Baffle for anti-rotation process kit for substrate processing chamber

USD1066275SActive Publication Date: 2025-03-11APPLIED MATERIALS INC

Patent Information

Application Number
US29/833394
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2022-04-04
Publication Date
2025-03-11
Estimated Expiration
2040-03-11

Smart Images

  • Figure USD1066275-D00000_ABST
    Figure USD1066275-D00000_ABST
Patent Text Reader
Need to check novelty before this filing date? Find Prior Art

Description

[0001] FIG. 1 is a top, front, right side isometric view of a first embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.

[0002] FIG. 2 is a bottom, left side, back isometric view thereof.

[0003] FIG. 3 is a top plan view thereof.

[0004] FIG. 4 is a bottom plan view thereof.

[0005] FIG. 5 is a front elevation view thereof.

[0006] FIG. 6 is a back elevation view thereof.

[0007] FIG. 7 is a left side elevation view thereof.

[0008] FIG. 8 is a right side elevation view thereof.

[0009] FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3.

[0010] FIG. 10 is a top, front, right side isometric view of a second embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.

[0011] FIG. 11 is a bottom, left side, back isometric view thereof.

[0012] FIG. 12 is a top plan view thereof.

[0013] FIG. 13 is a bottom plan view thereof.

[0014] FIG. 14 is a front elevation view thereof.

[0015] FIG. 15 is a back elevation view thereof.

[0016] FIG. 16 is a left side elevation view thereof.

[0017] FIG. 17 is a right side elevation view thereof; and,

[0018] FIG. 18 is an enlarged cross sectional view taken along line 18-18 in FIG. 12.

[0019] The dashed lines in FIGS. 1-13 represent unclaimed environment and form no part of the claimed design.

Claims

The ornamental design for a baffle for anti-rotation process kit for substrate processing chamber, as shown and described.

Citation Information

Patent Citations

  • Edge ring and extension ring combination

    CN307054816S

  • Edge Ring

    JP1644757S

  • Shield for blasting

    KR300972575S

  • Semiconductor Process Module Edge Ring Having Screw Inserts

    KR301093230S

  • Deposition ring for a substrate processing chamber

    TWD215402S

Cited By

  • Purge ring for reduced substrate backside deposition

    US12698561B2

  • Vertical flow control ring

    USD1100867S

  • CMP (chemical mechanical planarization) retaining ring

    USD1103131S

  • CMP (chemical mechanical planarization) retaining ring

    USD1103949S

  • Electrode cover for a plasma processing apparatus

    USD1108379S