Rotor for semiconductor manufacturing device
USD1096675SActive Publication Date: 2025-10-07AP SYST INC
Patent Information
- Application Number
- US29/861722
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Priority Date
- 2022-06-03
- Filing Date
- 2022-12-01
- Publication Date
- 2025-10-07
- Estimated Expiration
- 2040-10-07
Smart Images
Figure USD1096675-D00000_ABST
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Description
[0001] FIG. 1 is a perspective view of a rotor for semiconductor manufacturing device, showing our new design;
[0002] FIG. 2 is a front view thereof;
[0003] FIG. 3 is a top plan view thereof; and,
[0004] FIG. 4 is a bottom plan view thereof.
[0005] All sides not shown form no part of the claimed design. The broken lines form no part of the claimed design.
Claims
The ornamental design for a rotor for semiconductor manufacturing device as shown and described.
Citation Information
Patent Citations
Rotor for a high speed electrical machine
US11742711B1
Rotary substrate processing apparatus and method
US20020170571A1
Retaining ring for use on a carrier of a polishing apparatus
US20040077167A1
Retaining ring for chemical mechanical polishing
US20110065368A1
Retainer rings of chemical mechanical polishing apparatus and methods of manufacturing the same
US20120309276A1
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