Process chamber collimator
Patent Information
- Application Number
- US29/933826
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2024-03-21
- Publication Date
- 2025-12-02
- Estimated Expiration
- 2040-12-02
Smart Images

Figure USD1103950-D00000_ABST
Description
[0001] FIG. 1 is a top, front, left side isometric view of a process chamber collimator, showing our new design.
[0002] FIG. 2 is a top, rear, right side isometric view thereof.
[0003] FIG. 3 is a bottom, front, left side isometric view thereof.
[0004] FIG. 4 is a bottom, rear, right side isometric view thereof.
[0005] FIG. 5 is a front elevation view thereof.
[0006] FIG. 6 is a rear elevation view thereof.
[0007] FIG. 7 is a left side elevation view thereof.
[0008] FIG. 8 is a right side elevation view thereof.
[0009] FIG. 9 is a top plan view thereof.
[0010] FIG. 10 is a bottom plan view thereof.
[0011] FIG. 11 is a cross-sectional view taken along line 11-11 in FIG. 9.
[0012] FIG. 12 is a cross-sectional view taken along line 12-12 in FIG. 9.
[0013] FIG. 13 is an enlarged portion view of an encircled portion labeled, “FIG. 13” in FIG. 12; and,
[0014] FIG. 14 is an enlarged portion view of an encircled portion labeled, “FIG. 14” in FIG. 12.
[0015] The dot-dot-dashed broken lines shown in FIGS. 12-14 illustrate the boundary lines of the enlarged portion views of FIGS. 13 and 14 and form no part of the claimed design. The even dashed broken lines shown in the drawings represent portions of the process chamber collimator that form no part of the claimed design.
Claims
The ornamental design for a process chamber collimator, as shown and described.
Citation Information
Patent Citations
Collimator for use in a physical vapor deposition (PVD) chamber
TWD227585S
Collimator for a physical vapor deposition chamber
USD858468S1
Collimator for a physical vapor deposition chamber
USD859333S1
Collimator for use in a physical vapor deposition (PVD) chamber
USD997111S1
Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1
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