Gas nozzle for a substrate processing apparatus
Patent Information
- Application Number
- US29/961394
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Priority Date
- 2024-03-08
- Filing Date
- 2024-09-05
- Publication Date
- 2026-02-03
- Estimated Expiration
- 2041-02-03
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Figure USD1110978-D00000_ABST
Description
[0001] FIG. 1 is a front, bottom and left side perspective view of a gas nozzle for a substrate processing apparatus, showing our new design;
[0002] FIG. 2 is a front elevational view thereof;
[0003] FIG. 3 is a top plan view thereof;
[0004] FIG. 4 is a bottom plan view thereof; and
[0005] FIG. 5 is a rear elevational view thereof;
[0006] FIG. 6 is a left side elevational view thereof;
[0007] FIG. 7 is a right side elevational view thereof;
[0008] FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 6;
[0009] FIG. 9 is an enlarged portion view taken from encircled portion labeled, “9,” in FIG. 1;
[0010] FIG. 10 is an enlarged view of FIG. 6; and,
[0011] FIG. 11 is an enlarged view of FIG. 7.
[0012] The even dashed broken lines in the drawings represent portions of the gas nozzle for a substrate processing apparatus that form no part of the claimed design.
[0013] The dot-dashed lines shown in FIGS. 1, 8 and 9 represent boundary lines and form no part of the claimed design.
Claims
The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.
Citation Information
Patent Citations
Gas supply nozzle for substrate processing apparatus
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Gas supply nozzle for substrate processing device
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Gas supply nozzle for substrate processing device
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Gas supply nozzle for substrate processing device
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Gas supply nozzle for substrate processing device
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