Gas nozzle for a substrate processing apparatus

USD1110978SActive Publication Date: 2026-02-03KOKUSAI DENKI KK
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Patent Information

Application Number
US29/961394
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Priority Date
2024-03-08
Filing Date
2024-09-05
Publication Date
2026-02-03
Estimated Expiration
2041-02-03

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Description

[0001] FIG. 1 is a front, bottom and left side perspective view of a gas nozzle for a substrate processing apparatus, showing our new design;

[0002] FIG. 2 is a front elevational view thereof;

[0003] FIG. 3 is a top plan view thereof;

[0004] FIG. 4 is a bottom plan view thereof; and

[0005] FIG. 5 is a rear elevational view thereof;

[0006] FIG. 6 is a left side elevational view thereof;

[0007] FIG. 7 is a right side elevational view thereof;

[0008] FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 6;

[0009] FIG. 9 is an enlarged portion view taken from encircled portion labeled, “9,” in FIG. 1;

[0010] FIG. 10 is an enlarged view of FIG. 6; and,

[0011] FIG. 11 is an enlarged view of FIG. 7.

[0012] The even dashed broken lines in the drawings represent portions of the gas nozzle for a substrate processing apparatus that form no part of the claimed design.

[0013] The dot-dashed lines shown in FIGS. 1, 8 and 9 represent boundary lines and form no part of the claimed design.

Claims

The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.

Citation Information

Patent Citations

  • Gas supply nozzle for substrate processing apparatus

    CN303532538S

  • Gas supply nozzle for substrate processing device

    KR300751382S

  • Gas supply nozzle for substrate processing device

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  • Gas supply nozzle for substrate processing device

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  • Gas supply nozzle for substrate processing device

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