Baffle for substrate processing system
USD1073758SActive Publication Date: 2025-05-06LAM RES CORP
Patent Information
- Application Number
- US29/856399
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2022-10-13
- Publication Date
- 2025-05-06
- Estimated Expiration
- 2040-05-06
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Figure USD1073758-D00000_ABST
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Description
[0001] FIG. 1 is a top view of a baffle for a substrate processing system;
[0002] FIG. 2 is a bottom view of the baffle shown in FIG. 1;
[0003] FIG. 3 is a front view of the baffle shown in FIG. 1;
[0004] FIG. 4 is a back view of the baffle shown in FIG. 1;
[0005] FIG. 5 is a right-side view of the baffle shown in FIG. 1;
[0006] FIG. 6 is a left-side view of the baffle shown in FIG. 1;
[0007] FIG. 7 is a top perspective view of the baffle shown in FIG. 1; and,
[0008] FIG. 8 is a bottom perspective view of the baffle shown in FIG. 1.
Claims
The ornamental design for a baffle for a substrate processing system as shown and described.
Citation Information
Patent Citations
Plasma treatment device for achieving uniform exhaust
CN105789014A
Edge Ring
JP1644760S
Edge Ring
JP1652299S
Ion shielding plate for plasma treatment equipment
TWD212326S
Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors
US20150041061A1
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