjustment mechanism includes a galvanometer scanning system, which has at least one mirror and a corresponding servo driver.

3. The tilted optical path laser processing apparatus as described in claim 1, wherein, The optical path adjustment mechanism includes a precision tilting platform with at least two degrees of freedom for angle adjustment.

4. The tilted optical path laser processing apparatus as described in claim 1, wherein, The laser light source unit is a femtosecond laser light source with a wavelength in the range of 800 nanometers to 1100 nanometers. The working platform unit further includes a vacuum suction device for fixing the glass plate on the platform. The control unit includes a light refraction compensation algorithm module for calculating and compensating for the path offset caused when the laser beam penetrates the surface of the glass plate.