Baffle for anti-rotation process kit for substrate processing chamber
Patent Information
- Application Number
- US29/833394
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2022-04-04
- Publication Date
- 2025-03-11
- Estimated Expiration
- 2040-03-11
Smart Images

Figure USD1066275-D00000_ABST
Description
[0001] FIG. 1 is a top, front, right side isometric view of a first embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.
[0002] FIG. 2 is a bottom, left side, back isometric view thereof.
[0003] FIG. 3 is a top plan view thereof.
[0004] FIG. 4 is a bottom plan view thereof.
[0005] FIG. 5 is a front elevation view thereof.
[0006] FIG. 6 is a back elevation view thereof.
[0007] FIG. 7 is a left side elevation view thereof.
[0008] FIG. 8 is a right side elevation view thereof.
[0009] FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3.
[0010] FIG. 10 is a top, front, right side isometric view of a second embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.
[0011] FIG. 11 is a bottom, left side, back isometric view thereof.
[0012] FIG. 12 is a top plan view thereof.
[0013] FIG. 13 is a bottom plan view thereof.
[0014] FIG. 14 is a front elevation view thereof.
[0015] FIG. 15 is a back elevation view thereof.
[0016] FIG. 16 is a left side elevation view thereof.
[0017] FIG. 17 is a right side elevation view thereof; and,
[0018] FIG. 18 is an enlarged cross sectional view taken along line 18-18 in FIG. 12.
[0019] The dashed lines in FIGS. 1-13 represent unclaimed environment and form no part of the claimed design.
Claims
The ornamental design for a baffle for anti-rotation process kit for substrate processing chamber, as shown and described.
Citation Information
Patent Citations
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