Showerhead for a substrate processing system
Patent Information
- Application Number
- US29/836113
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2022-04-25
- Publication Date
- 2025-12-30
- Estimated Expiration
- 2040-12-30
Smart Images

Figure USD1107670-D00000_ABST
Description
[0001] FIG. 1 is a top perspective view of a showerhead for a substrate processing system;
[0002] FIG. 2 illustrates left, right, front, and rear side views of the showerhead for the substrate processing system shown in FIG. 1;
[0003] FIG. 3 is a top view of the showerhead for the substrate processing system shown in FIG. 1;
[0004] FIG. 4 is a bottom view of the showerhead for the substrate processing system shown in FIG. 1; and,
[0005] FIG. 5 is an enlarged portion view of FIG. 4 showing gas through holes in dotted lines.
[0006] The dashed broken lines depict portions of the showerhead for a substrate processing system that form no part thereof.
Claims
The ornamental design for a showerhead for a substrate processing system as shown and described.
Citation Information
Patent Citations
Showerhead for a semiconductor substrate processing system
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Showerhead for a substrate processing system
KR301219375S
Showerhead for chemical vapor deposition
US20090260571A1
Substrate processing chamber with showerhead having cooled faceplate
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Shower head
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