Reaction chamber base plate

USD1059311SActive Publication Date: 2025-01-28ASM IP HLDG BV
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Patent Information

Application Number
US29/803622
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2021-08-13
Publication Date
2025-01-28
Estimated Expiration
2040-01-28

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  • Figure USD1059311-D00000_ABST
    Figure USD1059311-D00000_ABST
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Description

[0001] FIG. 1 is a front perspective view of the reaction chamber base plate, showing our new design;

[0002] FIG. 2 is a back perspective view thereof;

[0003] FIG. 3 is a front view thereof;

[0004] FIG. 4 is a back view thereof;

[0005] FIG. 5 is a right side view thereof;

[0006] FIG. 6 is a left side view thereof;

[0007] FIG. 7 is a top view thereof; and,

[0008] FIG. 8 is a bottom view thereof.

[0009] The broken lines in the figure drawings are included to show portions of the reaction chamber base plate that form no part of the claimed design.

Claims

The ornamental design for a reaction chamber base plate as shown and described.

Citation Information

Patent Citations

  • Liftable ceramic baffle plate structure

    CN104851772A

  • A wafer reaction chamber structure and reaction equipment

    CN218826994U

  • Reaction chamber lining

    US20210398781A1

  • Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions

    US6833024B2

  • Method and apparatus for batch processing of wafers in a furnace

    US6835039B2

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