Furnace for substrate processing apparatus
Patent Information
- Application Number
- US29/849023
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Priority Date
- 2022-03-15
- Filing Date
- 2022-08-08
- Publication Date
- 2025-04-15
- Estimated Expiration
- 2040-04-15
Smart Images
Figure USD1070797-D00000_ABST
Description
[0001] FIG. 1 is a front, top and left side perspective view of a furnace for substrate processing apparatus showing our new design;
[0002] FIG. 2 is a front elevational view thereof;
[0003] FIG. 3 is a rear elevational view thereof;
[0004] FIG. 4 is a right side elevational view thereof;
[0005] FIG. 5 is a left side elevational view thereof;
[0006] FIG. 6 is a top plan view thereof;
[0007] FIG. 7 is a bottom plan view thereof; and,
[0008] FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 6.
[0009] The broken lines are included for the purpose of illustrating portions of the article that form no part of the claimed design.
Claims
The ornamental design for a furnace for substrate processing apparatus, as shown and described.
Citation Information
Patent Citations
Heater of substrate processing apparatus
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Furnace opening structure, substrate processing apparatus and method of manufacturing semiconductor device
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Vertical furnace for the treatment of semiconductor substrates
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Processing tube for use in a semiconductor wafer heat processing apparatus
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