Showerhead for a substrate processing system

USD1107670SActive Publication Date: 2025-12-30LAM RES CORP
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Patent Information

Application Number
US29/836113
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2022-04-25
Publication Date
2025-12-30
Estimated Expiration
2040-12-30

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Description

[0001] FIG. 1 is a top perspective view of a showerhead for a substrate processing system;

[0002] FIG. 2 illustrates left, right, front, and rear side views of the showerhead for the substrate processing system shown in FIG. 1;

[0003] FIG. 3 is a top view of the showerhead for the substrate processing system shown in FIG. 1;

[0004] FIG. 4 is a bottom view of the showerhead for the substrate processing system shown in FIG. 1; and,

[0005] FIG. 5 is an enlarged portion view of FIG. 4 showing gas through holes in dotted lines.

[0006] The dashed broken lines depict portions of the showerhead for a substrate processing system that form no part thereof.

Claims

The ornamental design for a showerhead for a substrate processing system as shown and described.

Citation Information

Patent Citations

  • Showerhead for a semiconductor substrate processing system

    KR301201007S

  • Showerhead for a substrate processing system

    KR301219375S

  • Showerhead for chemical vapor deposition

    US20090260571A1

  • Substrate processing chamber with showerhead having cooled faceplate

    US20190376183A1

  • Shower head

    USD328944S