Physical vapor deposition sputtering target

USD1129517SActive Publication Date: 2026-06-09APPLIED MATERIALS INC

Patent Information

Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
APPLIED MATERIALS INC
Filing Date
2025-01-17
Publication Date
2026-06-09

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Description

[0001] FIG. 1 is a top perspective view of a physical vapor deposition sputtering target.

[0002] FIG. 2 is a top plan view thereof.

[0003] FIG. 3 is a bottom plan view thereof.

[0004] FIG. 4 is a front elevation thereof.

[0005] FIG. 5 is a back elevation view thereof.

[0006] FIG. 6 is a right elevation view thereof.

[0007] FIG. 7 is a left elevation view thereof; and,

[0008] FIG. 8 is an enlarged partial front elevation view showing portions of the design in greater detail.

[0009] The broken lines shown in the drawings depict portions of the physical vapor deposition sputtering target that form no part of the claimed design. The dot-dash lines encircling portions of the physical vapor deposition sputtering target in FIGS. 4 and 8 indicate enlargements and form no part of the claimed design.

Claims

The ornamental design for a physical vapor deposition sputtering target, as shown and described.