Face mask

USD1080072SActive Publication Date: 2025-06-17CHONGQING MAIYI TECH CO LTD

Patent Information

Application Number
US29/946131
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2024-06-06
Publication Date
2025-06-17
Estimated Expiration
2040-06-17

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  • Figure USD1080072-D00000_ABST
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Description

[0001] FIG. 1 is a front, right and top perspective view of a face mask showing our new design;

[0002] FIG. 2 is a rear, left side, and bottom perspective view thereof;

[0003] FIG. 3 is a front elevation view thereof;

[0004] FIG. 4 is a rear elevation view thereof;

[0005] FIG. 5 is a left side elevation view thereof;

[0006] FIG. 6 is a right side elevation view thereof;

[0007] FIG. 7 is a top plan view thereof; and,

[0008] FIG. 8 is a bottom plan view thereof.

[0009] The broken lines that form a closed planar shape in the central area shown in FIG. 8 are only for the purpose of illustrating a neck opening in the face mask and do not form any part of the claimed design; all other broken lines illustrate stitching and form part of the claimed design.

Claims

The ornamental design for a face mask, as shown and described.

Citation Information

Patent Citations

  • Face-mask neck sash

    US20050155136A1

  • Convertible face and head covering

    US20060085881A1

  • Magnetic mask

    US20170196280A1

  • Sensorized garments

    US20200245932A1

  • Head covering

    US6272690B1

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