Process chamber pumping liner
Patent Information
- Application Number
- US29/867553
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2022-10-28
- Publication Date
- 2025-03-11
- Estimated Expiration
- 2040-03-11
Smart Images
Figure USD1066440-D00000_ABST
Description
[0001] FIG. 1 is a top front right side view of a process chamber pumping liner according to our design.
[0002] FIG. 2 is a top rear right side view thereof.
[0003] FIG. 3 is a top rear left side view thereof.
[0004] FIG. 4 is a top front left side view thereof.
[0005] FIG. 5 is a bottom front right side view thereof.
[0006] FIG. 6 is a bottom rear right side view thereof.
[0007] FIG. 7 is a bottom rear left side view thereof.
[0008] FIG. 8 is a bottom front left side view thereof.
[0009] FIG. 9 is a front view thereof.
[0010] FIG. 10 is a right side view thereof.
[0011] FIG. 11 is a left side view thereof.
[0012] FIG. 12 is a rear view thereof.
[0013] FIG. 13 is a top view thereof.
[0014] FIG. 14 is a bottom view thereof.
[0015] FIG. 15 is a cross-sectional view taken along the line 15-15 in FIG. 9.
[0016] FIG. 16 is a cross-sectional view taken along the line 16-16 in FIG. 9.
[0017] FIG. 17 is a cross-sectional view taken along the line 17-17 in FIG. 9; and,
[0018] FIG. 18 is a cross-sectional view taken along the line 18-18 in FIG. 9.
Claims
The ornamental design for a process chamber pumping liner as shown and described.
Citation Information
Patent Citations
Process shield for a substrate processing chamber
TWD215398S
Liner assembly for chemical vapor deposition chamber
US8980005B2
Process kit design for deposition chamber
US20050150452A1
Band shield for substrate processing chamber
US20070113783A1
Liner for epi chamber
US20160068997A1
Cited By
Purge ring for reduced substrate backside deposition
US12698561B2
Shield for plasma chambers
USD1121578S