CVD reactor for processes between finely dispersed material and gas / vapor

Abstract

CVD reactor for processes between finely dispersed material and gas / vapor comprises a cylindrical reactor chamber (1) limited by end flanges (2) with the possibility of hermetically closing by vacuum doors (3) and flange (4), inside of which a reaction chamber (5) of rectangular cross-section is mounted on guides (19), connected to the flange (4), in which flat heaters (8) with trays (7) for placing the graphite-catalytic mixture are installed, a channel (16) for removing the vapor-gas mixture is connected by a pipeline (20) to water condensers (21). Wherein, each heater (8) is equipped with two thermocouples (9) and is connected to an autonomous power supply line (30), and the reaction chamber (5) is closed on the loading side by a perforated flange (15). In addition, the CVD reactor is equipped with a looped phenylsilane circulation system, which includes: a phenylsilane evaporator (12) with a cartridge heater (13), an argon supply channel (23), a channel (14) for supplying the vapor-gas mixture to the reaction chamber (5), water condensers (21), a condensate collection chamber (22), and a pump (25) for returning the condensate to the phenylsilane evaporator (12).