Physical vapor deposition sputtering target
Patent Information
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- APPLIED MATERIALS INC
- Filing Date
- 2025-01-17
- Publication Date
- 2026-06-09
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Figure USD1129517-D00000_ABST
Description
[0001] FIG. 1 is a top perspective view of a physical vapor deposition sputtering target.
[0002] FIG. 2 is a top plan view thereof.
[0003] FIG. 3 is a bottom plan view thereof.
[0004] FIG. 4 is a front elevation thereof.
[0005] FIG. 5 is a back elevation view thereof.
[0006] FIG. 6 is a right elevation view thereof.
[0007] FIG. 7 is a left elevation view thereof; and,
[0008] FIG. 8 is an enlarged partial front elevation view showing portions of the design in greater detail.
[0009] The broken lines shown in the drawings depict portions of the physical vapor deposition sputtering target that form no part of the claimed design. The dot-dash lines encircling portions of the physical vapor deposition sputtering target in FIGS. 4 and 8 indicate enlargements and form no part of the claimed design.
Claims
The ornamental design for a physical vapor deposition sputtering target, as shown and described.