Gas nozzle for a substrate processing apparatus
Patent Information
- Application Number
- US29/961397
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Priority Date
- 2024-03-08
- Filing Date
- 2024-09-05
- Publication Date
- 2026-01-20
- Estimated Expiration
- 2041-01-20
Smart Images

Figure USD1109711-D00000_ABST
Description
[0001] FIG. 1 is a front, bottom and left side perspective view of a gas nozzle for a substrate processing apparatus, showing our new design;
[0002] FIG. 2 is a front elevational view thereof;
[0003] FIG. 3 is a top plan view thereof;
[0004] FIG. 4 is a bottom plan view thereof; and
[0005] FIG. 5 is a rear elevational view thereof;
[0006] FIG. 6 is a left side elevational view thereof;
[0007] FIG. 7 is a right side elevational view thereof;
[0008] FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2;
[0009] FIG. 9 is an enlarged portion view taken from encircled portion labeled, “9,” in FIG. 1;
[0010] FIG. 10 is a cross sectional view taken along line 10-10 in FIG. 2;
[0011] FIG. 11 is a cross sectional view taken along line 11-11 in FIG. 2;
[0012] FIG. 12 is an enlarged view of FIG. 6; and,
[0013] FIG. 13 is an enlarged view of FIG. 7.
[0014] The dot-dashed lines shown in FIGS. 1 and 9 represent boundary lines of the enlarged portion view of FIG. 9 and form no part of the claimed design.
Claims
The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.
Citation Information
Patent Citations
Gas supply nozzle for substrate processing apparatus
CN303532538S
Gas supply nozzle for substrate processing device
KR300751382S
Gas supply nozzle for substrate processing device
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Gas supply nozzle for substrate processing device
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