Gas distribution plate

USD1103948SActive Publication Date: 2025-12-02APPLIED MATERIALS INC

Patent Information

Application Number
US29/804613
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2021-08-21
Publication Date
2025-12-02
Estimated Expiration
2040-12-02

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Description

[0001] FIG. 1 is a top-front isometric view of a gas distribution plate;

[0002] FIG. 2 is a top-rear isometric view of the gas distribution plate of FIG. 1;

[0003] FIG. 3 is a front view of the gas distribution plate of FIG. 1;

[0004] FIG. 4 is a rear view of the gas distribution plate of FIG. 1;

[0005] FIG. 5 is a left side view of the gas distribution plate of FIG. 1;

[0006] FIG. 6 is a right side view of the gas distribution plate of FIG. 1;

[0007] FIG. 7 is a top view of the gas distribution plate of FIG. 1;

[0008] FIG. 8 is a bottom view of the gas distribution plate of FIG. 1; and,

[0009] FIG. 9 is an enlarged view of area IX in FIG. 3.

[0010] The broken lines in the drawings illustrate portions of the article that form no part of the claimed design.

[0011] The dot-dash broken line, shown in FIGS. 1, 3 and 9, illustrates a claim boundary and forms no part of the claimed design. The darker line weight broken line shown in FIGS. 3 & 9 illustrates the boundary of the enlarged view identified by area IX, shown in FIG. 3. The lighter line weight broken line forms no part of the claimed design.

[0012] The surfaces illustrated without any surface shading form no part of the claimed design.

Claims

The ornamental design for a gas distribution plate, substantially as shown and described.

Citation Information

Patent Citations

  • Gas distribution plate for semiconductor processing chambers

    CN306731322S

  • Physical vapor deposition equipment targets

    JP1640252S

  • Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate

    TW201610220A

  • Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling

    TW201834111A

  • Cleaning plate for inducing turbulent flow of a processing chamber cleaning gas

    TWD147215S

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