Baffle for substrate processing system

USD1073758SActive Publication Date: 2025-05-06LAM RES CORP

Patent Information

Application Number
US29/856399
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2022-10-13
Publication Date
2025-05-06
Estimated Expiration
2040-05-06

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    Figure USD1073758-D00000_ABST
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Description

[0001] FIG. 1 is a top view of a baffle for a substrate processing system;

[0002] FIG. 2 is a bottom view of the baffle shown in FIG. 1;

[0003] FIG. 3 is a front view of the baffle shown in FIG. 1;

[0004] FIG. 4 is a back view of the baffle shown in FIG. 1;

[0005] FIG. 5 is a right-side view of the baffle shown in FIG. 1;

[0006] FIG. 6 is a left-side view of the baffle shown in FIG. 1;

[0007] FIG. 7 is a top perspective view of the baffle shown in FIG. 1; and,

[0008] FIG. 8 is a bottom perspective view of the baffle shown in FIG. 1.

Claims

The ornamental design for a baffle for a substrate processing system as shown and described.

Citation Information

Patent Citations

  • Plasma treatment device for achieving uniform exhaust

    CN105789014A

  • Edge Ring

    JP1644760S

  • Edge Ring

    JP1652299S

  • Ion shielding plate for plasma treatment equipment

    TWD212326S

  • Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors

    US20150041061A1

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