Electrode cover for a plasma processing apparatus

USD1108380SActive Publication Date: 2026-01-06HITACHI HIGH TECH CORP

Patent Information

Application Number
US29/934856
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Priority Date
2023-09-29
Filing Date
2024-03-28
Publication Date
2026-01-06
Estimated Expiration
2041-01-06

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Description

[0001] FIG. 1 is a front, top and right side perspective view of an electrode cover for a plasma processing apparatus, showing our new design;

[0002] FIG. 2 is a rear, bottom and left side perspective view thereof;

[0003] FIG. 3 is a front elevational view thereof;

[0004] FIG. 4 is a right side elevational view thereof;

[0005] FIG. 5 is a left side elevational view thereof;

[0006] FIG. 6 is a rear elevational view thereof;

[0007] FIG. 7 is a top plan view thereof;

[0008] FIG. 8 is a bottom plan view thereof;

[0009] FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 3;

[0010] FIG. 10 is an enlarged portion view shown in a dot-dash line box labeled, “FIG. 10,” in “FIG. 9”;

[0011] FIG. 11 is an enlarged portion view shown in a dot-dash line box labeled, “FIG. 11,” in “FIG. 1”; and,

[0012] FIG. 12 is an enlarged portion view shown in a dot-dash line box labeled, “FIG. 12,” in “FIG. 7”.

[0013] The dot-dash line boxes shown in FIGS. 1, 7 and 9 define the enlarged portions shown in FIGS. 10-12, and form no part of the claimed design.

Claims

The ornamental design for an electrode cover for a plasma processing apparatus as shown and described.

Citation Information

Patent Citations

  • Susceptor for Plasma Processing Equipment

    JP1584241S

  • Susceptor for plasma processing equipment

    JP1584906S

  • Electrode cover for a plasma processing apparatus

    USD827592S

  • Electrode cover for a plasma processing apparatus

    USD840364S

  • Gasket

    US1798246A

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