Filler block for substrate processing apparatus

USD1108381SActive Publication Date: 2026-01-06KOKUSAI DENKI KK
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Patent Information

Application Number
US29/961389
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Priority Date
2024-03-08
Filing Date
2024-09-05
Publication Date
2026-01-06
Estimated Expiration
2041-01-06

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Description

[0001] FIG. 1 is a front, top and right side perspective view of a filler block for substrate processing apparatus showing my new design;

[0002] FIG. 2 is a front elevational view thereof;

[0003] FIG. 3 is a left side elevational view thereof;

[0004] FIG. 4 is a right side elevational view thereof;

[0005] FIG. 5 is a top plan view thereof;

[0006] FIG. 6 is a bottom plan view thereof;

[0007] FIG. 7 is a rear elevational view thereof; and,

[0008] FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.

Claims

The ornamental design for a filler block for substrate processing apparatus as shown and described.

Citation Information

Patent Citations

  • Substrate processing apparatus

    US11646184B2

  • Substrate processing method

    US12020934B2

  • Recess filling method and substrate processing apparatus

    US12374543B2

  • Chamber filler kit for plasma etch chamber useful for fast gas switching

    US20130244440A1

  • Chamber filler kit for dielectric etch chamber

    US20180005851A1