Process chamber manifold
Patent Information
- Application Number
- US29/924552
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2024-01-19
- Publication Date
- 2025-08-19
- Estimated Expiration
- 2040-08-19
Smart Images
Figure USD1089130-D00000_ABST
Description
[0001] FIG. 1 is a top, front, left side isometric view of a process chamber manifold, showing our new design.
[0002] FIG. 2 is a bottom, rear, right side isometric view thereof.
[0003] FIG. 3 is a left side elevation view thereof.
[0004] FIG. 4 is a right side elevation view thereof.
[0005] FIG. 5 is a front elevation view thereof.
[0006] FIG. 6 is a rear elevation view thereof.
[0007] FIG. 7 is a top plan view thereof.
[0008] FIG. 8 is a bottom plan view thereof.
[0009] FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 7; and,
[0010] FIG. 10 is a cross-sectional view taken along line 10-10 in FIG. 7.
Claims
The ornamental design for a process chamber manifold, as shown and described.
Citation Information
Patent Citations
Gas introduction pipe for substrate processing equipment
JP1624352S
Atomic layer deposition chamber with thermal lid
US10407771B2
Counter-flow multi inject for atomic layer deposition chamber
US10982326B2
Gas-dispersing apparatus for multiple chemical resources
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Atomic layer deposition chamber with multi inject
US20110223334A1
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